JP4512980B2 - Element device - Google Patents

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JP4512980B2
JP4512980B2 JP2004100224A JP2004100224A JP4512980B2 JP 4512980 B2 JP4512980 B2 JP 4512980B2 JP 2004100224 A JP2004100224 A JP 2004100224A JP 2004100224 A JP2004100224 A JP 2004100224A JP 4512980 B2 JP4512980 B2 JP 4512980B2
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hole
base material
element device
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conductive
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JP2005286209A (en
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清隆 杉浦
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Denso Corp
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本発明は、端子が圧入されるスルーホールを持つ素子装置に関する。   The present invention relates to an element device having a through hole into which a terminal is press-fitted.

近年、基材に導電部が形成されてなる素子装置に、集積回路装置等の他部材を実装するための取付構造として、基材にドリルやレーザ等により孔状のスルーホールを形成し、このスルーホールの外縁の一部または全部を基材に形成した導電部の一部で覆い、スルーホール内に端子を圧入取付するとともに導電部と端子とを弾接させて電気的に接続する無ハンダ圧入式のものが開発されている。   In recent years, as an attachment structure for mounting other members such as an integrated circuit device to an element device in which a conductive portion is formed on a base material, a hole-like through hole is formed in the base material by a drill or a laser. Solder-free solder that covers part or all of the outer edge of the through hole with a part of the conductive part formed on the base, press-fits the terminal into the through hole, and makes the conductive part and the terminal elastically contact each other A press-fit type has been developed.

無ハンダ圧入式の取付構造において、端子はスルーホールよりも大径であり弾性的に拡縮する、所謂プレスフィットコネクタと呼ばれるものが用いられる。端子をスルーホールに圧入する際に、端子は一旦縮径してスルーホール内部で再度拡径する。したがって端子の表面はスルーホールの外縁に弾接し、スルーホール外縁に表出する導電部に電気的に接続される(例えば、特許文献1、2)。   In the solderless press-fit mounting structure, a so-called press-fit connector is used in which the terminal has a larger diameter than the through hole and elastically expands and contracts. When the terminal is press-fitted into the through hole, the terminal is once reduced in diameter and expanded again in the through hole. Therefore, the surface of the terminal is elastically contacted with the outer edge of the through hole and is electrically connected to the conductive portion exposed at the outer edge of the through hole (for example, Patent Documents 1 and 2).

従来の素子装置を模式的に表す断面図を図11に示し、図11に示す素子装置に端子を圧入取付している様子を模式的に表す断面図を図12に示す。   FIG. 11 is a cross-sectional view schematically showing a conventional element device, and FIG. 12 is a cross-sectional view schematically showing a state in which a terminal is press-fitted to the element device shown in FIG.

図11に示す素子装置100は、基材101と、基材101に設けられた貫通孔状のスルーホール102と、基材101の上面側と下面側にそれぞれ形成されている導電部103とを持つ。   An element device 100 shown in FIG. 11 includes a base material 101, a through-hole-like through hole 102 provided in the base material 101, and conductive portions 103 formed on the upper surface side and the lower surface side of the base material 101, respectively. Have.

図11に示されるような従来の素子装置100において、スルーホール102の外縁105は端子106よりも小径に形成されている。したがって、スルーホール102に端子106を圧入する際には、図12に示すように、先ず端子106の表面は外縁105の上端を構成する入口部107に当接する。そして、大径の端子106はスルーホールの外縁105と圧接しつつ縮径する。このため、スルーホールの外縁105は端子106の弾性によって外方に強く押圧される。ここで、端子106と導電部103とを確実に電気的に接続させるためには、端子106の弾性による押圧力を大きく設定する方が好ましいが、この押圧力が過大になると、導電部103や基材101が大きく変形して、導電部103や基材101にクラックが生じる場合等がある。   In the conventional element device 100 as shown in FIG. 11, the outer edge 105 of the through hole 102 is formed to have a smaller diameter than the terminal 106. Therefore, when the terminal 106 is press-fitted into the through hole 102, the surface of the terminal 106 first comes into contact with the inlet portion 107 that constitutes the upper end of the outer edge 105, as shown in FIG. The large diameter terminal 106 is reduced in diameter while being in pressure contact with the outer edge 105 of the through hole. For this reason, the outer edge 105 of the through hole is strongly pressed outward by the elasticity of the terminal 106. Here, in order to securely connect the terminal 106 and the conductive portion 103, it is preferable to set a large pressing force due to the elasticity of the terminal 106. However, if this pressing force is excessive, the conductive portion 103 or There is a case where the base material 101 is greatly deformed to cause a crack in the conductive portion 103 or the base material 101.

導電部103にクラックが生じると、端子106と導電部103との電気的接続が不良になる場合がある。また、基材101にクラックが生じると基材101による絶縁が充分に為されずにショート等が生じる場合がある。これらの場合には、素子装置100に他部材が実装されてなる素子構造体は使用に適さなくなり、製造ロスが大きくなる問題があった。   If a crack occurs in the conductive portion 103, the electrical connection between the terminal 106 and the conductive portion 103 may be poor. Further, when a crack occurs in the base material 101, a short circuit may occur due to insufficient insulation by the base material 101. In these cases, the element structure in which other members are mounted on the element device 100 is not suitable for use, and there is a problem that manufacturing loss increases.

また、スルーホールの外表面を硬質の支持構造体で被覆する技術も開発されているが、この場合、素子装置の部品点数が著しく増大して製造工程が非常に煩雑になるために、素子装置の製造コストが著しく高くなる問題があった。
特開2003−283093号公報 特開2000−174406号公報
In addition, a technology for covering the outer surface of the through hole with a hard support structure has been developed. In this case, the number of parts of the element device is remarkably increased and the manufacturing process becomes very complicated. There was a problem that the manufacturing cost of the remarkably increased.
JP 2003-283093 A JP 2000-174406 A

本発明は上記事情を考慮してなされたもので、端子を取付する際にスルーホールの外縁が大きく変形しない素子装置を安価に提供することを目的とする。   The present invention has been made in view of the above circumstances, and an object of the present invention is to provide an element device at which the outer edge of a through hole is not greatly deformed when a terminal is attached at low cost.

前記課題を解決する本発明の素子装置は、基材と、該基材に形成されている導電部と、該基材に穿設され外縁の少なくとも一部に該導電部が表出しているスルーホールと、を備え、端子が該スルーホールに圧入されると該導電部が該端子に電気的に接続する素子装置であって、
該スルーホールの周縁に位置する該基材の内層には、硬質の強化部が該基材と一体に形成され、
該強化部は、該導電部と接触しない程度に該スルーホールの外周側全周に配置されていることを特徴とする。
The element device of the present invention that solves the above problems includes a base material, a conductive portion formed on the base material, and a through-hole that is formed in the base material and that the conductive portion is exposed on at least a part of the outer edge. An element device, wherein the conductive portion is electrically connected to the terminal when the terminal is press-fitted into the through-hole,
In the inner layer of the base material located at the periphery of the through hole, a hard reinforcing portion is formed integrally with the base material,
The strengthening portion is arranged on the entire outer circumference side of the through hole so as not to contact the conductive portion.

本発明の素子装置は、複数の薄層体が積層され隣接する該薄層体同士が接着材で接着されてなる上記基材と、少なくとも1つの該薄層体の表面に形成されている上記強化部と、を持つ多層積層体と、該多層積層体に形成されているスルーホールと、を持つように構成されていることが好ましい。 In the element device of the present invention , a plurality of thin layer bodies are laminated and the adjacent thin layer bodies are bonded to each other with an adhesive, and the substrate is formed on the surface of at least one of the thin layer bodies. It is preferable to have a multilayer laminate having a reinforced portion and a through hole formed in the multilayer laminate .

