JP4626056B2 - UV irradiation equipment - Google Patents

UV irradiation equipment Download PDF

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Publication number
JP4626056B2
JP4626056B2 JP2000393907A JP2000393907A JP4626056B2 JP 4626056 B2 JP4626056 B2 JP 4626056B2 JP 2000393907 A JP2000393907 A JP 2000393907A JP 2000393907 A JP2000393907 A JP 2000393907A JP 4626056 B2 JP4626056 B2 JP 4626056B2
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JP
Japan
Prior art keywords
light source
straight tube
irradiation device
ultraviolet
ultraviolet irradiation
Prior art date
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Expired - Fee Related
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JP2000393907A
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Japanese (ja)
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JP2002191965A (en
Inventor
陽介 鈴木
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Iwasaki Denki KK
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Iwasaki Denki KK
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Description

【0001】
【発明の属する技術分野】
本発明は紫外線照射装置の改良に関する。
【0002】
【従来の技術】
通常、レンズ等の光学部品あるいはプラスチック製電気部品等の表面には、有機物質が付着している。レンズ等の光学部品あるいはプラスチック製電気部品等の表面に有機物質が付着していると、例えばコーティング膜との密着性が悪くなり不良品多発の原因となる。そこで従来、紫外線の作用で発生するオゾンから分離した活性酸素の働きで、光学部品の表面に付着している有機物質を洗浄したり、電気部品の表面を改質し、コーティング膜との密着性を向上することが行なわれている。
【0003】
従来の紫外線照射装置としては図4に示すように、照射装置本体1の内部に、反射体2を収納し、同反射体2の内面に位置して直管形光源3を装着して構成してある。また同紫外線照射装置1の光源収納室4に不活性ガスを注入し、紫外線光源から照射された紫外線が減衰するのを防止することが行なわれている。
【0004】
【発明が解決しようとする課題】
ところで、光源を点灯することにより、紫外線照射装置1の内部に熱がこもって高温となり紫外線光源が十分に能力を発揮することができない状態となり、さらに高熱により、被照射物や周囲の装置にダメージを与えることとなる欠点がある。
【0005】
本発明は上記の点に鑑み発明したもので、紫外線照射装置が高温となることがなく、紫外線光源が十分に能力を発揮することができ、また被照射物や周囲の装置にダメージを与えることがなく、さらに作業者が危険にさらされることがない紫外線照射装置を提供することを目的とする。
【0006】
【課題を解決するための手段】
以下本発明の課題を解決するための手段を説明する。つまり請求項1に記載の発明は、照射装置本体の光源収納室内の水平方向に装着してなる直管形光源の下面に、紫外線透過ガラスを配置して構成してある。
また直管形光源の上部に、直管形光源に沿って多数の縦溝を有し、同一方向に冷却風が流れるように構成してなる水冷式ヒートシンクを設け、また直管形光源の一端にファンを配置し、水冷式ヒートシンクによって冷却された冷却風が、ファンから直管形光源に向かって送風されるように構成してある。
【0007】
請求項1に記載の紫外線照射装置によると、紫外線照射装置が高温となることがなく、紫外線光源が十分に能力を発揮することができる。また被照射物や周囲の装置にダメージを与えることがなく作業を行なうことができる。
【0008】
請求項2に記載の発明は、請求項1に記載の紫外線照射装置における直管形光源の長手方向の上面と両側面に亘って反射板を配置し、且つ反射板の下端は、紫外線透過ガラスに近接して構成してある。
【0009】
請求項2に記載の紫外線照射装置によると、冷却風が反射板の外部に送風されることが少なく、また光源は被照射物に近接することとなるので、紫外線照射装置を効率的に冷却することができ、さらに効果的に被照射物の洗浄改質を行なうことができる。
【0010】
