JP4598573B2 - Manufacturing method of passive component built-in module - Google Patents

Manufacturing method of passive component built-in module Download PDF

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JP4598573B2
JP4598573B2 JP2005076505A JP2005076505A JP4598573B2 JP 4598573 B2 JP4598573 B2 JP 4598573B2 JP 2005076505 A JP2005076505 A JP 2005076505A JP 2005076505 A JP2005076505 A JP 2005076505A JP 4598573 B2 JP4598573 B2 JP 4598573B2
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passive component
layer
prepreg
insulating layer
conductive
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JP2006261373A (en
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悟 倉持
義孝 福岡
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Dai Nippon Printing Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L24/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L2224/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Description

本発明は、キャパシタ、抵抗、インダクタ等の受動部品を内蔵した受動部品内蔵モジュールと、このような受動部品内蔵モジュールを製造するための製造方法に関する。   The present invention relates to a passive component built-in module including passive components such as capacitors, resistors, and inductors, and a manufacturing method for manufacturing such a passive component built-in module.

近年、LSIチップ等を多層配線基板上に直接実装するベアチップ実装法が提案されている。ベアチップ実装法では、予め多層配線基板上に形成された配線の接続パッド部に、ボンディング・ワイヤ、ハンダや金属球等からなるバンプ、異方性導電膜、導電性接着剤、光収縮性樹脂等の接続手段を用いて半導体チップが実装される。
また、半導体チップ等では、IC、LSI等の集積回路素子の高密度化が進むとともに、動作速度が年々上昇し、半導体チップ内部で発生するスイッチングノイズが集積回路素子を誤動作させる要因になるという問題があった。スイッチングノイズを低減させるためには、電源バスラインと接地バスラインとの間にキャパシタを配置することが有効である。
In recent years, a bare chip mounting method in which an LSI chip or the like is directly mounted on a multilayer wiring board has been proposed. In the bare chip mounting method, bonding wires, bumps made of solder, metal balls, etc., anisotropic conductive films, conductive adhesives, light-shrinkable resins, etc., are formed on wiring connection pads formed on a multilayer wiring board in advance. A semiconductor chip is mounted using the connecting means.
In addition, in semiconductor chips and the like, integrated circuit elements such as ICs and LSIs are becoming higher in density, and the operating speed is increasing year by year, and switching noise generated inside the semiconductor chip becomes a factor that causes the integrated circuit elements to malfunction. was there. In order to reduce switching noise, it is effective to arrange a capacitor between the power supply bus line and the ground bus line.

このようなキャパシタやインダクター等の受動部品が必要な場合、半導体チップと同様に、多層配線基板に外付けで実装することが行なわれている。しかし、キャパシタを外付け部品として配線基板上に配置すると、キャパシタと半導体チップの間の接続距離が長くなって配線インダクタンスが大きくなるため、キャパシタの効果が不充分となってしまう。また、多層配線基板上に形成された配線の接続パッド部は、半導体チップ等の電子部品の実装部位とは別の部位に設けられるため、受動部品を実装するためには多層配線基板の面方向の広がりが必要であった。このため、多層配線基板の小型化には限界があり、実装される電子部品の数が増えるにしたがって、小型化は更に困難となる傾向にあった。
これらの問題に対応するために、半導体チップを配線基板に実装する場合に用いられる中間基板(インターポーザ、あるいは半導体チップキャリア)に、キャパシタを内蔵させることが提案されている(特許文献1、2)。
特開平8−148595号公報 特開2001−326298号公報
When such passive components such as capacitors and inductors are required, they are externally mounted on a multilayer wiring board as in the case of semiconductor chips. However, if the capacitor is arranged as an external component on the wiring board, the connection distance between the capacitor and the semiconductor chip becomes long and the wiring inductance becomes large, so that the effect of the capacitor becomes insufficient. In addition, since the connection pad portion of the wiring formed on the multilayer wiring board is provided in a part different from the mounting part of the electronic component such as a semiconductor chip, the surface direction of the multilayer wiring board is required for mounting the passive component. The spread of was necessary. For this reason, there is a limit to the miniaturization of the multilayer wiring board, and the miniaturization tends to become more difficult as the number of electronic components to be mounted increases.
In order to cope with these problems, it has been proposed to incorporate a capacitor in an intermediate substrate (interposer or semiconductor chip carrier) used when a semiconductor chip is mounted on a wiring board (Patent Documents 1 and 2). .
JP-A-8-148595 JP 2001-326298 A

しかしながら、特許文献1に示される半導体装置は、ベース基板上に厚膜キャパシタを有するガラスセラミックスからなるチップキャリアが接続される構造を有し、誘電体層を薄くすることが困難であるため、キャパシタの特性に限界があった。また、特許文献2には、キャパシタをもつセラミックスからなるインターポーザを備えた構成が開示されているが、インターポーザを用いる方法では、キャパシタの誘電体層の材料、厚さ、キャパシタの位置、大きさ等を予め決めておかなければならないという問題があった。   However, the semiconductor device disclosed in Patent Document 1 has a structure in which a chip carrier made of glass ceramics having a thick film capacitor is connected to a base substrate, and it is difficult to make the dielectric layer thin. There was a limit to the characteristics. Patent Document 2 discloses a configuration including an interposer made of ceramics having a capacitor. However, in the method using the interposer, the material, thickness, capacitor position, size, etc. of the capacitor dielectric layer are disclosed. There was a problem that had to be determined in advance.

