JP4500657B2 - パターン形成材料、並びにパターン形成装置及びパターン形成方法 - Google Patents

パターン形成材料、並びにパターン形成装置及びパターン形成方法 Download PDF

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Publication number
JP4500657B2
JP4500657B2 JP2004347638A JP2004347638A JP4500657B2 JP 4500657 B2 JP4500657 B2 JP 4500657B2 JP 2004347638 A JP2004347638 A JP 2004347638A JP 2004347638 A JP2004347638 A JP 2004347638A JP 4500657 B2 JP4500657 B2 JP 4500657B2
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Japan
Prior art keywords
pattern forming
light
group
copolymer
meth
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Active
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JP2004347638A
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English (en)
Japanese (ja)
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JP2006154556A (ja
Inventor
秀知 高橋
裕一 若田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei E Materials Corp
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Asahi Kasei E Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority to JP2004347638A priority Critical patent/JP4500657B2/ja
Application filed by Asahi Kasei E Materials Corp filed Critical Asahi Kasei E Materials Corp
Priority to PCT/JP2005/021589 priority patent/WO2006059532A1/ja
Priority to KR1020147036965A priority patent/KR101528784B1/ko
Priority to KR1020077011922A priority patent/KR101338091B1/ko
Priority to CN2005800470449A priority patent/CN101103310B/zh
Priority to KR1020137022216A priority patent/KR101516613B1/ko
Priority to TW094141826A priority patent/TWI460541B/zh
Priority to TW102140681A priority patent/TWI514076B/zh
Publication of JP2006154556A publication Critical patent/JP2006154556A/ja
Application granted granted Critical
Publication of JP4500657B2 publication Critical patent/JP4500657B2/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2004347638A 2004-11-30 2004-11-30 パターン形成材料、並びにパターン形成装置及びパターン形成方法 Active JP4500657B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2004347638A JP4500657B2 (ja) 2004-11-30 2004-11-30 パターン形成材料、並びにパターン形成装置及びパターン形成方法
KR1020147036965A KR101528784B1 (ko) 2004-11-30 2005-11-24 패턴 형성 재료, 및 패턴 형성 장치 및 패턴 형성 방법
KR1020077011922A KR101338091B1 (ko) 2004-11-30 2005-11-24 패턴 형성 재료, 및 패턴 형성 장치 및 패턴 형성 방법
CN2005800470449A CN101103310B (zh) 2004-11-30 2005-11-24 图案形成材料以及图案形成装置及图案形成方法
PCT/JP2005/021589 WO2006059532A1 (ja) 2004-11-30 2005-11-24 パターン形成材料、並びにパターン形成装置及びパターン形成方法
KR1020137022216A KR101516613B1 (ko) 2004-11-30 2005-11-24 패턴 형성 재료, 및 패턴 형성 장치 및 패턴 형성 방법
TW094141826A TWI460541B (zh) 2004-11-30 2005-11-29 圖案形成材料、及圖案形成裝置以及圖案形成方法
TW102140681A TWI514076B (zh) 2004-11-30 2005-11-29 圖案形成材料、及圖案形成裝置以及圖案形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004347638A JP4500657B2 (ja) 2004-11-30 2004-11-30 パターン形成材料、並びにパターン形成装置及びパターン形成方法

Publications (2)

Publication Number Publication Date
JP2006154556A JP2006154556A (ja) 2006-06-15
JP4500657B2 true JP4500657B2 (ja) 2010-07-14

Family

ID=36564966

Family Applications (1)

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JP2004347638A Active JP4500657B2 (ja) 2004-11-30 2004-11-30 パターン形成材料、並びにパターン形成装置及びパターン形成方法

Country Status (5)

