JPS6041972Y2 - UV cleaning equipment - Google Patents

UV cleaning equipment

Info

Publication number
JPS6041972Y2
JPS6041972Y2 JP13543383U JP13543383U JPS6041972Y2 JP S6041972 Y2 JPS6041972 Y2 JP S6041972Y2 JP 13543383 U JP13543383 U JP 13543383U JP 13543383 U JP13543383 U JP 13543383U JP S6041972 Y2 JPS6041972 Y2 JP S6041972Y2
Authority
JP
Japan
Prior art keywords
cleaned
ultraviolet
cleaning device
shield plate
ozone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13543383U
Other languages
Japanese (ja)
Other versions
JPS6043325U (en
Inventor
一也 田中
Original Assignee
ウシオ電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ウシオ電機株式会社 filed Critical ウシオ電機株式会社
Priority to JP13543383U priority Critical patent/JPS6041972Y2/en
Publication of JPS6043325U publication Critical patent/JPS6043325U/en
Application granted granted Critical
Publication of JPS6041972Y2 publication Critical patent/JPS6041972Y2/en
Expired legal-status Critical Current

Links

Description

【考案の詳細な説明】 本考案は紫外線洗浄装置に関するものである。[Detailed explanation of the idea] The present invention relates to an ultraviolet cleaning device.

紫外線ランプより発生するオゾンを利用して汚染物を分
解洗浄することが行われているが、この紫外線ランプ、
例えば低圧水銀ランプを点灯すると、主として波長が2
54nmの水銀共鳴線の紫外線が外部に放出され、従と
して] 851mの紫外線が、更には他の波長のものが
わずかに放出される。
Ozone generated by ultraviolet lamps is used to decompose and clean pollutants.
For example, when a low-pressure mercury lamp is lit, the wavelength is mainly 2.
Ultraviolet rays at the mercury resonance line of 54 nm are emitted to the outside, and ultraviolet rays at 851 m, as well as a small amount of other wavelengths, are emitted.

そして、波長185nmの紫外線によってオゾンが生皮
し、次にこのオゾンが波長254nmにより分解されて
発生基の酸素が生皮腰この発生基の酸素が有機汚染物を
分解してガス状態で飛散することが知られている。
Then, ozone is converted into raw material by ultraviolet rays with a wavelength of 185 nm, and then this ozone is decomposed by UV light with a wavelength of 254 nm, producing oxygen as a generating group.This generating group oxygen decomposes organic pollutants and scatters in a gaseous state. Are known.

この紫外線洗浄装置は各種の被洗浄体に適用されるが、
例えばフィルム状の高分子材料よりなる被洗浄体のよう
に、被洗浄体によっては高温に加熱されると変形し変質
するものがある。
This ultraviolet cleaning device can be applied to various objects to be cleaned.
For example, some objects to be cleaned, such as objects to be cleaned made of film-like polymeric materials, may deform and change in quality when heated to high temperatures.

一方、紫外線ランプの照射光には赤外線も含まれている
ため、洗浄中に被洗浄体の温度は上昇し、被洗浄体表面
の反射率などによっても異るが、その温度は数十℃から
10除’C程度になる。
On the other hand, since the irradiation light from an ultraviolet lamp also includes infrared rays, the temperature of the object to be cleaned increases during cleaning, and although it varies depending on factors such as the reflectance of the surface of the object to be cleaned, the temperature ranges from several tens of degrees Celsius to It will be about 10 division 'C.

従って、この温度で変質する材料からなるものは被洗浄
体として制約を受けるので、この紫外線洗浄装置で洗浄
することが不可能であったり、或は変質を防止するため
に洗浄時間を短かくせざるを得す、その結果洗浄が不十
分であるなどの問題点があった。
Therefore, objects made of materials that change in quality at this temperature are subject to restrictions as objects to be cleaned, so it may be impossible to clean them with this ultraviolet cleaning device, or the cleaning time must be shortened to prevent the change in quality. However, as a result, there were problems such as insufficient cleaning.

