JP4519438B2 - 多塩素化アルカンの還元用触媒 - Google Patents
多塩素化アルカンの還元用触媒 Download PDFInfo
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- JP4519438B2 JP4519438B2 JP2003348976A JP2003348976A JP4519438B2 JP 4519438 B2 JP4519438 B2 JP 4519438B2 JP 2003348976 A JP2003348976 A JP 2003348976A JP 2003348976 A JP2003348976 A JP 2003348976A JP 4519438 B2 JP4519438 B2 JP 4519438B2
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- 239000003054 catalyst Substances 0.000 title claims description 94
- 150000001335 aliphatic alkanes Chemical class 0.000 title claims description 22
- 239000002245 particle Substances 0.000 claims description 48
- 229910052751 metal Inorganic materials 0.000 claims description 39
- 239000002184 metal Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 23
- 239000007864 aqueous solution Substances 0.000 claims description 19
- 238000001035 drying Methods 0.000 claims description 17
- 239000010410 layer Substances 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 239000002344 surface layer Substances 0.000 claims description 14
- 150000003839 salts Chemical class 0.000 claims description 13
- 230000000737 periodic effect Effects 0.000 claims description 5
- 229910021472 group 8 element Inorganic materials 0.000 claims description 4
- 239000012266 salt solution Substances 0.000 claims description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 55
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 50
- 238000006243 chemical reaction Methods 0.000 description 41
- 238000006722 reduction reaction Methods 0.000 description 40
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 40
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 36
- 229910052697 platinum Inorganic materials 0.000 description 27
- VHHHONWQHHHLTI-UHFFFAOYSA-N hexachloroethane Chemical compound ClC(Cl)(Cl)C(Cl)(Cl)Cl VHHHONWQHHHLTI-UHFFFAOYSA-N 0.000 description 19
- 239000001257 hydrogen Chemical class 0.000 description 18
- 229910052739 hydrogen Chemical class 0.000 description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical class [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 17
- 239000007789 gas Substances 0.000 description 11
- 239000012071 phase Substances 0.000 description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 239000002253 acid Substances 0.000 description 9
- 238000009826 distribution Methods 0.000 description 9
- 238000010894 electron beam technology Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 239000000523 sample Substances 0.000 description 9
- 239000007791 liquid phase Substances 0.000 description 8
- 238000007086 side reaction Methods 0.000 description 8
- 230000003197 catalytic effect Effects 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 229910000510 noble metal Inorganic materials 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