請求項3に記載の発明は、請求項1と請求項2に記載の紫外線照射装置における水冷式ヒートシンクの上面に熱伝導体を配置し、且つ同熱伝導体の上面に回路基盤を配置し、回路構成部品が冷却されるように構成してある。
【0011】
請求項3に記載の紫外線照射装置によると、紫外線照射装置内部の回路構成部品が熱的悪影響を受けることがない。
【0012】
請求項4に記載の発明は、請求項1乃至請求項3に記載の紫外線照射装置に装着する光源は、エキシマランプを使用し、且つ光源収納室は不活性ガス雰囲気として構成してある。
【0013】
請求項4に記載の紫外線照射装置によると、エキシマランプより波長172nmの紫外線が効果的に発生し、洗浄あるいは改質を効率よく行なうことができる。また光源収納室は不活性ガス雰囲気として構成してあるので、エキシマランプより発生する波長172nmの紫外線を効率よく利用することができる。
【0014】
【発明の実施の形態】
以下本発明を図1乃至図3について説明する。図1は本発明に係る密閉形紫外線照射装置の斜視図、図2は図1の正面図である。図1と図2において、
11は照射装置本体であって、ボックス型に構成してある。また同照射装置本体11は基台12に開閉自在に形成してある。13は照射装置本体11の光源収納室14内に装着してなる直管形光源であって、例えば200ワットのエキシマランプを水平面方向に例えば4本同一間隔に装着して構成してある。また光源収納室14は不活性ガス雰囲気として構成してある。不活性ガスとしては、例えば窒素ガスを用いて構成してある。
【0015】
20は直管形光源の下面に支持してなる紫外線透過ガラスであって、例えば合成石英ガラスを用いて構成してある。21は直管形光源の上部に設けてなる水冷式ヒートシンクであって、直管形光源に沿って多数の縦溝22を有して構成し、同水冷式ヒートシンクは、アルミニウム材で構成してある。23は直管形光源の一端に配置したファンであって、水冷式ヒートシンクによって冷却された冷却風を吸引し、直管形光源に向かって送風するように構成してある。その後、光源を冷却した排風は前記水冷式ヒートシンクに流入され、再び冷却されてファンにより循環される。
【0016】
30は直管形光源の長手方向の上面と両側面に亘って配置してなる反射板であって、下端は紫外線透過ガラスに近接し、冷却風が逃げないように構成してある。反射板30と紫外線透過ガラスの間隔は例えば2mm程度に近接して構成してある。
【0017】
40は水冷式ヒートシンクの上面に配置してなる熱伝導体であって、例えばアルミニウム材で板状に構成してある。41は熱伝導体40の上面に接触して配置してなる回路基盤であって、回路構成部品が効果的に冷却されるように構成してある。
【0018】
図3は、本発明に係る他の紫外線照射装置の正面図である。図3に示すものは、図2に示すものと異なり水冷式ヒートシンクの上面に複数条に屈曲する例えば角型の冷却パイプ50を設けて構成してある。他の構造は図2に示す密閉形紫外線照射装置と同一である。
【0019】
次に上記した紫外線照射装置による洗浄あるいは改質について説明する。
▲1▼この紫外線照射装置は、例えばクリーンルームに設置する。そして、基台12に対して開閉自在に構成した照射装置本体11を開いて、両者の間に例えばレンズ等の光学部品やプラスチック製電気部品等の被照射物60を配置し、かかる後照射装置本体11を閉じる。
▲2▼次にエキシマランプを点灯する。
ここで、5乃至60秒程度紫外線照射し、レンズ等の光学部品の表面の有機物を洗浄したり、プラスチック製電気部品の表面を改質する。
▲3▼かかる後、洗浄あるいは改質したレンズ等の光学部品やプラスチック製電気部品を未処理のものと入れ替える。
【0020】
ここでエキシマランプを点灯すると、主として照射される波長172nmの紫外線により、効果的にレンズ等の光学部品やプラスチック製電気部品の表面の有機物を洗浄しあるいは表面を改質する。またガラス板等の無機物の洗浄も効果的に行なうことができる。エキシマランプから照射される波長172nmの紫外線によると、従来の低圧水銀ランプから照射される波長185nmと波長254nmの紫外線に比較し、2倍乃至3倍の速い速度で処理することができる。
従来の低圧水銀ランプによると、空気中の酸素が185nmの紫外線を吸収してオゾンが発生し、発生したオゾンが254nmの紫外線を吸収し、活性酸素に分解され、この活性酸素と紫外線自身の光エネルギーにより、被照射物の表面の有機物を分解しあるいは表面の親水化等の表面改質が行なわれている。
これに対し、エキシマランプから放射される波長172nmの紫外線が被照射物を配置する空気中の酸素に照射されると、直接活性酸素が生成される。これは、エキシマランプから放射される紫外線は従来の低圧水銀ランプに比べて短波長で強いエネルギーを有するので反応速度が高まり、速い速度で処理することがでる。
【0021】
【発明の効果】
上記した請求項1に記載の紫外線照射装置によると、紫外線照射装置が高温となることがなく、光源が十分に能力を発揮することができ、また被照射物や周囲の装置にダメージを与えることがなく、さらに作業者が危険にさらされることがなく効率的に洗浄あるいは改質することができる特別な効果がある。
【0022】
上記した請求項2に記載の紫外線照射装置によると、冷却風が反射板の外部に送風されることが少なく、また光源は被照射物に近接することとなるので、紫外線照射装置を効率的に冷却することができ、さらに効果的に被照射物の洗浄あるいは改質を行なうことができる特別な効果がある。
【0023】