また、多面付けのウエハ基板に受動部品を載置するための凹部を形成し、この凹部に受動部品を内蔵させ、その後、所望の多層配線をウエハ基板上に形成した後、ダイシングすることにより受動部品内蔵モジュールを製造することが考えられる。しかし、受動部品上に多層配線を形成する工程では、電気絶縁層、導通ビア、配線層等を形成する工程が繰り返され、このため工程が複雑で長いものとなり、製造歩留まりの低下を来たすという問題があった。また、このような受動部品内蔵モジュールを複数重ねて使用する場合、重ねられた各受動部品内蔵モジュール間の接続、すなわち、受動部品モジュールにおける表裏導通が困難であった。
本発明は、上記のような実情に鑑みてなされたものであり、単体での使用、あるいは複数積み重ねての使用が可能な小型で信頼性が高い受動部品内蔵モジュールと、このような受動部品内蔵モジュールを簡便に製造するための製造方法を提供することを目的とする。
Further, a recess for mounting passive components is formed on a multi-sided wafer substrate, the passive components are built in the recess, and then a desired multilayer wiring is formed on the wafer substrate, and then passively formed by dicing. It is conceivable to manufacture a module with a built-in component. However, in the process of forming a multilayer wiring on a passive component, the process of forming an electrical insulating layer, a conductive via, a wiring layer, etc. is repeated, which makes the process complicated and long, resulting in a decrease in manufacturing yield. was there. Further, when a plurality of such passive component built-in modules are used in a stacked manner, it is difficult to connect the stacked passive component built-in modules, that is, to connect the front and back of the passive component modules.
The present invention has been made in view of the above circumstances, and is a compact and highly reliable passive component built-in module that can be used alone or in a stack, and such a passive component built-in. It aims at providing the manufacturing method for manufacturing a module simply.

このような目的を達成するために、本発明の受動部品内蔵モジュールの製造方法は、電気絶縁性樹脂と強化用繊維からなるプリプレグの所望の部位に導電部材を挿入させ、前記プリプレグを加熱することにより上下導通ビアを有する絶縁層とし、その後、前記絶縁層の両面に前記上下導通ビアと接続する配線層を形成して載置用部材を作製する工程と、表面に複数の表面端子を有する薄膜受動部品形成層をシリコン基板の一方の面に備え、該シリコン基板の他方の面には複数の裏面端子を備え、前記シリコン基板を貫通して前記薄膜受動部品形成層と前記裏面端子とを接続する複数の貫通ビアを備えた受動部品チップを、前記表面端子と裏面端子のいずれか一方が前記配線層に接続するように、前記載置用部材上に複数載置する工程と、電気絶縁性樹脂と強化用繊維からなるプリプレグの所望の部位に導電部材を挿入させ、前記プリプレグを加熱することにより上下導通ビアを有する絶縁層とし、その後、前記絶縁層の少なくとも一方の面に前記上下導通ビアと接続する配線層を形成し、次いで、前記受動部品チップに対応した複数の開口部を有する別のプリプレグに、前記上下導通ビアと接続するように導電部材を挿入し、その後、前記開口部に前記配線層の所望部位が露出するとともに、隣り合う前記開口部に同じ配線層が露出するように、前記プリプレグを前記絶縁層に重ねて封止用部材を作製する工程と、前記封止用部材を、前記開口部に前記受動部品チップが入り込み、かつ、受動部品チップの端子が前記封止用部材の前記開口部に露出している前記配線層に接続するように前記載置用部材に重ね合せ、加熱圧着する工程と、を有するような構成とした。 In order to achieve such an object, the method for manufacturing a module with built-in passive component according to the present invention includes inserting a conductive member into a desired portion of a prepreg made of an electrically insulating resin and a reinforcing fiber, and heating the prepreg. To form an insulating layer having vertical conductive vias, and then to form a mounting member by forming wiring layers connected to the vertical conductive vias on both surfaces of the insulating layer, and a thin film having a plurality of surface terminals on the surface A passive component forming layer is provided on one surface of the silicon substrate, and the other surface of the silicon substrate is provided with a plurality of back surface terminals, and the thin film passive component forming layer and the back surface terminal are connected through the silicon substrate. a step of plural mounting the passive component chip having a plurality of through vias, as one of the surface terminals and back terminal is connected to the wiring layer, before described置用member on which the electrical A conductive member is inserted into a desired portion of the prepreg composed of an edge resin and reinforcing fibers, and the prepreg is heated to form an insulating layer having vertical conductive vias, and then the upper and lower surfaces are formed on at least one surface of the insulating layer. A wiring layer connected to the conductive via is formed, and then a conductive member is inserted into another prepreg having a plurality of openings corresponding to the passive component chip so as to be connected to the vertical conductive via, and then the opening Forming a sealing member by overlaying the prepreg on the insulating layer so that a desired portion of the wiring layer is exposed at the portion and the same wiring layer is exposed at the adjacent opening, and the sealing The passive member chip is connected to the wiring layer in which the passive component chip enters the opening and the terminal of the passive component chip is exposed in the opening of the sealing member. Overlapping before described 置用 member, a step of thermocompression bonding, and the like have configure.

このような本発明の受動部品内蔵モジュールは、基板を備えておらず、貫通ビアによって表裏導通がとられている受動部品チップが絶縁層内に内蔵されているので小型、薄型化が可能であり、さらに、上下導通ビアを絶縁層中に備えているので、本発明の受動部品内蔵モジュールどうしの積層、あるいは、他の電子部品内蔵モジュール等との積層時に容易に各モジュール間の導通をとることができる。
また、本発明の受動部品内蔵モジュールの製造方法は、受動部品上に多層配線を形成する煩雑な工程が不要であるため、製造歩留まりが向上し、信頼性の高い受動部品内蔵モジュールを製造することができる。
Such a module with a built-in passive component according to the present invention does not include a substrate, and a passive component chip that is conductive on the front and back sides through through vias is built in an insulating layer, so that it can be reduced in size and thickness. Furthermore, since the vertical conductive vias are provided in the insulating layer, conduction between the modules can be easily established when the passive component built-in modules of the present invention are stacked or stacked with other electronic component built-in modules. Can do.
In addition, the manufacturing method of the passive component built-in module according to the present invention does not require a complicated process of forming a multilayer wiring on the passive component, thereby improving the manufacturing yield and manufacturing a highly reliable passive component built-in module. Can do.

