TW200425802A - Discharge produced plasma EUV light source - Google Patents

Abstract

An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO2. The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.

Description

200425802 (1) Description of the invention: [Technical field to which the invention belongs; j Field of the invention The present invention relates to EUV and 5 soft X-ray light sources that use a discharge between electrodes to form a light emitting plasma. t Prior Art 3 Related Applications This application is a partial continuation of the following cases, which was filed on April 8, 2003 as a partial continuation of US Serial No. 10 / 384,967, filed on March 8, 2003 U.S. Serial No. 10 / 409,254, U.S. Serial No. 10 / 189,824 filed on July 3, 2002, U.S. Serial No. 10 / 120,655, filed on April 10, 2002, now U.S. Patent No. 6,586,757, June 6, 2001 U.S. Serial No. 09 / 875,719, filed on June 6, and U.S. Serial No. 09 / 875,721, filed on June 6, 2001; U.S. Serial Number 15, 09 / 690,084, filed on October 16, 2000; and requested October 31, 2002 The patent application number 60 / 422,808 filed and the benefit of 60 / 419,805 filed on October 18, 2002; each of the above cases are incorporated herein by reference. BACKGROUND OF THE INVENTION It is well known to generate extreme ultraviolet ("EUV"), for example, by applying a high voltage across an electrode to generate a plasma generated by discharge, such as in a gaseous medium such as containing an active material such as xenon. Light at EUV wavelengths, such as 13.5 nm xenon (also known as soft X-rays). These EUV light sources are often referred to as plasma generated ("DPP") EUV (soft X-ray) light sources. U.S. Patent No. 7 200425802 5,763,930 issued to Partlo on June 9, 1998; U.S. Patent No. 6,064,072, issued to Partlo et al. On May 16, 2000; 2002 US Patent No. 6,452,199 issued to Partello et al. On September 17, US Patent No. 6,541,786 issued to Partlo on April 1, 2003, and Certificate issued on July 1, 2003 5 to US Patent No. 6,586,757 to Melnychuck and others, and US Patent Application No. 09 / 752,818 under review, filed on April 10, 2002 under the name "Use Pulse Power System for Far Ultraviolet and X-Ray, No. 10 / 120,655, Inventor Ness et al., Published on November 7, 2002, Announcement No. US / 2002-0163313-A1, July 2002 Submitted on the 3rd as "10" Plasma Focusing Light Source with Improved Pulse Power System, No. 10 / 189,824, inventor Melnychuck and others, published on January 9, 2003, Announcement No. US / 2003-0006383-A1, filed on March 8, 2003, entitled "High Power Deep Ultraviolet Laser with Long Lifetime Optical Device, No. 10 / 384,967, the inventor Yager et al., Submitted on April 8, 2003, the name 15 "Far Ultraviolet Light Source," No. 10 / 409,254, the inventor Melnychuck and others; Each of the above cases deals with the type of EUV light source that specifically uses dpp to generate a plasma for generating light, the disclosure of each of the above cases is incorporated herein by reference. The current EUV collection optics are, for example, composed of several nested shells with a common focus at some common ambient temperatures 20. Generally speaking, these shells are formed of, for example, nickel, and emphasize having relatively thin walls, such as approximately 1 mm thick. The result of EUV light is a high thermal load on the components close to the source of the Euv. In the case of optical components, these thermal loads s may bend the critical surface and shift the focus. 8 200425802 A very efficient way to send EUV light, for example via an "incident glancing angle" reflector. Generally speaking, the nested collector shell, for example, emphasizes that it has at least two different reflective surfaces, such as flat or curved surfaces, so that the plasma generated by self-discharge can emit light at a large angle to a smaller angle of 5 That is, the numerical aperture is collected and delivered to an intermediate focus or focal plane. Avoiding distortion and maintaining the focal plane or focal point is a type that can be partially modified with an EUV light source design. Electrode life is another EUV light source issue that needs attention. An electrode life of 100M firing with 10 10% output degradation is believed to be the minimum requirement for a DPP EUV system. The current technology only allows firing of less than about 30M for the above-mentioned deterioration. The by-product of EUV emission from a turn-clamp plasma generated by a DPP is a high thermal load on the structure and components next to the turn-clamp configuration. This can have several detrimental effects on performance and component life. For example, in the case of a 15 center electrode, the thermal load can be severe enough to cause excessive erosion of the electrode's external surface, such as through material evaporation. Because of several factors including the influence on the shape of the plasma and the inability to withstand the pressure of the cooling water flowing inside the electrode structure, these electrodes must eventually be replaced due to erosion. At this time, the life of the EUV electrode was an order of magnitude different from the life number 20 quoted by Microfilm. Therefore, replacement costs and machine downtime during electrode replacement constitute the majority of the “cost of ownership” of DPP EUV light sources. It is known to use SiC-BN in the defense industry for armor plating. BN-doped SiC is common for SiC-graphite systems such as coated fibers containing BN 9 200425802. TiW has been used on contacts in the semiconductor industry and is a common machining material, such as for pVD dry materials. Another important consideration of a 5 DPPEUV light source is that the plasma generated by the discharge needs to be read for money—the harmful shadows of red electrode debris created on the optical device of the money collection optical element system are simply reduced. DPP asks for light_other—4 The main form is: it needs to inject people and decoration energy most efficiently, such as to achieve a large light output for a given energy input. Very high energy light output is required, and for example due to the setting of 10 = and heat dissipation requirements, there are limitations in the ability to deliver very high energy pulses to the discharge electrode at the required repetition rate, for example. [Summary of the invention] Summary of the invention 15 Self-removal of electricity from the body _ • produces one: genus =: using a metal tooth element gas m chest-Γ 金属 metal debris reduction device. ,, Yes-can include multiple curved masks, where multiple curved masking members have = the inner and outer surfaces connected by the channel, the first space of #, ",, and the points show m and the ancient * The open workshop presents a parent replacement and can have an on-rotation axis and a rotation axis. The shape is elliptical / -® and at the other 20 electrical pulses and its shape is set to supply a discharge = current to the electrode and discharge during discharge. Radial compression stage === production :; It is used as ... ~, there is an inlet connected to the production chamber and it can be pumped to give priority to pumping than the source gas containing-adjusted conductive electricity & The source may be an electrode, and the conductive electrode contains .. ~ difference. 10 200425802 A hybrid ceramic material that is doped in a first region to select at least conductivity and a second region to select at least thermal conductivity. The first region may be located on or near the outer surface of the electrode structure, and the ceramic material may be SiC or alumina, and the dopant may be BN or a metal oxide including SiO or Ti02. The source may include Mobile electrode assembly mount and operable to mount electrode assembly Moved from a replacement position to an operating position, where the removable mounting base is located on a telescopic joint. This source may have a temperature control mechanism that is operatively connected to the collector and is operable to adjust each The temperature of the shell member maintains a temperature-dependent geometry to optimize the glancing angle of the incident reflection 10 from the respective shell member, or has a mechanical positioner for positioning the shell member. Yes A voltage biases the casing. The off-focus lightning can be used to make miscellaneous shields. The anode can be cooled by a hollow metal with two coolant channels or a porous metal with channels. Can Benefits ^ Provides interlocking tabs that are uniformly separated and strengthened without blocking significant amounts of light. From 15 to 15 large or medium-sized pieces are attached to each other to reduce installation rings or hubs to form a hybrid cover. ', The diagram is briefly explained. The first figure shows `` a schematic diagram of the main components of the embodiment of the electro-polymerized EUV (soft X-ray) light source system generated by the discharge; 20 The second figure shows the electrode for generating DPP EUV light. Of Intent; FIG. 3 shows an embodiment of a collector system for an EUV light source, such as a suitable light collecting device for collecting light in an emission cone; FIG. 4 shows an example of a collection shown in FIG. 3 A cross-sectional view of a glancing angle of 11 ^ 5802 operation of the embodiment of the device; FIG. 5 shows an embodiment of the present invention, which includes an electrode replacement system according to an embodiment of the present invention; and FIG. 6 shows Figure 4 is a close-up view of the embodiment; 5 Figure 7 shows the embodiments of Figures 5 and 6 with a gate valve sealing mechanism suitable for electrode replacement; Figure 8 shows one of the embodiments according to the invention Schematic diagram of a procedure for manufacturing materials that can be effectively used in DPP electrodes; FIG. 9 shows a cross-sectional view of a center electrode (anode) 10 according to one embodiment of the present invention; FIG. A three-dimensional cross-sectional view of an electrode assembly according to an embodiment; FIG. 11 shows a part of the electrode assembly shown in FIG. 10 and a close-up three-dimensional cross-sectional view of the center electrode (anode) shown in FIG. 9; 15 Figure 12 shows the electrode assembly shown in Figures 10 and 11. Views; Figures 12a to C show cross-sectional views of the electrode assembly of Figures 10 to 12, with the cross section taken along lines AA, BB, and CC of Figure 12; Figure 13 shows the electrodes of Figures 10 to Ik A cross-sectional view of the assembly, including a center electrode (anode) assembly; 20 FIG. 14 shows the assembly of FIGS. 10 to 13-cold heading, which shows the cooling passage according to an embodiment of the present invention; Peng FIG. 5 shows a perspective view of a debris mask according to an embodiment of the present invention; FIG. 16 shows a schematic diagram of a procedure for manufacturing debris according to the embodiment of the present invention; 12 200425802 masks; FIGS. 17A to 17D show Another debris shield according to an embodiment of the present invention; and FIGS. 18A and 18B show a simulation model of a type of production and a plasma turn clamp according to an embodiment of the present invention. [Real mode; J Detailed description of the preferred embodiment Now referring to FIG. 1, a plasma ("DPP,") EUV and soft X-ray light source 20 generated by a discharge according to one embodiment of the present invention is shown. The EUV light source may be Example 10 includes a housing 22 that defines a discharge cell 24. For example, a pair of electrodes 26, such as one of a wall attached through the chamber 22, may be sealed to seal the opening, and the pair of electrodes 26 may include a generally cylindrical The electrodes include, for example, an external electrode 28 that may be a cathode, and an internal electrode 30 that may be an anode, or vice versa, but the present disclosure will adopt the aforementioned method. The internal electrode 30 may be as shown in FIG. 2 and FIG. 15. It is shown that, for example, it is insulated from the external electrode 28 by an insulator 70, and when, for example, a solid-state pulse power module 139 is supplied with a high-voltage and a fast-rising electric energy pulse, as shown in FIG. For example, a plasma containing helium generates a discharge between the electrodes 28 and 30. For example, as shown in Figures 10 to 12, the discharge can be facilitated by the activation of a pre-ionizer 206. 