JP4535502B2 - 物質検出素子 - Google Patents
物質検出素子 Download PDFInfo
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- JP4535502B2 JP4535502B2 JP2005188660A JP2005188660A JP4535502B2 JP 4535502 B2 JP4535502 B2 JP 4535502B2 JP 2005188660 A JP2005188660 A JP 2005188660A JP 2005188660 A JP2005188660 A JP 2005188660A JP 4535502 B2 JP4535502 B2 JP 4535502B2
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- 238000001514 detection method Methods 0.000 title claims description 35
- 239000000126 substance Substances 0.000 title claims description 17
- 239000013076 target substance Substances 0.000 claims description 21
- 238000006073 displacement reaction Methods 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 8
- 238000001179 sorption measurement Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 230000003993 interaction Effects 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 239000010408 film Substances 0.000 description 110
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 39
- 239000001257 hydrogen Substances 0.000 description 31
- 229910052739 hydrogen Inorganic materials 0.000 description 31
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 18
- 229910052763 palladium Inorganic materials 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- 239000000758 substrate Substances 0.000 description 16
- 150000002431 hydrogen Chemical class 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000013078 crystal Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000010453 quartz Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- 239000011651 chromium Substances 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical compound OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 229910001252 Pd alloy Inorganic materials 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000004043 responsiveness Effects 0.000 description 3
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- GLZPCOQZEFWAFX-UHFFFAOYSA-N Geraniol Chemical compound CC(C)=CCCC(C)=CCO GLZPCOQZEFWAFX-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000000427 antigen Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229940088597 hormone Drugs 0.000 description 2
- 239000005556 hormone Substances 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 2
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 2
- 229940067107 phenylethyl alcohol Drugs 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 102000004169 proteins and genes Human genes 0.000 description 2
- 108090000623 proteins and genes Proteins 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- WUOACPNHFRMFPN-SECBINFHSA-N (S)-(-)-alpha-terpineol Chemical compound CC1=CC[C@@H](C(C)(C)O)CC1 WUOACPNHFRMFPN-SECBINFHSA-N 0.000 description 1
- HGUFODBRKLSHSI-UHFFFAOYSA-N 2,3,7,8-tetrachloro-dibenzo-p-dioxin Chemical compound O1C2=CC(Cl)=C(Cl)C=C2OC2=C1C=C(Cl)C(Cl)=C2 HGUFODBRKLSHSI-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 108090001008 Avidin Proteins 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 102000014914 Carrier Proteins Human genes 0.000 description 1
