JPH0447957Y2 - - Google Patents
Info
- Publication number
- JPH0447957Y2 JPH0447957Y2 JP1983129846U JP12984683U JPH0447957Y2 JP H0447957 Y2 JPH0447957 Y2 JP H0447957Y2 JP 1983129846 U JP1983129846 U JP 1983129846U JP 12984683 U JP12984683 U JP 12984683U JP H0447957 Y2 JPH0447957 Y2 JP H0447957Y2
- Authority
- JP
- Japan
- Prior art keywords
- ozone
- ultraviolet
- cleaning
- cleaned
- irradiation chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Cleaning In General (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Drying Of Semiconductors (AREA)
Description
【考案の詳細な説明】 本考案は紫外線洗浄装置に関するものである。[Detailed explanation of the idea] The present invention relates to an ultraviolet cleaning device.
紫外線ランプより発生するオゾンを利用して汚
染物を分解洗浄することが従来より行なわれてい
る。例えばシリコンウエハーに感光レジストを塗
付する際の前処理として、主洗浄後にシリコンウ
エハーに付着した大気中の有機汚染物を塗布直前
に追加洗浄することにより分解したり、電子ビー
ムによるスパツタリング蒸着の際に基体に付着し
た真空ポンプの油などによる有機汚染物を同じく
追加洗浄すると塗布膜あるいは蒸着膜の密着性を
著しく向上できることが明らかになつている。そ
の他にもレンズや水晶振動子など多くの被洗浄体
に適用されるが、いずれにしてもウエツト法によ
る主洗浄工程の後にこの紫外線洗浄装置を用いる
と優れた洗浄効果を得ることができる。 Conventionally, ozone generated from ultraviolet lamps has been used to decompose and clean contaminants. For example, as a pretreatment when applying a photoresist to a silicon wafer, organic contaminants in the air that have adhered to the silicon wafer after main cleaning can be decomposed by additional cleaning immediately before application, or during sputtering deposition using an electron beam. It has become clear that the adhesion of a coated or deposited film can be significantly improved by additionally cleaning organic contaminants such as vacuum pump oil that have adhered to the substrate. It is also applied to many other objects to be cleaned, such as lenses and crystal oscillators, but in any case, if this ultraviolet cleaning device is used after the main cleaning step using the wet method, excellent cleaning effects can be obtained.
ところで紫外線ランプ、例えば低圧水銀ランプ
を点灯すると、主として波長が254nmの水銀共鳴
線の紫外線が外部に放出され、従として185nmの
紫外線が、更には他の波長のものがわずかに放出
される。そして、波長185nmの紫外線によつてオ
ゾンが生成し、次に、このオゾンが波長254nmの
紫外線により分解されて発生基の酸素が生成し、
この発生基の酸素が有機汚染物を分解してガス状
態で飛散することが知られている。 By the way, when an ultraviolet lamp, such as a low-pressure mercury lamp, is turned on, ultraviolet rays of the mercury resonance line with a wavelength of 254 nm are mainly emitted to the outside, and ultraviolet rays of 185 nm and a small amount of other wavelengths are also emitted. Then, ozone is generated by ultraviolet rays with a wavelength of 185 nm, and then this ozone is decomposed by ultraviolet rays with a wavelength of 254 nm, producing oxygen as a generating group.
It is known that oxygen from this generating group decomposes organic contaminants and scatters them in a gaseous state.
紫外線による洗浄機構は以上の通りであるが、
この際に発生するオゾンは有害物質であり、装置
外への漏洩量も環境基準で定められる範囲内でな
ければならない。そして、この紫外線洗浄装置で
は酸素を含むガスの供給と、有機汚染物の分解ガ
スの排出のために、作動中は照射室はある程度の
換気が行れている。しかし、この様に換気の目的
が、洗浄終了後の照射室内のオゾンの排除を主と
したものではないためにその風量は少く、オゾン
が完全に排除されるまでに長時間を要した。従つ
て、洗浄終了後に被洗浄物を取出すために装置の
開閉扉を開けると内部のオゾンが漏洩して環境基
準を越えてしまつたり、また、内部のオゾンが排
除されるのを待つて開扉したのでは待ち時間が長
くなつてしまう問題点があつた。 The cleaning mechanism using ultraviolet rays is as described above.
