JP3526204B2 - UV cleaning equipment - Google Patents
UV cleaning equipmentInfo
- Publication number
- JP3526204B2 JP3526204B2 JP04284898A JP4284898A JP3526204B2 JP 3526204 B2 JP3526204 B2 JP 3526204B2 JP 04284898 A JP04284898 A JP 04284898A JP 4284898 A JP4284898 A JP 4284898A JP 3526204 B2 JP3526204 B2 JP 3526204B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaned
- ultraviolet
- wavelength
- cleaning
- irradiation window
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、紫外線洗浄装置に
関し、さらに詳細には、紫外線の照射により生成される
酸化エネルギーと光子エネルギーとを利用して、例え
ば、半導体基板あるいは液晶表示用基板などの各種の基
板（以下、本明細書においては、半導体基板あるいは液
晶表示用基板などの各種の基板を総称して、単に「基
板」と称する。）などの被洗浄物の表面に付着した有機
物を除去する紫外線洗浄装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet cleaning apparatus, and more particularly, it utilizes, for example, a semiconductor substrate or a liquid crystal display substrate by utilizing the oxidation energy and photon energy generated by the irradiation of ultraviolet rays. Organic substances adhering to the surface of the object to be cleaned such as various substrates (hereinafter, various substrates such as a semiconductor substrate or a liquid crystal display substrate are collectively referred to as "substrate" in this specification) are removed. The invention relates to an ultraviolet cleaning device.
【０００２】[0002]
【従来の技術】一般に、紫外線洗浄装置として、例え
ば、特開昭６１−１９４８３０号公報に開示された紫外
線洗浄装置が知られている。2. Description of the Related Art Generally, as an ultraviolet cleaning device, for example, an ultraviolet cleaning device disclosed in Japanese Patent Application Laid-Open No. 61-194830 is known.
【０００３】この紫外線洗浄装置においては、紫外線を
照射する紫外線ランプとして、波長２５４ｎｍと波長１
８４ｎｍとの２つの波長を同時に出す紫外線を照射する
紫外線ランプを用いている。In this ultraviolet cleaning apparatus, an ultraviolet lamp for irradiating ultraviolet rays has a wavelength of 254 nm and a wavelength of 1
An ultraviolet lamp that radiates ultraviolet rays that simultaneously emit two wavelengths of 84 nm is used.
【０００４】ところで、上記した紫外線洗浄装置による
波長２５４ｎｍと波長１８４ｎｍとの紫外線による洗浄
は、紫外線により空気中の酸素をオゾンに変え、さらに
オゾンを酸化力の強い励起酸素原子に分解し、この励起
酸素原子によって基板などの被洗浄物の表面に付着した
有機物を酸化除去するものであり、主に化学的なガス反
応に基づく洗浄である。By the way, in the cleaning by the above-mentioned ultraviolet cleaning device with ultraviolet rays having wavelengths of 254 nm and 184 nm, oxygen in the air is converted into ozone by the ultraviolet rays, and the ozone is decomposed into excited oxygen atoms having a strong oxidizing power, and the excited oxygen atoms are excited. Oxygen atoms are used to oxidize and remove organic substances attached to the surface of an object to be cleaned such as a substrate, and cleaning is mainly based on a chemical gas reaction.
【０００５】このために、上記した紫外線洗浄装置によ
り、例えば、実際の基板のように、表面にアルミニウム
（Ａｌ）等の腐食しやすい材料により配線パターンが形
成された基板を洗浄する場合には、上記したガス反応に
よって配線パターンに腐食を発生する恐れがあり、基板
の表面に付着した有機物を除去して洗浄を行うことが可
能である一方で、配線パターンに腐食によるダメージを
発生する恐れがあるという問題点があった。For this reason, in the case of cleaning a substrate having a wiring pattern formed of a material such as aluminum (Al) which is easily corroded on the surface, such as an actual substrate, by the above-mentioned ultraviolet cleaning device, Corrosion may occur in the wiring pattern due to the gas reaction described above, and it is possible to remove the organic substances adhering to the surface of the substrate for cleaning, while there is a possibility that the wiring pattern may be damaged by corrosion. There was a problem.
【０００６】従来より、こうした問題点に対処するため
に、紫外線の照射により生成される酸化エネルギーと光
子エネルギーとを利用した光分解反応を主体とする洗浄
作用を利用することによって、配線パターンの腐食によ
るダメージを避けるようにした洗浄方法が提案されてい
る。[0006] Conventionally, in order to deal with such problems, the cleaning action mainly based on the photolysis reaction utilizing the oxidation energy and the photon energy generated by the irradiation of ultraviolet rays is utilized to corrode the wiring pattern. A cleaning method that avoids damage due to is proposed.