本発明の素子装置によると、スルーホールの周縁に位置する基材の内部に、硬質の強化部が配置されている。このため、例えば端子の弾性が大きく設定されており端子がスルーホールの外縁を強く押圧する場合にも、スルーホールの外縁が大きく変形することが防止される。したがって、スルーホール外縁を構成する基材や導電部が大きく変形することはなく、基材や導電部にクラック等が生じることが防止される。   According to the element device of the present invention, the hard reinforcing portion is arranged inside the base material located at the periphery of the through hole. For this reason, for example, even when the elasticity of the terminal is set to be large and the terminal strongly presses the outer edge of the through hole, the outer edge of the through hole is prevented from being greatly deformed. Therefore, the base material and the conductive part constituting the outer edge of the through hole are not greatly deformed, and it is possible to prevent the base material and the conductive part from being cracked.

また、強化部は基材の内層に基材と一体形成されていることから、強化部を形成するためには煩雑な工程等を必要とせず、素子装置を容易かつ安価に製造することが可能になる。   In addition, since the reinforced part is integrally formed with the base material in the inner layer of the base material, it is possible to manufacture the element device easily and inexpensively without requiring complicated steps to form the reinforced part. become.

強化部を導電性の高い材料から形成し、その少なくとも一部を導電部に電気的に接続させる場合には、強化部から導電部の一部を構成することができ、素子装置の構成を単純にすることができ、素子装置の製造コストをより低減できる効果がある。   When the reinforced portion is formed of a highly conductive material and at least a part of the reinforced portion is electrically connected to the conductive portion, a part of the conductive portion can be configured from the reinforced portion, and the configuration of the element device is simplified. Thus, the manufacturing cost of the element device can be further reduced.

本発明の素子装置は、上述したプレスフィットコネクタと呼ばれる端子が取付されるものである。本発明の素子装置は通常の基材や導電部を備えるとともに、端子を圧入し端子と導電部とを電気的に接続するためのスルーホールを備える。   The element device of the present invention is provided with a terminal called a press-fit connector described above. The element device of the present invention includes a normal base material and a conductive part, and also includes a through hole for press-fitting a terminal and electrically connecting the terminal and the conductive part.

基材および導電部は、既知の方法で製造された既知のものであり、所謂プリント基材と呼ばれるもの等を用いることができる。スルーホールは基材の厚さ方向に孔状に穿設された部分であり、基材の厚さ方向に貫通する貫通穴であってもよいし、基材の厚さ方向の一表面に開口した行き止まり穴であってもよい。   The substrate and the conductive part are known ones manufactured by a known method, and what is called a so-called print substrate can be used. The through-hole is a portion formed in a hole shape in the thickness direction of the base material, and may be a through hole penetrating in the thickness direction of the base material, or may be opened on one surface of the base material in the thickness direction. It may be a dead end.

スルーホールの外縁には、基材と導電部とが表出するかあるいは導電部のみが表出する。すなわち、基材にスルーホールとなる穴を穿設し、その一部のみを導電部で覆う場合には、スルーホールの外縁には基材と導電部とが表出する。また、基材にスルーホールとなる穴を穿設し、その全体を導電部で覆う場合には、スルーホールの外縁には導電部のみが表出する。何れの場合にも、素子装置のうちスルーホールの外縁に表出した導電部の部分が端子と接触して導電部と端子とが電気的に接続される。   At the outer edge of the through hole, the base material and the conductive portion are exposed, or only the conductive portion is exposed. That is, when a hole to be a through hole is formed in the base material and only a part thereof is covered with the conductive portion, the base material and the conductive portion are exposed at the outer edge of the through hole. Further, when a hole to be a through hole is formed in the base material and the whole is covered with the conductive portion, only the conductive portion is exposed on the outer edge of the through hole. In any case, the portion of the conductive portion exposed to the outer edge of the through hole in the element device comes into contact with the terminal, and the conductive portion and the terminal are electrically connected.