Ozone generated at this time is a harmful substance, and the amount leaked outside the device must also be within the range specified by environmental standards. In this ultraviolet cleaning device, the irradiation chamber is ventilated to some extent during operation in order to supply oxygen-containing gas and discharge decomposed gas from organic contaminants. However, since the purpose of ventilation was not primarily to remove ozone from the irradiation chamber after cleaning, the air volume was small and it took a long time for ozone to be completely removed. Therefore, if the door of the device is opened to take out the object to be cleaned after cleaning, the ozone inside may leak and exceed environmental standards, or the door must be opened after waiting for the ozone inside to be removed. There was a problem with the waiting time being longer if the door was closed.
そこで本考案は、洗浄が終了してから所定の短
時間内に開扉して安全に被洗浄体を取出すことが
可能な紫外線洗浄装置を提供することを目的と
し、その構成は、紫外線ランプの光でオゾンを発
生させ、このオゾンの分解により生成される発生
基の酸素により被洗浄体の表面に付着する有機汚
染物などを分解して洗浄する紫外線洗浄装置であ
つて、1分間に、被洗浄体が支持される照射室を
その容積の少なくとも5倍の風量で換気が可能な
排気装置を備えてなることを特徴とする。 Therefore, the purpose of the present invention is to provide an ultraviolet cleaning device that can open the door and safely take out the object to be cleaned within a predetermined short time after cleaning is completed. This is an ultraviolet cleaning device that generates ozone using light and decomposes and cleans organic contaminants that adhere to the surface of the object to be cleaned using the generated oxygen generated by the decomposition of this ozone. The irradiation chamber in which the cleaning body is supported is equipped with an exhaust device capable of ventilating the irradiation chamber with an air volume at least five times the volume of the irradiation chamber.
以下に図面に示す実施例に基づいて本考案を具
体的に説明する。 The present invention will be specifically described below based on embodiments shown in the drawings.
第1図は装置の断面図を示すが、装置箱1には
灯体2が内蔵されて二重構造をなし、発生したオ
ゾンが外部に漏洩しないようになつている。灯体
2の内部が照射室3であるが、その上方には紫外
線ランプ3としてU字状の350W高出力低圧水銀
灯が2本配設され、その背後にはミラー5が設け
られて紫外線が下方に照射される。灯体2の天井
上面には冷却水路6が固着されて水冷されてい
る。照射室3の中央部には被洗浄体支持台7が配
設されており、被洗浄体8が支持されるが、この
被洗浄体8は開閉扉9を開閉して出し入れされ
る。灯体2の側方には換気のための吸入孔10と
排気孔11が設けられ、排気孔11には排気装置
20が接続されて、この中でオゾンが分解されて
装置箱1外に排出されるようになつている。 FIG. 1 shows a cross-sectional view of the apparatus, and a lamp body 2 is built into the apparatus box 1, forming a double structure to prevent generated ozone from leaking to the outside. The inside of the lamp body 2 is the irradiation chamber 3, and above it there are two U-shaped 350W high-output low-pressure mercury lamps as ultraviolet lamps 3, and behind them a mirror 5 is installed to direct the ultraviolet rays downward. is irradiated. A cooling water channel 6 is fixed to the upper surface of the ceiling of the lamp body 2 and is water-cooled. A cleaning object support stand 7 is disposed in the center of the irradiation chamber 3, and supports a cleaning object 8. The cleaning object 8 is taken in and out by opening and closing an opening/closing door 9. An intake hole 10 and an exhaust hole 11 are provided on the sides of the lamp body 2 for ventilation, and an exhaust device 20 is connected to the exhaust hole 11, in which ozone is decomposed and exhausted to the outside of the device box 1. It is becoming more and more common.
排気装置20は、第2図に示すようにフイルタ
ー30を脱着可能に内蔵するが、蓋21を開けて
段部22上にフイルター30を載置し、上方をス
プリング23で押圧することにより装着されてお
り、フイルター30を取換える際も簡単に取出せ
るようになつている。そして段部22の下方には
フアン24が設けられ、この吸引力により、オゾ
ンを含む照射室3内の空気が、排気孔11、フイ
ルター30を通つて排出される。このフアン24
の吸引力は強力であつて、1分間の短時間内に照
射室3の容積の少なくとも5倍の風量を排出でき
るものが使用される。 The exhaust device 20 has a removably built-in filter 30 as shown in FIG. The filter 30 can be easily removed when replacing it. A fan 24 is provided below the stepped portion 22, and the suction force of the fan 24 causes the air containing ozone in the irradiation chamber 3 to be exhausted through the exhaust hole 11 and the filter 30. This fan 24
The suction force is strong and the amount of air at least five times the volume of the irradiation chamber 3 can be discharged within a short period of one minute.