20 This discharge Pre-ionization The internal electrodes of the insulator 206 and the insulator 70 generally show a magnetic field extending radially, as shown in 82 in FIG. 2, and then extend axially when being sent along the outer surface 208 of the internal electrode (anode) 30, as shown in FIG. 2. This is shown schematically in Figure 84. The axially extending magnetic field material forms a high-density plasma turn that is briefly defined by a magnetic field 84 containing a source material such as xenon. 13 '32' The source material is, for example, via a source duct 60 Delivered to the site of orbicularitis and, for example, into the central electrode (anode) tip recess 34 of the central electrode 30. The light emitted from the plasma coil clamp passes through, for example, can trap trapped sounds and may damage the collection. Debris shields 36 of reflective surfaces in the reflector 40, such as ionized xenon particles emitted from the plasma during the light generation procedure, or debris shields of electrode materials such as crane debris from the electrode, may then be provided by, for example, an incident collector 40 The glancing angle is collected. The light focused by the collector 40 can also pass through a spectral purity filter, for example, the light focused by the collector 40 can be the focal point or focal point of the so-called intermediate focus 42. Incident reflection The single curved surface of the EUV light reflects rays due to the grazing angle. The spectral purity filter can be used to filter out almost all light except for narrower frequencies, such as 13.5 nm and 13.5 nm. One form of an embodiment of the present invention includes compensating the thermal load on the collector 40 and 15 to generate a more uniform high Ενν energy delivered to the intermediate focus 42. Referring now to FIGS. 3 and 4, there is shown in accordance with the present invention A perspective sectional view of the collector 40 according to an embodiment of the invention also shows a schematic diagram of an example of the collector 40 according to the embodiment of the present invention. As shown in FIG. 4, one is used to track some exemplary restricted rays. The ray system has a limiting ray 04 and a limiting ray and is arranged to reflect the limiting ray 104 from the σ 卩 1Q2a to the part 1Q2b at a glancing angle of incidence, wherein each shell of the collector 40 102 has a first shell portion 102a and a second shell portion 102b, and each portion 102a, can be flat or curved. On some Chuanxiong 14 200425802, the grazing angle of the incident reflection focuses the light in the rays 104, 104, toward the intermediate focal point 42. For this application, the light can be widened and needs to pass through a filter, such as the spectral purity filter 50 shown in FIG. As shown in FIG. 4, there is only a very small volume, that is, a solid space to support the thickness of each of the shells 102 and 5 including the component parts 102a and 102b. This will hinder the transmission of adjacent casings, such as one. By modifying the shell's geometry, thicker walls can increase the individual grazing angles, thereby reducing the design's transmission efficiency. For example, depending on the wavelength λ of the emitted light and the material of the reflective surface, some of the light rays 104 "and 104 '" do not enter the cone of the collector 40 or enter the grazing angle at an appropriate angle of 10 (usually less than about 2.) When not entering, it is not collected by the collector. As shown in Fig. 3, the collector 40 may be composed of a plurality of nested shells 102, each of which has a smaller diameter than the other outer shell. The shell can be composed of a plurality of parts, for example, two parts 102a and 102b, of which the part 102a is closest to the turn clamp portion 32. For example, the angle of each of the shells 102 and 102a can be set to reflect the light rays in a part of the incident cone of the light generated by the plasma on the collector 40 shell 102 and reflect the light to the Section 102b. On the portion 102b, a further incident reflection glancing angle may occur, which may, for example, reflect an incident EUV 20 light at an angle focused on the intermediate focal point 42. The housing 102 may be mounted to a collector hub 90, for example, and the collector hub 90 may have a collector hub extension 92 extending from the hub 90 along the axial length of the collector 40, for example. A plurality of, for example, four radial supports 94 are also attached to the 90s. Kexin may connect each of the shells 102 to the bracket 94 by welding or brazing. It is possible to strengthen the structure of the collector 40 and the installation method of the shell sleeve 102 to the bracket 94 by 15 200425802 to the collector 100. According to one form of an embodiment of the present invention, the maximum heat load that the collector 40 can expect to see in month b can be obtained. The geometry of the collector 40 and its composition 5 The method of generating the shell 10 and its parts 102a and 102b can make it, for example, only one type of performance required by the focus specialist. That is, at a part of a known preselected temperature, the geometry of a known collector element 'will result in the required operating parameters, such as the focus selection of an intermediate focal point 42 such as a particular lambda. The heating element (not shown) may be attached to each of the 10 individual casings 102 of the collector 40 or, for example, to the hub 90 and / or its extension 92, and for example, whether having the original would cause the collector 40 temperature to vary with Any task cycle or repetition rate that changes over time can be used to maintain this ideal geometry. This changing temperature may, for example, cause the shell portions 102a, 102b to flex and / or modify their positional relationship with each other. According to another version of an embodiment of the present invention, 15 cooling can be used to maintain the required fixed temperature, such as including a Peltier cooler (not shown) instead of a heater element, such as Kryotherm ) Manufactured a Drift 0.8 (40 square millimeters) 172 watts. In either case, the collector housing 102 can be equipped with a biomorphic piezoelectric actuator such as a type 20 PL122-140 series manufactured by Physik Instrumente, which can be bonded by brazing, for example To the outer surface of each shell part 102a, 102b. Applying a voltage to the piezoelectric actuator, for example, will distort the housing parts 102a, 102b, so that the focal point of the housing 102 is substantially changed, for example, to the intermediate focus 42. According to a form of an embodiment of the present invention, each of the shells 102 may have 16 200425802, for example, and has two discrete parts 102a and 102b, and each of the parts 102a and 102b has its own for the other and for more than 90 Curvature and / or angular relationship. Kexin can maintain the focus by changing the relationship between the two halves 102a and 102b along the optical axis as expected. According to the degree of action required, for example, using a positioning motor (not shown) 5 or a piezoelectric element (not shown) This effect can be achieved. For example, a manipulator (not shown) connected to the casing 102 through a telescopic joint (not shown) can be used to install a motor or a piezoelectric component, such as outside a vacuum environment. The casing 1 2 can be interconnected, for example, on the joint 106 by a thin connection member that does not hinder the transmission of a significant amount of light through the collector, so for example, the 10 outermost casing 102 can be joined using an actuator as described above. The operation of the part 106 will have the effect of simultaneously manipulating all the shells 102. According to another form of an embodiment of the present invention, since the electrodes can be quickly replaced, the electrode life can become a "cost of ownership" issue. This can be done, for example, using a quick electrode replacement assembly as shown in Figures 5 to 7. According to another embodiment of the present invention, since the bias voltage is, for example, from the reflective surface of the casing 102 and faces toward the roughened surface, for example, the casing 102 may be connected to a bias voltage (not shown) to make the same polarity Charged ions are biased for debris collection. 20 At this time, the life of the EUV electrode was an order of magnitude different from the life figures quoted by Microfilm. Therefore, replacement costs and equipment downtime during electrode replacement constitute a large part of the “cost of ownership” of the DPP EUV source. The electrode 26 can also be positioned in a single location such as a collection optics 40, a spectral purity filter 50, and debris The large vacuum chamber 24 of the resistance member 32 and the like. By breaking the loose seal on the vacuum chamber 24 17 200425802 to access the electrode 26, for example, the interior of the vacuum chamber 24 is exposed to humidity, dirt, etc. Surrounding chamber conditions. The time of 'pumping to operating conditions when vacuum chamber 24 is released will adversely affect overall performance (cost of ownership) and may also cause debris and water 5 vapors to attach to the chamber due to exposure to the external environment Even in a perfect environment, the pumping time is about 5 to 10 minutes for a given room 24, which currently takes into account the volume necessary to accommodate the required optical components. For example, Faster pumping times are achieved by adding additional high vacuum pumps, but each requires a significant cost of approximately $ 20 to 10 $ 30K depending on the type of application selected. However, it is possible to pass through Vapor is pumped to eliminate important downtime factors. According to one embodiment of the present invention, for example, by adding a sealed flange adjacent to the electrode 26, it is no longer necessary to vent and reseal the container. Subsequent pumping is performed later. However, this position is not favorable for the position of the sealed 15 flange. Based on the need, the collection optics 40 (and therefore the debris blocking member 36) must be positioned next to the turn clamp 32 points In addition, the area immediately adjacent to the turn clamp 32, for example, may be subjected to a temperature of more than 200 (rc), or may be "plated" by a metal that evaporates from the surface of the electrode 26 during light emission. Type, therefore, by using the _ telescopic joint 122 20 to increase the distance between the tip of the electrode 26 and the first optical component such as the debris blocking member 36 to facilitate the replacement of the battery. This telescopic joint 122 can also have some functions for the following items: the applicant has observed that the optical alignment of the S32 32 position can change (for example, due to repetition rate and gas mixture), and the thermal effect on the collection optics For example, the collapsing of the collector 40), its shadow 18 200425802 sounds to the focal length of the collector 40. With the collapse of the telescopic joint 122, it is possible to establish Enough clearance to accommodate a sealing mechanism such as a gate valve 130. This gate valve 130 will perform the function of sealing the container 22 during the electrode 26 exchange.