導電部は、スルーホールの外縁全体を覆い外縁全体に表出してもよいし、スルーホールの外縁の一部のみに表出してもよいが、外縁の厚さ方向全体に表出することが好ましい。端子に確実に接触させて端子と導電部との電気的接続を確実におこなうためである。また、導電部を外縁の厚さ方向全体に表出させる場合には、端子と摩擦した導電部が剥がれ落ちにくくなる等の利点もある。   The conductive portion may cover the entire outer edge of the through hole and may be exposed to the entire outer edge, or may be exposed to only a part of the outer edge of the through hole, but is preferably exposed to the entire thickness direction of the outer edge. . This is because the electrical connection between the terminal and the conductive portion is ensured by reliably contacting the terminal. Further, when the conductive portion is exposed in the entire thickness direction of the outer edge, there is an advantage that the conductive portion rubbed with the terminal is difficult to peel off.

本発明の素子装置において、スルーホールの周縁に位置する基材の内層には、硬質の強化部が基材と一体形成されている。この強化部は、端子を圧入した際にスルーホールの外縁が大きく変形することを防止するためのものであり、端子の弾接に耐える程度に高強度な材料や形状からなるものが用いられる。このような強化部は、例えば銅、鉄もしくはそれらの合金等の導電性の高い材料からなるものでも良く、あるいは、樹脂やセラミック等の導電性の低い、または導電性がない材料からなるものでも良い。   In the element device of the present invention, a hard reinforcing portion is integrally formed with the base material in the inner layer of the base material located at the periphery of the through hole. This reinforcing portion is for preventing the outer edge of the through hole from being greatly deformed when the terminal is press-fitted, and is made of a material or shape that is strong enough to withstand the elastic contact of the terminal. Such a reinforced portion may be made of a material having high conductivity such as copper, iron or an alloy thereof, or may be made of a material having low conductivity or non-conductivity such as resin or ceramic. good.

強化部を導電性の高い材料で構成する場合には、強化部の少なくとも一部を導電部に電気的に接続して、強化部から導電部の一部を構成しても良い。この場合には、簡易な構成で素子装置の内部に導電部と強化部とを形成でき、素子装置の製造コストをより低減できる効果がある。   When the reinforced portion is made of a highly conductive material, at least a part of the reinforced portion may be electrically connected to the conductive portion, and the reinforced portion may constitute a part of the conductive portion. In this case, the conductive portion and the reinforcing portion can be formed inside the element device with a simple configuration, and the manufacturing cost of the element device can be further reduced.

また、強化部は、スルーホールの外縁が大きく変形することをより確実に防止するためには、基材の肉厚方向での配設厚さが大きい方が好ましい。例えば、肉厚が35μm以上に形成されることや、18μm程度の肉厚で2層以上に形成されることが望ましい。   In addition, it is preferable that the reinforcing portion has a large arrangement thickness in the thickness direction of the base material in order to more reliably prevent the outer edge of the through hole from being greatly deformed. For example, it is desirable that the thickness be formed to be 35 μm or more, or to be formed in two or more layers with a thickness of about 18 μm.

強化部は、スルーホールの外縁を基材内部側から支持する効果を発揮すればよく、スルーホール外縁に表出しても良いし表出しなくても良い。また、強化部は、スルーホールの周縁のうち一部に形成されても良いし全周に形成されても良い。強化部を、スルーホール周縁のうち全周に形成される場合には、スルーホール外縁が大きく変形することがより確実に防止されて、基材や導電部のクラック等がより確実に防止される。   The reinforcing part only needs to exhibit the effect of supporting the outer edge of the through hole from the inside of the base material, and may or may not be exposed to the outer edge of the through hole. Further, the reinforcing portion may be formed on a part of the periphery of the through hole or may be formed on the entire periphery. When the reinforced portion is formed on the entire periphery of the through-hole periphery, the outer edge of the through-hole is more reliably prevented from being deformed more reliably, and cracks and the like of the base material and the conductive portion are more reliably prevented. .