【０００７】こうした洗浄方法とは、具体的には、紫外
線の中心波長を１７２ｎｍ±２０ｎｍとすることによ
り、配線パターンの腐食のダメージを避ける方法である
が、基板の表面に付着した有機物の除去効果が十分でな
いという新たな問題点が指摘されていた。[0007] Such a cleaning method is specifically a method of avoiding the corrosion damage of the wiring pattern by setting the central wavelength of ultraviolet rays to 172 nm ± 20 nm, but the effect of removing the organic substances adhering to the surface of the substrate. A new problem was pointed out that was insufficient.
【０００８】[0008]
【発明が解決しようとする課題】本発明は、上記したよ
うな従来の技術の有する種々の問題点に鑑みてなされた
ものであり、その目的とするところは、被洗浄物の表面
にある腐食しやすい材料の腐食によるダメージの発生を
抑止することができるとともに、被洗浄物の表面に付着
した有機物の除去効果を十分に達成することができるよ
うにした紫外線洗浄装置を提供しようとするものであ
る。SUMMARY OF THE INVENTION The present invention has been made in view of the various problems of the above-mentioned conventional techniques, and the purpose thereof is to corrode the surface of an object to be cleaned. It is an object of the present invention to provide an ultraviolet cleaning device capable of suppressing the occurrence of damage due to corrosion of a material that is easy to remove and also capable of sufficiently achieving the effect of removing the organic substances adhering to the surface of the object to be cleaned. is there.
【０００９】[0009]
【課題を解決するための手段】上記目的を達成するため
に、本発明のうち請求項１に記載の発明は、上下方向に
移動自在に配置され、ヒーターを内蔵し、上面に被洗浄
物を載置する被洗浄物保持台と、中心波長として波長１
７２ｎｍ±２０ｎｍの紫外線を照射する紫外線ランプ
と、上記被洗浄保持台の上方に配置され、上記被洗浄物
保持台の上記上面と対向する側に波長１７２ｎｍ±２０
ｎｍの紫外線を吸収しない照射窓を備え、上記紫外線ラ
ンプを波長１７２ｎｍ±２０ｎｍの紫外線の酸素による
吸収を防止した内部に配置し、上記紫外線ランプから照
射された波長１７２ｎｍ±２０ｎｍの紫外線を、上記照
射窓を通して上記被洗浄物保持台の上記上面に載置され
た上記被洗浄物へ照射可能な紫外線ランプ・ハウジング
と、上記被洗浄物保持台の上記上面に載置された上記被
洗浄物の表面と、上記紫外線ランプ・ハウジングの上記
照射窓の外表面との間の距離Ｌが、０＜Ｌ≦５ｍｍとな
るように上記被洗浄物保持台を移動する移動機構とを有
するようにしたものである。従って、本発明のうち請求
項１に記載の発明によれば、波長１７２ｎｍ±２０ｎｍ
の紫外線を被洗浄物に照射するので、被洗浄物の表面に
ある腐食しやすい材料の腐食を抑止することができると
ともに、照射窓の被洗浄物と対向する表面と被洗浄物の
照射窓と対向する表面との間の距離Ｌを０＜Ｌ≦５ｍｍ
としたので、被洗浄物の表面に付着した有機物の除去効
果も十分に得ることができるものである。In order to achieve the above object, the invention according to claim 1 of the present invention is arranged so as to be movable in the vertical direction, has a built-in heater, and has an object to be cleaned on its upper surface. An object holding base to be placed and a wavelength of 1 as the central wavelength
An ultraviolet lamp for irradiating ultraviolet rays of 72 nm ± 20 nm, and a wavelength of 172 nm ± 20, which is arranged above the holding base to be cleaned and which faces the upper surface of the holding base to be cleaned.
equipped with an irradiation window that does not absorb UV of 172 nm, and the UV lamp is placed inside to prevent absorption of UV of 172 nm ± 20 nm by oxygen, and the UV of 172 nm ± 20 nm emitted from the UV lamp is irradiated. An ultraviolet lamp housing capable of irradiating the object to be cleaned placed on the upper surface of the object to be cleaned through a window, and a surface of the object to be cleaned mounted on the upper surface of the object to be cleaned holder And a moving mechanism for moving the object-holding table so that the distance L between the ultraviolet lamp housing and the outer surface of the irradiation window is 0 <L ≦ 5 mm. is there. Therefore, according to the invention of claim 1 of the present invention, the wavelength is 172 nm ± 20 nm.
