JP4611045B2 - インクジェットプリントヘッドの製造方法 - Google Patents
インクジェットプリントヘッドの製造方法 Download PDFInfo
- Publication number
- JP4611045B2 JP4611045B2 JP2005023662A JP2005023662A JP4611045B2 JP 4611045 B2 JP4611045 B2 JP 4611045B2 JP 2005023662 A JP2005023662 A JP 2005023662A JP 2005023662 A JP2005023662 A JP 2005023662A JP 4611045 B2 JP4611045 B2 JP 4611045B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- print head
- ink
- manufacturing
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 29
- 239000000758 substrate Substances 0.000 claims description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 18
- 229910052710 silicon Inorganic materials 0.000 claims description 18
- 239000010703 silicon Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 17
- 238000005530 etching Methods 0.000 claims description 16
- 230000004888 barrier function Effects 0.000 claims description 12
- 239000010410 layer Substances 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 10
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 9
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 9
- 238000001020 plasma etching Methods 0.000 claims description 6
- 238000004891 communication Methods 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims description 5
- 238000012545 processing Methods 0.000 claims description 5
- 239000011241 protective layer Substances 0.000 claims description 5
- 125000001153 fluoro group Chemical group F* 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 67
- 239000000463 material Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 6
- 238000005553 drilling Methods 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000002360 explosive Substances 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B41J2/1634—Manufacturing processes machining laser machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1635—Manufacturing processes dividing the wafer into individual chips
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
Claims (10)
- 基板の表面上に少なくとも1つのインク射出素子を形成するステップと、
前記基板の表面上に設けられた薄膜回路、および、該薄膜回路上に塗布された障壁層を含む、前記基板の少なくとも1つの表面を耐エッチング性保護層で覆うステップと、
インク供給源と前記インク射出素子の間で流体連通を可能にするように前記基板の後面から上方にレーザー加工によって前記基板内に貫通孔を形成するステップと、
前記レーザー加工から生ずる微小なチップおよび亀裂を除去するために、前記貫通孔に実質的に等方性エッチングを施すステップと、
前記耐エッチング性保護層を水で除去するステップとを含み、
前記障壁層および前記障壁層上に適用されたノズルプレートが、一緒に少なくとも1つのインク射出チャンバを画定し、前記等方性エッチングが、前記障壁層の塗布後であって、前記ノズルプレートの適用前に行われるインクジェットプリントヘッドの製造方法。 - 前記プリントヘッドが、前記基板上に実質的に同時に形成されるような複数のプリントヘッドのうちの1つであり、前記貫通孔を形成し、エッチングした後に、前記基板を個々のプリントヘッドに分割するステップをさらに含む請求項1に記載のインクジェットプリントヘッドの製造方法。
- 前記保護層が、ポリビニルアルコールを含む請求項1に記載のインクジェットプリントヘッドの製造方法。
- 前記等方性エッチングが、プラズマエッチングである請求項1〜3のいずれかに記載のインクジェットプリントヘッドの製造方法。
- 前記基板が、半導体基板である請求項1〜4のいずれかに記載のインクジェットプリントヘッドの製造方法。
- 前記基板が、シリコン基板である請求項1〜5のいずれかに記載のインクジェットプリントヘッドの製造方法。
- 前記基板が、シリコン基板であり、前記プラズマが、前記シリコン基板と反応して、気体フッ化ケイ素を形成するフッ素原子を含有する請求項4に記載のインクジェットプリントヘッドの製造方法。
- 請求項1〜7のいずれかに記載の方法によって製造されるインクジェットプリントヘッド。
- インク溜めからプリントヘッドにインクを供給するための孔を有するカートリッジ本体と、インク供給開口と流体連通した前記孔を有する前記カートリッジ本体上に取り付けられた請求項8に記載のプリントヘッドとを備えるプリントカートリッジ。
- 請求項9に記載のプリントカートリッジを備えるインクジェットプリンタ。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0401872A GB2410465A (en) | 2004-01-29 | 2004-01-29 | Method of making an inkjet printhead |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005231361A JP2005231361A (ja) | 2005-09-02 |