本発明の素子装置において、基材は1層構造のものであっても良いし、2層以上の多層構造のものであっても良い。また、導電部は基材の1表面にのみ形成されていても良いし、基材の対向する2表面等の複数の表面に形成されていても良いし、基材内層に形成されていても良い。   In the element device of the present invention, the substrate may have a single layer structure or a multilayer structure of two or more layers. Further, the conductive portion may be formed only on one surface of the base material, may be formed on a plurality of surfaces such as two opposing surfaces of the base material, or may be formed on the inner layer of the base material. good.

さらに、導電部はスルーホールの外縁に表出する部分とその他の部分とが一体に形成されても良いし、別体で形成されても良い。例えば、基材のスルーホールの外縁以外の部分にプリント等の方法で予め導電部を形成し、スルーホールの外縁部分にのみメッキ等の方法で導電部を形成するとともに、両導電部を接触させて電気的に接続しても良い。この場合導電部のうちスルーホールの外縁に表出する部分とその他の部分とを異なる材料で形成することもできる。   Furthermore, the conductive part may be formed integrally with the part exposed to the outer edge of the through hole and the other part, or may be formed separately. For example, a conductive part is formed in advance on the part other than the outer edge of the through hole of the base material by a method such as printing, and a conductive part is formed only on the outer edge part of the through hole by a method such as plating, and both conductive parts are brought into contact with each other. May be electrically connected. In this case, the part exposed to the outer edge of the through hole in the conductive part and the other part can be formed of different materials.

基材を多層構造のものとする場合には、強化部は、通常の積層方法で層状の基材同士の層間、すなわち基材の内層に積層形成することができる。また基材を1層構造のものとする場合には、強化部は、例えばインサート成形等の方法で基材内層に積層することができる。   In the case where the base material has a multilayer structure, the reinforcing portion can be laminated and formed between the layered base materials, that is, the inner layer of the base material by an ordinary laminating method. When the base material has a single-layer structure, the reinforcing portion can be laminated on the base material inner layer by a method such as insert molding.

以下、本発明の素子装置を図面を基に説明する。 Hereinafter, an element device of the present invention will be described with reference to the drawings.

参考例
参考例の素子装置は、集積回路装置が実装されるプリント基板である。本参考例の素子装置を模式的に表す要部拡大断面図を図1に示す。
( Reference example )
The element device of this reference example is a printed circuit board on which an integrated circuit device is mounted. The principal part expanded sectional view which represents typically the element apparatus of this reference example is shown in FIG.

参考例の素子装置1は、図1に示すように、略平板状の基材2と、基材2の上層と内層と下面とにプリント形成されているプリント導電部3と、基材2の厚さ方向に穿設されているスルーホール5と、スルーホール5の外縁全体にメッキ形成されている接続導電部6とを備える。このうち、プリント導電部3と接続導電部6とは繋がっており、互いに電気的に接続されて導電部8を構成している。基材2はガラス織布エポキシ樹脂からなり、この基材2の所定位置には略円孔状の貫通穴であるスルーホール5が切削形成されている。このスルーホール5は、直径1mmの真円柱状に形成されている。 As shown in FIG. 1, the element device 1 of the present reference example includes a substantially flat substrate 2, a printed conductive portion 3 that is printed on the upper layer, the inner layer, and the lower surface of the substrate 2, and the substrate 2. Through-hole 5 drilled in the thickness direction, and a connection conductive portion 6 formed by plating on the entire outer edge of the through-hole 5. Among these, the print conductive part 3 and the connection conductive part 6 are connected to each other and are electrically connected to each other to form a conductive part 8. The base material 2 is made of a glass woven epoxy resin, and through holes 5 that are substantially circular through holes are cut and formed at predetermined positions of the base material 2. The through hole 5 is formed in a true cylinder shape having a diameter of 1 mm.