Due to the large heat load originating from the position of the resistance clamp 32, the expansion joint η] must have a larger diameter to survive. However, because, for example, it must be withdrawn from the opening of the gate valve 130 during normal operation, the diameter of the telescopic joint 122 also determines, for example, the size of the gate valve 130 required to seal the chamber 24. For example, as shown in FIG. 10, by positioning the expansion joint 122 in a "shallow shape" with respect to the electrode 26, the thermal load to which the expansion joint 122 is exposed can be significantly reduced, for example. For example, a flange positioned on the chamber wall 132 and the electrode assembly 160; the "shielded" telescopic joint 122 between 34 and the telescopic joint 122 and the turn 32 position will help limit the size of the telescopic joint 122 (Such as smaller size), this also holds true for the gate valve 130. 15 Because any outgassing from any elastomer will severely reduce the optical

For the life of the assembly, the gate valve 130 must not have the elastomers commonly found in the environment in which the EUV optical assembly is located. However, the disadvantage of non-elastomeric seals is that they have strict requirements on the surface finish and flatness of the sealing surface. Within the Euv DPP environment, these surfaces must be positioned to minimize, for example, the plating caused by the evaporated metal discharged from the electrode 20 surface. Another embodiment of the present invention may include a replaceable sealing surface 136, which may be replaced in the event that the currently installed sealing surface deteriorates. Another embodiment of the present invention includes a dry nitrogen purge point near the sealing flange 126. If the sealing surface becomes contaminated (during electrode service) that cannot maintain vacuum integrity within the enclosure, a 19 leak can be detected and the chamber filled with dry nitrogen to prevent the formation of water vapor and the intrusion of debris from the surrounding environment. The elements of the EUV light source 20 can be quite large and therefore quite heavy. Individual sections of the vacuum container 22 may weigh more than 400 pounds. According to an embodiment of the present invention, the type “can be independently installed on a set of common linear rails (not shown) by each module such as a vacuum container, a segmented electrode 32 / DPP commutator 140” Unlock and slide these segments out for service as shown in Figure 7. Linear actuators, for example, provide dual uses for easy module handling and alignment during reassembly during electrode replacement. According to the consistent embodiment of the present invention, the material used for the electrode 26 must be carefully considered, and the manufacturing technology and its specific structural form must take into account the harsh environment in which the electrode must operate. Thermal load. Silicon carbide Sic is an example of a material with advantageous properties according to an embodiment of the present invention, such as adjusting SiC for high thermal conductivity and electrical conductivity. It is also possible to change the conductivity of such materials and similar materials commonly referred to as refractory metal carbide ceramics by adding specific refractory impurities, as described in more detail below. In addition to adjusting Sic and similar materials, for example, the conductivity of alumina and alumina (AlO2) can be adjusted by adding, for example, titanium dioxide. The resulting conductivity is doped—for example, it can withstand mouth splash damage and thermal damage better than any metal. In addition, titanium tungsten (TiW) Taoman metal composition ("ceremets") may also have similar effects as SiC and related materials. Tiw is conductive and does not require metal doping to create conductivity, however, it has a more limited thermal conductivity. If produced by vacuum hot pressing, the Tiw machine can be used well and most suitably for the type of an embodiment according to the present invention. Alumina-titanium oxide, alumina-titanium dioxide (A1N-Ti02) systems are also effective for low temperature systems. The applicant has found that the metal electrode 26, especially the internal electrode (anode) 30 5 is prone to melting and / or ablation on the surface of the electrode 26, especially near the turn clamp 32, that is, on the anode 30. Since the applicant has observed damage to the surface of the electrode 26 used, it is suggested that the plasma formed in the turn clamp 32 will transfer significant thermal and ion energy to the surface of the electrode 26, especially the anode 30. Even tungsten-rhenium (W-Th) alloys are around 3500, for example. K appears melted and splashes easily. 10 Covalent materials tend to be electrically insulating and more resistant to ionic damage. A doped ceramic such as SiC or alumina can be adjusted for electrical and thermal conductivity. For example, BN-doped SiC will be at 2700. K is decomposed and can be modified to have a thermal conductivity close to pure Shao. The degree of BN doping in SiC may be as high as 30% by weight. Because the trend of thermal shock resistance is directly proportional to the material's thermal conductivity, strength 15 degrees and fracture toughness, and inversely proportional to the expansion coefficient, SiC-BN composites can exhibit extremely high thermal shock resistance. Alumina has a thermal shock resistance of 200 ° C (ΔT ° c), and a BN-SiC composite having, for example, 30% BN doping exhibits 63 ° to 120 ° C (AT ° C). Since the ceramic may have inappropriate bulk conductivity, the conductivity close to the surface of the electrode 26 may be adjusted. As for alumina materials, metal oxide doping (Sn0, Ti02) can be used to enhance surface conductivity without significantly negatively changing other beneficial properties of the material. There are many ways to synthesize SiC-BN or alumina-titanium dioxide systems. Plasma spraying or liquid phase sintering can be used for the mixed source powder. May 21 200425802 Modify a particle-enhanced CVD growth procedure such as that used by Trex at Kauai to obtain the best material density and it is important for electrodes that do not crack or explode. Based on available literature and information, see for example

Homepage of Trex Enterprises. Because Trex's procedure is done at low pressure (100 Torr) 5 'the electrode will have relatively low dissolved gas and high density. The Trex SiC material is close to 100% dense, which is ideal. This procedure is shown schematically in Fig. 8. In the figure, for example, the SiC-BN composite via particle-reinforced cvd is schematically shown, that is, for example, a reduction of 100 millitorr. In the presence of MCS of H2, the thermal decomposition of 10 Methly-Chloro Silane 140 on BN particles 142 when a SiC surface 144 appeared. Other synthetic methods can be used, for example, for alumina_TiW: A) Sintering in a reducing environment to generate non-ideal oxides on the ceramic surface, that is, its oxygen is insufficient and conductive; B) Alumina is placed on titanium dioxide And 15 sintering / diffusing the two together; C) depositing two layers of alternating layers, and then grilling the system at> 1900 ° C or D) vacuum hot pressing, because the hot pressing of refractory metals can contain high Of dissolved gas, so it can be used for pure W, for example. High levels of dissolved gas will promote electrode dents and volcanic explosions in metal electrodes. 20 Referring now to FIG. 9, there is shown an electrode 26 (such as an anode 30), which may have, for example, an outer surface of TiW which may be formed, for example, of doped alumina or SiC_BN and may also be, for example, undoped TiW. 150. An electromoxibustion hydrofocal light source 20, such as that produced by EUV discharges for use in microlithography, has also caused other demands on the electrodes 26, especially 22 200425802 cooling and manufacturing requirements. Figure 2 schematically shows a coaxial electrode group with one cathode% and one anode 30, for example, can be exposed to high average heat flux (&gt; 1 kW / cm 2) and extremely high transient heat during pulsed operation. Flux (&gt; L MW / cm2). This may, for example, require the use of refractory metals and special alloys in conjunction with the best available cooling technology, as described above. High vacuum and structurally complete joints may also be required between different metals with different thermal expansion coefficients. Referring to Figures 9 to 16, an embodiment of the present invention including an electrode assembly 160 is shown. The electrode assembly 160 may include, for example, a cathode (external electrode) assembly 162 10 and an anode assembly 220. The applicant has tested cylindrical anode 30 (internal electrode) in several geometric embodiments with different outer diameters. The smallest cooled device tested has an outer diameter of 0.625 inches, and the other has an outer diameter of 0.725 inches. It is envisaged that larger electrodes with an outer diameter of 1 "or larger will be needed in the future. However, because the heat flux is distributed over a larger area, cooling of larger electrodes may be less difficult. 15 However, in larger diameter Among electrodes, due to large relative dimensional changes with temperature during manufacturing and operation, joining between different metals will become more difficult. Conversely, smaller diameter electrodes may be easier to manufacture but more difficult during operation Cooling. Generally speaking, this design is made more complicated by the need to transport a plasma source, such as a gas, through the center of the electrode. At present, 20 gas is foreseen, such as xenon. This transport may also be in a solid or liquid state. The electrode can be 26 and the delivered plasma source are regarded as consumables, so they are also cost-sensitive. Generally speaking, 'a combination of brazing and fusion welding technology can be used to assemble a type that is contemplated by an embodiment of the present invention. Electrodes. Joint type 23 200425802 and manufacturing sequence, eg depending on specific design. If possible, use fusible stainless steel such as 304L or 316L Manufacture electrode assembly 160. This, for example, can keep material costs low, simplify machining and assembly, and improve the yield of finished products. Due to high surface temperature transients, the electrode 26 can be completely composed of, for example, a 5 such as tungsten or its pseudoalloy. Made of refractory metals such as W-Cu, W-La, W-Th, and W-Re. However, this will cause brittle refractory metals with a low coefficient of thermal expansion (CTE) of ~ 4.5 ppm / ° C to join such materials as ~ 16 6 ppm / ° c higher CTE steel, etc. This joint may need to be compatible with, for example, high vacuum and able to withstand internal coolant pressures such as more than 1000 psig. Because of the need for 10 machining in cranes such as even using the so-called " Machinable, deep-type annular cooling channels that cannot normally be rotated or milled with pseudo-alloys will further complicate this design. Therefore, it must be generated using, for example, electrical discharge machining ("EDM") and grinding procedures. Most components require high-precision machining to ensure that the proper and uniform cooling of the electrode assembly 160 can meet the increased demand such as tight 15-limited cooling volume. According to a form of an embodiment of the present invention, the applicant currently wants to see that tungsten uses a brazing method for the steel joint, such as in a vacuum stove in the pressure range of 10 to 6 Torr, such as ~ 100. 0CC gold and nickel alloys, such as NI0R0® (82% Au-18% Ni). The applicant has chosen gold because it can wet tungsten well and has low ductility, for example, resulting in lower residual stress in the joint. The specific joint design according to one form of an embodiment of the present invention enables the steel to provide an annular mounting groove for tungsten. During heating in the stove, the more rapidly expanding steel causes tungsten to elastically strain from its inner diameter. This, for example, has the dual benefit of reducing the residual stress in tungsten when cooling, and also centering the steel precisely in the steel ball. Lower residual stress is extremely important to avoid crane cracking. Another possible technique according to one form of the invention is the use of copper recasting. The applicant wanted to see a procedure involving pouring molten oxygen-free copper around, for example, a refractory metal electrode blank. The finished component can then be machined from the resulting assembly. Although oxygen-free copper has 17 卯 111 /. The CTE of 〇 is soft and ductile with only 10 ksi of reduced stress (~ 25% of Vostian stainless steel such as 304L), so it can locally reduce the stress at the joint and greatly reduce the compressive stress on tungsten. If the residual stress needs to be further reduced, it can be subsequently annealed. A special advantage of this procedure is the good vacuum and structural properties of the joint. The joint produced by this procedure, for example, is generally less likely to have a leak condition that was originally a problem with the brazed assembly. The main disadvantage of this technique is, for example, the lack of strength of copper. Copper, for example, does not cope well with high local support forces imposed by thread details or metal seals, and its form according to an embodiment of the invention is considered important for this application. However, for example, these problems can be avoided by careful design, and the applicant believes that these problems do not limit the use of this technology to manufacture DPP EUV electrodes according to a form of an embodiment of the present invention. Pianse 0 and including its US subsidiary Schwartzkopf and other units 20 are sources of supply for joints made according to the procedure just cited. Brazing to steel is greater than ~ 〇.75 " A tungsten electrode with an outer diameter, for example, may have a high risk of cracking due to the residual stress of the bonding interface. A technique to avoid this phenomenon is to use a turning insert in the joint. The material selection of the turning insert may be required, for example. Materials that have a CTE close to tungsten but also have good 25 &amp; ductility to better cope with, for example, higher forces W that will eventually occur at the boundary with steel. Good machinability is also a helpful property. According to According to one form of an embodiment of the present invention, since molybdenum can meet the requirement of this discrimination standard and can be brazed well by similar techniques, the applicant wants to see molybdenum that can make appliances <35 ppm / ° CCTE. This is for The envisioned larger diameter electrode will be particularly useful, and it implies that this concept is used in engineering design. According to a form of an embodiment of the present invention, the electrode assembly 160 may include an external electrode Assembly 162, outer electrode assembly 162 may have an electrode assembly side wall 164 connected to an electrode assembly mounting flange 166 for mounting electrode assembly 160 to SSPPM 139 with mounting screws 168. Approximately cylindrical The side wall 164 may be connected to or integrated with a circular cold plate 170, in which the circular cold plate 170 may be machined with a central opening to insert a cathode substrate 21 and a plurality of cold-life passages 172 '174 and 214, 216. The external electrode (cathode) substrate 210 may be machined therein with a plurality of cooling channels 15, passages 184 and openings of the inlet pipe 182 and openings of the outlet pipe 180. For example, four passages 184 are formed and each has an inlet pipe 182 and an outlet. The tube 180 is used to cool the cathode 28. The coolant can enter from a coolant inlet 173 to an inlet plenum 172, and the inlet plenum 172 is connected to a pair of opposite inlet plenums 176 and 178 (shown at 12c and 14). (In the figure). Two of the four long tubes 180 are each connected to 20 to the inlet plenum 176 or 178. Two of the four short tubes 182 are each connected to a separate passage 184 and to an outlet plenum 214 or 216, each outlet plenum 214 or 216 is connected to a Coolant outlet 175. The cathode substrate 210 may also be machined to include a central opening 218 for forming the cathode inner wall 163. 26 200425802 Material of the electrode assembly 160 and includes an external electrode (cathode) assembly 162 and an internal electrode (anode) The assembly 220 may be, for example, a stainless steel 30411 type, except that the anode 30 may be made of sintered tungsten or the above materials. The separation distance may be a significant 5 size and must be selected based on the coolant flow required to provide proper cooling between the separator 256 and the electrode walls 250, 254 through this point. According to a form of an embodiment of the present invention, the anode 30 can be cooled by a simple open-path cooling configuration, such as the coolant system formed by the anode 30 having a hollow interior 252 with the electrode 30 One of the inner walls 250 of one of the inner electrodes 10 (anode) 30, and then the other inner wall 254 of the inner electrode (anode) 30 flowing down may be assembled by inserting a heat pipe partition 256 into one of the inner walls 250, 254 in the hollow interior 252. To facilitate this effect. Heat transfer can be achieved by convection at the boundary between the inner walls 250, 254 of the electrode and a coolant passing between the separator 256 and the inner walls 250, 254. The applicant has determined the best thermal results that can be achieved in this application ', such as allowing the coolant to flow on the inner inner wall 254 and down the outer inner wall 250.