Country Link
JP (1) JP4500657B2 (zh)
KR (3) KR101528784B1 (zh)
CN (1) CN101103310B (zh)
TW (2) TWI460541B (zh)
WO (1) WO2006059532A1 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006208730A (ja) * 2005-01-27 2006-08-10 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP4942969B2 (ja) * 2005-09-16 2012-05-30 富士フイルム株式会社 パターン形成材料及びパターン形成方法
TWI546574B (zh) * 2011-06-01 2016-08-21 Jsr股份有限公司 著色組成物、彩色濾光片及顯示元件
CN103918021B (zh) * 2012-09-18 2016-05-25 深圳市柔宇科技有限公司 大尺寸显示屏及其制造方法
JP7308014B2 (ja) * 2017-02-23 2023-07-13 旭化成株式会社 感光性樹脂組成物及び感光性樹脂積層体
JP6968633B2 (ja) * 2017-09-07 2021-11-17 東京応化工業株式会社 感光性組成物、及びそれに用いられる光重合開始剤
KR20200112551A (ko) * 2019-03-22 2020-10-05 주식회사 엘지화학 포토레지스트 제거용 스트리퍼 조성물 및 이를 이용한 포토레지스트의 박리방법
JP7327485B2 (ja) * 2019-08-14 2023-08-16 株式会社レゾナック 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP7437212B2 (ja) * 2020-03-26 2024-02-22 株式会社オーク製作所 露光装置および露光方法
KR102325273B1 (ko) * 2021-05-07 2021-11-10 황록연 카메라 렌즈용 스페이서 제조방법 및 이로부터 제조되는 스페이서

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214382A (ja) * 1998-11-16 2000-08-04 Canon Inc 光学系及びそれを用いた投影装置
JP2001159817A (ja) * 1999-12-03 2001-06-12 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP2001318461A (ja) * 2000-05-11 2001-11-16 Nichigo Morton Co Ltd 感光性樹脂組成物およびそれを用いてなる感光性フィルム
JP2004126375A (ja) * 2002-10-04 2004-04-22 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP2004317851A (ja) * 2003-04-17 2004-11-11 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造方法及びプリント配線板の製造方法
JP2004335639A (ja) * 2003-05-06 2004-11-25 Fuji Photo Film Co Ltd 投影露光装置
JP2004335692A (ja) * 2003-05-07 2004-11-25 Fuji Photo Film Co Ltd 投影露光装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3931467A1 (de) * 1989-09-21 1991-04-04 Hoechst Ag Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske
JPH04240854A (ja) * 1991-01-25 1992-08-28 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
JPH07199458A (ja) * 1993-07-22 1995-08-04 E I Du Pont De Nemours & Co プリント回路のための多層、光画像形成性、水性処理可能なエレメント
JP4448707B2 (ja) * 2003-02-06 2010-04-14 富士フイルム株式会社 感光性平版印刷版
JP4450689B2 (ja) * 2003-07-31 2010-04-14 富士フイルム株式会社 露光ヘッド
JP4708785B2 (ja) * 2003-12-26 2011-06-22 富士フイルム株式会社 画像露光方法および装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214382A (ja) * 1998-11-16 2000-08-04 Canon Inc 光学系及びそれを用いた投影装置
JP2001159817A (ja) * 1999-12-03 2001-06-12 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP2001318461A (ja) * 2000-05-11 2001-11-16 Nichigo Morton Co Ltd 感光性樹脂組成物およびそれを用いてなる感光性フィルム
JP2004126375A (ja) * 2002-10-04 2004-04-22 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP2004317851A (ja) * 2003-04-17 2004-11-11 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造方法及びプリント配線板の製造方法
JP2004335639A (ja) * 2003-05-06 2004-11-25 Fuji Photo Film Co Ltd 投影露光装置
JP2004335692A (ja) * 2003-05-07 2004-11-25 Fuji Photo Film Co Ltd 投影露光装置

Also Published As

Publication number Publication date
KR101516613B1 (ko) 2015-05-04
KR20150009609A (ko) 2015-01-26
KR101528784B1 (ko) 2015-06-15
TW201407283A (zh) 2014-02-16
TWI514076B (zh) 2015-12-21
KR101338091B1 (ko) 2013-12-06
CN101103310B (zh) 2012-03-14
KR20130101590A (ko) 2013-09-13
TWI460541B (zh) 2014-11-11
WO2006059532A1 (ja) 2006-06-08
JP2006154556A (ja) 2006-06-15
KR20070084581A (ko) 2007-08-24
TW200627067A (en) 2006-08-01
CN101103310A (zh) 2008-01-09

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