そこで本考案は、熱によって変質しやすい材料からなる
被洗浄体をも完全に洗浄できる紫外線洗浄装置を提供す
ることを目的とし、その構成は、紫外線ランプの光でオ
ゾンを発生させ、このオゾンの分解にまり生皮される発
生基の酸素により被洗浄体の表面に付着する有機汚染物
などを分解して洗浄する紫外線洗浄装置であって、紫外
線ランプと被洗浄体との間に2枚の石英ガラス板間に水
を介在させた遮熱板を配設してなることを特徴とする。
Therefore, the purpose of the present invention is to provide an ultraviolet cleaning device that can completely clean objects made of materials that are easily altered by heat. This is an ultraviolet cleaning device that decomposes and cleans organic contaminants adhering to the surface of an object to be cleaned by using oxygen from generated radicals that are generated during decomposition. It is characterized by a heat shield plate with water interposed between glass plates.

以下に図面に示す実施例に基いて本考案を具体的に説明
する。
The present invention will be specifically described below based on embodiments shown in the drawings.

第1図は装置の断面図を示すが、装置箱1には灯体2が
内蔵されて二重構造をなし、発生したオゾンが外部に漏
洩しないようになっている。
FIG. 1 shows a sectional view of the device, and the device box 1 has a built-in lamp body 2 and has a double structure to prevent generated ozone from leaking to the outside.

灯体2の内部が照射室3であるが、この照射室3の上方
には紫外線ランプ4としてU字状の350W高出力低圧
水銀灯が2本配設されている。
Inside the lamp body 2 is an irradiation chamber 3, and above this irradiation chamber 3, two U-shaped 350W high output low pressure mercury lamps are arranged as ultraviolet lamps 4.

この紫外線ランプ4の背後にはミラー5が配置され、紫
外線ランプ4の光は下方に向けて照射される。
A mirror 5 is placed behind the ultraviolet lamp 4, and the light from the ultraviolet lamp 4 is directed downward.

なお、灯体2の上面には冷却水路6が固着されており、
紫外線ランプ4やミラー5が冷却される。
Note that a cooling water channel 6 is fixed to the top surface of the lamp body 2.
The ultraviolet lamp 4 and mirror 5 are cooled.

照射室3の中央には高分子材料からなる被洗浄体7が支
持具8によって支持されるが、この被洗浄体7と紫外線
ランプ4との間には遮熱板9が設けられており、紫外線
はこの遮熱板9を透過して被洗浄体7に照射される。
In the center of the irradiation chamber 3, an object to be cleaned 7 made of a polymeric material is supported by a support 8, and a heat shield plate 9 is provided between the object to be cleaned 7 and the ultraviolet lamp 4. The ultraviolet rays pass through this heat shield plate 9 and are irradiated onto the object 7 to be cleaned.

遮熱板9は、第2図と第3図に示すように2枚の石英ガ
ラス板91間に水路92が設けられ、そこに水Wが流さ
れているが、水Wは紫外線はよく透過するが熱線をよく
遮断する性質を有し、これを利用したものである。
As shown in FIGS. 2 and 3, the heat shield plate 9 has a water channel 92 between two quartz glass plates 91, through which water W flows. However, it has the property of blocking heat rays well, and this is utilized.

そして、灯体2の側方には酸素を含むガスを照射室3に
供給する吸入孔10と、内部のガスを分解された汚染物
とともに排出する排気孔11が設けられているが、排気
孔11より吸引されたガスはオゾン分解室で処理された
後に大気中に放出される。
On the side of the lamp body 2, there are provided an intake hole 10 for supplying oxygen-containing gas to the irradiation chamber 3, and an exhaust hole 11 for discharging the internal gas together with decomposed contaminants. The gas sucked through 11 is treated in an ozone decomposition chamber and then released into the atmosphere.

しかして、冷却水路6と遮断板9の水路92に水を流し
紫外線ランプ4を点灯すると紫外線は遮熱板9を透過し
て被洗浄体7に照射されて洗浄されるが、紫外線ランプ
4より発生した熱は冷却水路6の冷却水によって冷却さ
れるとともに、遮熱板9によって遮えぎられて被洗浄体
7にはほとんど輻射されない。
When water is poured into the cooling channel 6 and the channel 92 of the shielding plate 9 and the ultraviolet lamp 4 is turned on, the ultraviolet rays pass through the heat shielding plate 9 and are irradiated onto the object to be cleaned 7 to be cleaned. The generated heat is cooled by the cooling water in the cooling water channel 6, and is blocked by the heat shield plate 9, so that almost no heat is radiated to the object to be cleaned 7.