基材2は略平板状の薄層体7が肉厚方向に3層に積層されてなる積層構造に形成されている。プリント導電部3のうち基材2内層に形成されている部分は、基材2のうち最上層とそれに隣接する層との間、および、最下層とそれに隣接する層との層間に形成されている。プリント導電部3および接続導電部6は銅からなる。プリント導電部3のうち基材2の層間に形成されている部分は35μmの肉厚に形成されている。そして、この部分は、スルーホール5の全周にわたってスルーホール5の周縁に配置されている。本参考例においては、この基材2内層に形成されているプリント導電部3が強化部10を構成している。この強化部10は、スルーホール5外縁に隣接する部分が接続導電部6と接続されている。 The base material 2 is formed in a laminated structure in which a substantially flat thin layer body 7 is laminated in three layers in the thickness direction. The portion of the printed conductive part 3 formed in the inner layer of the substrate 2 is formed between the uppermost layer and the adjacent layer of the substrate 2 and between the lowermost layer and the adjacent layer. Yes. The printed conductive part 3 and the connecting conductive part 6 are made of copper. A portion of the printed conductive portion 3 formed between the layers of the base material 2 is formed with a thickness of 35 μm. This portion is disposed on the periphery of the through hole 5 over the entire circumference of the through hole 5. In the present reference example , the printed conductive portion 3 formed on the inner layer of the base material 2 constitutes the reinforced portion 10. In the reinforced portion 10, a portion adjacent to the outer edge of the through hole 5 is connected to the connection conductive portion 6.

参考例の素子装置1によると、スルーホール5の周縁に強化部10が設けられている。したがって、この素子装置1に端子を取付する際に、端子11がスルーホール5に強く弾接する場合にも、スルーホール5外縁は大きく変形し難く、接続導電部6やプリント導電部3および基板2にクラックが生じることはない。また、強化部10が導電部8の一部を構成していることから、簡易な構造で素子装置1の内部に導電部8と強化部10とがともに形成されて、素子装置1は安価に製造されたものとなる。本参考例の素子装置1の製造方法を以下に説明する。本参考例の素子装置1が製造される様子を模式的に表す図を図2〜図7に示す。 According to the element device 1 of the present reference example , the reinforcing portion 10 is provided on the periphery of the through hole 5. Therefore, when the terminal is attached to the element device 1, the outer edge of the through hole 5 is not easily deformed even when the terminal 11 is elastically contacted with the through hole 5. No cracks occur. In addition, since the reinforced portion 10 constitutes a part of the conductive portion 8, the conductive portion 8 and the reinforced portion 10 are formed together inside the element device 1 with a simple structure, and the element device 1 is inexpensive. It will be manufactured. A method for manufacturing the element device 1 of this reference example will be described below. 2 to 7 schematically show how the element device 1 of this reference example is manufactured.

先ず、図2に示すように略平板状の薄層体7を準備し、図3に示すようにこの薄層体7の表面に銅からなる導電層12を形成した。その後に、導電層12の表面を所望のパターンを持つマスク材(図示せず)で覆って導電層12をエッチングし、図4に示すように導電層12を所望のパターンに形成して1層の薄層体7とその上層に形成されたプリント導電部3とからなる積層体15を形成した。   First, as shown in FIG. 2, a substantially flat thin layer body 7 was prepared, and a conductive layer 12 made of copper was formed on the surface of the thin layer body 7 as shown in FIG. Thereafter, the surface of the conductive layer 12 is covered with a mask material (not shown) having a desired pattern, and the conductive layer 12 is etched to form the conductive layer 12 in a desired pattern as shown in FIG. The laminated body 15 which consists of the thin layer body 7 and the printed conductive part 3 formed thereon is formed.

次に、略平板状の薄層体16を別に準備し、図5に示すように、上述した工程で得られた2つの積層体15の間隙に、この薄層体16を接着材18で接着して、図6に示す多層積層体20を得た。   Next, a substantially flat thin layer body 16 is prepared separately, and the thin layer body 16 is bonded to the gap between the two laminates 15 obtained in the above-described process with an adhesive 18 as shown in FIG. Thus, the multilayer laminate 20 shown in FIG. 6 was obtained.