Since the object to be cleaned is irradiated with the ultraviolet rays of, the corrosion of the easily corroded material on the surface of the object to be cleaned can be suppressed, and the surface of the irradiation window facing the object to be cleaned and the irradiation window of the object to be cleaned are Distance L between opposing surfaces is 0 <L ≦ 5 mm
Therefore, the effect of removing the organic substances adhering to the surface of the object to be cleaned can be sufficiently obtained.
【００１０】また、本発明のうち請求項２に記載の発明
は、波長１７２ｎｍ±２０ｎｍの紫外線を吸収しない照
射窓を備えるとともに波長１７２ｎｍ±２０ｎｍの紫外
線の酸素による吸収を防止したハウジング内に、波長１
７２ｎｍ±２０ｎｍの紫外線を照射する紫外線ランプを
配置し、上記紫外線ランプから照射された波長１７２ｎ
ｍ±２０ｎｍの紫外線を上記照射窓を通して被洗浄物へ
照射する紫外線洗浄装置において、上記照射窓の上記被
洗浄物と対向する表面と上記被洗浄物の上記照射窓と対
向する表面との間の距離Ｌを０＜Ｌ≦５ｍｍとしたもの
である。従って、本発明のうち請求項２に記載の発明に
よれば、波長１７２ｎｍ±２０ｎｍの紫外線を被洗浄物
に照射するので、被洗浄物の表面にある腐食しやすい材
料の腐食を抑止することができるとともに、照射窓の被
洗浄物と対向する表面と被洗浄物の照射窓と対向する表
面との間の距離Ｌを０＜Ｌ≦５ｍｍとしたので、被洗浄
物の表面に付着した有機物の除去効果も十分に得ること
ができるものである。The invention according to claim 2 of the present invention is characterized in that a housing is provided with an irradiation window that does not absorb ultraviolet rays having a wavelength of 172 nm ± 20 nm and the wavelength of 172 nm ± 20 nm is prevented from being absorbed by oxygen. 1
An ultraviolet lamp that radiates ultraviolet rays of 72 nm ± 20 nm is arranged, and the wavelength of 172 n emitted from the ultraviolet lamp is set.
In an ultraviolet cleaning apparatus for irradiating an object to be cleaned with ultraviolet rays of m ± 20 nm through the irradiation window, between the surface of the irradiation window facing the object to be cleaned and the surface of the object to be cleaned facing the irradiation window. The distance L is 0 <L ≦ 5 mm. Therefore, according to the second aspect of the present invention, since the object to be cleaned is irradiated with the ultraviolet rays having the wavelength of 172 nm ± 20 nm, it is possible to suppress the corrosion of the easily corrosive material on the surface of the object to be cleaned. At the same time, the distance L between the surface of the irradiation window facing the object to be cleaned and the surface of the object to be cleaned facing the irradiation window is set to 0 <L ≦ 5 mm. The removal effect can be sufficiently obtained.
【００１１】また、本発明のうち請求項３に記載の発明
は、波長１７２ｎｍ±２０ｎｍの紫外線を吸収しない照
射窓を備えるとともに波長１７２ｎｍ±２０ｎｍの紫外
線の酸素による吸収を防止したハウジング内に、波長１
７２ｎｍ±２０ｎｍの紫外線を照射する紫外線ランプを
配置し、上記紫外線ランプから照射された波長１７２ｎ
ｍ±２０ｎｍの紫外線を上記照射窓を通して被洗浄物へ
照射する紫外線洗浄装置において、上記被洗浄物を載置
する被洗浄物保持台と、上記照射窓の上記被洗浄物と対
向する表面と上記被洗浄物保持台に載置された上記被洗
浄物の上記照射窓と対向する表面との間の距離Ｌが０＜
Ｌ≦５ｍｍとなるように上記被洗浄物保持台を移動する
移動機構とを有するようにしたものである。According to a third aspect of the present invention, the wavelength of 172 nm ± 20 nm is not absorbed in the housing and the wavelength of 172 nm ± 20 nm is prevented from being absorbed by oxygen. 1
An ultraviolet lamp that radiates ultraviolet rays of 72 nm ± 20 nm is arranged, and the wavelength of 172 n emitted from the ultraviolet lamp is set.