Another consideration is, for example, thin-walled (0010, , ) Partition 256, According to an embodiment of the present invention, the internal electrode (anode) 30 cooling system can be separated from the entrance of the internal electrode (anode) 30 form, And it is from the exhaust passage 270 of the heat exchanger for cooling the passage between the internal electrode 30 to discharge the separator 256 and the inner wall 250 of the outside 20 to the passage between the separator 256 and the inner inner wall 254. According to a form of an embodiment of the present invention, For example, to avoid buckling, This partition 256 may, for example, be loaded with a tensile force instead of compression due to the pressure of the refrigerant, And it is the result of the flow path just described. This solution can also have, for example, a design that can fully use the material of the spacer 256 such as 304L 27 to reduce the strength. Applicants have tested a method utilizing this cooling method with a maximum flow rate of 37 lpm and &gt; Prototype electrode 30 with 80 psig in pressure. The applicant believes that This design may, for example, be able to withstand inlet water pressures significantly in excess of 1000 psig and higher and thermal loads corresponding to source plasma discharge repetition rates in excess of 3 kHz and higher.  However, according to one embodiment of the present invention, An annular path may, for example, require a high heat transfer coefficient, E.g, The limited area exposed to the coolant, for example, may require efficient heat transfer and thus a high heat transfer coefficient.  And ’according to a form of the invention, Such as inner wall 250, The higher temperature above 254, for example, would require high pressure to deliver a high flow rate coolant to, for example, suppress the boiling of the coolant ’, especially flake or bulk boiling, not nuclear boiling, This can consistently improve from the inner wall 250, 254 Heat transfer to coolant.  According to another aspect of an embodiment of the present invention, The applicant wants to see the use of a porous metal heat exchanger in the hollow interior of the electrode 30. In this embodiment (not shown), For example, particularly in the region 34 of the tip portion of the turn clamp opening containing the electrode 30, For example, a porous metal medium may be bonded to the inner wall 250 of the electrode 30, such as by brazing, 254. This, for example, will eventually lead to a large extended fin on the anode 20 for cooling. From the inner wall 25〇, 254 Conductive heat transfer into this extended porous surface area, for example, can be more efficient than convective heat transfer across a simple wall into a coolant passage into the coolant. The extended porous surface area may, for example, have a much larger area to discharge heat into the coolant therefrom. The result is, for example, the use of less coolant and better heat transfer.  This structure can also replace the separator 256 and the inner wall 250 in the entire hollow portion 252 of the electrode 30. 254. Possible disadvantages of New Zealand metal heat exchangers are, for example, 200425802, which is a high inherent pressure drop across porous media. At high source repetition rates, this, for example, would require high inlet pressure and cause large mechanical stresses in the brazed joints and flow baffles that are only associated with coolant pumping, And it needs to be reviewed. Another possible drawback is, for example, the decrease in temperature across the wall of the electrode 30 due to more efficient heat transfer into the coolant, which will magnify the decrease in temperature across the wall of the electrode 30, And it will generate a high stress load across the shell wall of the electrode 30.  Higher stress levels may cause structural failure of the tungsten shell of the electrode. Another design criterion may be, for example, the alternating stress in the casing wall of the electrode 30 caused by the operation of the electrode 30 in the 10 burst mode, This may have, for example, a different result from the static stress load. This, for example, has led to a demand for the material of the electrode 30 to have tensile rigidity and also be sharp. For example, in different operating methods, Including repeat rate, Turn clamp temperature, Factors such as task cycling,  The heat flux distribution incident on the electrode 30 is also a factor that determines, for example, the life of the electrode. however, The applicant has tested porous electrodes, such as those obtained from Thermacore, at repeated rates of up to 2 kHz, such as in a negative polarity configuration, without failure. According to another possibility of one form of an embodiment of the present invention, for example, a porous copper cooled electrode 30 made of, for example, a porous copper foam such as that purchased from Porvair can be used. It can be machined, for example, from electrical discharge machining 20 ("EDM") to a geometry that is useful for applications according to embodiments of the present invention. Another possibility of a form according to an embodiment of the present invention is, for example, the use of electroplating or ion fusion technology to uniformly deposit silver to the optimal brazing thickness selected for brazing. This approach, for example, can realize the full potential of cooling of porous metals as described above for the internal electrode (anode) 30.  29 5 A moment in accordance with the present invention * &  To achieve high rail fluxes, For example, available micro-channels,  Let P. According to this embodiment, For example, high inlet pressure can be used to pass cooling through a series of small channels, Kushiro. 1_,  These channels are expected to be ridden or rectangular and have a small body size of 小 的 2㈣. In the itt configuration, the ratio of the surface area of the passage to the volume of the coolant is 10 15 σ Other high heat flux electronic components and χ force-conductor technology This technique can be followed to cool the electrode 30 of the present invention. The applicant has tested the original cooling electrode 30 at a repetition rate of up to 2 kHz, And I believe that the publication uses this cooling technology to achieve a much higher repeat rate. however, This _ does present a relatively high pressure drop from k in to σ and may also cause stress in the assembly during source operation, For example, the brazing of a relatively stiff microvia insert into the + "252 of the -Lai anode 30 may result in additional restraints and stresses in the anode assembly 220 as described above, This role must be considered in the overall design.  For example, as shown in Figures 10 to 15, The external electrode (cathode) 28 may include a cathode assembly 162, such as a generally annular shape. The cathode 28 itself may have within the cathode assembly 162, for example, a gap 15 facing the internal electrode 30 and varying from 019 inches of the substrate to 0.46 inches of the upper edge. In the form of a conical inner surface 163. The upper edge 20 may be covered by a cathode cover 212. The external electrode (cathode) 28 can be much larger than the internal electrode (anode) 30, for example, and is therefore easier to cool. According to an embodiment of the present invention, The erosion of the outer electrode 28 may also be less problematic than the inner electrode 30, Therefore, material selection and manufacturing are also slightly simpler. therefore, The other electrode (cathode) 28 may not be regarded as a consumable.  30 200425802 According to a form of an embodiment of the present invention, External electrode (cathode) 28 can be made of Glidcop® AL-15, for example, It is also a specialized oxide dispersion reinforced copper from OMG Metals Inc., According to a form of the invention, For example, this material is selected based on its thermal and electrical conductivity. And it also has good mechanical strength and reasonable machinability, for example. The Glidcop® outer electrode 28 can be brazed into, for example, a 304L stainless steel base 210.  The substrate 210 may interface with, for example, the outer electrode 28 having a portion of a DPP pulsed power unit 139 shown in FIG. The applicant has, for example, brazed the external electrode 28 to the substrate 210 using a nickel-based alloy, This nickel-based alloy is, for example, Nibsi® (nickel / boron / silicon) available from Morgan Crucible Company pic, Recently using NIORO® brazing material from Morgan Crucible, And it is also used for brazing of the internal electrode 30, As above, As mentioned above, a similar brazing preparation and stove procedure is used for the internal electrode.  15 As mentioned above, With respect to the internal electrode 30, Since the outer electrode 28 has a large size and uses a highly thermally conductive material, the cooling work is simplified. The relatively large open channel water tunnel 184 can be machined into Glidcop® outer electrode 28 body 210, It can be supplied and discharged, for example, via a 316L fitting such as a short tube 182 brazed into an opening in the body 210, It is also connected to an inlet manifold 214 and a discharge manifold 216. According to an embodiment of the present invention, For example, four or more such tunnels 184 may be provided to ensure uniform coolant flow, There is therefore more uniform cooling in all positions. The inlet and discharge fittings such as inlet plenum 214 and outlet plenum 216 (shown in more detail in Figure 14) can be arranged to have similar flow for each tunnel 184 31 200425802 dynamic resistance, A similar cooling amount is therefore passed through each. According to a form of the invention, The applicant anticipates that an open passage 184 with a high coolant flow rate and sufficient back pressure to prevent boiling will, for example, be sufficient to cool the external electrode 28 as described above. However, If necessary, for example, the aforementioned porous media or microchannel cooling can be used.  5 According to a form of an embodiment of the present invention, It may, for example, include a top surface of a monolithic cold plate 170 which is machined into a 304L cathode assembly 162.  The flow path of this cold plate 170 (shown in more detail in FIG. 16) may, for example, include an actual inlet manifold 214 and a discharge manifold 216 for the electrode 28. This effect can be achieved by, for example, cooling a pulse 10-type power output switch LS3 (not shown) which can be located below, for example, the electrode assembly 160, It is also used, for example, to equalize the flow to the cooling tunnels 182. Such as 214, Passages such as 216 may be milled into the top of cathode assembly 162, for example, and may be sealed, for example, by fusion-bonding plates.  The external electrode 28 may be formed of a cooling passage wall for forming a cooling tunnel 184, And, a cathode cover 15 212 for sealing the coolant tunnel 184 may have been stewed to the top end and the cathode base 210.  The cathode assembly 163 may be joined to the anode assembly 220 by screws 231 and may be insulated from each other, such as by an overlapping central insulator 222, The overlapping center insulator 222 may be made of, for example, pyrolyzed boron nitride or alumina, and may extend axially along the outer wall of the internal electrode 30 and extend a length of non-elastomeric body 20. The electrode insulator 224, The non-elastomeric electrode insulator 224 may be made of, for example, pyrolytic boron nitride or alumina and may be held in place by, for example, an insulator clip 242 and its fixing screw 244. A seal can be provided between the insulator 224 and the cathode substrate 210 by a pair of non-elastomeric metal c-rings 230. One is between the insulator 224 and the cathode substrate 210 and one is between the insulator and the anode 32 200425802 pole assembly 220, Instead, they are inserted into the respective opposite grooves.  According to another aspect of an embodiment of the present invention, Debris reduction is considered an important consideration for long-lasting DPP EUV light sources. According to a form of an embodiment of the present invention, The central electrode 5 of the plasma EUV light source generated by a discharge may be made of, for example, a high-temperature and possibly fire-resistant material as described above, and may also have strong magnetic permeability, for example. According to this embodiment of the present invention, Due to the bombardment of Surface melts or burns, Debris caused by surface erosion, for example, from the electrode 30 may also have significant magnetic properties. According to a form of the invention, The applicant can imagine that in the optical path between, for example, the plasma and the position of the optical element of the collector 10, for example, at least about 50 milliTesla ("mT") and moderately large in the range of 50 mT to 1T Magnetic field. With this approach, Such as biasing debris, It is then quasi-permanently collected, for example, by a suitably placed static magnet (not shown) arranged around one of the optical paths. According to a version of this embodiment of the present invention, The magnetic field of this collector, such as 15 can be generated by an electromagnet, In this example, For example, debris can be removed during a regeneration cycle, And during this period, for example, the electromagnet can be reduced in energy. A suitably cooled, high temperature, and ferromagnetic metal, for example, can be started.  