JP2005231361A5 JP2005231361A5 (ja) | 2010-10-21 |
JP4611045B2 true JP4611045B2 (ja) | 2011-01-12 |
Family
ID=31971616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005023662A Expired - Fee Related JP4611045B2 (ja) | 2004-01-29 | 2005-01-31 | インクジェットプリントヘッドの製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20050185017A1 (ja) |
EP (1) | EP1559553A1 (ja) |
JP (1) | JP4611045B2 (ja) |
GB (1) | GB2410465A (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100570822B1 (ko) * | 2004-05-11 | 2006-04-12 | 삼성전자주식회사 | 잉크젯 헤드의 제조방법 및 그에 의해 제조된 잉크젯 헤드 |
KR101562201B1 (ko) * | 2008-10-01 | 2015-10-22 | 삼성전자주식회사 | 잉크젯 프린터 헤드 및 그의 제조방법 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS584338B2 (ja) * | 1978-11-20 | 1983-01-26 | 富士通株式会社 | レジスト剥離防止方法 |
US5387314A (en) * | 1993-01-25 | 1995-02-07 | Hewlett-Packard Company | Fabrication of ink fill slots in thermal ink-jet printheads utilizing chemical micromachining |
JPH07333850A (ja) * | 1994-06-14 | 1995-12-22 | Sony Corp | 感光性組成物 |
FR2736303B1 (fr) * | 1995-07-03 | 1998-08-21 | Seiko Epson Corp | Tete a jets d'encre et son procede de fabrication |
DE19536429A1 (de) * | 1995-09-29 | 1997-04-10 | Siemens Ag | Tintenstrahldruckkopf und Verfahren zum Herstellen eines solchen Tintenstrahldruckkopfes |
US6171510B1 (en) * | 1997-10-30 | 2001-01-09 | Applied Materials Inc. | Method for making ink-jet printer nozzles |
US6204182B1 (en) * | 1998-03-02 | 2001-03-20 | Hewlett-Packard Company | In-situ fluid jet orifice |
TW368479B (en) * | 1998-05-29 | 1999-09-01 | Ind Tech Res Inst | Manufacturing method for ink passageway |
CN1200793C (zh) * | 1999-02-25 | 2005-05-11 | 精工爱普生株式会社 | 利用激光加工被加工物的方法 |
US6560871B1 (en) * | 2000-03-21 | 2003-05-13 | Hewlett-Packard Development Company, L.P. | Semiconductor substrate having increased facture strength and method of forming the same |
US6663221B2 (en) * | 2000-12-06 | 2003-12-16 | Eastman Kodak Company | Page wide ink jet printing |
KR100506082B1 (ko) * | 2000-12-18 | 2005-08-04 | 삼성전자주식회사 | 반구형 잉크 챔버를 가진 잉크 젯 프린트 헤드의 제조 방법 |
US6450619B1 (en) * | 2001-02-22 | 2002-09-17 | Eastman Kodak Company | CMOS/MEMS integrated ink jet print head with heater elements formed during CMOS processing and method of forming same |
US6749289B2 (en) * | 2001-03-22 | 2004-06-15 | Fuji Photo Film Co., Ltd. | Liquid ejection apparatus and inkjet printer, and method of manufacturing them |
US6409312B1 (en) * | 2001-03-27 | 2002-06-25 | Lexmark International, Inc. | Ink jet printer nozzle plate and process therefor |
US6766817B2 (en) * | 2001-07-25 | 2004-07-27 | Tubarc Technologies, Llc | Fluid conduction utilizing a reversible unsaturated siphon with tubarc porosity action |
EP1297959A1 (en) * | 2001-09-28 | 2003-04-02 | Hewlett-Packard Company | Inkjet printheads |
US6908563B2 (en) * | 2001-11-27 | 2005-06-21 | Canon Kabushiki Kaisha | Ink-jet head, and method for manufacturing the same |
US7357486B2 (en) * | 2001-12-20 | 2008-04-15 | Hewlett-Packard Development Company, L.P. | Method of laser machining a fluid slot |