以下、本発明の実施の形態について図面を参照して説明する。
[受動部品内蔵モジュール]
図1は、本発明の受動部品内蔵モジュールの一実施形態を示す断面図である。図1において、本発明の受動部品内蔵モジュール1は、絶縁層2内に受動部品チップ21を内蔵している。絶縁層2は絶縁層3,4,5の積層であり、各絶縁層3,4,5には、それぞれ上下導通ビア11,12,13が配設されており、これらの上下導通ビア11,12,13によって絶縁層2は表裏導通がとられている。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[Passive component built-in module]
FIG. 1 is a cross-sectional view showing an embodiment of a module with built-in passive component according to the present invention. In FIG. 1, a passive component built-in module 1 of the present invention has a passive component chip 21 built in an insulating layer 2. The insulating layer 2 is a stack of insulating layers 3, 4, and 5. Vertical insulating vias 11, 12, and 13 are provided in the insulating layers 3, 4, and 5, respectively. 12 and 13, the insulating layer 2 is electrically connected to the front and back.

絶縁層2内に内蔵されている受動部品21は、両面に端子24,26を備え、これらの端子24,26と上下導通ビア11,12,13とを接続するように、絶縁層2内に配線層18,15が配設されている。また、絶縁層2の両面には、配線層16,17が配設されている。   The passive component 21 built in the insulating layer 2 includes terminals 24 and 26 on both sides, and the terminals 24 and 26 and the vertical conduction vias 11, 12 and 13 are connected in the insulating layer 2. Wiring layers 18 and 15 are provided. In addition, wiring layers 16 and 17 are disposed on both surfaces of the insulating layer 2.

本発明の受動部品内蔵モジュール1を構成する絶縁層2は、エポキシ樹脂、ベンゾシクロブテン樹脂、カルド樹脂、ポリイミド樹脂等の有機材料、あるいは、これらの有機材料とガラス繊維等の強化用繊維を組み合せたもの等からなるものとすることができ、厚み(絶縁層3,4,5の合計厚み)は60〜300μm、好ましくは90〜300μmの範囲で設定することができる。また、絶縁層3,4の厚みは、20〜100μm、好ましくは30〜100μmの範囲で設定することができ、絶縁層5の厚みは、内蔵する受動部品チップ21の厚みに対応して適宜設定することができる。   The insulating layer 2 constituting the passive component built-in module 1 of the present invention is made of an organic material such as epoxy resin, benzocyclobutene resin, cardo resin, or polyimide resin, or a combination of these organic materials and reinforcing fibers such as glass fiber. The thickness (total thickness of the insulating layers 3, 4, 5) can be set in the range of 60 to 300 μm, preferably 90 to 300 μm. The thickness of the insulating layers 3 and 4 can be set in the range of 20 to 100 μm, preferably 30 to 100 μm, and the thickness of the insulating layer 5 is appropriately set corresponding to the thickness of the built-in passive component chip 21. can do.

本発明の受動部品内蔵モジュール1を構成する配線層15,16,17,18は、銅、銀、金、クロム、アルミニウム、ニッケル等の導電材料からなるものとすることができる。また、上下導通ビア11,12,13は、銅、銀、金、クロム、アルミニウム等の導電材料、あるいは、これらの導電材料を含有するペーストからなるものとすることができ、太さは、例えば、20〜500μm、好ましくは50〜300μmの範囲で設定することができる。尚、本発明の受動部品内蔵モジュール1は、上下導通ビア11,12の露出面上、あるいは、配線16,17上にはんだボールを備えるものであってもよい。   The wiring layers 15, 16, 17, and 18 constituting the passive component built-in module 1 of the present invention can be made of a conductive material such as copper, silver, gold, chromium, aluminum, or nickel. The vertical conduction vias 11, 12, and 13 can be made of a conductive material such as copper, silver, gold, chromium, and aluminum, or a paste containing these conductive materials. It can be set in the range of 20 to 500 μm, preferably 50 to 300 μm. The passive component built-in module 1 of the present invention may be provided with solder balls on the exposed surfaces of the vertical conduction vias 11 and 12 or on the wirings 16 and 17.

図2は、内蔵される受動部品チップ21の一例を示す部分拡大断面図である。図2に示される例では、受動部品チップ21は、シリコン基板22と、このシリコン基板22の一方の面に形成された薄膜受動部品形成層23と、シリコン基板22の他方の面に絶縁層25cを介して配設された裏面端子26とを有している。
シリコン基板22は、貫通孔を有し、この貫通孔の壁面を含む表面に絶縁薄膜22′を備えている。このシリコン基板22には貫通ビア30が配設されている。
FIG. 2 is a partially enlarged cross-sectional view showing an example of the built-in passive component chip 21. In the example shown in FIG. 2, the passive component chip 21 includes a silicon substrate 22, a thin film passive component forming layer 23 formed on one surface of the silicon substrate 22, and an insulating layer 25 c on the other surface of the silicon substrate 22. And a rear surface terminal 26 disposed through the connector.
The silicon substrate 22 has a through hole, and an insulating thin film 22 'is provided on the surface including the wall surface of the through hole. A through via 30 is disposed in the silicon substrate 22.