紫外線ランプ4は前記の通りの高出力低圧水銀灯であっ
て発熱量の大きなものではあるが、長時間照射しても被
洗浄体7の温度は室温より数℃ないし十数℃上昇するの
みであった。
Although the ultraviolet lamp 4 is a high-output, low-pressure mercury lamp as described above and generates a large amount of heat, the temperature of the object to be cleaned 7 will only rise by a few degrees Celsius to more than ten degrees Celsius above room temperature even if it is irradiated for a long time. Ta.

従って、被洗浄体7がフィルム状の高分子材料からなる
ものであっても、変形や変質することがなく、照射時間
も任意に選ぶことができるので有機汚染物を完全に分解
するまで洗浄することが可能である。
Therefore, even if the object to be cleaned 7 is made of a film-like polymeric material, it will not be deformed or deteriorated, and the irradiation time can be arbitrarily selected, so that it can be cleaned until the organic contaminants are completely decomposed. Is possible.

以上説明した様に、本考案は、紫外線ランプと被洗浄体
との間に2枚の石英ガラス板間に水を介在させた遮熱板
を配設したので、熱によって変質しやすい材料からなる
被洗浄体をも完全に洗浄できる紫外線洗浄装置を提供す
ることができる。
As explained above, in this invention, a heat shield plate with water interposed between two quartz glass plates is disposed between the ultraviolet lamp and the object to be cleaned, so it is made of a material that is easily altered by heat. It is possible to provide an ultraviolet cleaning device that can completely clean even objects to be cleaned.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案実施例の断面図、第2図は第1図のA部
分の拡大図、第3図は遮熱板の斜視図である。 1・・・・・・装置箱、2・・・・・・灯体、3・・・
・・・照射室、4・・・・・・紫外線ランプ、5・・・
・・・ミラー、6・・・・・・冷却水路、7・・・・・
・被洗浄体、8・・・・・・支持具、9・・・・・・遮
熱板、91・・・・・・石英ガラス板、92・・・・・
・水路、W・・・・・・水。
FIG. 1 is a sectional view of an embodiment of the present invention, FIG. 2 is an enlarged view of portion A in FIG. 1, and FIG. 3 is a perspective view of a heat shield plate. 1...Equipment box, 2...Light body, 3...
...Irradiation chamber, 4...Ultraviolet lamp, 5...
...Mirror, 6...Cooling channel, 7...
・Object to be cleaned, 8...Support, 9...Heat shield plate, 91...Quartz glass plate, 92...
・Waterway, W...Water.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 紫外線ランプの光でオゾンを発生させ、このオゾンの分
解により生成される発生基の酸素により被洗浄体の表面
に付着する有機汚染物などを分解して洗浄する紫外線洗
浄装置であって、紫外線ランプと被洗浄体との間に2枚
の石英ガラス板間に水を介在させた遮熱板を配設してな
る紫外線洗浄装置。
This is an ultraviolet cleaning device that generates ozone using the light of an ultraviolet lamp, and decomposes and cleans organic contaminants that adhere to the surface of the object to be cleaned using the generated oxygen generated by the decomposition of this ozone. An ultraviolet cleaning device comprising a heat shield plate with water interposed between two quartz glass plates between the body and the object to be cleaned.
JP13543383U 1983-09-02 1983-09-02 UV cleaning equipment Expired JPS6041972Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13543383U JPS6041972Y2 (en) 1983-09-02 1983-09-02 UV cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13543383U JPS6041972Y2 (en) 1983-09-02 1983-09-02 UV cleaning equipment

Publications (2)

Publication Number Publication Date
JPS6043325U JPS6043325U (en) 1985-03-27
JPS6041972Y2 true JPS6041972Y2 (en) 1985-12-21

Family

ID=30304832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13543383U Expired JPS6041972Y2 (en) 1983-09-02 1983-09-02 UV cleaning equipment

Country Status (1)

Country Link
JP (1) JPS6041972Y2 (en)

Also Published As

Publication number Publication date
JPS6043325U (en) 1985-03-27

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