KR100552664B1 (ko) * | 2002-10-12 | 2006-02-20 | 삼성전자주식회사 | 측벽에 의해 한정되는 잉크 챔버를 가진 일체형 잉크젯프린트헤드 및 그 제조방법 |
-
2004
- 2004-01-29 GB GB0401872A patent/GB2410465A/en not_active Withdrawn
-
2005
- 2005-01-26 US US11/041,991 patent/US20050185017A1/en not_active Abandoned
- 2005-01-26 EP EP05100500A patent/EP1559553A1/en not_active Withdrawn
- 2005-01-31 JP JP2005023662A patent/JP4611045B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1559553A1 (en) | 2005-08-03 |
GB0401872D0 (en) | 2004-03-03 |
US20050185017A1 (en) | 2005-08-25 |
GB2410465A (en) | 2005-08-03 |
JP2005231361A (ja) | 2005-09-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5387314A (en) | Fabrication of ink fill slots in thermal ink-jet printheads utilizing chemical micromachining | |
EP0609011B1 (en) | Method for manufacturing a thermal ink-jet print head | |
US8608288B2 (en) | Liquid drop ejector having self-aligned hole | |
KR100400015B1 (ko) | 잉크젯 프린트헤드 및 그 제조방법 | |
US6757973B2 (en) | Method for forming throughhole in ink-jet print head | |
US7549224B2 (en) | Methods of making slotted substrates | |
CN1926056B (zh) | 槽形成法和流体喷射机构 | |
JP4611045B2 (ja) | インクジェットプリントヘッドの製造方法 | |
EP1765596B1 (en) | Process for modifying the surface profile of an ink supply channel in a printhead | |
JP2011011425A (ja) | 液体吐出ヘッド用ノズルプレートの製造方法 | |
US6911155B2 (en) | Methods and systems for forming slots in a substrate | |
JP4693496B2 (ja) | 液体吐出ヘッドおよびその製造方法 | |
JP6584251B2 (ja) | 液体吐出ヘッド、液体吐出装置、及び液体吐出ヘッドの製造方法 | |
US20060150408A1 (en) | Method of forming symmetric nozzles in an inkjet printhead | |
WO2008075715A1 (ja) | 液体吐出ヘッド用ノズルプレートの製造方法、液体吐出ヘッド用ノズルプレート及び液体吐出ヘッド | |
US20060094200A1 (en) | Methods for controlling feature dimensions in crystalline substrates | |
JP2007136875A (ja) | インクジェット記録ヘッド用基体 | |
JP5657034B2 (ja) | 液体吐出ヘッドの製造方法及び基板の加工方法 | |
JP2004209708A (ja) | インクジェット記録ヘッド、その製造方法、およびその製造に用いるインクジェット記録ヘッド用基体 | |
JP2007301785A (ja) | 穿孔方法、及び、液体吐出装置用ノズルの製造方法 | |
JP2007320254A (ja) | ノズルプレートの製造方法、ノズルプレート、液滴吐出ヘッドの製造方法、液滴吐出ヘッド、液滴吐出装置の製造方法及び液滴吐出装置 | |
KR101439816B1 (ko) | 슬릿형 노즐 및 이것의 제조방법 | |
KR100561370B1 (ko) | 잉크분사장치의 제조방법 | |
JP2009018423A (ja) | ノズル基板の製造方法、ノズル基板、液滴吐出ヘッド及び液滴吐出装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080118 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080208 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080414 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080805 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081104 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20090206 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090507 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090526 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20090630 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20090724 |
|
A524 | Written submission of copy of amendment under article 19 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A524 Effective date: 20100906 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101013 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131022 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |