JP4545854B2 - 投影露光装置 - Google Patents

投影露光装置 Download PDF

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Publication number
JP4545854B2
JP4545854B2 JP31561199A JP31561199A JP4545854B2 JP 4545854 B2 JP4545854 B2 JP 4545854B2 JP 31561199 A JP31561199 A JP 31561199A JP 31561199 A JP31561199 A JP 31561199A JP 4545854 B2 JP4545854 B2 JP 4545854B2
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JP
Japan
Prior art keywords
light
illuminance
optical
illumination
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP31561199A
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English (en)
Japanese (ja)
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JP2001135564A (ja
JP2001135564A5 (enExample
Inventor
洋 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP31561199A priority Critical patent/JP4545854B2/ja
Publication of JP2001135564A publication Critical patent/JP2001135564A/ja
Publication of JP2001135564A5 publication Critical patent/JP2001135564A5/ja
Application granted granted Critical
Publication of JP4545854B2 publication Critical patent/JP4545854B2/ja
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Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP31561199A 1999-11-05 1999-11-05 投影露光装置 Expired - Fee Related JP4545854B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31561199A JP4545854B2 (ja) 1999-11-05 1999-11-05 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31561199A JP4545854B2 (ja) 1999-11-05 1999-11-05 投影露光装置

Publications (3)

Publication Number Publication Date
JP2001135564A JP2001135564A (ja) 2001-05-18
JP2001135564A5 JP2001135564A5 (enExample) 2006-12-21
JP4545854B2 true JP4545854B2 (ja) 2010-09-15

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ID=18067455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31561199A Expired - Fee Related JP4545854B2 (ja) 1999-11-05 1999-11-05 投影露光装置

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JP (1) JP4545854B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003023832A1 (en) * 2001-09-07 2003-03-20 Nikon Corporation Exposure method and system, and device production method
JP2010517310A (ja) * 2007-01-30 2010-05-20 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明システム
WO2010061674A1 (ja) * 2008-11-28 2010-06-03 株式会社ニコン 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
KR20180012270A (ko) * 2015-05-26 2018-02-05 가부시키가이샤 브이 테크놀로지 노광용 조명 장치, 노광 장치 및 노광 방법
JP6587557B2 (ja) * 2016-02-24 2019-10-09 株式会社ブイ・テクノロジー 露光用照明装置、露光装置及び露光方法
JP6761306B2 (ja) * 2016-08-30 2020-09-23 キヤノン株式会社 照明光学系、リソグラフィ装置、及び物品製造方法
JP6740107B2 (ja) * 2016-11-30 2020-08-12 Hoya株式会社 マスクブランク、転写用マスク及び半導体デバイスの製造方法
JP7208787B2 (ja) * 2018-12-26 2023-01-19 キヤノン株式会社 照明光学系、露光装置、および物品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677111A (ja) * 1992-08-27 1994-03-18 Nec Corp 縮小投影露光装置
JP3208863B2 (ja) * 1992-09-04 2001-09-17 株式会社ニコン 照明方法及び装置、露光方法、並びに半導体素子の製造方法
JP3440458B2 (ja) * 1993-06-18 2003-08-25 株式会社ニコン 照明装置、パターン投影方法及び半導体素子の製造方法
JPH09223661A (ja) * 1996-02-15 1997-08-26 Nikon Corp 露光装置
JP3259657B2 (ja) * 1997-04-30 2002-02-25 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法

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Publication number Publication date
JP2001135564A (ja) 2001-05-18

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