JP4495498B2 - 基板処理装置および半導体装置の製造方法 - Google Patents

基板処理装置および半導体装置の製造方法 Download PDF

Info

Publication number
JP4495498B2
JP4495498B2 JP2004096886A JP2004096886A JP4495498B2 JP 4495498 B2 JP4495498 B2 JP 4495498B2 JP 2004096886 A JP2004096886 A JP 2004096886A JP 2004096886 A JP2004096886 A JP 2004096886A JP 4495498 B2 JP4495498 B2 JP 4495498B2
Authority
JP
Japan
Prior art keywords
exhaust
heater unit
processing chamber
exhaust ports
ceiling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2004096886A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005286051A5 (enExample
JP2005286051A (ja
Inventor
真一 島田
敏光 宮田
威憲 岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc, Kokusai Denki Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP2004096886A priority Critical patent/JP4495498B2/ja
Publication of JP2005286051A publication Critical patent/JP2005286051A/ja
Publication of JP2005286051A5 publication Critical patent/JP2005286051A5/ja
Application granted granted Critical
Publication of JP4495498B2 publication Critical patent/JP4495498B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Landscapes

  • Furnace Details (AREA)
JP2004096886A 2004-03-29 2004-03-29 基板処理装置および半導体装置の製造方法 Expired - Lifetime JP4495498B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004096886A JP4495498B2 (ja) 2004-03-29 2004-03-29 基板処理装置および半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004096886A JP4495498B2 (ja) 2004-03-29 2004-03-29 基板処理装置および半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JP2005286051A JP2005286051A (ja) 2005-10-13
JP2005286051A5 JP2005286051A5 (enExample) 2007-10-25
JP4495498B2 true JP4495498B2 (ja) 2010-07-07

Family

ID=35184102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004096886A Expired - Lifetime JP4495498B2 (ja) 2004-03-29 2004-03-29 基板処理装置および半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JP4495498B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100782484B1 (ko) 2006-07-13 2007-12-05 삼성전자주식회사 열처리 설비
JP4791303B2 (ja) * 2006-09-19 2011-10-12 株式会社日立国際電気 基板処理装置およびこの装置に用いられる冷却手段、ｉｃの製造方法
KR100932965B1 (ko) * 2007-02-09 2009-12-21 가부시키가이샤 히다치 고쿠사이 덴키 단열 구조체, 가열 장치, 가열 시스템, 기판 처리 장치 및반도체 장치의 제조 방법
JP5721219B2 (ja) * 2010-07-09 2015-05-20 株式会社日立国際電気 基板処理装置、半導体装置の製造方法及び加熱装置
JP5743746B2 (ja) * 2011-06-27 2015-07-01 東京エレクトロン株式会社 熱処理炉及び熱処理装置
JP5274696B2 (ja) * 2012-07-12 2013-08-28 株式会社日立国際電気 断熱構造体、加熱装置、加熱システム、基板処理装置および半導体装置の製造方法
JP6255267B2 (ja) * 2014-02-06 2017-12-27 株式会社日立国際電気 基板処理装置、加熱装置、天井断熱体及び半導体装置の製造方法
CN105960701B (zh) * 2014-03-20 2019-04-05 株式会社国际电气 衬底处理装置、顶棚部及半导体器件的制造方法
WO2020026445A1 (ja) * 2018-08-03 2020-02-06 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置およびデバイス製造方法
CN114395804B (zh) * 2022-01-14 2022-12-02 浙江大学杭州国际科创中心 一种导电型碳化硅衬底加工方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05102045A (ja) * 1991-10-11 1993-04-23 Furukawa Electric Co Ltd:The 気相成長装置
US6005225A (en) * 1997-03-28 1999-12-21 Silicon Valley Group, Inc. Thermal processing apparatus
JP2001257172A (ja) * 2000-03-09 2001-09-21 Hitachi Kokusai Electric Inc 半導体製造装置

Also Published As

Publication number Publication date
JP2005286051A (ja) 2005-10-13

Similar Documents

Publication Publication Date Title
JP5089401B2 (ja) 断熱構造体、加熱装置、加熱システム、基板処理装置および半導体装置の製造方法
JP4365017B2 (ja) 熱処理装置の降温レート制御方法および熱処理装置
TWI404819B (zh) 成膜裝置及成膜方法
JP6255267B2 (ja) 基板処理装置、加熱装置、天井断熱体及び半導体装置の製造方法
JP5090097B2 (ja) 基板処理装置、半導体装置の製造方法及び基板処理方法
JP4495498B2 (ja) 基板処理装置および半導体装置の製造方法
JP4404620B2 (ja) 基板処理装置および半導体装置の製造方法
KR102255315B1 (ko) 기판 처리장치 및 기판 처리방법
JP4104070B2 (ja) 基板処理装置及び半導体装置の製造方法及び加熱装置及び断熱材
JP4669465B2 (ja) 基板処理装置及び半導体装置の製造方法及び加熱装置及び断熱材
JP3907546B2 (ja) 縦型熱処理装置および半導体集積回路装置の製造方法
JP4495717B2 (ja) 基板処理装置及び半導体装置の製造方法
JP5274696B2 (ja) 断熱構造体、加熱装置、加熱システム、基板処理装置および半導体装置の製造方法
JP2006319175A (ja) 基板処理装置
JP4185395B2 (ja) 基板処理装置及び半導体装置の製造方法
JP4791303B2 (ja) 基板処理装置およびこの装置に用いられる冷却手段、ｉｃの製造方法
JP2006093411A (ja) 基板処理装置
JP2005093911A (ja) 基板処理装置
JP2007221019A (ja) 基板処理装置
JP2011103469A (ja) 基板処理装置及び半導体装置の製造方法及び加熱装置及び断熱材
JP2012089603A (ja) 基板処理装置
JP2008311587A (ja) 基板処理装置
JPH04369215A (ja) 縦型電気炉
JP3118760B2 (ja) 熱処理装置
JP2006032409A (ja) 基板処理装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070328

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070907

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090918

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090929

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091118

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100105

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100302

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100323

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100409

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 4495498

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130416

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140416

Year of fee payment: 4

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

EXPY Cancellation because of completion of term