JP4607072B2 - 複数のcd計測ツール間の一貫した測定結果を検証する方法 - Google Patents
複数のcd計測ツール間の一貫した測定結果を検証する方法 Download PDFInfo
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- JP4607072B2 JP4607072B2 JP2006225962A JP2006225962A JP4607072B2 JP 4607072 B2 JP4607072 B2 JP 4607072B2 JP 2006225962 A JP2006225962 A JP 2006225962A JP 2006225962 A JP2006225962 A JP 2006225962A JP 4607072 B2 JP4607072 B2 JP 4607072B2
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
"INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS 2003 EDITION METROLOGY"
20 エリア
30 エリア
40 エリア
50 エリア
101 第1フィールド
102 第2フィールド
201 エリア
301 エリア
Claims (6)
- それぞれ同じサイズのフィーチャが設けられた複数のフィールドを有する基板を供給するステップと、
複数のCD計測ツールの第1のもので、前記基板上の第1フィールドの中の第1エリアにある前記フィーチャのサイズを測定するステップと、
前記複数のCD計測ツールの第2のもので、第2フィールドの第2エリアにある前記フィーチャのサイズを測定するステップであって、前記第2フィールドに関する前記第2エリアの位置が、前記第1エリアの前記第1フィールドに関する位置と同じであるステップと、
前記複数のCD計測ツールの第1のもので、前記第2フィールドの中の第3エリアにある前記フィーチャのサイズを測定するステップと、
前記複数のCD計測ツールの第2のもので、前記第1フィールドの中の第4エリアにある前記フィーチャのサイズを測定するステップであって、前記第1フィールドに関する前記第4エリアの位置が、前記第2フィールドに関する前記第3エリアの位置と同じであるステップと、
前記複数のCD計測ツールの第1のもので複数測定された前記フィーチャのサイズの平均値と、前記複数のCD計測ツールの第2のもので複数測定された前記フィーチャのサイズの平均値と、の差をとるステップと、
を含む、複数のCD計測ツール間の測定結果を検証する方法。 - 前記第1及び第2CD計測ツールがそれぞれ、前記第1及び第2フィールドの中の複数のエリア内の前記フィーチャ・サイズを測定し、
前記第1CD計測ツールによって測定された前記第1フィールドに関する前記エリアの位置が、前記第2CD計測ツールによって測定された前記第2フィールドに関するエリアの位置と同じである、請求項1に記載の方法。 - 前記2つのフィールドが隣接している、請求項1又は2に記載の方法。
- 前記2つのフィールドの間に間隔が置かれている、請求項1又は2に記載の方法。
- 複数のフィーチャが各エリアで測定される、請求項1乃至3のいずれか1項に記載の方法。
- 前記複数のCD計測ツールが複数の走査電子顕微鏡又は複数のスキャッタロメータである、請求項1乃至5のいずれか1項に記載の方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/210,113 US20070046954A1 (en) | 2005-08-24 | 2005-08-24 | Method of verifying consistent measurement between a plurality of CD metrology tools |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007057531A JP2007057531A (ja) | 2007-03-08 |
JP2007057531A5 JP2007057531A5 (ja) | 2010-03-18 |
JP4607072B2 true JP4607072B2 (ja) | 2011-01-05 |
Family
ID=37803623
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006225962A Expired - Fee Related JP4607072B2 (ja) | 2005-08-24 | 2006-08-23 | 複数のcd計測ツール間の一貫した測定結果を検証する方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20070046954A1 (ja) |
JP (1) | JP4607072B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9857291B2 (en) | 2013-05-16 | 2018-01-02 | Kla-Tencor Corporation | Metrology system calibration refinement |
US10276375B2 (en) * | 2016-11-18 | 2019-04-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Assistant pattern for measuring critical dimension of main pattern in semiconductor manufacturing |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030071994A1 (en) * | 2001-10-09 | 2003-04-17 | Peter G. Borden | Calibration as well as measurement on the same workpiece during fabrication |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IL140179A (en) * | 2000-12-07 | 2004-09-27 | Nova Measuring Instr Ltd | Method and system for measuring in patterned structures |
US7382447B2 (en) * | 2001-06-26 | 2008-06-03 | Kla-Tencor Technologies Corporation | Method for determining lithographic focus and exposure |
US7174281B2 (en) * | 2002-05-01 | 2007-02-06 | Lsi Logic Corporation | Method for analyzing manufacturing data |
US7119893B2 (en) * | 2003-04-10 | 2006-10-10 | Accent Optical Technologies, Inc. | Determination of center of focus by parameter variability analysis |
US7186486B2 (en) * | 2003-08-04 | 2007-03-06 | Micronic Laser Systems Ab | Method to pattern a substrate |
US7065423B2 (en) * | 2004-07-08 | 2006-06-20 | Timbre Technologies, Inc. | Optical metrology model optimization for process control |
US7408154B2 (en) * | 2004-10-29 | 2008-08-05 | Hitachi High-Technologies Corporation | Scanning electron microscope, method for measuring a dimension of a pattern using the same, and apparatus for correcting difference between scanning electron microscopes |
US7340374B2 (en) * | 2005-02-25 | 2008-03-04 | International Business Machines Corporation | Determining fleet matching problem and root cause issue for measurement system |
CN100461361C (zh) * | 2005-07-14 | 2009-02-11 | 中芯国际集成电路制造(上海)有限公司 | 用于半导体器件制造的测量工具的校准方法 |
JP4638800B2 (ja) * | 2005-10-27 | 2011-02-23 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡装置における機差管理システムおよびその方法 |
US7353128B2 (en) * | 2006-02-15 | 2008-04-01 | International Business Machines Corporation | Measurement system optimization |
-
2005
- 2005-08-24 US US11/210,113 patent/US20070046954A1/en not_active Abandoned
-
2006
- 2006-08-23 JP JP2006225962A patent/JP4607072B2/ja not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030071994A1 (en) * | 2001-10-09 | 2003-04-17 | Peter G. Borden | Calibration as well as measurement on the same workpiece during fabrication |
Also Published As
Publication number | Publication date |
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JP2007057531A (ja) | 2007-03-08 |
US20070046954A1 (en) | 2007-03-01 |
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