An ultraviolet cleaning apparatus for irradiating an object to be cleaned with ultraviolet rays of m ± 20 nm through the irradiation window, an object to be cleaned holder on which the object to be cleaned is placed, a surface of the irradiation window facing the object to be cleaned, The distance L between the irradiation window of the object to be cleaned and the surface facing the object to be cleaned placed on the object to be cleaned is 0 <
And a moving mechanism for moving the object holding base so that L ≦ 5 mm.
【００１２】従って、本発明のうち請求項３に記載の発
明によれば、照射窓の被洗浄物と対向する表面と被洗浄
物の照射窓と対向する表面との間の距離Ｌを０＜Ｌ≦５
ｍｍの範囲に容易に設定することができる。Therefore, according to the third aspect of the present invention, the distance L between the surface of the irradiation window that faces the object to be cleaned and the surface of the object that faces the irradiation window is 0 < L ≦ 5
It can be easily set in the range of mm.
【００１３】また、本発明のうち請求項４に記載の発明
は、請求項１または請求項２のいずれか１項に記載の発
明において、上記被洗浄物を加熱する加熱装置を有する
ようにしたものである。Further, the invention according to claim 4 of the present invention is the invention according to any one of claim 1 or claim 2, further comprising a heating device for heating the object to be cleaned. It is a thing.
【００１４】従って、本発明のうち請求項４に記載の発
明によれば、加熱装置により被洗浄物を加熱することが
でき、被洗浄物の表面に付着した有機物の除去効果を一
層促進することができる。Therefore, according to the fourth aspect of the present invention, the object to be cleaned can be heated by the heating device, and the effect of removing the organic substances adhering to the surface of the object to be cleaned can be further promoted. You can
【００１５】また、本発明のうち請求項５に記載の発明
は、請求項４に記載の発明において、上記加熱装置は、
上記被洗浄物保持台内に配設されたヒーターであるよう
にしたものである。In the invention according to claim 5 of the present invention, in the invention according to claim 4, the heating device is:
The heater is arranged in the object holding base.
【００１６】従って、本発明のうち請求項５に記載の発
明によれば、加熱装置を被洗浄物保持台内に配設するこ
とができるので、装置全体の小型化を図ることができ
る。Therefore, according to the invention of claim 5 of the present invention, the heating device can be arranged in the object-holding base for the object to be cleaned, so that the overall size of the device can be reduced.
【００１７】[0017]
【発明の実施の形態】以下、図面に基づいて、本発明に
よる紫外線洗浄装置の実施の形態の一例を詳細に説明す
るものとする。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An example of an embodiment of an ultraviolet cleaning device according to the present invention will be described in detail below with reference to the drawings.
【００１８】図１は、本発明による紫外線洗浄装置の実
施の形態の一例を示す説明図であり、ベース台１０に
は、シリンダー１２により上下方向（図１上矢印方向）
に移動自在に設置された被洗浄物保持台１４が配設され
ている。基板などの被洗浄物１６は、この被洗浄物保持
台１４の上面１４ａに載置されることになる。FIG. 1 is an explanatory view showing an example of an embodiment of an ultraviolet cleaning apparatus according to the present invention, in which a base 12 is vertically moved by a cylinder 12 (direction of an arrow in FIG. 1).
An object-to-be-cleaned holding base 14 that is movably installed is provided. The object 16 to be cleaned such as a substrate is placed on the upper surface 14 a of the object holding base 14.
【００１９】また、被洗浄物保持台１４にはヒーター１
８が内蔵されており、ヒーター１８を作動させることに
より被洗浄物１６を適宜加熱することができるようにな
されている。Further, the heater 1 is mounted on the object-holding base 14 for cleaning.
8 is built in, and the object to be cleaned 16 can be appropriately heated by operating the heater 18.
【００２０】さらに、被洗浄物保持台１４の上方には紫
外線ランプ・ハウジング２０が配置されており、紫外線
ランプ・ハウジング２０内には中心波長として波長１７
２ｎｍ±２０ｎｍの紫外線を照射する紫外線ランプ２２
が配設されている。Further, an ultraviolet lamp housing 20 is disposed above the object to be cleaned holding base 14, and a wavelength of 17 is set as a central wavelength in the ultraviolet lamp housing 20.
Ultraviolet lamp 22 that radiates ultraviolet rays of 2 nm ± 20 nm
Is provided.