According to the present invention, in another embodiment of the embodiment, one would like to see the use of the electrodes 30, 28 current pulses are shaped, In order to maximize the current during the magnetic compression phase of the discharge, the current is optimally used, for example, when compressing an active element (electric source). According to the -type of this embodiment, SSppM can include, for example, a front-phase saturable inductor in the final stage of DPP DDPPM. -Possible optimization waveforms, e.g. starting from a moderate current during wheel reduction phase, It then peaks during the radial compression phase.  33 200425802 The applicant has used a kind of electrode geometry that is slightly closer to the schematic diagram in Figure 2 to simulate this discharge, In addition, Use 1 ^ instead of, for example, this simulation. however, This simulation provides sufficient simulation details to understand the dynamics of the operation of a type of consistent embodiment of the invention. In the simulation, Use SSPPM of gas discharge laser products currently available to employees to perform, for example, a discharge simulation, For the final stage of the compression head saturable inductor has 6nH inductance, It is about as low as available materials and geometries are currently achievable, And provide the fastest discharge possible across the electrode, Which is the fastest rise time of the discharge pulse, This simulation is shown in Figure 18, The lengthened time scale is used for illustration. As shown in Figure 1, In the first use of 12 1111 inductors, And an additional saturable inductor is switched on to quickly reach one of the 6 nH total inductances in a similar simulation, The discharge initially traveled to about 20 kAmps and gently rose to about 40 KA before returning several kAmps, Until the inductance reaches, for example, 6 nH, At this time, about 15 rapid 15-spikes, It was then reduced to 0 in about 0.001%. During the axial reduction phase of the discharge, With a peak capacitor across the electrode, That is, in the simulation of Figure 18a, from about 50 ns to about 240 ns, The discharge is generally arranged horizontally between the inner surface of the outer electrode 28 and the outer surface of the inner electrode 30. Increase the angle slightly along the internal electrode 30, Until the inner electrode 30 reaches a region adjacent to the lowermost extension of the recess 20 on the tip 34 of the inner electrode 30. therefore, Its action causes a discharge at, for example, 82 and moves the discharge at, for example, go to the electrode tip.  And a smaller current is required to sustain the migration discharge. During the radial compression phase, For example, in the simulation in Figure 18a, between 240 ns and 260 ns, When the plasma is formed at the tip 34 of the electrode 26, The discharge is faster in the flow of fluid to the electrode 26 34, Ground increase ’which, for example, rapidly transfers a significant increase in kinetic energy to the plasma via, for example, a rapidly increasing magnetic π, which is used to limit electro-polymerization, For example lead to-better resistance to magic. This is shown in a further simulation in the first figure. A better rent clamp $ "has several beneficial properties," such as keeping active source gas ions in the clamp clamp longer, To, for example, induce greater energy transfer to ions, For example, it produces more X-rays from 32.  With the increase in compression, This shape of the delivered current may, for example, allow a current up to 3 ^ 5 times greater than the current during the formation of the E-clip in the reduction of the branching direction, But overall, Electrode &amp; The peak capacitor of SSPPM eliminates the same amount of energy ’, so the electrode is also maintained during the entire pulse.  Thermal budget in 28, It is not different from the conventional discharge shown in the simulation of Fig. 18a. A conventional saturable inductor may be included in, for example, 551 &gt; 1 &gt; River 139 compression head circuit, For example, it has twice the saturable inductance that is currently known. For example, 12 nH shown in the simulation of Figure 18A, And can be saturated in the usual way. For example, 15 an additional saturable inductor connected in parallel with a conventional saturable inductor to make the parallel inductance smaller can then be biased to saturate, For example, as shown in the simulation of FIG. 18A, and if the discharge current at the end of the discharge is increased, For example, as shown in the simulation of Fig. 18a. The applicant's simulation of plasma fluid using simulation software has confirmed the advantages of the proposed driver configuration.  20 According to another aspect of an embodiment of the present invention, It may be necessary to use a source gas such as xenon to generate an EUV light of a particular lambda such as 13.5 nm, But it can also absorb the same light to a high enough level to interfere with the overall light output. therefore, The applicant can imagine using a buffer gas, such as argon and helium, which is less absorbing for the light produced by the ideal λ, And for example, 35 200425802, such as generating a container from EUV light to remove the green gas and the buffer gas. According to an embodiment of the present invention, Can be set specifically for the higher molecular weight of blindly I—wind source gases such as xenon—the configuration of a turbo pump (not shown), It also reduces pumping energy relative to argon and helium. Can be as bad as shoes + Λ J 5 as bad by changes such as internal clearance,  5 blade angle and speed and other operating characteristics, and also eliminates the Hölweck (molecular resistance) stage of the system, To achieve this effect. therefore, The design of a buildable turbomolecular 杲 makes gas with a much lower molecular weight compared to, for example, nitrogen based on molecular velocity, Priority dishes include gases with a higher atomic weight (or molecular weight as needed) such as mountain gas.  10 5 See figure 15 with reference, A miscellaneous mask 300 according to an embodiment of the present invention is shown. The debris shield 300 can simplify the manufacture of the debris shield 300 and still achieve a functional solution to prevent debris from the light source from reaching the mirror surface of the collector. According to this embodiment of the invention, Simplified manufacturing techniques can be used, such as manufacturing debris mask 300, It is also more cost-effective than other proposed manufacturing techniques such as those used to make 15-column structures. The manufacturing structure and technology also relax the range of possible materials by which this debris shield 300 can be produced with a simplified manufacturing process.  The debris shield 300 according to this embodiment of the present invention is designed, for example, to be composed of a coplanar layer 302. 2 launches and leads to collector 40. Debris will need to navigate through these layers 302 to reach the mirror of the collector 40. It will be monitored how much debris can actually leave the outer surface of the heterogeneous masker 300 formed from an outer surface 306 of the outermost layer 302 (that is, the outermost of the electric polyclamp 32). This determines the number of layers 302 required.  36 200425802 As shown in Figure 15, Each layer 302 is composed of a plurality of optical channels 3104 extending between an outer surface 306 of the respective layer 302 and an inner surface 308 of the respective layer 302. The respective curved outer surface 306 of each layer 302 may, for example, have an arc 316, It has, for example, a first 5 radius of curvature around, for example, a focal point located at the center of the plasma, The plasma center may be, for example, a fixed point relative to the electrode 30, The plasma is controlled to locate the discharges at a point roughly determined by the actual plasma positioning (such as pulse to pulse). For example, at its center of gravity. This arc 316 may be a circular arc centered in focus. Each respective inner surface 308 may have a concentric arc of the same or similar 10 centered at the same focal point, The difference is that it has a small curvature half depending on the thickness of the layer 302. The meaning of the surface being coplanar is that the curvature around the two axes of rotation can still be the same, for example, in the overall structure, That is, from the outer surface of one layer to the inner surface of one layer to the outer surface of the next layer arranged toward the turn clamp 32 is still the same.  The outer surface 306 of each of the individual layers 302 may, for example, have an arc 318, For example, forming an oval centered on the first focus, It may coincide with β formed by the arc 316 or a concentric circle center having a circular center for forming the isolated 316. However, it is determined by the shape of the collector mirror used by the collector 40.  20 Each optical channel 304 may have a uniform shape between the outer surface 306 and the inner surface 308 in each layer 302 or it may be pushed toward one or both centers of the shape containing the arcs 316 and 318.  Layer sounds can be made of metals such as titanium or tungsten, For example, Si〇2 Aluminium oxide α1〇2 〆 Specialized ceramics or fire metal, Or it can be formed by other pottery metal composition.  37 200425802 = According to another aspect of this embodiment of the present invention-there may be gaps between layers, As shown in Figure 15. The individual layers 302 can be connected to each other by, for example, ^ connecting 320 corresponding to the four corners of the optical channel outline in the overall interface space between different layers, or by periodically separating connector posts, As shown in Figure 15. As shown in Figure 15, The layers can be divided into sections,  For example, it has the overall size of the 15th ㈣, or the sub-segments such as the sub-segment 330 shown in 15_ this way, For example, it can be manufactured—completely rotating the solid body to fit around all or substantially all of the focal point 32 of the clip 0. Miscellaneous materials can be dropped to the thin bottom of the mask instead of being accumulated in the holes of the proposed design. Debris removal can be an added feature, for example, For example, to allow longer intervals between replacements.  Also understand that The debris shield 300 may, for example, in each layer 302 or in an opening between adjacent layers 302 (if such openings are present) follow an arc 316 or 15 318, such as an opening formed only by the opposite side wall 304 . that is, The channel 304 does not need to have four walls 312 and still can provide sufficient debris trapping effect and a sound structure. But for example this would be good for manufacturing and / or for having a part that is circular and for example an arc that is part of an oval 2 = 316, 318 debris debris shield 300.  20 Referring now to Figure 16, Another embodiment of the present invention is shown regarding the manufacture and construction of a debris shield 400. Figure 16 shows an example of the "out-of-focus laser machining" 'technology used to make DPP or other EUV debris maskers, For example, it has a light transmission channel focused to a focal point, Or other applications of a push-like array structure with a common focus.  38 200425802 This debris shield 400 may require, for example, a push-like path pointing to a common focus 402. For example, an unfocused laser beam can be used for laser machining with a sufficiently high laser intensity. to this end, The applicant has found that For example, a focusing lens 404 can be used behind a grid-like mask 406 to generate the correct shape of a 5 miscellaneous mask and its channel. In the configuration of Figure 18, A two-chamber MIMO configuration laser processing using X LA of the applicant's assignee may be used to provide defocus laser machining such as a sufficiently high laser power and a moderately short laser wavelength. The general construction shown in Fig. 16 may include, for example, a parallel laser beam 41o incident from the right as shown in Fig. 18 (not necessarily 10 parallel in total). The laser beam 410, for example, may be first incident on a mask 406, which may be a grid or a mesh. For example, a square or circular via 412 is generated.  A mask that may be made of W or Mo, for example, may be coated with a reflective coating on the side facing the laser beam 410, For example, a thin film of aluminum is used to enhance reflectivity and prevent the mask 406 from being deteriorated by the laser beam 410. The mask 410, for example, can be tilted slightly 15 'to avoid back reflections into the laser amplifier / oscillator. and, If the mesh (not shown) is made of a line with a circular cross section, Reduces reflection problems. The lens 404 or more generally the focusing optics may, for example, produce a convergent beamlet 414 of an array that already has one of the required push rates.  