JP4611663B2 - 重ね合わせ誤差測定方法、重ね合わせ誤差測定装置、及び半導体デバイスの製造方法 - Google Patents

重ね合わせ誤差測定方法、重ね合わせ誤差測定装置、及び半導体デバイスの製造方法 Download PDF

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Publication number
JP4611663B2
JP4611663B2 JP2004138913A JP2004138913A JP4611663B2 JP 4611663 B2 JP4611663 B2 JP 4611663B2 JP 2004138913 A JP2004138913 A JP 2004138913A JP 2004138913 A JP2004138913 A JP 2004138913A JP 4611663 B2 JP4611663 B2 JP 4611663B2
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image signal
center position
evaluation function
pattern
symmetry evaluation
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JP2004138913A
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Japanese (ja)
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JP2005322748A (ja
JP2005322748A5 (enExample
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高彦 鈴木
孝和 田部井
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Image Analysis (AREA)
JP2004138913A 2004-05-07 2004-05-07 重ね合わせ誤差測定方法、重ね合わせ誤差測定装置、及び半導体デバイスの製造方法 Expired - Fee Related JP4611663B2 (ja)

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JP2004138913A JP4611663B2 (ja) 2004-05-07 2004-05-07 重ね合わせ誤差測定方法、重ね合わせ誤差測定装置、及び半導体デバイスの製造方法

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JP2004138913A JP4611663B2 (ja) 2004-05-07 2004-05-07 重ね合わせ誤差測定方法、重ね合わせ誤差測定装置、及び半導体デバイスの製造方法

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JP2005322748A JP2005322748A (ja) 2005-11-17
JP2005322748A5 JP2005322748A5 (enExample) 2006-10-05
JP4611663B2 true JP4611663B2 (ja) 2011-01-12

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4957027B2 (ja) * 2006-03-13 2012-06-20 株式会社ニコン 重ね合わせ測定装置
KR100714280B1 (ko) 2006-04-27 2007-05-02 삼성전자주식회사 오버레이 계측설비 및 그를 이용한 오버레이 계측방법
JP5002221B2 (ja) * 2006-09-11 2012-08-15 キヤノン株式会社 マークの位置を検出する装置
JP5922927B2 (ja) * 2011-12-28 2016-05-24 キヤノン株式会社 位置を求める方法、情報処理装置、リソグラフィ装置及び物品の製造方法
JP5986817B2 (ja) 2012-06-15 2016-09-06 株式会社日立ハイテクノロジーズ オーバーレイ誤差測定装置、及びコンピュータープログラム

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61108133A (ja) * 1984-11-01 1986-05-26 Canon Inc 位置合せ装置の光走査光学系オフセツト補正方法
JPS61236117A (ja) * 1985-04-12 1986-10-21 Hitachi Ltd パタ−ンの位置検出方法
JPH0626178B2 (ja) * 1985-06-03 1994-04-06 株式会社日立製作所 パターン位置検出方法とその装置
JPH0827174B2 (ja) * 1986-12-11 1996-03-21 キヤノン株式会社 パタ−ン検出方法
JPH0864500A (ja) * 1994-08-25 1996-03-08 Hitachi Ltd 信号処理方法および位置検出光学系の調整方法およびターゲットパターンならびに露光方法および露光装置
JPH1070062A (ja) * 1996-08-26 1998-03-10 Fuji Xerox Co Ltd アライメント装置及びアライメントマークの検出方法

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