【００２１】そして、紫外線ランプ・ハウジング２０の
被洗浄物保持台１４の上面１４ａと対向する側には、例
えば、石英ガラスなどにより形成された波長１７２ｎｍ
±２０ｎｍの紫外線に対して透明な照射窓２４が設けら
れており、紫外線ランプ２２により照射された紫外線
は、照射窓２４を透過して被洗浄物保持台１４の上面１
４ａに向けて照射されるようになされている。On the side of the ultraviolet lamp housing 20 facing the upper surface 14a of the object-to-be-cleaned holder 14, a wavelength of 172 nm formed of, for example, quartz glass or the like.
An irradiation window 24 transparent to ultraviolet rays of ± 20 nm is provided, and the ultraviolet rays emitted by the ultraviolet lamp 22 pass through the irradiation window 24 and the upper surface 1 of the object-holding base 14 for cleaning.
Irradiation is directed toward 4a.
【００２２】なお、シリンダー１２を作動させることに
より、被洗浄物保持台１４の上面１４ａに載置された被
洗浄物１６の表面１６ａと紫外線ランプ・ハウジング２
０に設けられた照射窓２４の外表面２４ａとの間の距離
Ｌを、０＜Ｌ≦５ｍｍとなるように調整することができ
るようになされている。By operating the cylinder 12, the surface 16a of the object to be cleaned 16 placed on the upper surface 14a of the object to be cleaned holding base 14 and the ultraviolet lamp housing 2
The distance L between the irradiation window 24 provided at 0 and the outer surface 24a can be adjusted so that 0 <L ≦ 5 mm.
【００２３】また、紫外線ランプ・ハウジング２０内に
は、窒素（Ｎ2）ガスが流されており、紫外線ランプ２
２により照射された紫外線が空気中の酸素（０2）によ
り吸収されるのを防止するようになされている。In addition, nitrogen (N 2 ) gas is flown in the ultraviolet lamp housing 20, and the ultraviolet lamp 2
The ultraviolet rays irradiated by 2 are prevented from being absorbed by oxygen (0 2 ) in the air.
【００２４】なお、この実施の形態においては、紫外線
ランプ・ハウジング２０内に窒素（Ｎ2）ガスを流すこ
とにより、紫外線ランプ２２により照射された紫外線が
空気中の酸素（０2）により吸収されるのを防止するよ
うにしたが、これに限られるものではなく、真空ポンプ
を用いて紫外線ランプ・ハウジング２０内の真空度を高
めることによって、紫外線ランプ２２により照射された
紫外線が空気中の酸素（０2）により吸収されるのを防
止するようにしてもよい。In this embodiment, by passing a nitrogen (N 2 ) gas into the ultraviolet lamp housing 20, the ultraviolet rays emitted by the ultraviolet lamp 22 are absorbed by oxygen (0 2 ) in the air. However, the present invention is not limited to this, and by increasing the degree of vacuum in the ultraviolet lamp housing 20 by using a vacuum pump, the ultraviolet rays emitted by the ultraviolet lamp 22 can absorb oxygen in the air. It may be prevented from being absorbed by (0 2 ).
【００２５】以上の構成において、この紫外線洗浄装置
により被洗浄物１６の洗浄を行うには、まず、シリンダ
ー１２を作動させて被洗浄物保持台１４を下方へ移動さ
せ、被洗浄物保持台１４の上面１４ａに被洗浄物１６を
載置する。In order to clean the object 16 to be cleaned with this ultraviolet cleaning device having the above-described structure, first, the cylinder 12 is operated to move the object-holding table 14 downward, and the object-holding table 14 is cleaned. The object to be cleaned 16 is placed on the upper surface 14a of the.
【００２６】それから、シリンダー１２を作動させて被
洗浄物保持台１４を上方へ移動させ、被洗浄物保持台１
４の上面１４ａに載置された被洗浄物１６の表面１６ａ
と紫外線ランプ・ハウジング２０に設けられた照射窓２
４の外表面２４ａとの間の距離Ｌが０＜Ｌ≦５ｍｍとな
るようにする。Then, the cylinder 12 is operated to move the object-to-be-cleaned holding base 14 upward, and the object-to-be-cleaned holding base 1 is moved.
Surface 16a of the object to be cleaned 16 placed on the upper surface 14a of No. 4
And an irradiation window 2 provided in the ultraviolet lamp housing 20
The distance L between the outer surface 24 and the outer surface 24a of 4 is 0 <L ≦ 5 mm.
【００２７】その後に、紫外線ランプ２２を点灯して、
照射窓２４を通して紫外線を被洗浄物１６上に照射する
ことにより、被洗浄物１６の表面の洗浄を行う。After that, the ultraviolet lamp 22 is turned on,
The surface of the object to be cleaned 16 is cleaned by irradiating the object to be cleaned 16 with ultraviolet rays through the irradiation window 24.
【００２８】また、ヒーター１８を作動させることによ
り被洗浄物保持台１４を加熱すると、これにより被洗浄
物保持台１４の上面１４ａに載置された被洗浄物１６が
加熱されることになり、紫外線による被洗浄物１６の洗
浄の効果を向上することができる。When the heater 18 is operated to heat the object-to-be-cleaned holding base 14, the object-to-be-cleaned 16 placed on the upper surface 14a of the object-to-be-cleaned holding base 14 is heated. The effect of cleaning the object to be cleaned 16 with ultraviolet rays can be improved.
【００２９】図２は、上記した本発明による紫外線洗浄
装置（図２においては「本発明」として示す。）と「従
来の技術」の項で説明した波長２５４ｎｍと波長１８４
ｎｍとの２つの波長を同時に出す紫外線を照射する紫外
線ランプを用いた紫外線洗浄装置（図２においては「従
来技術」として示す。）とを用いて、被洗浄物として表
面にＡｌ（アルミニウム）により配線パターンが形成さ
れた液晶用表示用基板を洗浄した場合の比較実験の結果
を示す図表である。FIG. 2 shows the ultraviolet cleaning apparatus according to the present invention described above (shown as "the present invention" in FIG. 2) and the wavelengths of 254 nm and 184 described in the "Prior Art" section.
By using an ultraviolet cleaning device (shown as “prior art” in FIG. 2) using an ultraviolet lamp that irradiates ultraviolet rays that simultaneously emit two wavelengths of nm, Al (aluminum) is used as the object to be cleaned on the surface. 7 is a chart showing the results of a comparative experiment when the liquid crystal display substrate on which the wiring pattern is formed is washed.
【００３０】なお、実験の結果の評価にあたって、液晶
用表示用基板に付着した有機物の除去スピードについて
は、水の接触角が５°以下になるまでの紫外線の照射時
間で評価した。この照射時間が短いほど液晶用表示用基
板に付着した有機物の除去スピードが速いことを示して
おり、被洗浄物の表面に付着した有機物の除去効果が高
いことを意味している。In the evaluation of the experimental results, the removal speed of the organic substances adhering to the liquid crystal display substrate was evaluated by the irradiation time of ultraviolet rays until the contact angle of water became 5 ° or less. It is shown that the shorter the irradiation time is, the faster the removal rate of the organic substances attached to the liquid crystal display substrate is, which means that the removal effect of the organic substances attached to the surface of the object to be cleaned is higher.
【００３１】また、実験の結果の評価にあたって、液晶
用表示用基板の表面に形成された配線パターンのダメー
ジの発生については、顕微鏡観察による目視により評価
した。In the evaluation of the results of the experiment, the occurrence of damage to the wiring pattern formed on the surface of the liquid crystal display substrate was evaluated visually by a microscope.
【００３２】図２に示す実験結果から明らかなように、
「本発明」において距離Ｌが０＜Ｌ≦５ｍｍのときに
は、「従来技術」よりも液晶用表示用基板に付着した有
機物の除去スピードが大幅に向上する（速くなる）とと
もに、液晶用表示用基板の表面に形成された配線パター
ンにダメージを与えないことが理解される。As is clear from the experimental results shown in FIG.
In the “present invention”, when the distance L is 0 <L ≦ 5 mm, the removal speed of the organic substances adhering to the liquid crystal display substrate is significantly improved (faster) than in the “prior art”, and the liquid crystal display substrate is It is understood that the wiring pattern formed on the surface of is not damaged.
【００３３】また、ヒーター１８を作動させて液晶表示
用基板を加熱することにより、液晶用表示用基板に付着
した有機物の除去スピードをさらに速めることができる
ものであることがわかる。Further, it is understood that the heater 18 is operated to heat the liquid crystal display substrate, whereby the speed of removing the organic substances adhering to the liquid crystal display substrate can be further increased.