- WTEVQBCEXWBHNA-UHFFFAOYSA-N Citral Natural products CC(C)=CCCC(C)=CC=O WTEVQBCEXWBHNA-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 108020004414 DNA Proteins 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000005792 Geraniol Substances 0.000 description 1
- GLZPCOQZEFWAFX-YFHOEESVSA-N Geraniol Natural products CC(C)=CCC\C(C)=C/CO GLZPCOQZEFWAFX-YFHOEESVSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 102000018697 Membrane Proteins Human genes 0.000 description 1
- 108010052285 Membrane Proteins Proteins 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- LEHOTFFKMJEONL-UHFFFAOYSA-N Uric Acid Chemical compound N1C(=O)NC(=O)C2=C1NC(=O)N2 LEHOTFFKMJEONL-UHFFFAOYSA-N 0.000 description 1
- TVWHNULVHGKJHS-UHFFFAOYSA-N Uric acid Natural products N1C(=O)NC(=O)C2NC(=O)NC21 TVWHNULVHGKJHS-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- OVKDFILSBMEKLT-UHFFFAOYSA-N alpha-Terpineol Natural products CC(=C)C1(O)CCC(C)=CC1 OVKDFILSBMEKLT-UHFFFAOYSA-N 0.000 description 1
- 229940088601 alpha-terpineol Drugs 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 102000036639 antigens Human genes 0.000 description 1
- 108091007433 antigens Proteins 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 108091008324 binding proteins Proteins 0.000 description 1
- 229960002685 biotin Drugs 0.000 description 1
- 239000011616 biotin Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000007084 catalytic combustion reaction Methods 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 229940043350 citral Drugs 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229940125532 enzyme inhibitor Drugs 0.000 description 1
- 239000002532 enzyme inhibitor Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- WTEVQBCEXWBHNA-JXMROGBWSA-N geranial Chemical compound CC(C)=CCC\C(C)=C\C=O WTEVQBCEXWBHNA-JXMROGBWSA-N 0.000 description 1
- 229940113087 geraniol Drugs 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002157 polynucleotide Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- RIUWBIIVUYSTCN-UHFFFAOYSA-N trilithium borate Chemical compound [Li+].[Li+].[Li+].[O-]B([O-])[O-] RIUWBIIVUYSTCN-UHFFFAOYSA-N 0.000 description 1
- 229940116269 uric acid Drugs 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
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- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Description
振動子上に設けられ、振動子に対して電圧を印加するための駆動電極膜、
振動子上に設けられ、振動子の振動を検出する検出電極膜、および
駆動電極膜の周縁部上に設けられた被膜であって、この被膜によって被覆されていない露出部分を形成する被膜
を備えており、
露出部分への目的物質の吸着による振動子の振動状態の変化に基づいて目的物質を検出することを特徴とする。
イソアミルアセテート、フェニルエチルアルコール、p-アニスアルデヒド、シトラール、ゲラニオール、フェニルエチルアルコール、α-テルピネオール等のにおい物質、ダイオキシンなどの環境ホルモン、たんぱく質、DNA、抗原抗体などの生体物質、グリコース、アルコール、尿素、尿酸、乳酸などの化学物質、水素、アンモニア
下に示す各対は、目的物質と検出膜材質との組み合わせを示す対である。従って、各対から、一方を目的物質として選択すると、他方が検出膜の材質となる。
抗体−抗原、ホルモン−ホルモンレセプター、アビジン/ストレプトアビジン−ビオチン、酵素−酵素基質または酵素インヒビター、レクチン−カルボキシハイドレート、脂質−脂質結合タンパク質または膜会合タンパク質、レセプター−伝達物質、タンパク質−タンパク質、タンパク質−ポリヌクレオチド、DNA−DNA、DNA−RNA、RNA−RNA
SiO2、Al2O3、Ta2O5、DLC(Diamond like carbon)
(1) 振動周波数を測定し、目的物質と膜との相互作用による膜の質量変化に基づく振動周波数変化から、物質の存在を検出し、また物質の濃度を計測する。
(2) 振動のQ値を測定し、目的物質と膜との相互作用による膜の質量変化に基づくQ値の変化から、物質の存在を検出し、また物質の濃度を計測する。
(3) 振動子の振動変位を測定し、目的物質と膜との相互作用による膜の質量変化に基づく振動変位の変化から、目的物質の存在を検出し、また物質の濃度を計測する。この方法によれば、周波数の変化を測定する場合に比べて、単位質量変化当たりの感度を向上させることが可能である。しかも、ねじれ弾性率μ、厚さ方向弾性率Cyなどの温度特性等の環境変化は、振動子の全体にわたって生ずる。この際、本例においては、振動子の変位のバランス変化は、振動子の全体にわたって生ずるので、測定前後における振動変位の変化には影響しない。従って、質量変化のみを正確に測定することができる。