薄膜受動部品形成層23は、シリコン基板22上に貫通ビア30と接続された抵抗配線27、ビア29aを介して絶縁層25a上に形成された配線24′、さらに、ビア29bを介して絶縁層25b上に形成された表面端子24を備えている。また、抵抗配線27には下部電極28aが接続され、配線24′の一部は所望の厚みの絶縁層25aを介して下部電極28aと対向する上部電極28bとなっており、これによりキャパシタ28が構成されている。
シリコン基板22の他方の面には、貫通ビア30と接続された配線26′が形成され、この配線26′はビア29cによって上記の裏面端子26と接続されている。
The thin-film passive component forming layer 23 includes a resistance wiring 27 connected to the through via 30 on the silicon substrate 22, a wiring 24 'formed on the insulating layer 25a via the via 29a, and an insulating layer via the via 29b. The surface terminal 24 formed on 25b is provided. A lower electrode 28a is connected to the resistance wiring 27, and a part of the wiring 24 'serves as an upper electrode 28b facing the lower electrode 28a through an insulating layer 25a having a desired thickness. It is configured.
On the other surface of the silicon substrate 22, a wiring 26 ′ connected to the through via 30 is formed, and this wiring 26 ′ is connected to the back terminal 26 through the via 29 c.

このような受動部品チップ21では、薄膜受動部品形成層23に形成されたキャパシタ28と抵抗配線27とによりフィルタ回路が形成されている。受動部品チップ21を構成するシリコン基板22の厚みは20〜250μm、薄膜受動部品形成層23の厚みは3〜10μm程度とすることができ、受動部品21全体の厚みは30〜300μmの範囲となるように設定することが好ましい。また、1個の受動部品チップ21の外形寸法は、一辺の長さが1〜20mm、好ましくは1〜15mmの範囲となるように設定することが好ましい。
尚、薄膜受動部品形成層が備える受動部品としては、キャパシタ、抵抗、インダクタ、トランス、LCR回路等、または、PNジャンクションを用いたダイオード素子やオペアンプ素子等であり、上述の薄膜受動部品形成層23は例示であって、これに限定されるものではない。
In such a passive component chip 21, a filter circuit is formed by the capacitor 28 and the resistance wiring 27 formed in the thin film passive component forming layer 23. The thickness of the silicon substrate 22 constituting the passive component chip 21 can be set to 20 to 250 μm, the thickness of the thin film passive component forming layer 23 can be set to about 3 to 10 μm, and the total thickness of the passive component 21 is in the range of 30 to 300 μm. It is preferable to set so. Moreover, it is preferable that the external dimension of one passive component chip 21 is set so that the length of one side is 1 to 20 mm, preferably 1 to 15 mm.
The passive component included in the thin film passive component forming layer includes a capacitor, a resistor, an inductor, a transformer, an LCR circuit, or the like, or a diode element or an operational amplifier element using a PN junction. Is an example and is not limited thereto.

このような本発明の受動部品内蔵モジュール1は、基板を備えておらず、貫通ビア30によって表裏導通がとられている受動部品チップ21が絶縁層2内に内蔵されているので、小型、薄型化が可能である。また、上下導通ビア11,12,13が絶縁層2中に配設されているので、例えば、本発明の受動部品内蔵モジュール1を複数重ねて積層構造とした場合、あるいは、他の電子部品内蔵モジュール等と重ねて積層構造とした場合に、各モジュール間の導通を容易にとることができる。
尚、上述の実施形態では、受動部品内蔵モジュールは2個の受動部品チップを内蔵するものであるが、本発明の受動部品内蔵モジュールでは、内蔵する受動部品チップの個数に限定はなく、また、配設位置、配設間隔等も任意に設定することができる。
Such a passive component built-in module 1 of the present invention does not include a substrate, and the passive component chip 21 that is electrically conductive by the through via 30 is built in the insulating layer 2, so that it is small and thin. Is possible. Further, since the vertical conduction vias 11, 12, and 13 are arranged in the insulating layer 2, for example, when a plurality of passive component built-in modules 1 of the present invention are stacked to form a laminated structure, or other electronic components are built in. When a stacked structure is formed by overlapping with a module or the like, conduction between the modules can be easily obtained.
In the above-described embodiment, the passive component built-in module includes two passive component chips. However, in the passive component built-in module of the present invention, the number of built-in passive component chips is not limited. Arrangement positions, arrangement intervals and the like can be arbitrarily set.

[受動部品内蔵モジュールの製造方法]
図3および図4は、本発明の受動部品内蔵モジュールの製造方法の一実施形態を説明するための工程図である。
本発明の受動部品内蔵モジュールの製造方法では、まず、電気絶縁層樹脂と強化用繊維からなるプリプレグ3′の所望の部位に導電部材を挿入させ、この状態でプリプレグ3′を加熱して、上下導通ビア11を備えた絶縁層3を形成する(図3(A))。その後、絶縁層3の両面に、上下導通ビア11と接続する配線層15,16を形成して、載置用部材31を作製する(図3(B))。
[Method of manufacturing module with built-in passive components]
3 and 4 are process charts for explaining an embodiment of a method for manufacturing a module with built-in passive component according to the present invention.
In the method of manufacturing a module with built-in passive component according to the present invention, first, a conductive member is inserted into a desired portion of a prepreg 3 'made of an electrically insulating layer resin and reinforcing fibers, and in this state, the prepreg 3' is heated to The insulating layer 3 including the conductive via 11 is formed (FIG. 3A). Thereafter, wiring layers 15 and 16 connected to the vertical conductive vias 11 are formed on both surfaces of the insulating layer 3 to produce a mounting member 31 (FIG. 3B).