【００３４】[0034]
【発明の効果】本発明は、以上説明したように構成され
ているので、被洗浄物の表面にある腐食しやすい材料の
腐食の発生を避けることができるとともに、被洗浄物の
表面に付着した有機物の除去効果を十分に達成すること
ができるという優れた効果を奏する。Since the present invention is constructed as described above, it is possible to avoid the occurrence of corrosion of the easily corroded material on the surface of the object to be cleaned and to attach it to the surface of the object to be cleaned. It has an excellent effect that the effect of removing organic substances can be sufficiently achieved.
【図１】本発明による紫外線洗浄装置の実施の形態の一
例を示す概略構成説明図である。FIG. 1 is a schematic configuration explanatory view showing an example of an embodiment of an ultraviolet cleaning device according to the present invention.
【図２】本発明による紫外線洗浄装置と「従来の技術」
の項で説明した紫外線洗浄装置との比較実験の結果を示
す図表である。FIG. 2 is an ultraviolet cleaning apparatus according to the present invention and “prior art”.
5 is a table showing the results of a comparative experiment with the ultraviolet cleaning device described in Section 2.
１０ ベース台
１２ シリンダー
１４ 被洗浄物保持台
１４ａ 被洗浄物保持台の上面
１６ 被洗浄物
１６ａ 被洗浄物の表面
１８ ヒーター
２０ 紫外線ランプ・ハウジング
２２ 紫外線ランプ
２４ 照射窓
２４ａ 照射窓の外表面
Ｌ 被洗浄物の表面と照射窓の外表面との間の
距離DESCRIPTION OF SYMBOLS 10 Base stand 12 Cylinder 14 Cleaning object holding table 14a Upper surface of cleaning object holding table 16 Cleaning object 16a Surface of cleaning object 18 Heater 20 UV lamp / housing 22 UV lamp 24 Irradiation window 24a Irradiation window outer surface L Distance between the surface of the item to be washed and the outer surface of the irradiation window
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平９−74079（ＪＰ，Ａ) 特開 平７−249603（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) B08B 7/00 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-9-74079 (JP, A) JP-A-7-249603 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) B08B 7/00
Claims (5)
ーを内蔵し、上面に被洗浄物を載置する被洗浄物保持台
と、 中心波長として波長１７２ｎｍ±２０ｎｍの紫外線を照
射する紫外線ランプと、 前記被洗浄保持台の上方に配置され、前記被洗浄物保持
台の前記上面と対向する側に波長１７２ｎｍ±２０ｎｍ
の紫外線を吸収しない照射窓を備え、前記紫外線ランプ
を波長１７２ｎｍ±２０ｎｍの紫外線の酸素による吸収
を防止した内部に配置し、前記紫外線ランプから照射さ
れた波長１７２ｎｍ±２０ｎｍの紫外線を、前記照射窓
を通して前記被洗浄物保持台の前記上面に載置された前
記被洗浄物へ照射可能な紫外線ランプ・ハウジングと、 前記被洗浄物保持台の前記上面に載置された前記被洗浄
物の表面と、前記紫外線ランプ・ハウジングの前記照射
窓の外表面との間の距離Ｌが、０＜Ｌ≦５ｍｍとなるよ
うに前記被洗浄物保持台を移動する移動機構とを有する
ことを特徴とする紫外線洗浄装置。1. A to-be-cleaned object holding base, which is movably arranged in the vertical direction, has a built-in heater, and mounts an to-be-cleaned object on the upper surface, and an ultraviolet lamp for irradiating ultraviolet rays having a central wavelength of 172 nm ± 20 nm. A wavelength of 172 nm ± 20 nm on the side of the object to be cleaned that faces the upper surface of the object to be cleaned and is disposed above the object to be cleaned.
Of the ultraviolet lamp which does not absorb the ultraviolet rays of 172 nm ± 20 nm, and the ultraviolet lamp is disposed inside to prevent the absorption of the ultraviolet rays of the wavelength of 172 nm ± 20 nm by oxygen. An ultraviolet lamp housing capable of irradiating the object to be cleaned placed on the upper surface of the object to be cleaned through, and a surface of the object to be cleaned placed on the upper surface of the object to be cleaned holder. A moving mechanism for moving the object-holding table so that a distance L between the ultraviolet lamp housing and the outer surface of the irradiation window is 0 <L ≦ 5 mm. Cleaning device.