A workpiece 420 may be, for example, a segment that is constructed or positioned to have a spherical solid body located at the center of the focal point 402 20, This workpiece 420 can be placed at the correct distance between the lens 404 and the laser focus 40. Even if the intensity of the laser beam 410 is not sufficient, for example, to mechanically process the entire debris masker 400 at one time, for example, a focused laser beam using a scan across the mask 406 will have the desired effect. I.e. mask 406, 404 and workpiece 420, etc. 39 200425802 For example, as shown in Figure 16, you can Move vertically, And, for example, the path can be subsequently machined continuously. For example, scanning over the entire surface of the workpiece can be controlled to make drilling faster than via 412. Therefore, no additional stress is induced in the part of the workpiece due to partially completed drilling. For 5 to make scanning reproducible, For example, it can be used to drive the overall building 404, 406, The 420 is motorized and / or controlled relative to the laser beam's side-acting piezoelectric actuator. or, A deflection optical device (not shown) that can be controlled by, for example, an actuator that holds the incident direction of the laser beam and the laser focus position, The laser beam is scanned across the lens 404. The laser beam 410 10 can be controlled to have a sufficiently high intensity, So it is enough to ablate the workpiece even when out of focus, However, the lens 404 and the reflection mask 406 are not damaged at the same time. therefore, In most cases, The short (ultraviolet) wavelength such as the laser beam 410 is most suitable. The applicant believes that For example, as shown in Figure 16, it is better to place the mask 406 in front of the lens 404. This prevents the laser spattering material from the shield 406 from entering the lens and damaging the lens. Sputtering materials are often emitted in the direction of the incident laser light. Another option, such as increasing the laser intensity on the workpiece 420, may be, for example, a femtosecond laser machining using a Ti-sapphire laser of 745 nm or 772 nm, And, for example, the subsequent frequency is tripled or quadrupled, respectively, and then the pulse is amplified, for example, using a KrF or ArF excimer laser discharge laser 20 amplifier.  According to another aspect of an embodiment of the present invention, Debris removal can be performed using an electrochemical reaction. The applicant wants to see that tungsten can be used to react directly with fluorine F2 or -fluorine-containing molecules such as nf3 at room temperature to form a gasification crane. According to the embodiment of the present invention, You can, for example, combine the output of the source with 40 200425802 such as fluorine or gas to form a metal halide, As a result, too many tungsten atoms, such as from the tungsten electrode 30, are removed from the source output. —In the example, For example, in the presence of reactive element gas, unwanted debris particles such as tungsten atoms, Ions and clusters form reactions similar to molecules 5 such as WF6 or WC16, Thereby a volatile gas is formed. In sharp contrast to pure tungsten particles with a high probability of adhesion on solid surfaces, such as collector optics, These molecular compounds have a very low probability of sticking on solid surfaces and are therefore preferentially pumped and removed from the container. For example, this volatile gas is inserted into the output light emitted from the EUV plasma source. Therefore, for example, it can provide a tungsten atom and , An environment where increased atomic collisions occur between halogen gases. This can then, for example, cause the tungsten atoms to merge with the gas to form a compound such as tungsten fluoride WF0 or gasified tungsten WCl0 and remove it from the container.  σ seconds 15 2〇 According to another aspect of an embodiment of the present invention, There are many different ways to increase electrode life and / or reduce replacement costs. For example, by including the screw connection on the outer wall of the electrode and the anode assembly 22, In order to make the inner electrode into a screw shape. The electrode 30 can be made, for example, continuously provided by an external device, It is, for example, an accessory extending through the wall of the container 22 and it may have threads for moving electrodes that wear away over time and provide a sealed path for the container. Electric coffee can be mounted on a cylinder with corresponding threads. The electrode 30 may be replaced by a plurality of electrodes, For example, multiple materials, The poles are arranged, And grilling to make a discharge pulse or, for example, one-by-one grilling, Or wait for the non-roasting-weaving in the discharge circuit for some time. The shape of the electrode 30 can be selected to have a longer life. Electric cooling can be used instead of 41 water cooling.  Referring now to sections 17A to Η®, Another debris mask according to the embodiment of the present invention is shown. Fig. 17A shows a perspective view of a miscellaneous mask 45o of a core according to an embodiment of the present invention. Debris concealer willows may include a 5-ring-opening mounting ring 452, This opening defines, for example, a collection opening extending over a portion of a spherical surface of light extending from a focally located electrical source and covering s, such as approximately 1 to 2 spheres. In the center of the opening there may be a 454, The lower portion 454 has a side wall including the groove 455 and is pushed toward the focus, for example. The women's ring 452 may also have a groove 453 (as shown in FIG. 17C).  10. A plurality of thin long binding pieces 456, for example, about 0.25 cm thick, can be joint-mounted to the trough milk and / or milk in the mounting ring 452 or the hub 454, respectively. Please understand. Grooves may only be needed in one or the other of the mounting ring 452 and the hub 454, And / or the grooves may be a plurality of short grooves instead of the grooves extending over the length of the hub 454 as shown in Figures 17a and 17D, And can be combined with a specific long fin 456 to position around the hub 454, such as That is, each long fin 456 may have one or more specific grooves that are vertically displaced along the radius of the outer surface of the pushing portion of the hub 454. A specific long fin 456 can be engaged therein and only the long fin 456 can be engaged. The same is true for the slot 453 on the women's dress 452.  Between the long binding pieces 456 'according to a form of an embodiment of the present invention,  20 For example, forming a group such as five fins and consisting of, for example, two long fins 456, For example, the intermediate fins 458 between two adjacent long fins 456,  And two short fins 470, Each short fin 470 is interposed between the middle fin 458 and an adjacent long fin 456.  As shown in Figure 17E in more detail, The long fin 456 may have a middle fin 42 200425802 chip receiving slot 457 and a short fin receiving slot 459. then, The middle * fin may have a long fin 460 as shown in FIG. 17, The long fins 460 may, for example, engage a respective middle patch receiving slot 457 on an adjacent long fin 456.  and, For example, five pairs of short fins 470 may be installed between the middle fins 458 and the adjacent long fins 456. Each short fin 470 may, for example, have a short fin patch,  In addition, the short fin tabs can be mated in one of the respective adjacent long fins 456 in a respective short fin tab receiving groove 459, for example. The intermediate fins 458 and the short fins 470 may each have, for example, a separator / reinforcement fin 46〇a, 472a, and it may, for example, lean against the respective middle fins 458 10 or long fins 454 depending on the circumstances. It can be seen that Lot 460, 460a, 472, 472a may, for example, extend along the radius to the focal point of a debris shield, such as at the center of the plasma turn clamp 32, It does not block any significant amount of light emitted from the turn clamp 32 and passing through the debris shield 45o. As shown in the top view of FIG. 17B, You can see lot 46〇,  460a, 472, 472a extends to the focal point along respective radii.  15 The debris shield 450 may have one of the positions held by the screws 486 and 490 on the mounting ring, respectively, a mounting ring top locking ring 484 and a mounting ring bottom locking ring 488 'so whether the groove 453 is present in the mounting ring 452 or not For example, the respective fins 454, The mounting rings of 456 and 470 are held to the mounting ring 452 side by side. Similarly, The hub 454 may have, for example, a top lock plate 48 that may be held in position by a lock plate nut 4 and a bottom lock nut 4.  Please understand, When operating, Such as thin fins 456 cm thick,  458, 47〇 can be used to collect money to cover the fins A%, 458, 47 the role of debris on the taste surface, And the interlocking tab 46〇, 4? 2 and separator tab 牝 ㈨,  472a can strengthen and evenly separate the fins in the structural group 456, 牦 8 and 4 Sichuan 43 200425802 And prevent 1 if the conversion due to the thermal exposure of the miscellaneous mask.  Rooted in this month's-implementation of the other-type, It is known that metal compounds can be used as the source of the plasma generated by the discharge, and metal compounds such as tin in this powder form may be a reliable method for the source of plasma to form the plasma. however, For a reliable method of delivering the correct amount of this material, The applicant has discovered this method. According to the embodiment of the present invention- «, The applicant proposes to provide metal particles in the form of a powder, for example, having particles that are as small as possible and for example having a diameter of m 忖. By powdering a powder such as tin, such as a CT object for everyone-pulsed plasma discharge-inside the gas feeder 10 ', the private particles can be transported to the formation site. The feeding part is also the carrier gas. For example, it may be a kind of harmless gas such as neon.  Or it may be, for example, an effective gas such as xenon that also helps to form a plasma and / or causes plasma discharge. For example, the method of atomizing tin into the feedstock may include, for example, a method of passing a feed gas through or over a quantity of 15 powdered metals such as tin, This powdered metal can be agitated by, for example, a piezoelectric actuator and shaken, for example, enough to turn a fine metal powder into a feed gas stream, propagate through the gas, It is then guided to the plasma formation site, for example, via a hollow anode.  It can be understood that in this way, a precisely measured quantity of powdered material is inserted into the feed gas stream at a specific density, such as per unit time, This amount can be adjusted as needed, for example, by adjusting the amount of search (for example, by adjusting the voltage applied to the piezoelectric actuator). Also understand that Control can also be applied by modifying the feed airflow rate of the powdered material through the dial. Adjustments can be implemented to limit the formation of debris in the plasma. It can also be adjusted by periodically cutting the feed gas flow (Nie 44 200425802, such as by using a cross-flow geometry, such as by periodically injecting a pure feed gas flow without any intervening material). and, for example, If larger particles are used, For example, a mesh can be used to reduce debris. This mesh opening prevents the passage of particle feed gas beyond a certain selected size.  5 does not consider the above embodiments of the present invention to be the only embodiments of the present invention disclosed in this application, And these embodiments can make many changes and modifications familiar to the technology and its specialists, While still within the scope of patent application, The scope of the claimed invention is limited only by the scope of the patent application.  ίο [Schematic simple explanation] Figure 1 shows a schematic diagram of a plasma EUV (soft x-ray) light source generated by a discharge and the main components of an embodiment of the system;  Figure 2 shows a schematic diagram of an embodiment of an electrode for generating Dpp EUV light;  15 FIG. 3 shows an embodiment of a collector system for an EUV light source, such as a light collector suitable for collecting light in an emission cone from a light generating plasma;  Figure 4 shows a cross-sectional view of a grazing angle illustrating the incident operation of the embodiment of the collector shown in Figure 3;  Fig. 5 shows an embodiment of the present invention, It includes an electrode replacement system according to one of the -20 embodiments of the present invention;  Figure 6 shows a close-up view of the embodiment of Figure 4;  Figure 7 shows the 5th and 6th embodiments, Which has-a gate valve sealing mechanism suitable for electrode replacement;  ,  FIG. 8 shows a schematic diagram of a process for manufacturing a material that can be used in DPP electrodes according to an embodiment of the present invention;  FIG. 9 shows a cross-sectional view of a center electrode (anode) according to an embodiment of the present invention; FIG.  FIG. 10 is a cross-sectional view of an electrode assembly according to an embodiment of the present invention;  FIG. 11 shows a part of the electrode assembly shown in FIG. 10 and a close-up perspective sectional view of the center electrode (anode) shown in FIG. 9;  Figure 12 shows a top view of the electrode assembly shown in Figures 10 and 11;  Figures 12a to c show cross-sectional views of the electrode assembly of Figures 10 to 12,  10 where the cross section is along line A-A in Figure 12, B-B and C-C;  Fig. 13 shows a cross-sectional view of the electrode assembly of Figs. 10 to 12c, It includes a center electrode (anode) assembly;  Figure 14 shows the cold plate section of one of the assemblies of Figures 10 to 13, It shows a cooling passage according to an embodiment of the invention;  15 FIG. 15 shows a perspective view of a debris shield according to an embodiment of the present invention;  FIG. 16 shows a schematic diagram of a procedure for manufacturing a debris shield according to an embodiment of the present invention;  17A to 17D show another debris 20 mask according to an embodiment of the present invention; And Figs. 18A and 18B show a simulation model of a plasma turn clamp generated in a pseudo state according to an embodiment of the present invention.  