使用するプリプレグ3′は、例えば、ガラス繊維等の強化用繊維にエポキシ樹脂、ベンゾシクロブテン樹脂、カルド樹脂、ポリイミド樹脂等の熱硬化性有機材料を含浸させたものを挙げることができ、プリプレグ3′の厚みは、20〜100μm、好ましくは30〜100μm程度とすることができる。また、上下導通ビア11とするための導電部材としては、銅、銀、金、クロム、アルミニウム等の導電材料からなるもの、あるいは、これらの導電材料を含有するペーストで形成したものとすることができる。このような導電部材の形状は、例えば、截頭錐体、柱体等であり、太さは、例えば、20〜500μm、好ましくは50〜300μmの範囲で設定することができる。   Examples of the prepreg 3 'to be used include those obtained by impregnating reinforcing fibers such as glass fibers with thermosetting organic materials such as epoxy resin, benzocyclobutene resin, cardo resin, and polyimide resin. The thickness of ′ can be 20 to 100 μm, preferably about 30 to 100 μm. In addition, the conductive member for forming the vertical conductive via 11 may be made of a conductive material such as copper, silver, gold, chromium, aluminum, or formed of a paste containing these conductive materials. it can. The shape of such a conductive member is, for example, a truncated cone, a column, and the like, and the thickness can be set in the range of, for example, 20 to 500 μm, preferably 50 to 300 μm.

上記の配線層15,16の形成は、例えば、以下のように行うことができる。まず、絶縁層3上に真空成膜法により導電層(例えば、クロム/銅、チタン/銅、ニッケル/金等の2層構造)を形成し、この導電層にレジスト層を形成し、所望のパターン露光、現像を行うことによりレジストパターンを形成する。次に、このレジストパターンをマスクとして、電解めっきにより導電材料を析出させて配線層15,16を形成し、その後、レジストパターンと導電層を除去する。上記の導電材料としては、例えば、銅、銀、金、クロム、アルミニウム、ニッケル等を挙げることができる。尚、例えば、導電層をクロム/銅、チタン/銅の2層構造とする場合、導電材料としては銅が好ましく、ニッケル/金の2層構造とする場合、導電材料として金が好ましい。   The wiring layers 15 and 16 can be formed as follows, for example. First, a conductive layer (for example, a two-layer structure of chromium / copper, titanium / copper, nickel / gold, etc.) is formed on the insulating layer 3 by a vacuum film formation method, and a resist layer is formed on the conductive layer, and a desired layer is formed. A resist pattern is formed by performing pattern exposure and development. Next, using this resist pattern as a mask, a conductive material is deposited by electrolytic plating to form wiring layers 15 and 16, and then the resist pattern and the conductive layer are removed. Examples of the conductive material include copper, silver, gold, chromium, aluminum, nickel, and the like. For example, when the conductive layer has a two-layer structure of chromium / copper and titanium / copper, the conductive material is preferably copper. When the conductive layer has a two-layer structure of nickel / gold, gold is preferable as the conductive material.

次に、上記の載置用部材31上に受動部品チップ21を載置固定する(図3(C))。この受動部品チップ21は、表面に複数の表面端子24を有する薄膜受動部品形成層23をシリコン基板22の一方の面に備え、シリコン基板22の他方の面には複数の裏面端子26を備え、シリコン基板22を貫通して薄膜受動部品形成層23と裏面端子26とを接続する複数の貫通ビア(図示せず)を備えたものである。図示例では、受動部品チップ21は、裏面端子26が配線層15に接続するように、載置用部材31上に載置されている。受動部品チップ21と載置用部材31は、例えば、エポキシ樹脂、ポリイミド樹脂等の絶縁性樹脂を用いて固着することができる。
受動部品チップ21を構成する薄膜受動部品形成層23は、キャパシタ、抵抗、インダクタ、トランス、LCR回路等の所望の薄膜受動部品が形成されたものである。
Next, the passive component chip 21 is mounted and fixed on the mounting member 31 (FIG. 3C). The passive component chip 21 includes a thin film passive component forming layer 23 having a plurality of surface terminals 24 on the surface thereof on one surface of the silicon substrate 22, and includes a plurality of back surface terminals 26 on the other surface of the silicon substrate 22. A plurality of through vias (not shown) for connecting the thin film passive component forming layer 23 and the back terminal 26 through the silicon substrate 22 are provided. In the illustrated example, the passive component chip 21 is placed on the placement member 31 so that the back terminal 26 is connected to the wiring layer 15. The passive component chip 21 and the mounting member 31 can be fixed using, for example, an insulating resin such as an epoxy resin or a polyimide resin.
The thin film passive component forming layer 23 constituting the passive component chip 21 is formed with a desired thin film passive component such as a capacitor, a resistor, an inductor, a transformer, and an LCR circuit.

次に、電気絶縁層樹脂と強化用繊維からなるプリプレグの所望の部位に導電部材を挿入させ、このプリプレグを加熱して、上下導通ビア12を備えた絶縁層4を形成し、その後、この絶縁層4の両面に、上下導通ビア12と接続する配線層17,18を形成する(図3(D))。次いで、開口部6を有するプリプレグ5′に上記の上下導通ビア12と接続するように、導電部材を挿入して上下導通ビア13とし、このプリプレグ5′を上記の絶縁層4の一方の面に重ねて封止用部材32を作製する(図4(A))。   Next, a conductive member is inserted into a desired portion of the prepreg composed of the electrical insulating layer resin and the reinforcing fiber, and the prepreg is heated to form the insulating layer 4 having the vertical conduction vias 12, and then the insulation Wiring layers 17 and 18 connected to the vertical conductive vias 12 are formed on both surfaces of the layer 4 (FIG. 3D). Next, a conductive member is inserted into the prepreg 5 ′ having the opening 6 so as to be connected to the vertical conduction via 12 to form the vertical conduction via 13, and this prepreg 5 ′ is formed on one surface of the insulating layer 4. Overlay the sealing member 32 (FIG. 4A).

