JP4570732B2 - ガス噴出装置及び真空処理装置 - Google Patents

ガス噴出装置及び真空処理装置 Download PDF

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Publication number
JP4570732B2
JP4570732B2 JP2000153942A JP2000153942A JP4570732B2 JP 4570732 B2 JP4570732 B2 JP 4570732B2 JP 2000153942 A JP2000153942 A JP 2000153942A JP 2000153942 A JP2000153942 A JP 2000153942A JP 4570732 B2 JP4570732 B2 JP 4570732B2
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Japan
Prior art keywords
gas
mixing
shower plate
chamber
hole
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Expired - Lifetime
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JP2000153942A
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English (en)
Japanese (ja)
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JP2001335941A5 (enExample
JP2001335941A (ja
Inventor
一也 斎藤
康男 清水
英介 堀
邦明 黒川
勝彦 森
正志 菊池
征典 橋本
道夫 石川
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Ulvac Inc
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Ulvac Inc
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Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP2000153942A priority Critical patent/JP4570732B2/ja
Publication of JP2001335941A publication Critical patent/JP2001335941A/ja
Publication of JP2001335941A5 publication Critical patent/JP2001335941A5/ja
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Publication of JP4570732B2 publication Critical patent/JP4570732B2/ja
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JP2000153942A 2000-05-25 2000-05-25 ガス噴出装置及び真空処理装置 Expired - Lifetime JP4570732B2 (ja)

Priority Applications (1)

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JP2000153942A JP4570732B2 (ja) 2000-05-25 2000-05-25 ガス噴出装置及び真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000153942A JP4570732B2 (ja) 2000-05-25 2000-05-25 ガス噴出装置及び真空処理装置

Publications (3)

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JP2001335941A JP2001335941A (ja) 2001-12-07
JP2001335941A5 JP2001335941A5 (enExample) 2007-04-19
JP4570732B2 true JP4570732B2 (ja) 2010-10-27

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JP2000153942A Expired - Lifetime JP4570732B2 (ja) 2000-05-25 2000-05-25 ガス噴出装置及び真空処理装置

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JP (1) JP4570732B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4219702B2 (ja) 2003-02-06 2009-02-04 東京エレクトロン株式会社 減圧処理装置
JP4680619B2 (ja) * 2005-02-09 2011-05-11 株式会社アルバック プラズマ成膜装置
KR102159868B1 (ko) 2015-10-06 2020-09-24 가부시키가이샤 알박 혼합기, 진공 처리 장치

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02205681A (ja) * 1989-02-06 1990-08-15 Nec Corp 化学気相成長装置
JP2802865B2 (ja) * 1992-11-04 1998-09-24 日立電子エンジニアリング株式会社 プラズマｃｖｄ装置
JP2909364B2 (ja) * 1993-09-20 1999-06-23 東京エレクトロン株式会社 処理装置及びそのクリーニング方法
JPH09143737A (ja) * 1995-11-22 1997-06-03 Tokyo Electron Ltd 成膜装置

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JP2001335941A (ja) 2001-12-07

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