上記した請求項3に記載の紫外線照射装置によると、紫外線照射装置内部の回路構成部品が熱的悪影響を受けることがない特別な効果がある。
【0024】
上記した請求項4に記載の紫外線照射装置によると、172nmの紫外線が効果的に発生し、洗浄あるいは改質を効率よく行なうことができ、また光源収納室は不活性ガス雰囲気として構成してあるので、エキシマランプより発生する172nmの紫外線を効率よく利用することができる特別な効果がある。
【図面の簡単な説明】
【図1】本発明に係る紫外線照射装置の斜視図。
【図2】図1の正面図。
【図3】本発明に係る他の紫外線照射装置の正面図。
【図4】従来の紫外線照射装置の正面図。
【符号の説明】
11 照射装置本体
12 基台
13 直管形光源
14 光源収納室
20 紫外線透過ガラス
21 水冷式ヒートシンク
22 縦溝
23 ファン
30 反射板
40 熱伝導体
41 回路基盤
50 冷却パイプ
60 被照射物
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an improvement of an ultraviolet irradiation device.
[0002]
[Prior art]
Usually, organic substances adhere to the surface of optical parts such as lenses or plastic electrical parts. If an organic substance adheres to the surface of an optical component such as a lens or a plastic electrical component, for example, the adhesion to the coating film is deteriorated, which causes frequent defective products. Therefore, conventionally, the active oxygen separated from the ozone generated by the action of ultraviolet rays is used to clean organic substances adhering to the surface of optical components and to modify the surface of electrical components, and to adhere to the coating film. It has been done to improve.
[0003]
As shown in FIG. 4, a conventional ultraviolet irradiation device is configured such that a reflector 2 is housed inside an irradiation device body 1 and a straight tube light source 3 is mounted on the inner surface of the reflector 2. It is. In addition, an inert gas is injected into the light source storage chamber 4 of the ultraviolet irradiation device 1 to prevent the ultraviolet rays irradiated from the ultraviolet light source from being attenuated.
[0004]
[Problems to be solved by the invention]
By turning on the light source, heat is accumulated inside the ultraviolet irradiation device 1 and the temperature becomes high, so that the ultraviolet light source cannot fully perform, and the high heat causes damage to the irradiated object and surrounding devices. There is a drawback that will give.
[0005]
The present invention has been invented in view of the above points, and the ultraviolet irradiation device does not become high temperature, the ultraviolet light source can sufficiently exert its ability, and damages the irradiated object and surrounding devices. Further, an object of the present invention is to provide an ultraviolet irradiation device that does not endanger the operator.
