JP2006520107A5 - - Google Patents

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Publication number
JP2006520107A5
JP2006520107A5 JP2006509069A JP2006509069A JP2006520107A5 JP 2006520107 A5 JP2006520107 A5 JP 2006520107A5 JP 2006509069 A JP2006509069 A JP 2006509069A JP 2006509069 A JP2006509069 A JP 2006509069A JP 2006520107 A5 JP2006520107 A5 JP 2006520107A5
Authority
JP
Japan
Prior art keywords
rotational axis
shape
tubular opening
curved surfaces
adjacent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006509069A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006520107A (ja
JP4638867B2 (ja
Filing date
Publication date
Priority claimed from US10/384,967 external-priority patent/US6904073B2/en
Priority claimed from US10/409,254 external-priority patent/US6972421B2/en
Priority claimed from US10/742,233 external-priority patent/US7180081B2/en
Application filed filed Critical
Priority claimed from PCT/US2004/006551 external-priority patent/WO2004081503A2/en
Publication of JP2006520107A publication Critical patent/JP2006520107A/ja
Publication of JP2006520107A5 publication Critical patent/JP2006520107A5/ja
Application granted granted Critical
Publication of JP4638867B2 publication Critical patent/JP4638867B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2006509069A 2003-03-08 2004-03-03 放電生成プラズマｅｕｖ光源 Expired - Fee Related JP4638867B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/384,967 US6904073B2 (en) 2001-01-29 2003-03-08 High power deep ultraviolet laser with long life optics
US10/409,254 US6972421B2 (en) 2000-06-09 2003-04-08 Extreme ultraviolet light source
US10/742,233 US7180081B2 (en) 2000-06-09 2003-12-18 Discharge produced plasma EUV light source
PCT/US2004/006551 WO2004081503A2 (en) 2003-03-08 2004-03-03 Discharge produced plasma euv light source

Publications (3)

Publication Number Publication Date
JP2006520107A JP2006520107A (ja) 2006-08-31
JP2006520107A5 true JP2006520107A5 (zh) 2007-06-14
JP4638867B2 JP4638867B2 (ja) 2011-02-23

Family

ID=46205121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006509069A Expired - Fee Related JP4638867B2 (ja) 2003-03-08 2004-03-03 放電生成プラズマｅｕｖ光源

Country Status (4)

Country Link
EP (1) EP1602116A4 (zh)
JP (1) JP4638867B2 (zh)
TW (1) TWI275325B (zh)
WO (1) WO2004081503A2 (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7410265B2 (en) * 2000-09-13 2008-08-12 Carl Zeiss Smt Ag Focusing-device for the radiation from a light source
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
JP2006202671A (ja) * 2005-01-24 2006-08-03 Ushio Inc 極端紫外光光源装置及び極端紫外光光源装置で発生するデブリの除去方法
DE102005015274B4 (de) * 2005-03-31 2012-02-23 Xtreme Technologies Gmbh Strahlungsquelle zur Erzeugung kurzwelliger Strahlung
US7141806B1 (en) * 2005-06-27 2006-11-28 Cymer, Inc. EUV light source collector erosion mitigation
US7394083B2 (en) * 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
US20070115443A1 (en) * 2005-11-23 2007-05-24 Asml Netherlands B.V. Radiation system and lithographic apparatus
US7465943B2 (en) * 2005-12-08 2008-12-16 Asml Netherlands B.V. Controlling the flow through the collector during cleaning
US7960701B2 (en) 2007-12-20 2011-06-14 Cymer, Inc. EUV light source components and methods for producing, using and refurbishing same
NL1036768A1 (nl) 2008-04-29 2009-10-30 Asml Netherlands Bv Radiation source.
JP5252586B2 (ja) * 2009-04-15 2013-07-31 ウシオ電機株式会社 レーザー駆動光源
US8153994B2 (en) * 2009-12-02 2012-04-10 Media Lario S.R.L. Cooling systems and methods for grazing incidence EUV lightography collectors
US8276866B2 (en) * 2010-03-08 2012-10-02 Media Lario, S.R.L. Adjustable clips for grazing-incidence collectors
US10437162B2 (en) * 2017-09-21 2019-10-08 Asml Netherlands B.V. Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58115821A (ja) * 1981-12-28 1983-07-09 Fujitsu Ltd Ｘ線露光装置
US6452199B1 (en) * 1997-05-12 2002-09-17 Cymer, Inc. Plasma focus high energy photon source with blast shield
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
JP2001144002A (ja) * 1999-11-16 2001-05-25 Canon Inc 環境チャンバおよび半導体製造装置
US6576912B2 (en) * 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
US6567499B2 (en) * 2001-06-07 2003-05-20 Plex Llc Star pinch X-ray and extreme ultraviolet photon source
DE10219173A1 (de) * 2002-04-30 2003-11-20 Philips Intellectual Property Verfahren zur Erzeugung von Extrem-Ultraviolett-Strahlung
TWI241465B (en) * 2002-11-22 2005-10-11 Asml Netherlands Bv Lithographic projection apparatus with multiple suppression meshes

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