フイルター30は、第3図に示すように、内面
にフツ素樹脂がコーテングされた筒体31内にハ
ニカム状の活性炭32が多層に保持されている。
もつとも活性炭32の代りに二酸化マンガンなど
の触媒も使用可能であり、要はオゾンを吸着や分
解させるものであればよい。活性炭32,32間
には長さ数mmの短筒状のスペーサー33が介装さ
れ、従つて活性炭32は相互に数mm離間してい
る。このため、ハニカム状の活性炭32内を層流
で通過したオゾンを含む空気がこの間隙で乱流と
なり次の活性炭32内に流れ込むので、活性炭3
2との反応性が向上し効率よくオゾンが吸着され
る。従つてハニカム状の活性炭32を5層に並べ
ておくと100ppmのオゾンは0.1ppm以下にまで吸
着分解されて環境基準を満すことができる。な
お、入口部にはガラス繊維34が充填されてお
り、異物が除去されるようになつている。 As shown in FIG. 3, the filter 30 has a cylindrical body 31 whose inner surface is coated with a fluororesin and in which honeycomb-shaped activated carbon 32 is held in multiple layers.
Of course, a catalyst such as manganese dioxide can also be used instead of the activated carbon 32, as long as it can adsorb or decompose ozone. A short cylindrical spacer 33 having a length of several mm is interposed between the activated carbons 32, 32, so that the activated carbons 32 are spaced apart from each other by several mm. Therefore, the air containing ozone that has passed through the honeycomb-shaped activated carbon 32 in a laminar flow becomes a turbulent flow in this gap and flows into the next activated carbon 32.
The reactivity with 2 is improved and ozone is efficiently adsorbed. Therefore, by arranging the honeycomb-shaped activated carbon 32 in five layers, 100 ppm of ozone can be adsorbed and decomposed to 0.1 ppm or less, meeting environmental standards. Note that the inlet portion is filled with glass fibers 34 to remove foreign matter.
しかして、上記構成の洗浄装置において、被洗
浄体8を支持台7上にセツトし、開閉扉9を閉じ
て紫外線ランプ4を点灯すると紫外線が照射され
て洗浄されるが、洗浄が終了して紫外線ランプ4
が消灯された後もフアン24は回転し、その吸引
力によつてオゾンを含む空気は排気装置20内に
導かれ、フイルター30によつてオゾンが環境基
準以下に吸着分解されて装置箱1外に排出され
る。そして消灯後1分間の間に、照射室3の容積
の約5倍の風量が排出されて換気されるので、照
射室3内のオゾンは環境基準の0.1ppm以下とな
る。このことは、例えば電気機器の防爆基準とし
て、その容器の5倍の換気をしたのち不活性ガス
を充填することにより安全を確保することが定め
られていることからも理解される。従つて、消灯
1分後に開閉扉9を開けて被洗浄体8を取出して
もオゾンの漏洩により環境が害されることがな
い。 In the cleaning apparatus configured as described above, when the object to be cleaned 8 is set on the support stand 7, the opening/closing door 9 is closed, and the ultraviolet lamp 4 is turned on, ultraviolet rays are irradiated and the object is cleaned. UV lamp 4
Even after the lights are turned off, the fan 24 continues to rotate, and its suction force guides the ozone-containing air into the exhaust system 20.The filter 30 adsorbs and decomposes the ozone to a level below environmental standards, causing it to flow outside the equipment box 1. is discharged. Then, during one minute after the lights are turned off, an air volume approximately five times the volume of the irradiation chamber 3 is exhausted and ventilated, so that the ozone in the irradiation chamber 3 falls below the environmental standard of 0.1 ppm. This can be understood from the fact that, for example, explosion-proof standards for electrical equipment stipulate that safety be ensured by ventilating the container five times as much as possible and then filling the container with inert gas. Therefore, even if the opening/closing door 9 is opened and the object to be cleaned 8 is taken out one minute after the lights are turned off, the environment will not be harmed by ozone leakage.