[0006]
[Means for Solving the Problems]
Means for solving the problems of the present invention will be described below. That is, the invention described in claim 1 is configured by arranging the ultraviolet transmissive glass on the lower surface of the straight tube light source mounted in the horizontal direction in the light source storage chamber of the irradiation apparatus main body.
In addition, a water-cooled heat sink having a number of vertical grooves along the straight tube light source and configured to allow cooling air to flow in the same direction is provided above the straight tube light source, and one end of the straight tube light source is provided. A fan is disposed in the cooling air, and the cooling air cooled by the water-cooled heat sink is blown from the fan toward the straight tube light source.
[0007]
According to the ultraviolet irradiation device of the first aspect, the ultraviolet irradiation device does not reach a high temperature, and the ultraviolet light source can sufficiently exhibit its ability. Further, the work can be performed without damaging the irradiated object and surrounding devices.
[0008]
According to a second aspect of the present invention, a reflector is disposed across the upper surface and both side surfaces in the longitudinal direction of the straight tube light source in the ultraviolet irradiation device according to the first aspect , and the lower end of the reflector is an ultraviolet transmissive glass. It is constituted close to.
[0009]
According to the ultraviolet irradiating device of claim 2, the cooling air is hardly blown to the outside of the reflector, and the light source is close to the irradiated object, so that the ultraviolet irradiating device is efficiently cooled. In addition, the object to be irradiated can be more effectively cleaned and modified.
[0010]
In the invention according to claim 3, a heat conductor is arranged on the upper surface of the water-cooled heat sink in the ultraviolet irradiation device according to claim 1 and claim 2, and a circuit board is arranged on the upper surface of the heat conductor, The circuit components are configured to be cooled.
[0011]
According to the ultraviolet irradiation device of the third aspect, the circuit components inside the ultraviolet irradiation device are not adversely affected by heat.
[0012]
According to a fourth aspect of the present invention, the light source attached to the ultraviolet irradiation device according to the first to third aspects uses an excimer lamp, and the light source storage chamber is configured as an inert gas atmosphere.
[0013]
According to the ultraviolet irradiation device of the fourth aspect, ultraviolet light having a wavelength of 172 nm is effectively generated from the excimer lamp, and cleaning or modification can be performed efficiently. Further, since the light source storage chamber is configured as an inert gas atmosphere, it is possible to efficiently use ultraviolet rays having a wavelength of 172 nm generated from an excimer lamp.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
The present invention will be described below with reference to FIGS. FIG. 1 is a perspective view of a sealed ultraviolet irradiation apparatus according to the present invention, and FIG. 2 is a front view of FIG. 1 and 2,
Reference numeral 11 denotes an irradiation apparatus body, which is configured in a box shape. The irradiation device main body 11 is formed on the base 12 so as to be freely opened and closed. Reference numeral 13 denotes a straight tube type light source mounted in the light source storage chamber 14 of the irradiation apparatus main body 11, and is configured by mounting, for example, four 200 watt excimer lamps at the same interval in the horizontal plane direction. The light source storage chamber 14 is configured as an inert gas atmosphere. As the inert gas, for example, nitrogen gas is used.
[0015]
Reference numeral 20 denotes an ultraviolet light transmitting glass supported on the lower surface of the straight tube light source, and is made of, for example, synthetic quartz glass. A water-cooled heat sink 21 is provided on the top of the straight tube light source, and has a number of vertical grooves 22 along the straight tube light source. The water-cooled heat sink is composed of an aluminum material. is there. Reference numeral 23 denotes a fan disposed at one end of the straight tube light source, which is configured to suck the cooling air cooled by the water-cooled heat sink and blow it toward the straight tube light source. Thereafter, the exhaust air that has cooled the light source flows into the water-cooled heat sink, is cooled again, and is circulated by a fan.
[0016]
Reference numeral 30 denotes a reflecting plate arranged over the upper surface and both side surfaces in the longitudinal direction of the straight tube light source, and the lower end is close to the ultraviolet light transmitting glass so that the cooling air does not escape. The distance between the reflecting plate 30 and the ultraviolet ray transmitting glass is set close to, for example, about 2 mm.