以上の工程で得られた多層積層体20にスルーホール5を切削形成し、さらにスルーホール5の外縁表面を銅メッキして接続導電部6を形成し、図7に示す本参考例の素子装置1を得た。 The through hole 5 is cut and formed in the multilayer laminate 20 obtained by the above process, and the outer peripheral surface of the through hole 5 is copper-plated to form the connection conductive portion 6, and the element device of this reference example shown in FIG. 1 was obtained.

参考例の素子装置は、上述したように非常に少ない工程で容易に製造することができるために、端子11を取付した際にスルーホール5の外縁が大きく変形し難い素子装置であっても製造コストが大きく低減されたものとなる。 Since the element device of this reference example can be easily manufactured with very few processes as described above, even if the outer edge of the through hole 5 is not easily deformed when the terminal 11 is attached, The manufacturing cost is greatly reduced.

参考例においては、素子装置1のスルーホール5の外縁が銅メッキからなる接続導電部6で覆われていたが、図8に示すように、接続導電部6を設けなくても良い。この場合には、スルーホール5の外縁には、基材2と、基材2の上層と下面とにプリント形成されているプリント導電部3と、強化部10とが表出する。そして、この素子装置1のスルーホール5に端子11が圧入されると、これらの導電部8が直接端子11と接触して電気的に接続される。この場合にも、スルーホール5の周縁に位置する基材2の内層に、硬質の強化部10が設けられていることから、スルーホール5の外縁が大きく変形することはなく、基材2や導電部8にクラックが生じることはない。 In this reference example , the outer edge of the through hole 5 of the element device 1 is covered with the connection conductive portion 6 made of copper plating, but the connection conductive portion 6 may not be provided as shown in FIG. In this case, at the outer edge of the through hole 5, the base material 2, the printed conductive portion 3 printed on the upper layer and the lower surface of the base material 2, and the reinforcing portion 10 are exposed. When the terminals 11 are press-fitted into the through holes 5 of the element device 1, the conductive portions 8 are in direct contact with and electrically connected to the terminals 11. Also in this case, since the hard reinforcing portion 10 is provided in the inner layer of the base material 2 located at the periphery of the through hole 5, the outer edge of the through hole 5 is not greatly deformed. The conductive portion 8 is not cracked.

また、本参考例においては強化部10は基材2の肉厚方向の2箇所に設けられていたが、例えば図9に示すように肉厚方向の1箇所にのみ設けても良い。この場合には、強化部10の肉厚は、基材2の肉厚方向の複数箇所に設ける場合よりも厚肉に形成することが望ましい。スルーホール5周縁の強度をより高めて、端子11を圧入する際にスルーホール5の外縁をより変形し難くするためである。 Moreover, in this reference example , although the reinforcement | strengthening part 10 was provided in two places of the thickness direction of the base material 2, you may provide only in one place of the thickness direction as shown, for example in FIG. In this case, it is desirable that the thickness of the reinforced portion 10 be thicker than that provided in a plurality of locations in the thickness direction of the substrate 2. This is because the strength of the periphery of the through hole 5 is further increased to make it difficult to deform the outer edge of the through hole 5 when the terminal 11 is press-fitted.

さらに、本参考例では強化部10と接続導電部6とを電気的に接続したが、本発明の素子装置は、例えば図10に示すように、強化部10を接続導電部6と接触しない程度にスルーホール5の外周側に配置して、強化部10と接続導電部6とを電気的に接続しないこの場合にも、上述した参考例と同様に、強化部10によってスルーホール5の周縁を強化されるために、端子11を圧入した際にもスルーホール5の外縁が大きく変形することが防止される。 Furthermore, in the present reference example , the reinforcing portion 10 and the connection conductive portion 6 are electrically connected. However, the element device of the present invention is such that, for example, the reinforcing portion 10 does not contact the connection conductive portion 6 as shown in FIG. The reinforcing portion 10 and the connection conductive portion 6 are not electrically connected by being arranged on the outer peripheral side of the through hole 5 . Also in this case, since the periphery of the through hole 5 is reinforced by the reinforcing portion 10 as in the above-described reference example , the outer edge of the through hole 5 is prevented from being greatly deformed even when the terminal 11 is press-fitted. The