担体としてガンマアルミナ(平均直径d=2.0mm)の100gに白金含有量が担体の0.25重量%である塩化白金酸水溶液60mlを一様に噴霧した。110℃で60分乾燥した後、300℃に加熱し水素を用い気相で3時間還元処理を行った。
担体としてガンマアルミナ(平均直径d=2.0mm)の100gに白金量含有が担体の0.25重量%である塩化白金酸水溶液60mlに投入し穏やかに攪拌し白金を担持せしめた。110℃で60分乾燥した後、300℃に加熱し水素を用い気相で3時間還元処理を行った。
担体としてガンマアルミナ(平均直径d=2.0mm)の100gに白金含有量が担体の0.25重量%である塩化白金酸水溶液100mlを一様に噴霧した。110℃で60分乾燥した後、300℃に加熱し水素を用い気相で3時間還元処理を行った。
得られた触媒粒子の断面を電子線プローブマイクロアナライザー(EPMA)で観察し白金の分布を調べた。tおよびt/dを表1に示す。
担体としてガンマアルミナ(平均直径d=2.0mm)の100gに白金含有量が担体の2.0重量%である塩化白金酸水溶液60mlを一様に噴霧した。110℃で60分乾燥した後、300℃に加熱し水素を用い気相で3時間還元処理を行った。
得られた触媒粒子の断面を電子線プローブマイクロアナライザー(EPMA)で観察し白金の分布を調べた。tおよびt/dを表1に示す。
担体としてチタニア(平均直径d=2.0mm)の100gに白金含有量が担体の0.25重量%である塩化白金酸水溶液60mlを一様に噴霧した。110℃で60分乾燥した後、300℃に加熱し水素を用い気相で3時間還元処理を行った。
得られた触媒粒子の断面を電子線プローブマイクロアナライザー(EPMA)で観察し白金の分布を調べた。tおよびt/dを表1に示す。
担体としてチタニア(平均直径d=2.0mm)の100gに白金量含有が担体の0.25重量%である塩化白金酸水溶液60mlに投入し穏やかに攪拌し白金を担持せしめた。110℃で60分乾燥した後、300℃に加熱し水素を用い気相で3時間還元処理を行った。
担体としてチタニア(平均直径d=2.0mm)の100gに白金量含有が担体の0.25重量%である塩化白金酸水溶液100mlを一様に噴霧した。110℃で60分乾燥した後、300℃に加熱し水素を用い気相で3時間還元処理を行った。
得られた触媒粒子の断面を電子線プローブマイクロアナライザー(EPMA)で観察し白金の分布を調べた。tおよびt/dを表1に示す。
担体としてジルコニア(平均直径d=2.0mm)の100gに白金量含有が担体の0.25重量%である塩化白金酸水溶液60mlを一様に噴霧した。110℃で60分乾燥した後、300℃に加熱し水素を用い気相で3時間還元処理を行った。
得られた触媒粒子の断面を電子線プローブマイクロアナライザー(EPMA)で観察し白金の分布を調べた。tおよびt/dを表1に示す。
担体としてシリカ(平均直径d=2.0mm)の100gに白金量含有が担体の0.25重量%である塩化白金酸水溶液60mlを一様に噴霧した。110℃で60分乾燥した後、300℃に加熱し水素を用い気相で3時間還元処理を行った。
Claims (3)
- 周期律表第8族元素、9族元素及び10族元素から選ばれた少なくとも1種の触媒金属を多孔質担体粒子に担持せしめた触媒であって、上記多孔質担体粒子の平均直径が1.5mm以上であり、前記触媒金属の担持層を該多孔質担体粒子の表層部に厚みが0.5mm以下の範囲で形成したことを特徴とする多塩素化アルカンの還元用触媒。
- 周期律表8族、9族および10族元素から選ばれた少なくとも1種の金属の可溶性塩水溶液を平均直径が1.5mm以上の多孔質担体粒子表面に噴霧してその表面のみに付着せしめた後、乾燥し、次いで還元処理することにより、該金属の担持層を該多孔質担体粒子の表層部に厚みが0.5mm以下の範囲となるように形成することを特徴とする多塩素化アルカン還元用触媒の製造方法。
- 多孔質担体粒子に対する上記金属の可溶性塩水溶液の液量が担体100重量部に対して50〜100重量部である請求項2に記載の方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003348976A JP4519438B2 (ja) | 2003-10-08 | 2003-10-08 | 多塩素化アルカンの還元用触媒 |
CNB2004100951910A CN100423833C (zh) | 2003-10-08 | 2004-10-08 | 多氯代烷烃还原用催化剂、其制备方法以及低级氯代烷烃的制备方法 |
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JP2003348976A JP4519438B2 (ja) | 2003-10-08 | 2003-10-08 | 多塩素化アルカンの還元用触媒 |
Publications (2)
Publication Number | Publication Date |
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JP2005111366A JP2005111366A (ja) | 2005-04-28 |
JP4519438B2 true JP4519438B2 (ja) | 2010-08-04 |
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JP2003348976A Expired - Fee Related JP4519438B2 (ja) | 2003-10-08 | 2003-10-08 | 多塩素化アルカンの還元用触媒 |
Country Status (2)
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JP (1) | JP4519438B2 (ja) |
CN (1) | CN100423833C (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103323513B (zh) * | 2013-06-07 | 2015-11-25 | 惠州市富济电子材料有限公司 | 一种氧传感器内电极铂浆及其制备方法和应用 |
CN107876046A (zh) * | 2017-10-27 | 2018-04-06 | 江苏理文化工有限公司 | 一种四氯化碳气相加氢脱氯制氯仿的高效催化剂 |
CN108147943A (zh) * | 2018-01-19 | 2018-06-12 | 江苏理文化工有限公司 | 一种四氯化碳转氯仿生产工艺 |
CN112871153A (zh) * | 2021-01-14 | 2021-06-01 | 广东醇氢新能源研究院有限公司 | 一种甲醇常温燃烧用的催化剂及其制备方法 |
Citations (10)
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JPS4853980A (ja) * | 1971-11-09 | 1973-07-28 | ||
JPS4953587A (ja) * | 1972-08-17 | 1974-05-24 | ||
JPS5211185A (en) * | 1975-07-16 | 1977-01-27 | Degussa | Method of making catalysttactive coating on catalyst carriers |
JPH05140008A (ja) * | 1991-11-21 | 1993-06-08 | Daikin Ind Ltd | 1,3−ジクロロ−1,2,2,3,3−ペンタフルオロプロパンの製造方法 |
JPH07149669A (ja) * | 1993-08-26 | 1995-06-13 | Dow Chem Co:The | 塩素化副生成物および廃棄物の有用な物質への変換法 |
JPH08283182A (ja) * | 1995-04-11 | 1996-10-29 | Tokuyama Corp | 含水素クロロメタン類の製造方法 |
JP2812800B2 (ja) * | 1989-12-22 | 1998-10-22 | エルクロス・エス・エー | クロロフォルムの製造方法 |
JP2001316322A (ja) * | 2000-02-22 | 2001-11-13 | Central Glass Co Ltd | 1,1,1−トリフルオロアセトンの製造方法 |
JP2003238475A (ja) * | 2002-02-08 | 2003-08-27 | Central Glass Co Ltd | 1,1,1−トリフルオロアセトンの製造方法 |
JP2005518277A (ja) * | 2002-02-26 | 2005-06-23 | ビーエーエスエフ アクチェンゲゼルシャフト | シェル型触媒の製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2661671B1 (fr) * | 1990-05-03 | 1992-07-17 | Atochem | Procede de dechloration des chloromethanes superieures. |
ITMI971161A1 (it) * | 1997-05-19 | 1998-11-19 | Montecatini Tecnologie Srl | Catalizzatori di idrogenazione |
-
2003
- 2003-10-08 JP JP2003348976A patent/JP4519438B2/ja not_active Expired - Fee Related
-
2004
- 2004-10-08 CN CNB2004100951910A patent/CN100423833C/zh not_active Expired - Fee Related
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4853980A (ja) * | 1971-11-09 | 1973-07-28 | ||
JPS4953587A (ja) * | 1972-08-17 | 1974-05-24 | ||
JPS5211185A (en) * | 1975-07-16 | 1977-01-27 | Degussa | Method of making catalysttactive coating on catalyst carriers |
JP2812800B2 (ja) * | 1989-12-22 | 1998-10-22 | エルクロス・エス・エー | クロロフォルムの製造方法 |
JPH05140008A (ja) * | 1991-11-21 | 1993-06-08 | Daikin Ind Ltd | 1,3−ジクロロ−1,2,2,3,3−ペンタフルオロプロパンの製造方法 |
JPH07149669A (ja) * | 1993-08-26 | 1995-06-13 | Dow Chem Co:The | 塩素化副生成物および廃棄物の有用な物質への変換法 |
JPH08283182A (ja) * | 1995-04-11 | 1996-10-29 | Tokuyama Corp | 含水素クロロメタン類の製造方法 |
JP2001316322A (ja) * | 2000-02-22 | 2001-11-13 | Central Glass Co Ltd | 1,1,1−トリフルオロアセトンの製造方法 |
JP2003238475A (ja) * | 2002-02-08 | 2003-08-27 | Central Glass Co Ltd | 1,1,1−トリフルオロアセトンの製造方法 |
JP2005518277A (ja) * | 2002-02-26 | 2005-06-23 | ビーエーエスエフ アクチェンゲゼルシャフト | シェル型触媒の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1636631A (zh) | 2005-07-13 |
CN100423833C (zh) | 2008-10-08 |
JP2005111366A (ja) | 2005-04-28 |
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