[0017]
Reference numeral 40 denotes a heat conductor disposed on the upper surface of the water-cooled heat sink, and is formed into a plate shape with, for example, an aluminum material. Reference numeral 41 denotes a circuit board that is disposed in contact with the upper surface of the heat conductor 40, and is configured so that the circuit components are effectively cooled.
[0018]
FIG. 3 is a front view of another ultraviolet irradiation apparatus according to the present invention. 3 differs from that shown in FIG. 2 in that, for example, a rectangular cooling pipe 50 that is bent into a plurality of strips is provided on the upper surface of the water-cooled heat sink. The other structure is the same as that of the sealed ultraviolet irradiation apparatus shown in FIG.
[0019]
Next, cleaning or modification by the above-described ultraviolet irradiation apparatus will be described.
(1) This ultraviolet irradiation device is installed in a clean room, for example. Then, the irradiation device main body 11 configured to be openable and closable with respect to the base 12 is opened, and an irradiated object 60 such as an optical component such as a lens or a plastic electrical component is disposed between the two, and the post-irradiation device The main body 11 is closed.
(2) Next, turn on the excimer lamp.
Here, ultraviolet rays are irradiated for about 5 to 60 seconds to clean organic substances on the surface of optical components such as lenses, or to modify the surface of plastic electrical components.
{Circle around (3)} After this, the cleaned or modified optical parts such as lenses and plastic electrical parts are replaced with unprocessed ones.
[0020]
When the excimer lamp is turned on, the organic matter on the surface of the optical component such as a lens or the plastic electrical component is effectively cleaned or the surface is effectively modified mainly by the ultraviolet ray having a wavelength of 172 nm. In addition, cleaning of inorganic materials such as glass plates can be performed effectively. The ultraviolet rays with a wavelength of 172 nm emitted from the excimer lamp can be processed at a speed twice to three times faster than the ultraviolet rays with wavelengths of 185 nm and 254 nm emitted from the conventional low-pressure mercury lamp.
According to the conventional low-pressure mercury lamp, oxygen in the air absorbs ultraviolet rays of 185 nm to generate ozone, and the generated ozone absorbs ultraviolet rays of 254 nm and is decomposed into active oxygen. Surface modification such as decomposing organic substances on the surface of the irradiated object or making the surface hydrophilic is performed by energy.
On the other hand, when an ultraviolet ray having a wavelength of 172 nm emitted from the excimer lamp is irradiated to oxygen in the air where the irradiated object is arranged, active oxygen is directly generated. This is because the ultraviolet rays emitted from the excimer lamp have strong energy at a short wavelength as compared with the conventional low-pressure mercury lamp, so that the reaction speed is increased and the process can be performed at a high speed.
[0021]
【The invention's effect】
According to the ultraviolet irradiation device according to claim 1 described above, the ultraviolet irradiation device does not reach a high temperature, the light source can sufficiently exert its ability, and damages the irradiated object and surrounding devices. In addition, there is a special effect that the worker can be efficiently cleaned or modified without being in danger.
[0022]
According to the ultraviolet irradiation device described in claim 2, the cooling air is less likely to be blown to the outside of the reflector, and the light source is close to the irradiated object. There is a special effect that can be cooled and that the irradiated object can be more effectively cleaned or modified.
[0023]
According to the ultraviolet irradiation device described in claim 3, there is a special effect that the circuit components inside the ultraviolet irradiation device are not adversely affected by heat.
[0024]
According to the ultraviolet irradiation device described in claim 4, the ultraviolet rays of 172 nm are effectively generated, cleaning or modification can be performed efficiently, and the light source storage chamber is configured as an inert gas atmosphere. Therefore, there is a special effect that the 172 nm ultraviolet rays generated from the excimer lamp can be efficiently used.
[Brief description of the drawings]
FIG. 1 is a perspective view of an ultraviolet irradiation apparatus according to the present invention.
FIG. 2 is a front view of FIG.