参考例の素子装置を模式的に表す断面図である。It is sectional drawing which represents typically the element apparatus of a reference example . 参考例の素子装置を製造している様子を模式的に表す断面図である。It is sectional drawing which represents typically a mode that the element apparatus of a reference example is manufactured. 参考例の素子装置を製造している様子を模式的に表す断面図である。It is sectional drawing which represents typically a mode that the element apparatus of a reference example is manufactured. 参考例の素子装置を製造している様子を模式的に表す断面図である。It is sectional drawing which represents typically a mode that the element apparatus of a reference example is manufactured. 参考例の素子装置を製造している様子を模式的に表す断面図である。It is sectional drawing which represents typically a mode that the element apparatus of a reference example is manufactured. 参考例の素子装置を製造している様子を模式的に表す断面図である。It is sectional drawing which represents typically a mode that the element apparatus of a reference example is manufactured. 参考例の素子装置を製造している様子を模式的に表す断面図である。It is sectional drawing which represents typically a mode that the element apparatus of a reference example is manufactured. 参考例の素子装置の他の例を模式的に表す断面図である。It is sectional drawing which represents typically the other example of the element apparatus of a reference example . 参考例の素子装置の他の例を模式的に表す断面図である。It is sectional drawing which represents typically the other example of the element apparatus of a reference example . 本発明の素子装置の一例を模式的に表す断面図である。It is sectional drawing which represents typically an example of the element apparatus of this invention . 従来の素子装置を模式的に表す断面図である。It is sectional drawing which represents the conventional element device typically. 図11に示す従来の素子装置に端子を圧入取付している様子を模式的に表す断面図である。It is sectional drawing which represents typically a mode that the terminal is press-fitted and attached to the conventional element apparatus shown in FIG.

符号の説明Explanation of symbols

1:素子装置 2:基材 5:スルーホール 8:導電部 10:強化部 11:端子 1: Element device 2: Base material 5: Through hole 8: Conductive part 10: Reinforced part 11: Terminal

Claims (2)

基材と、該基材に形成されている導電部と、該基材に穿設され外縁の少なくとも一部に該導電部が表出しているスルーホールと、を備え、端子が該スルーホールに圧入されると該導電部が該端子に電気的に接続する素子装置であって、
該スルーホールの周縁に位置する該基材の内層には、硬質の強化部が該基材と一体形成され、
該強化部は、該導電部と接触しない程度に該スルーホールの外周側全周に配置されていることを特徴とする素子装置。
A base member, a conductive part formed in the base member, and a through hole formed in the base member and exposed at least at a part of the outer edge, and a terminal is provided in the through hole. An element device in which the conductive portion is electrically connected to the terminal when press-fitted,
In the inner layer of the base material located at the periphery of the through hole, a hard reinforcing portion is integrally formed with the base material,
The element device is characterized in that the reinforcing portion is arranged on the entire outer circumference side of the through-hole so as not to contact the conductive portion.
前記素子装置は、
複数の薄層体が積層され隣接する該薄層体同士が接着材で接着されてなる前記基材と、少なくとも1つの該薄層体の表面に形成されている前記強化部と、を持つ多層積層体と、
該多層積層体に形成されているスルーホールと、を持つ請求項1記載の素子装置。
The element device is:
A multilayer having the base material in which a plurality of thin layer bodies are laminated and the adjacent thin layer bodies are bonded together with an adhesive, and the reinforcing portion formed on the surface of at least one of the thin layer bodies A laminate,
The element device according to claim 1, further comprising a through hole formed in the multilayer laminate.
JP2004100224A 2004-03-30 2004-03-30 Element device Expired - Fee Related JP4512980B2 (en)

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