46 200425802 [Representative symbols for main components of the diagram] 20 ... Plasma ("DPP") generated by discharge 104, 104 ’... Limited EUV and soft X-ray light source 22 ··· Vacuum container (housing) 24 ··· Large vacuum chamber (discharge chamber) 26. .  . Metal electrode 28. .  . External electrode 30 ... · Inner electrode (anode) 32. .  . High-density plasma turn clamps 34. .  . Electrode tips 36, 300, 400, 450 ... Debris shield 40. .  . Collector 42. .  . Intermediate focus 50. .  . Spectrum Purity Filter 60. .  . Source duct 70. .  . Insulators 82, 84 ... Magnetic field 90 ... collector hub 92. .  . Collector hub extension 94. .  . Radial bracket 100. .  . Radial collector drag reducer 102 ... shell 102a ... first shell section 102b ... second shell section 104 ", 104 '" ... part of light rays 106. .  . Joint 122 ... Telescopic joints 126. .  . Sealing flange 130 ... gate valve 132 ... chamber wall 134 ... flange 136. .  . Replaceable sealing surface 139. .  . DPP pulsed power unit, solid state pulsed power module (SSPPM) 140. .  . DPP commutator 142. .  . BN particles 150, 208, 306 ... outer surface 160. .  . Electrode assembly 162. .  . External electrode (cathode) assembly 163. .  . Cathode inner wall 164, 312 ... wall 168 ... Mounting screw 170. .  . Circular cold plates 172, 176, 178 ... Inlet plenum 173 ... Coolant inlets 174, 184 ... Cooling passage 47 200425802 175 ... Coolant outlet 180 ... Outlet pipe 182 ... Inlet pipe 184 ... Open passage water tunnel 206 ... pre-ionizer 210 ... outer electrode (cathode) substrate 212 ... cathode cover 214 ... inlet manifold 216 ... emission manifold 218 ... central opening 220 ... inner electrode (anode) assembly 222 ... central insulator 224 ... inelastic Body electrode insulator 230 ... Non-elastomeric metal C sealing soil 231, 486, 490 ... Screws 242 ... Insulator clips 244 ... Fixing screws 250, 254 ... Electrode inner wall 252 ... Hollow part of the crane casing anode 256 ... · Heat pipe partition 270 ... Emission path 302 of the heat parent switch ... Coplanar layer 304 ... Light channel 308 ... Inner surface 316, 318 ... Arc 402 ... Common focus 404 ... Focus lens 406 ... Grating-like mask 410. Laser beam 412 ... Square or circular passage 420 ... Workpiece 452 ... Mounting ring 453, 455 ... Slot 454 ... Hub 456 ... Thin long fins 457 ... Middle sign Receiving slot 458 ··· Thin fin (middle fin) 459 ·· Short fin pick receiving slot 460,472 ... Interlocking tab 460a, 472a ... Divider / reinforced fin 470 ... Sheet 480 ... top lock plate 482 ... lock plate nut 483 ... bottom lock nut 484 ... mounting ring top lock ring 488 ... mounting ring bottom lock ring λ ... wavelength 48 of light

Claims (1)

200425802 Scope of patent application: 1. An EUV source debris reduction device, which is operable to remove a metal debris caused by the formation of an electric mass by using a deep electric mass turn electrode including a metal. The device includes : A metal halogen-generating gas containing a 5 halogen gas or a halogen-containing gas and which will generate a metal halide with the electrode-containing metal in the path of an output beam generated by the EUV source. 2. The device according to item 1 of the patent application scope, further comprising: the metal of the electrode contains tungsten; the halogen gas or the gas containing halogen 10 contains fluorine; and the metal halide contains fluoride crane. 3. An EUV source debris shield comprising: a first debris shielding member comprising: a first curved surface having a first selected shape relative to a first axis of rotation 15; a first A two curved surface having the first selected shape with respect to the first axis of rotation and distributed between the first curved surface and the first axis of rotation; and a plurality of aligned tubular openings located in the The debris shielding 20 shield member is used to connect the first curved surface and the second curved surface, and has an internal opening that is pushed toward a focus on the first rotation axis; and a second debris The debris shielding member includes: a third curved surface having the first selected shape relative to the first rotation 49 200425802 axis and distributed between the second curved surface and the rotation axis; a fourth curve A molding surface having the first selected shape with respect to the rotation axis and distributed between the third curve 5 type surface and the first rotation axis; and a plurality of aligned tubular openings located at Miscellaneous debris shield for shielding member connected to the third curved surface and the fourth curved surface and having a focal point on the first axis of rotation form a taper shape toward the inner opening. 10 4. The device of claim 3, further comprising: the second and third curved surfaces abut against each other. 5. The device of claim 3, further comprising: the second and third curved surfaces are separated from each other. 6. The device of claim 3, further comprising: 15 the first, second, third and fourth curved surfaces have a second shape relative to a second axis of rotation. 7. The device according to item 4 of the scope of patent application, further comprising: the first, second, third, and fourth curved surfaces have a second shape with respect to a second axis of rotation. 20 8. The device according to item 5 of the patent application scope, further comprising: the first, second, third, and fourth curved surfaces have a second shape with respect to a second axis of rotation. 9. The device according to item 6 of the patent application scope, further comprising: the first shape is the same as the second shape. 50 200425802 10. The device according to item 7 of the scope of patent application, further comprising: the first shape is the same as the second shape. 11. The device according to item 8 of the patent application scope, further comprising: the first shape is the same as the second shape. 5 12. The device according to item 6 of the patent application scope, further comprising: the second shape is different from the first shape. 13. The device according to item 7 of the patent application, further comprising: the second shape is different from the first shape. 14. The device according to item 8 of the patent application scope, further comprising: 10 The second shape is different from the first shape. 15. The device according to item 3 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a first direction, and define a structure surrounding the 15 curvatures of the first, second, third and fourth curved surfaces of the first axis of rotation. 16. The device according to item 4 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a first direction, and define a structure surrounding the 20 curvatures of the first, second, third and fourth curved surfaces of the first axis of rotation. 17. The device according to item 5 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a first direction, and define a structure surrounding the 51 200425802 curvature of the first, second, third, and fourth curved surfaces of the first axis of rotation. 18. The device according to item 6 of the scope of patent application, further comprising: the tubular openings include open-walled structures located on adjacent wall portions of adjacent tubular openings along a first direction, and define surrounding the Curvature of the first, second, third and fourth curved surface of the fifth rotation axis. 19. The device according to item 7 of the scope of patent application, further comprising: the tubular openings include an open-wall structure located on an adjacent wall portion of an adjacent tubular opening along a first direction, and define a structure surrounding the The curvature of the first, second, third, and fourth curved surfaces of the tenth rotation axis. 20. The device according to item 8 of the scope of patent application, further comprising: the tubular openings include an open-wall structure located on an adjacent wall portion of an adjacent tubular opening along a first direction, and define a structure surrounding the The curvature of the first, second, third, and fourth curved surfaces of the fifteenth rotation axis. 21. The device according to item 9 of the scope of patent application, further comprising: the tubular openings include an open-wall structure located on an adjacent wall portion of an adjacent tubular opening along a first direction, and define a structure surrounding the Curvature of the first, second, third and fourth curved surface of the 20th rotation axis. 22. The device according to item 10 of the patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a first direction, and define a structure surrounding the 52nd 200425802 The curvature of the first, second, third, and fourth curved surfaces of a rotation axis. 23. The device according to item 11 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of the 5-shaped openings of adjacent tubes along a first direction, and define a winding The curvature of the first, second, third, and fourth curved surfaces facing the first axis of rotation. 24. The device according to item 12 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of the 10-shaped openings of adjacent tubes along a first direction, and define a winding The curvature of the first, second, third, and fourth curved surfaces facing the first axis of rotation. 25. The device according to item 13 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of the 15-shaped openings of adjacent tubes along a first direction, and define a winding The curvature of the first, second, third, and fourth curved surfaces facing the first axis of rotation. 26. The device according to item 14 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of adjacent 20-shaped openings of adjacent tubes along a first direction, and define a winding The curvature of the first, second, third, and fourth curved surfaces facing the first axis of rotation. 27. If the device in the scope of the patent application item 3 further includes: the tubular openings include open-walled structures located on adjacent walls of the adjacent tube 53 200425802-like opening along a second direction, and define The curvature of the first, second, third, and fourth curved surfaces around the second axis of rotation. 28. The device according to item 4 of the scope of patent application, further comprising: 5 the tubular openings include open-walled structures located on adjacent wall portions of adjacent tubular openings along a second direction, and define the surrounding The curvature of the first, second, third and fourth curved surfaces of the second axis of rotation. 29. The device according to item 5 of the scope of patent application, further comprising: 10 the tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a second direction, and define the surrounding The curvature of the first, second, third and fourth curved surfaces of the second axis of rotation. 30. The device according to item 6 of the scope of patent application, further comprising: 15 The tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a second direction, and define the surrounding The curvature of the first, second, third and fourth curved surfaces of the second axis of rotation. 31. The device according to item 7 of the scope of patent application, further comprising: 20 The tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a second direction, and define the surrounding The curvature of the first, second, third and fourth curved surfaces of the second axis of rotation. 32. If the device in the scope of patent application No. 8 further includes: 54 200425802 The tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a second direction, and define a winding The curvature of the first, second, third, and fourth curved surfaces facing the second axis of rotation. 5 33. The device according to item 9 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a second direction, and define the surrounding The curvature of the first, second, third and fourth curved surfaces of the second axis of rotation. 10 34. The device according to item 10 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a second direction, and define the surrounding The curvature of the first, second, third and fourth curved surfaces of the second axis of rotation. 15 35. The device according to item 11 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a second direction, and define the surrounding The curvature of the first, second, third and fourth curved surfaces of the second axis of rotation. 20 36. The device according to item 12 of the scope of patent application, further comprising: the tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a second direction, and define the surrounding The curvature of the first, second, third and fourth curved surfaces of the second axis of rotation. 55 2004258 02 37. The device according to item 13 of the patent application scope further includes: the tubular openings include open-wall structures located on adjacent wall portions of adjacent tubular openings along a second direction, and define 5 curvatures of the first, second, third and fourth curved surfaces around the second axis of rotation. 