FIG. 3 is a front view of another ultraviolet irradiation apparatus according to the present invention.
FIG. 4 is a front view of a conventional ultraviolet irradiation device.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 11 Irradiation device main body 12 Base 13 Straight tube light source 14 Light source storage chamber 20 Ultraviolet transmissive glass 21 Water-cooled heat sink 22 Vertical groove 23 Fan 30 Reflector 40 Heat conductor 41 Circuit board 50 Cooling pipe 60

Claims (4)

照射装置本体の光源収納室内の水平方向に装着してなる直管形光源の下面に、紫外線透過ガラスを配置し、また同直管形光源の上部に、直管形光源に沿って多数の縦溝を有し、同一方向に冷却風が流れるように構成してなる水冷式ヒートシンクを設け、また直管形光源の一端にファンを配置し、水冷式ヒートシンクによって冷却された冷却風が、ファンから直管形光源に向かって送風されるように構成したことを特徴とする紫外線照射装置。An ultraviolet transmissive glass is arranged on the lower surface of the straight tube light source mounted horizontally in the light source storage chamber of the irradiation device main body, and a number of vertical light sources are arranged on the upper portion of the straight tube light source along the straight tube light source. A water-cooled heat sink having a groove and configured to flow cooling air in the same direction is provided, and a fan is disposed at one end of the straight tube light source, and the cooling air cooled by the water-cooled heat sink is An ultraviolet irradiation device configured to be blown toward a straight tube light source. 直管形光源の長手方向の上面と両側面に亘って反射板を配置し、且つ反射板の下端は、紫外線透過ガラスに近接し、冷却風が逃げないように構成したことを特徴とする請求項1記載の紫外線照射装置。A reflecting plate is arranged over the upper surface and both side surfaces in the longitudinal direction of the straight tube light source, and the lower end of the reflecting plate is close to the ultraviolet ray transmitting glass so that the cooling air does not escape. Item 1. An ultraviolet irradiation device according to Item 1. 水冷式ヒートシンクの上面に熱伝導体を配置し、且つ同熱伝導体の上面に回路基盤を配置し、回路構成部品が冷却されるように構成したことを特徴とする請求項1と請求項2記載の紫外線照射装置。3. A heat conductor is disposed on the upper surface of the water-cooled heat sink, and a circuit board is disposed on the upper surface of the heat conductor so that the circuit components are cooled. The ultraviolet irradiation device described. 直管形光源はエキシマランプを使用し、且つ光源収納室は不活性ガス雰囲気としてなることを特徴とする請求項1乃至請求項3記載の紫外線照射装置。4. The ultraviolet irradiation apparatus according to claim 1, wherein an excimer lamp is used as the straight tube light source, and the light source storage chamber is an inert gas atmosphere.
JP2000393907A 2000-12-26 2000-12-26 UV irradiation equipment Expired - Fee Related JP4626056B2 (en)

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Publication number Priority date Publication date Assignee Title
JP5724488B2 (en) * 2011-03-16 2015-05-27 岩崎電気株式会社 Ultraviolet irradiator and ultraviolet irradiator

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0343379U (en) * 1989-08-31 1991-04-23
JPH0768163A (en) * 1993-06-29 1995-03-14 Iwasaki Electric Co Ltd Ultraviolet irradiation device
JPH11244690A (en) * 1998-02-27 1999-09-14 Iwasaki Electric Co Ltd U.v. ray irradiation device
JP2000331649A (en) * 1999-05-19 2000-11-30 Quark Systems Co Ltd Excimer irradiating device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0343379U (en) * 1989-08-31 1991-04-23
JPH0768163A (en) * 1993-06-29 1995-03-14 Iwasaki Electric Co Ltd Ultraviolet irradiation device
JPH11244690A (en) * 1998-02-27 1999-09-14 Iwasaki Electric Co Ltd U.v. ray irradiation device
JP2000331649A (en) * 1999-05-19 2000-11-30 Quark Systems Co Ltd Excimer irradiating device

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