この様に、本考案の紫外線洗浄装置は、1分間
に、被洗浄体が支持される照射室をその容積の少
なくとも5倍の風量で換気が可能であり、オゾン
を吸着や分解するフイルターを内蔵した排気装置
を備えるようにしたので、紫外線ランプの消灯後
に短時間で照射室内のオゾンは環境基準以下とな
り、従つて本考案によれば、洗浄が終了してから
短時間内に開扉して安全に被洗浄体を取出すこと
が可能な紫外線洗浄装置を提供することができ
る。 In this way, the ultraviolet cleaning device of the present invention can ventilate the irradiation chamber in which the object to be cleaned is supported at an air volume of at least five times the volume per minute, and has a built-in filter that adsorbs and decomposes ozone. As a result, the ozone in the irradiation chamber falls below environmental standards in a short time after the ultraviolet lamp is turned off. Therefore, according to the present invention, the door can be opened within a short time after cleaning is completed. It is possible to provide an ultraviolet cleaning device that can safely take out objects to be cleaned.
第1図は本考案実施例の断面図、第2図は排気
装置の断面図、第3図はフイルターの断面図であ
る。
1……装置箱、2……灯体、3……照射室、4
……紫外線ランプ、5……ミラー、7……支持
台、8……被洗浄体、9……開閉扉、10……吸
入孔、11……排気孔、20……排気装置、24
……フアン、30……フイルター、32……活性
炭。
FIG. 1 is a sectional view of an embodiment of the present invention, FIG. 2 is a sectional view of an exhaust device, and FIG. 3 is a sectional view of a filter. 1...Equipment box, 2...Lamp body, 3...Irradiation chamber, 4
...Ultraviolet lamp, 5...Mirror, 7...Support stand, 8...Object to be cleaned, 9...Opening/closing door, 10...Suction hole, 11...Exhaust hole, 20...Exhaust device, 24
... Juan, 30 ... Filter, 32 ... Activated carbon.
Claims (1)
ゾンの分解により生成される発生基の酸素により
被洗浄体の表面に付着する有機汚染物などを分解
して洗浄する紫外線洗浄装置であつて、 1分間に、被洗浄体が支持される照射室をその
容積の少なくとも5倍の風量で換気が可能であ
り、オゾンを吸着や分解するフイルターを内蔵し
た排気装置を備えてなる紫外線洗浄装置。[Claim for Utility Model Registration] Ultraviolet light is used to generate ozone with the light of an ultraviolet lamp, and to decompose and clean organic contaminants etc. that adhere to the surface of the object to be cleaned using the oxygen generated as a generating group generated by the decomposition of this ozone. A cleaning device capable of ventilating the irradiation chamber in which the object to be cleaned is supported at an air volume of at least five times the volume per minute, and equipped with an exhaust device equipped with a filter that adsorbs and decomposes ozone. Ultraviolet cleaning equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12984683U JPS6039240U (en) | 1983-08-24 | 1983-08-24 | UV cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12984683U JPS6039240U (en) | 1983-08-24 | 1983-08-24 | UV cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6039240U JPS6039240U (en) | 1985-03-19 |
| JPH0447957Y2 true JPH0447957Y2 (en) | 1992-11-12 |
Family
ID=30294075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12984683U Granted JPS6039240U (en) | 1983-08-24 | 1983-08-24 | UV cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6039240U (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0621236Y2 (en) * | 1985-03-28 | 1994-06-01 | シャープ株式会社 | Semiconductor substrate cleaning equipment |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT992983B (en) * | 1972-08-18 | 1975-09-30 | Gen Electric | METHOD FOR REMOVING PHOTORESISTANT MATERIAL FROM A SUPPORT |
| JPS5588335A (en) * | 1978-12-07 | 1980-07-04 | Kokusai Electric Co Ltd | Automatic conveying mechanism for plasma etching/ stripping device |
| JPS5858726A (en) * | 1981-10-05 | 1983-04-07 | Hitachi Ltd | semiconductor processing equipment |
-
1983
- 1983-08-24 JP JP12984683U patent/JPS6039240U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6039240U (en) | 1985-03-19 |
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