JP2001335941A5 - - Google Patents

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Publication number
JP2001335941A5
JP2001335941A5 JP2000153942A JP2000153942A JP2001335941A5 JP 2001335941 A5 JP2001335941 A5 JP 2001335941A5 JP 2000153942 A JP2000153942 A JP 2000153942A JP 2000153942 A JP2000153942 A JP 2000153942A JP 2001335941 A5 JP2001335941 A5 JP 2001335941A5
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JP
Japan
Prior art keywords
electrode
gas
chamber
plate
shower plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000153942A
Other languages
English (en)
Japanese (ja)
Other versions
JP4570732B2 (ja
JP2001335941A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000153942A priority Critical patent/JP4570732B2/ja
Priority claimed from JP2000153942A external-priority patent/JP4570732B2/ja
Publication of JP2001335941A publication Critical patent/JP2001335941A/ja
Publication of JP2001335941A5 publication Critical patent/JP2001335941A5/ja
Application granted granted Critical
Publication of JP4570732B2 publication Critical patent/JP4570732B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2000153942A 2000-05-25 2000-05-25 ガス噴出装置及び真空処理装置 Expired - Lifetime JP4570732B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000153942A JP4570732B2 (ja) 2000-05-25 2000-05-25 ガス噴出装置及び真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000153942A JP4570732B2 (ja) 2000-05-25 2000-05-25 ガス噴出装置及び真空処理装置

Publications (3)

Publication Number Publication Date
JP2001335941A JP2001335941A (ja) 2001-12-07
JP2001335941A5 true JP2001335941A5 (enExample) 2007-04-19
JP4570732B2 JP4570732B2 (ja) 2010-10-27

Family

ID=18659113

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000153942A Expired - Lifetime JP4570732B2 (ja) 2000-05-25 2000-05-25 ガス噴出装置及び真空処理装置

Country Status (1)

Country Link
JP (1) JP4570732B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4219702B2 (ja) 2003-02-06 2009-02-04 東京エレクトロン株式会社 減圧処理装置
JP4680619B2 (ja) * 2005-02-09 2011-05-11 株式会社アルバック プラズマ成膜装置
CN108138321B (zh) 2015-10-06 2020-03-20 株式会社爱发科 混合器、真空处理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02205681A (ja) * 1989-02-06 1990-08-15 Nec Corp 化学気相成長装置
JP2802865B2 (ja) * 1992-11-04 1998-09-24 日立電子エンジニアリング株式会社 プラズマｃｖｄ装置
JP2909364B2 (ja) * 1993-09-20 1999-06-23 東京エレクトロン株式会社 処理装置及びそのクリーニング方法
JPH09143737A (ja) * 1995-11-22 1997-06-03 Tokyo Electron Ltd 成膜装置

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