38. The device according to item 14 of the scope of patent application, further comprising that the tubular openings include an open-wall structure located on an adjacent wall portion of an adjacent tubular opening along a second direction, and define a circle around the first 10 curvatures of the first, second, third and fourth curved surfaces of the two rotation axes. 39. An electropolymeric EUV source comprising an electrode pulsed power source discharge, comprising: a pulsed saturable inductor included in a chamber stage of the pulsed power module and operable to deliver to the pulsed power module The pulse waveform of the equal discharge electrode is shaped, wherein the discharge pulse during the axial run-out phase of the discharge consists of a moderate current and a peak during the radial compression phase of the discharge. 40. The device of claim 39, further comprising: the pulse waveform of the discharge pulse includes a current of 20 during the radial compression phase and it is at least the current for the electrodes during the axial run-out phase Three times. 41. The device according to item 39 of the scope of patent application, further comprising: the pulse waveform of the discharge pulse includes a current flow during the radial compression phase and is at least the same for the 56 200425802 electrodes during the axial run-out phase. Three to five times the current. 42. The device according to item 40 of the scope of patent application, further comprising. The pulse waveform of the discharge pulse includes a current flow during the radial compression phase and at least the axial current during the axial run-out phase. Three to five times the current of the electrode. 43 · —A plasma EUV light source produced by a discharge, comprising: an EUV light generating chamber; a source gas contained in the generating chamber; a buffer gas' which is contained in the chamber and has a lower content than the source gas A molecular weight of 10; a thirsty-wheel molecular pump having an inlet connected to the production chamber and operable to preferentially pump more of the source gas from the chamber than the buffer gas. 44. The device according to item 43 of the scope of patent application, further comprising: the turbine sub-sub pump has an internal clearance, blade angle and speed that can be selected to preferentially pump higher molecular weight molecules. 45. The device according to item 43 of the scope of patent application, further comprising: the turbo-molecular pump is preferentially pumped based on the atomic velocity of the pumped gas. 46. The device according to item 44 of the scope of patent application, further comprising: the turbo molecular pump gives priority to delivery based on the atomic velocity of the gas being pumped. 47. The device according to item 43 of the scope of patent application, further comprising: 3 molecular thigh wheels do not include molecular resistance classes. 57 200425802 48. The device according to item 44 of the patent application, further comprising: The turbomolecular pump does not include a molecular resistance class. 49. The device of claim 45, further comprising: the turbomolecular pump does not include a molecular resistance stage. 5 50. The device of claim 46, further comprising: the turbomolecular pump does not include a molecular resistance stage. 51. A plasma EUV light source generated by a discharge, comprising: an adjusted conductive electrode comprising: a differentially doped ceramic material doped in a first region 10 to select at least conductivity and doped Doped in a second zone to select at least thermal conductivity. 52. The device of claim 51, further comprising: the first region is located on or near the outer surface of the electrode structure. 15 53. The device according to item 51 of the scope of patent application, further comprising: The ceramic material is SiC and the dopant is BN. 54. The device of claim 52, further comprising: the ceramic material is SiC and the dopant is BN. 55. The device of claim 51, further comprising: 20 the ceramic material is alumina and the dopant is BN. 56. The device of claim 52, further comprising: the ceramic material is alumina and the dopant is BN. 57. The device of claim 51, further comprising: the ceramic material is alumina and the dopant is a metal oxide. 58 200425802 58. If the device of the scope of patent application is Dana, the steps further include: ... by: the material is oxygen, and the dopant is-metal oxide. The device in the 57th patent scope of Shen Qing further includes: the dopant is SiO or Ti02. 60. The device according to item 58 of the patent application, further comprising: the dopant is SiO or Ti02. 61. A type of electric v light source included in a discharge chamber discharge, comprising an electrode assembly comprising a discharge electrode mounted in a movable electrode assembly seat; -An extensible rhyme element, which is connected to the removable mounting base and can only work = move the electrode assembly from the -replacement position to an operating position; A sealing mechanism housing is operable to seal the discharge cell by moving from the -accommodating position to the -sealing position when the removable mounting seat is moved to the replacement position. 62. The device according to item 61 of the scope of patent application, further comprising: the expandable sealing element is a telescopic joint and the mechanism is a gate valve. 63 · —a plasma-eUV light source generated by discharge, including: 20—collecting H ′, which includes a plurality of nested shell members arranged in opposite-electrical-missing positions to form the electropolymerized &amp; lost-emission The grazing angle of the incident reflector of the EUV light; and a temperature-controlled structure operatively connected to the device and operable to adjust the temperature of the respective shell components 59 200425802 geometry so that The grazing angles of the incident reflections from the respective shell members are optimized. 64. The device of scope 63 of the patent application, further comprising: The temperature control mechanism includes a heater. 5 65. If a patent is applied The device of the scope item 63 further includes: The temperature control member includes a heat remover. 66. The device of the scope of the patent application item 63 further comprises: each nested shell member, including: an incident reflector element A first glancing angle of the lens, which collects the EUV light emitted from the 10 plasma turn clip; and a second glancing angle of the incident reflector element, which collects the emission from the first glancing angle of the incident reflector element EUV 67. The device according to item 64 of the scope of patent application, further comprising: each nested shell member, including: 15 a first glancing angle of the incident reflector element, which is collected from the plasma turn-on EUV Light; and a second glancing angle of the incident reflector element, which collects EUV light emitted from the first glancing angle of the incident reflector element. 68. The device according to item 65 of the patent application, further comprising: 20 Each nested shell member includes: a first grazing angle of the incident reflector element, which collects EUV light emitted from the plasma turn clip; and a second grazing angle of the incident reflector element, which collects EUV light emitted from the first glancing angle of the incident reflector element. 60 69 · —A plasma generated by a discharge £ 1; ¥ light source, which includes: a collector, which includes an array arranged relative to a plasma turn clamp A plurality of nested shell members to form a grazing angle of the incident reflector of υν light emitted from the plasma turn clip; and a temperature control mechanism operatively connected to the collector and operable to mechanically Adjust at least one of this The individual shell members are waited to maintain a geometric structure so that the grazing angle of the incident reflection from the respective shell members is optimized. 70. The device of the 69th scope of the patent application, further comprising: The shell-shaped member includes: a first grazing angle of the incident reflector element, which collects EUV light emitted from the plasma turn clip; a second grazing angle of the incident reflector element, which collects the incident reflection The EUV light emitted by the first glancing angle of the reflector element; and 15 ^ the mechanical control mechanism includes a first adjustment device operatively connected to the first glancing angle and incidence of the incident reflector element A second glancing angle of the reflector element. 71. The device of claim 69, further comprising: the mechanical control mechanism includes a piezoelectric actuator. 20.2 The device according to item 70 of the scope of patent application, further comprising: the mechanical control mechanism includes a piezoelectric actuator. 73. The device of claim 71, further comprising: the piezoelectric actuator includes a biomorphic piezoelectric actuator coupled to an outer surface of each of the respective shell members. 61 200425802 74. The device according to item 72 of the scope of patent application, further comprising: the piezoelectric actuator includes a biomorphic piezoelectric actuator coupled to an outer surface of each respective shell member. 75. A plasma EUV light source generated by a discharge, comprising: 5 an EUV light collector having a plurality of collectors, each of which includes a reflective surface and each of which has a reverse surface; and a polarizer The voltage source is electrically connected to each of the plurality of reflectors. 76. The device according to item 75 of the scope of patent application, further comprising: 10 a plasma generated by a discharge, which has an electrical polarity; and the voltage of the bias voltage source is selected to have a polarity opposite to that of the plasma. 77. The device of claim 74, further comprising: the reverse surface of each reflector has a roughened light system. 15 78. The device of claim 75, further comprising: the reverse surface of each reflector has a roughened light system. 79. A method for manufacturing a debris-shielding device for a discharge-generating plasma EUV light source, comprising: a high-energy irradiation light source including a working beam; 20 a mask member located in a path of the working beam And is operable to divide the working beam into a plurality of sub-working beams; a focusing optical device which is located in the path of the plurality of sub-working beams and is operable to focus the plurality of sub-working beams to a focus; The workpiece is located between the focusing optics and the focus. 62 200425802 Therefore, each of the plurality of working beams is drilled in the workpiece with a hole aligned with the focus and pushed toward the focus. 80. The method of claim 79, further comprising: the workpiece includes at least one surface 5 having a radius of curvature that is concentric with the focal point. 81. A plasma EUV light source generated by a discharge, comprising: at least one plasma generating electrode formed by a shell having a hollow interior; a first-class defining member located within the hollow interior along the hollow interior A pair of 10 opposing inner walls define a coolant flow path from a coolant inlet to a coolant outlet. 82. The device of claim 81, further comprising: the flow defining member includes a porous region for interconnecting the opposite inner walls. 15 83. The device of claim 81, further comprising: the flow-defining member includes a thin-walled cylindrical member, the thin-walled cylindrical member having its coolant inlet connected to the thin-walled cylindrical member A passage formed with an inner inner wall of the hollow interior and its coolant outlet is connected to a passage between the thin-walled cylindrical member and the outer inner wall of the hollow interior 20. 84. A plasma EUV light source produced by a discharge, comprising: at least one electrode including a material having high magnetic permeability sufficient to allow debris in the form of the material removed from the electrode to be magnetically biased without depositing On a protected system element. 63 200425802 85. An EUV debris shield, comprising: a mounting ring having a collecting opening to define a collecting opening having a focal point; a hub; 5 a plurality of large fins, which are joint-mounted to The hub and the mounting ring; and at least one intermediate fin mounted between adjacent large fins and joint-mounted to the hub or the mounting ring between adjacent large fins and including at least one support The tabs are extended along a radius extending through the focal point and 10 are jointedly installed in at least one of the concealed chip receiving grooves on the adjacent large fins. 86. The device of claim 85, further comprising: the at least one intermediate fin includes a first intermediate fin and a second intermediate fin, and; 15 at least one short fin, which is adjacent to Intermediate fins are joint-mounted to the hub or the mounting ring, and include at least one support tab extending along a radius extending past the focal point and joint-mounted on at least one of the adjacent intermediate fins. A lot of picks in the receiving slot. 87. A method for forming a plasma generated by a discharge, comprising: 20 providing a metal compound as a source for the discharge generated in the form of metal particles in powder form, wherein the particles are contained in a feed gas The particles are placed in the feed gas by passing the feed gas through a quantity of agitated powdered material. 64