JP4541481B2 - 位置検出装置、露光装置、およびデバイス製造方法 - Google Patents

位置検出装置、露光装置、およびデバイス製造方法 Download PDF

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Publication number
JP4541481B2
JP4541481B2 JP2000044497A JP2000044497A JP4541481B2 JP 4541481 B2 JP4541481 B2 JP 4541481B2 JP 2000044497 A JP2000044497 A JP 2000044497A JP 2000044497 A JP2000044497 A JP 2000044497A JP 4541481 B2 JP4541481 B2 JP 4541481B2
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Japan
Prior art keywords
light
opening
wafer
detection
slit
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JP2000044497A
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English (en)
Japanese (ja)
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JP2001237160A5 (enExample
JP2001237160A (ja
Inventor
和彦 三島
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Canon Inc
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Canon Inc
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Priority to JP2000044497A priority Critical patent/JP4541481B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000044497A 2000-02-22 2000-02-22 位置検出装置、露光装置、およびデバイス製造方法 Expired - Fee Related JP4541481B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000044497A JP4541481B2 (ja) 2000-02-22 2000-02-22 位置検出装置、露光装置、およびデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000044497A JP4541481B2 (ja) 2000-02-22 2000-02-22 位置検出装置、露光装置、およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2001237160A JP2001237160A (ja) 2001-08-31
JP2001237160A5 JP2001237160A5 (enExample) 2007-04-05
JP4541481B2 true JP4541481B2 (ja) 2010-09-08

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JP2000044497A Expired - Fee Related JP4541481B2 (ja) 2000-02-22 2000-02-22 位置検出装置、露光装置、およびデバイス製造方法

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JP (1) JP4541481B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3803699B2 (ja) * 2004-05-31 2006-08-02 独立行政法人農業・食品産業技術総合研究機構 分光画像取得装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09320926A (ja) * 1996-05-27 1997-12-12 Nikon Corp 露光方法
JPH11260679A (ja) * 1998-03-06 1999-09-24 Nikon Corp マーク検出装置及び露光装置
JPH11304422A (ja) * 1998-04-20 1999-11-05 Nikon Corp 位置検出装置及び位置検出方法並びに露光装置
JP4258035B2 (ja) * 1998-05-22 2009-04-30 株式会社ニコン 露光装置及びデバイス製造方法

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JP2001237160A (ja) 2001-08-31

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