上下導通ビア12を備えた絶縁層4の形成は、上述の絶縁層3の形成と同様に行うことができ、配線層17,18の形成は、上述の配線層15,16と同様に行うことができる。
また、プリプレグ5′の開口部6は、上記の受動部品チップ21を内蔵するためのものである。この開口部6の大きさは、後述する加熱圧着工程でのプリプレグ5′の流動、熱収縮を考慮して、受動部品チップ21よりもやや大きいものであってよい。このプリプレグ5′も、上述のプリプレグ3′と同じものを使用することができ、プリプレグ5′の厚みは、使用する受動部品チップ21の厚みを考慮して適宜設定することができる。
The formation of the insulating layer 4 including the vertical conduction vias 12 can be performed in the same manner as the formation of the insulating layer 3 described above, and the wiring layers 17 and 18 are formed in the same manner as the wiring layers 15 and 16 described above. Can do.
The opening 6 of the prepreg 5 'is for incorporating the passive component chip 21 described above. The size of the opening 6 may be slightly larger than that of the passive component chip 21 in consideration of the flow and thermal contraction of the prepreg 5 ′ in the thermocompression bonding process described later. The same prepreg 5 ′ can be used as the prepreg 3 ′, and the thickness of the prepreg 5 ′ can be appropriately set in consideration of the thickness of the passive component chip 21 to be used.

次に、封止用部材32を、開口部6に受動部品チップ21が入り込み、かつ、受動部品チップ21の端子24が封止用部材32の配線層18に接続し、上下導通ビア13が上下導通ビア11に接続するようにして、載置用部材31に重ね合せ、加熱圧着する(図4(B))。これにより、載置用部材31と封止用部材32が接合され、内部に受動部品チップ21が内蔵された本発明の受動部品内蔵モジュール1が得られる。また、多面付けで載置用部材31と封止用部材32の接合工程まで行われた場合には、その後、ダイシングして所望の寸法で本発明の受動部品内蔵モジュール1を得ることができる。
上述の受動部品内蔵モジュールの製造方法は例示であり、本発明は、これに限定されるものではない。
Next, in the sealing member 32, the passive component chip 21 enters the opening 6, the terminal 24 of the passive component chip 21 is connected to the wiring layer 18 of the sealing member 32, and the vertical conductive vias 13 are It is overlaid on the mounting member 31 so as to be connected to the conductive via 11, and is thermocompression bonded (FIG. 4B). Thereby, the mounting member 31 and the sealing member 32 are joined, and the passive component built-in module 1 of the present invention in which the passive component chip 21 is built inside is obtained. Further, when the mounting process of the mounting member 31 and the sealing member 32 is performed in multiple faces, dicing is then performed to obtain the passive component built-in module 1 of the present invention with desired dimensions.
The above-described method for manufacturing the passive component built-in module is an example, and the present invention is not limited to this.

次に、具体的実施例を挙げて本発明を更に詳細に説明する。
(載置用部材の作製)
ガラス繊維にエポキシ樹脂を含浸させた厚み約0.6mm、400mm×500mmのプリプレグ(松下電工(株)製 R1661)を準備した。次に、銀ペーストで形成した截頭錐体(上部径0.15mm、下部径0.2mm、高さ0.15mm)形状の導電部材を、小径側から上記のプリプレグに挿入した。この導電部材は、隣接する導電部材のピッチを1mmとして、20mm×20mmの大きさの格子形状となるように総数400個挿入した。その後、180℃、60分間の加熱処理を施してプリプレグを硬化させ、上下導通ビアを備えた絶縁層(厚み0.07mm)を形成した。
Next, the present invention will be described in more detail with specific examples.
(Production of mounting member)
A prepreg (R1661 manufactured by Matsushita Electric Works Co., Ltd.) having a thickness of about 0.6 mm and 400 mm × 500 mm in which a glass fiber was impregnated with an epoxy resin was prepared. Next, a conductive member having a truncated cone shape (upper diameter 0.15 mm, lower diameter 0.2 mm, height 0.15 mm) formed of silver paste was inserted into the prepreg from the small diameter side. A total of 400 conductive members were inserted such that the adjacent conductive members had a pitch of 1 mm and a lattice shape of 20 mm × 20 mm. Then, the heat processing for 180 minutes and 180 degreeC were performed, the prepreg was hardened, and the insulating layer (thickness 0.07mm) provided with the vertical conduction via was formed.

次に、絶縁層の両面に、スパッタリング法によりクロム/銅の2層からなる導電層を形成し、この導電層上に液状レジスト(東京応化工業(株)製LA900)を塗布した。次いで、フォトマスクを介し露光、現像して、配線層を形成するためのレジストパターンを形成した。このレジストパターンをマスクとし、上記の導電層を給電層として、電解銅めっきを行って配線層を形成し、その後、レジストパターンと導電層を除去した。これにより、載置用部材を得た。   Next, a conductive layer composed of two chromium / copper layers was formed on both surfaces of the insulating layer by sputtering, and a liquid resist (LA900 manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied on the conductive layer. Next, exposure and development were performed through a photomask to form a resist pattern for forming a wiring layer. Using this resist pattern as a mask and using the above conductive layer as a power feeding layer, electrolytic copper plating was performed to form a wiring layer, and then the resist pattern and the conductive layer were removed. This obtained the member for mounting.