収しない照射窓を備えるとともに波長１７２ｎｍ±２０
ｎｍの紫外線の酸素による吸収を防止したハウジング内
に、波長１７２ｎｍ±２０ｎｍの紫外線を照射する紫外
線ランプを配置し、前記紫外線ランプから照射された波
長１７２ｎｍ±２０ｎｍの紫外線を前記照射窓を通して
被洗浄物へ照射する紫外線洗浄装置において、 前記照射窓の前記被洗浄物と対向する表面と前記被洗浄
物の前記照射窓と対向する表面との間の距離Ｌを０＜Ｌ
≦５ｍｍとしたことを特徴とする紫外線洗浄装置。2. An irradiation window which does not absorb ultraviolet rays having a wavelength of 172 nm ± 20 nm and has a wavelength of 172 nm ± 20
An ultraviolet lamp for irradiating ultraviolet rays having a wavelength of 172 nm ± 20 nm is arranged in a housing which prevents absorption of ultraviolet rays having a wavelength of 172 nm ± 20 nm by oxygen, and an ultraviolet ray having a wavelength of 172 nm ± 20 nm emitted from the ultraviolet lamp is passed through the irradiation window to be cleaned. In the ultraviolet cleaning device, the distance L between the surface of the irradiation window facing the object to be cleaned and the surface of the object cleaning to face the irradiation window is 0 <L.
An ultraviolet cleaning device characterized in that ≦ 5 mm.
収しない照射窓を備えるとともに波長１７２ｎｍ±２０
ｎｍの紫外線の酸素による吸収を防止したハウジング内
に、波長１７２ｎｍ±２０ｎｍの紫外線を照射する紫外
線ランプを配置し、前記紫外線ランプから照射された波
長１７２ｎｍ±２０ｎｍの紫外線を前記照射窓を通して
被洗浄物へ照射する紫外線洗浄装置において、 前記被洗浄物を載置する被洗浄物保持台と、 前記照射窓の前記被洗浄物と対向する表面と前記被洗浄
物保持台に載置された前記被洗浄物の前記照射窓と対向
する表面との間の距離Ｌが０＜Ｌ≦５ｍｍとなるように
前記被洗浄物保持台を移動する移動機構とを有すること
を特徴とする紫外線洗浄装置。3. An irradiation window that does not absorb ultraviolet rays having a wavelength of 172 nm ± 20 nm and has a wavelength of 172 nm ± 20
An ultraviolet lamp for irradiating ultraviolet rays having a wavelength of 172 nm ± 20 nm is arranged in a housing which prevents absorption of ultraviolet rays having a wavelength of 172 nm ± 20 nm by oxygen, and an ultraviolet ray having a wavelength of 172 nm ± 20 nm emitted from the ultraviolet lamp is passed through the irradiation window to be cleaned. In the ultraviolet cleaning apparatus for irradiating the cleaning object, a cleaning object holding table on which the cleaning object is placed, a surface of the irradiation window facing the cleaning object, and the cleaning object placed on the cleaning object holding table. An ultraviolet cleaning apparatus, comprising: a moving mechanism that moves the object holding base so that a distance L between the irradiation window of the object and a surface facing the object is 0 <L ≦ 5 mm.
の紫外線洗浄装置において、 前記被洗浄物を加熱する加熱装置とを有することを特徴
とする紫外線洗浄装置。4. The ultraviolet cleaning device according to claim 2, further comprising: a heating device that heats the object to be cleaned.
て、 前記加熱装置は、前記被洗浄物保持台内に配設されたヒ
ーターであることを特徴とする紫外線洗浄装置。5. The ultraviolet cleaning apparatus according to claim 4, wherein the heating device is a heater arranged inside the object holding base.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04284898A JP3526204B2 (en) | 1998-02-09 | 1998-02-09 | UV cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04284898A JP3526204B2 (en) | 1998-02-09 | 1998-02-09 | UV cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11221535A JPH11221535A (en) | 1999-08-17 |
| JP3526204B2 true JP3526204B2 (en) | 2004-05-10 |
Family
ID=12647437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04284898A Expired - Fee Related JP3526204B2 (en) | 1998-02-09 | 1998-02-09 | UV cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3526204B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3778432B2 (en) | 2002-01-23 | 2006-05-24 | 東京エレクトロン株式会社 | Substrate processing method and apparatus, and semiconductor device manufacturing apparatus |
| JP6899217B2 (en) | 2016-12-28 | 2021-07-07 | 株式会社Ｓｃｒｅｅｎホールディングス | Board processing equipment, board processing method and board processing system |
-
1998
- 1998-02-09 JP JP04284898A patent/JP3526204B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11221535A (en) | 1999-08-17 |
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