図8〜図10を参照しつつ説明する下記手順に従って、図1〜図5に示す水素検出素子を作製した。具体的には、縦2インチ、横2インチ、厚さ0.16mmの水晶基板2(図10(a))を希フッ酸にてエッチング洗浄した後、スピンドライヤーにて乾燥し、水晶基板2の両方の表面2a、2bを清浄化した。スパッタ装置を用いて水晶基板各表面2a、2bに厚さ0.02μmのCrを下地層21A、21Bとして成膜し、厚さ0.1μmのPd膜22A、22Bを成膜した(図10(a)。)
前記水晶基板2の片面2aに再びフォトレジストをスピンコーターによって塗布して厚さ1μmのレジスト膜25を形成した。レジストの溶剤成分を除去するため、オーブンを用いてプリベークした(図11(c))。Pd膜露出パターンを描画したフォトマスクを用い、露光装置によりレジスト膜表面に、前記フォトマスクパターン25をホトリソグラフィーによって転写し、レジストパターン27を形成した(図11(d)、図12(a))。26は硬化部分であり、25は未硬化部分である。
Claims (3)
- 電圧印加によって駆動可能な振動子、
前記振動子上に設けられ、前記振動子に対して電圧を印加するための駆動電極膜、
前記振動子上に設けられ、前記振動子の振動を検出する検出電極膜,および
前記駆動電極膜の周縁部上に設けられた被膜であって、この被膜によって被覆されていない露出部分を形成する被膜
を備えており、
前記露出部分と目的物質との相互作用による前記振動子の振動状態の変化に基づいて前記目的物質を検出することを特徴とする、物質検出素子。 - 前記相互作用が前記目的物質の吸着であることを特徴とする、請求項1記載の素子。
- 前記振動状態の変化が振動変位であることを特徴とする、請求項1または2記載の素子。
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JP2005188660A JP4535502B2 (ja) | 2005-06-28 | 2005-06-28 | 物質検出素子 |
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JP2005188660A JP4535502B2 (ja) | 2005-06-28 | 2005-06-28 | 物質検出素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007010361A JP2007010361A (ja) | 2007-01-18 |
JP4535502B2 true JP4535502B2 (ja) | 2010-09-01 |
Family
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JP2005188660A Expired - Fee Related JP4535502B2 (ja) | 2005-06-28 | 2005-06-28 | 物質検出素子 |
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JP (1) | JP4535502B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007008266A1 (de) * | 2007-02-20 | 2008-08-21 | Siemens Ag | Piezoaktor und Verfahren zum Herstellen eines Piezoaktors |
JP5317650B2 (ja) * | 2008-11-28 | 2013-10-16 | 日立Geニュークリア・エナジー株式会社 | プラント構成部材の表面へのフェライト皮膜の形成方法及びフェライト皮膜形成装置 |
JP2010216895A (ja) * | 2009-03-13 | 2010-09-30 | Mitsubishi Materials Corp | 微量質量センサ |
KR102471291B1 (ko) * | 2018-09-27 | 2022-11-25 | 아이펙스 가부시키가이샤 | 물질 검출 소자 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10132646A (ja) * | 1996-10-29 | 1998-05-22 | Ricoh Co Ltd | 液相表面処理装置およびこれを用いた被処理体の質量変化計測方法 |
JP2000032117A (ja) * | 1998-07-16 | 2000-01-28 | Brother Ind Ltd | 通信装置 |
JP2000321117A (ja) * | 1998-09-04 | 2000-11-24 | Ngk Insulators Ltd | 質量センサ及び質量検出方法 |
JP2004205392A (ja) * | 2002-12-26 | 2004-07-22 | Japan Science & Technology Agency | Qcm装置及び試料測定方法 |
JP2005098986A (ja) * | 2003-08-19 | 2005-04-14 | Ngk Insulators Ltd | 質量測定装置および方法 |
JP2005098966A (ja) * | 2003-09-05 | 2005-04-14 | Canon Inc | 光学素子を評価する方法 |
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2005
- 2005-06-28 JP JP2005188660A patent/JP4535502B2/ja not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10132646A (ja) * | 1996-10-29 | 1998-05-22 | Ricoh Co Ltd | 液相表面処理装置およびこれを用いた被処理体の質量変化計測方法 |
JP2000032117A (ja) * | 1998-07-16 | 2000-01-28 | Brother Ind Ltd | 通信装置 |
JP2000321117A (ja) * | 1998-09-04 | 2000-11-24 | Ngk Insulators Ltd | 質量センサ及び質量検出方法 |
JP2004205392A (ja) * | 2002-12-26 | 2004-07-22 | Japan Science & Technology Agency | Qcm装置及び試料測定方法 |
JP2005098986A (ja) * | 2003-08-19 | 2005-04-14 | Ngk Insulators Ltd | 質量測定装置および方法 |
JP2005098966A (ja) * | 2003-09-05 | 2005-04-14 | Canon Inc | 光学素子を評価する方法 |
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