(受動部品の作製と載置)
貫通ビア(直径30μm)を備えた厚み50μmのシリコン基板の一方の面に、薄膜受動部品としてキャパシタを具備する受動部品形成層(厚み10μm)を設けた。また、上記のシリコン基板の他方の面に絶縁層を設け、ビアを介して上記の貫通ビアに接続するように端子を形成した。その後、ダイシングして、7mm×7mmの大きさの受動部品チップを作製した。
次に、受動部品チップの受動部品形成層側と反対側の端子を配線層と接続するようにして、エポキシ樹脂を用いて載置用部材上に受動部品チップを載置固定した。このように載置された各受動部品チップの間隔は2mmであった。
(Production and placement of passive components)
A passive component forming layer (thickness 10 μm) having a capacitor as a thin film passive component was provided on one surface of a 50 μm thick silicon substrate provided with a through via (diameter 30 μm). In addition, an insulating layer was provided on the other surface of the silicon substrate, and a terminal was formed so as to be connected to the through via. Thereafter, dicing was performed to produce a passive component chip having a size of 7 mm × 7 mm.
Next, the passive component chip was mounted and fixed on the mounting member using an epoxy resin so that the terminal on the side opposite to the passive component forming layer side of the passive component chip was connected to the wiring layer. The interval between the passive component chips placed in this way was 2 mm.

(封止用部材の作製)
載置用部材に使用したのと同じプリプレグを準備し、このプリプレグに、銀ペーストで形成した截頭錐体(上部径0.15mm、下部径0.2mm、高さ0.15mm)形状の導電部材を、小径側から挿入した。この導電部材は、隣接する導電部材のピッチを1mmとして、20mm×20mmの大きさの格子形状となるように総数400個挿入した。その後、180℃、60分間の加熱処理を施してプリプレグを硬化させ、上下導通ビアを備えた絶縁層(厚み0.07mm)を形成した。
(Preparation of sealing member)
The same prepreg as used for the mounting member was prepared, and on this prepreg, a truncated cone (upper diameter 0.15 mm, lower diameter 0.2 mm, height 0.15 mm) formed of silver paste was formed. The member was inserted from the small diameter side. A total of 400 conductive members were inserted such that the adjacent conductive members had a pitch of 1 mm and a lattice shape of 20 mm × 20 mm. Then, the heat processing for 180 minutes and 180 degreeC were performed, the prepreg was hardened, and the insulating layer (thickness 0.07mm) provided with the vertical conduction via was formed.

次に、絶縁層の両面に、スパッタリング法によりクロム/銅の2層からなる導電層を形成し、この導電層上に液状レジスト(東京応化工業(株)製LA900)を塗布した。次いで、フォトマスクを介し露光、現像して、配線層を形成するためのレジストパターンを形成した。このレジストパターンをマスクとし、上記の導電層を給電層として、電解銅めっきを行って配線層を形成し、その後、レジストパターンと導電層を除去した。   Next, a conductive layer composed of two chromium / copper layers was formed on both surfaces of the insulating layer by sputtering, and a liquid resist (LA900 manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied on the conductive layer. Next, exposure and development were performed through a photomask to form a resist pattern for forming a wiring layer. Using this resist pattern as a mask and using the above conductive layer as a power feeding layer, electrolytic copper plating was performed to form a wiring layer, and then the resist pattern and the conductive layer were removed.

次に、ガラス繊維にエポキシ樹脂を含浸させた厚み約0.06mm、400mm×500mmのプリプレグ(松下電工(株)製 R1661)を準備し、このプリプレグに、7.2mm×7.2mmの大きさで開口部を形成した。この開口部は、上述の載置用部材に載置された受動部品チップに対応する位置に設けた。次いで、このプリプレグに、銀ペーストで形成した截頭錐体(上部径0.15mm、下部径0.2mm、高さ0.1mm)形状の導電部材を、上記の上下導通ビアと接続するように挿入し、その後、このプリプレグを上記の絶縁層の一方の面に、開口部内に所望の配線が露出するように位置合せして重ね合わせ、封止用部材を得た。   Next, a prepreg (R1661 made by Matsushita Electric Works Co., Ltd.) having a thickness of about 0.06 mm and 400 mm × 500 mm in which a glass fiber is impregnated with an epoxy resin is prepared, and the size of 7.2 mm × 7.2 mm is prepared in this prepreg. An opening was formed. This opening was provided at a position corresponding to the passive component chip mounted on the mounting member. Next, a conductive member having a truncated cone shape (upper diameter 0.15 mm, lower diameter 0.2 mm, height 0.1 mm) formed of silver paste is connected to the prepreg so as to connect to the above-described vertical conduction via. After that, the prepreg was aligned with one surface of the insulating layer so that a desired wiring was exposed in the opening, and overlapped to obtain a sealing member.

(受動部品内蔵モジュールの作製)
載置用部材に載置された受動部品チップが開口部に入り込むように、封止用部材を載置用部材に重ね合わせた。この段階で、受動部品チップの受動部品形成層の端子は、封止用部材に配設された配線層と接続され、3層の上下導通ビアは相互に接続されて表裏導通をとるものとなった。この状態で、その後、180℃、60分間の加熱処理を施してプリプレグを硬化した。次いで、ダイシングして、受動部品チップ4個を内蔵した本発明の受動部品内蔵モジュール(20mm×30mm、厚み0.25mm)を得た。
(Production of module with built-in passive components)
The sealing member was superimposed on the mounting member so that the passive component chip mounted on the mounting member entered the opening. At this stage, the terminals of the passive component forming layer of the passive component chip are connected to the wiring layer disposed on the sealing member, and the three layers of the upper and lower conductive vias are connected to each other so as to conduct the front and back. It was. In this state, heat treatment at 180 ° C. for 60 minutes was then performed to cure the prepreg. Subsequently, dicing was performed to obtain a passive component built-in module (20 mm × 30 mm, thickness 0.25 mm) of the present invention in which four passive component chips were built.

