JP4557703B2 - 自動補正方法および自動補正装置 - Google Patents

自動補正方法および自動補正装置 Download PDF

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Publication number
JP4557703B2
JP4557703B2 JP2004366268A JP2004366268A JP4557703B2 JP 4557703 B2 JP4557703 B2 JP 4557703B2 JP 2004366268 A JP2004366268 A JP 2004366268A JP 2004366268 A JP2004366268 A JP 2004366268A JP 4557703 B2 JP4557703 B2 JP 4557703B2
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JP
Japan
Prior art keywords
exposure
sensor
elements
heads
lighting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004366268A
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English (en)
Japanese (ja)
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JP2006173470A (ja
JP2006173470A5 (enExample
Inventor
健二 池戸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
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Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP2004366268A priority Critical patent/JP4557703B2/ja
Priority to US11/303,900 priority patent/US7440080B2/en
Publication of JP2006173470A publication Critical patent/JP2006173470A/ja
Publication of JP2006173470A5 publication Critical patent/JP2006173470A5/ja
Application granted granted Critical
Publication of JP4557703B2 publication Critical patent/JP4557703B2/ja
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Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B7/00—Control of exposure by setting shutters, diaphragms or filters, separately or conjointly
    • G03B7/20—Control of exposure by setting shutters, diaphragms or filters, separately or conjointly in accordance with change of lens

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004366268A 2004-12-17 2004-12-17 自動補正方法および自動補正装置 Expired - Fee Related JP4557703B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004366268A JP4557703B2 (ja) 2004-12-17 2004-12-17 自動補正方法および自動補正装置
US11/303,900 US7440080B2 (en) 2004-12-17 2005-12-15 Method and apparatus for automatic correction of direct exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004366268A JP4557703B2 (ja) 2004-12-17 2004-12-17 自動補正方法および自動補正装置

Publications (3)

Publication Number Publication Date
JP2006173470A JP2006173470A (ja) 2006-06-29
JP2006173470A5 JP2006173470A5 (enExample) 2007-10-25
JP4557703B2 true JP4557703B2 (ja) 2010-10-06

Family

ID=36595241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004366268A Expired - Fee Related JP4557703B2 (ja) 2004-12-17 2004-12-17 自動補正方法および自動補正装置

Country Status (2)

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US (1) US7440080B2 (enExample)
JP (1) JP4557703B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006337614A (ja) * 2005-05-31 2006-12-14 Fujifilm Holdings Corp 描画方法および装置
JP5260021B2 (ja) * 2007-03-30 2013-08-14 株式会社ジャパンディスプレイ 評価パターンを配置した液晶表示装置およびその製造方法
JP2010102084A (ja) * 2008-10-23 2010-05-06 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
JP5190630B2 (ja) * 2009-02-26 2013-04-24 株式会社ブイ・テクノロジー 露光装置
JP2011107569A (ja) * 2009-11-20 2011-06-02 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
SG193240A1 (en) 2011-03-29 2013-10-30 Asml Netherlands Bv Measurement of the position of a radiation beam spot in lithography

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10112579A (ja) 1996-10-07 1998-04-28 M S Tec:Kk レジスト露光方法及びその露光装置
CN1159628C (zh) 1997-04-14 2004-07-28 迪科公司 用于点照明介质的照明装置和照明方法
JP4188712B2 (ja) 2003-01-21 2008-11-26 富士フイルム株式会社 露光装置及び露光装置の調整方法
CN1573414A (zh) * 2003-06-10 2005-02-02 富士胶片株式会社 像素位置特定方法、图像偏移修正方法、及图像形成装置
JP4322564B2 (ja) * 2003-06-10 2009-09-02 富士フイルム株式会社 画素位置特定方法、画像ずれ補正方法、および画像形成装置
JP4486323B2 (ja) * 2003-06-10 2010-06-23 富士フイルム株式会社 画素位置特定方法、画像ずれ補正方法、および画像形成装置
JP4322837B2 (ja) * 2004-03-31 2009-09-02 富士フイルム株式会社 露光装置の校正方法及び露光方法並びに露光装置

Also Published As

Publication number Publication date
US20060132745A1 (en) 2006-06-22
JP2006173470A (ja) 2006-06-29
US7440080B2 (en) 2008-10-21

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