小型で高信頼性が要求される半導体装置や各種電子機器への用途にも適用できる。   The present invention can also be applied to small semiconductor devices and various electronic devices that require high reliability.

本発明の受動部品内蔵モジュールの一実施形態を示す断面図である。It is sectional drawing which shows one Embodiment of the module with a built-in passive component of this invention. 本発明の受動部品内蔵モジュールに用いられる受動部品チップの一例を示す部分拡大断面図である。It is a partial expanded sectional view which shows an example of the passive component chip | tip used for the passive component built-in module of this invention. 本発明の受動部品内蔵モジュールの製造方法の一実施形態を説明する工程図である。It is process drawing explaining one Embodiment of the manufacturing method of the passive component built-in module of this invention. 本発明の受動部品内蔵モジュールの製造方法の一実施形態を説明する工程図である。It is process drawing explaining one Embodiment of the manufacturing method of the passive component built-in module of this invention.

符号の説明Explanation of symbols

1…受動部品内蔵モジュール
2(3,4,5)…絶縁層
3′,5′…プリプレグ
6…開口部
11,12,13…上下導通ビア
15,16,17,18…配線層
21…受動部品チップ
22…シリコン基板
23…薄膜受動部品形成層
24…表面端子
26…裏面端子
31…載置用部材
32…封止用部材
DESCRIPTION OF SYMBOLS 1 ... Passive component built-in module 2 (3, 4, 5) ... Insulating layer 3 ', 5' ... Prepreg 6 ... Opening part 11, 12, 13 ... Vertical conduction | electrical_connection via 15, 16, 17, 18 ... Wiring layer 21 ... Passive Component chip 22 ... Silicon substrate 23 ... Thin-film passive component formation layer 24 ... Front terminal 26 ... Back terminal 31 ... Mounting member 32 ... Sealing member

Claims (1)

電気絶縁性樹脂と強化用繊維からなるプリプレグの所望の部位に導電部材を挿入させ、前記プリプレグを加熱することにより上下導通ビアを有する絶縁層とし、その後、前記絶縁層の両面に前記上下導通ビアと接続する配線層を形成して載置用部材を作製する工程と、
表面に複数の表面端子を有する薄膜受動部品形成層をシリコン基板の一方の面に備え、該シリコン基板の他方の面には複数の裏面端子を備え、前記シリコン基板を貫通して前記薄膜受動部品形成層と前記裏面端子とを接続する複数の貫通ビアを備えた受動部品チップを、前記表面端子と裏面端子のいずれか一方が前記配線層に接続するように、前記載置用部材上に複数載置する工程と、
電気絶縁性樹脂と強化用繊維からなるプリプレグの所望の部位に導電部材を挿入させ、前記プリプレグを加熱することにより上下導通ビアを有する絶縁層とし、その後、前記絶縁層の少なくとも一方の面に前記上下導通ビアと接続する配線層を形成し、次いで、前記受動部品チップに対応した複数の開口部を有する別のプリプレグに、前記上下導通ビアと接続するように導電部材を挿入し、その後、前記開口部に前記配線層の所望部位が露出するとともに、隣り合う前記開口部に同じ配線層が露出するように、前記プリプレグを前記絶縁層に重ねて封止用部材を作製する工程と、
前記封止用部材を、前記開口部に前記受動部品チップが入り込み、かつ、受動部品チップの端子が前記封止用部材の前記開口部に露出している前記配線層に接続するように前記載置用部材に重ね合せ、加熱圧着する工程と、を有することを特徴とする受動部品内蔵モジュールの製造方法。
A conductive member is inserted into a desired portion of a prepreg made of an electrically insulating resin and reinforcing fibers, and the prepreg is heated to form an insulating layer having vertical conductive vias, and then the vertical conductive vias on both surfaces of the insulating layer. Forming a wiring layer to be connected to and producing a mounting member;
A thin film passive component forming layer having a plurality of surface terminals on the surface is provided on one surface of the silicon substrate, a plurality of back surface terminals are provided on the other surface of the silicon substrate, and the thin film passive component penetrates the silicon substrate. a plurality a plurality of through passive component chip with vias, as one of the surface terminals and back terminal is connected to the wiring layer, before described置用member on connecting the forming layer and the back terminal A process of placing;
A conductive member is inserted into a desired portion of a prepreg made of an electrically insulating resin and reinforcing fibers, and the prepreg is heated to form an insulating layer having a vertical conduction via, and then the at least one surface of the insulating layer A wiring layer connected to the vertical conductive via is formed, and then a conductive member is inserted into another prepreg having a plurality of openings corresponding to the passive component chip so as to connect to the vertical conductive via. Producing a sealing member by overlapping the prepreg on the insulating layer so that a desired portion of the wiring layer is exposed in the opening and the same wiring layer is exposed in the adjacent opening ;
The above-mentioned sealing member is connected to the wiring layer in which the passive component chip enters the opening and the terminal of the passive component chip is exposed in the opening of the sealing member. A method of manufacturing a module with a built-in passive component, comprising: a step of superimposing on a mounting member and heat pressing.
JP2005076505A 2005-03-17 2005-03-17 Manufacturing method of passive component built-in module Expired - Fee Related JP4598573B2 (en)

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JP5266009B2 (en) * 2008-10-14 2013-08-21 株式会社フジクラ Built-in circuit wiring board
US8395054B2 (en) * 2009-03-12 2013-03-12 Ibiden Co., Ltd. Substrate for mounting semiconductor element and method for manufacturing substrate for mounting semiconductor element

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