JP4491447B2 - レーザビーム・紫外線照射周辺露光装置およびその方法 - Google Patents

レーザビーム・紫外線照射周辺露光装置およびその方法 Download PDF

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Publication number
JP4491447B2
JP4491447B2 JP2006246269A JP2006246269A JP4491447B2 JP 4491447 B2 JP4491447 B2 JP 4491447B2 JP 2006246269 A JP2006246269 A JP 2006246269A JP 2006246269 A JP2006246269 A JP 2006246269A JP 4491447 B2 JP4491447 B2 JP 4491447B2
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JP
Japan
Prior art keywords
substrate
laser beam
moving
irradiation
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006246269A
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English (en)
Japanese (ja)
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JP2007148362A (ja
Inventor
晴康 劔持
博明 佐藤
泰人 池田
昌人 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
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Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Priority to JP2006246269A priority Critical patent/JP4491447B2/ja
Priority to TW095137696A priority patent/TW200719094A/zh
Priority to KR1020060108027A priority patent/KR100931714B1/ko
Publication of JP2007148362A publication Critical patent/JP2007148362A/ja
Application granted granted Critical
Publication of JP4491447B2 publication Critical patent/JP4491447B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
JP2006246269A 2005-11-04 2006-09-12 レーザビーム・紫外線照射周辺露光装置およびその方法 Expired - Fee Related JP4491447B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006246269A JP4491447B2 (ja) 2005-11-04 2006-09-12 レーザビーム・紫外線照射周辺露光装置およびその方法
TW095137696A TW200719094A (en) 2005-11-04 2006-10-13 Laser beam/uv-irradiation peripheral exposure apparatus and method therefor
KR1020060108027A KR100931714B1 (ko) 2005-11-04 2006-11-02 레이저 빔·자외선조사 주변노광장치 및 그 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005321256 2005-11-04
JP2006246269A JP4491447B2 (ja) 2005-11-04 2006-09-12 レーザビーム・紫外線照射周辺露光装置およびその方法

Publications (2)

Publication Number Publication Date
JP2007148362A JP2007148362A (ja) 2007-06-14
JP4491447B2 true JP4491447B2 (ja) 2010-06-30

Family

ID=38209776

Family Applications (1)

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JP2006246269A Expired - Fee Related JP4491447B2 (ja) 2005-11-04 2006-09-12 レーザビーム・紫外線照射周辺露光装置およびその方法

Country Status (3)

Country Link
JP (1) JP4491447B2 (enExample)
KR (1) KR100931714B1 (enExample)
TW (1) TW200719094A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101006747B1 (ko) * 2008-07-24 2011-01-10 (주)미래컴퍼니 솔라셀 패널 제조장치 및 제조방법
JP2011013512A (ja) * 2009-07-03 2011-01-20 Orc Manufacturing Co Ltd 周辺露光装置
JP5747305B2 (ja) * 2011-03-02 2015-07-15 株式会社ブイ・テクノロジー 露光装置及びマイクロレンズアレイ構造体
KR102225208B1 (ko) * 2019-05-13 2021-03-09 디아이티 주식회사 반도체 표면처리 시스템 및 방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000294500A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP2000294501A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP3091460B1 (ja) * 1999-12-10 2000-09-25 東レエンジニアリング株式会社 露光装置
JP4342663B2 (ja) * 1999-12-20 2009-10-14 株式会社オーク製作所 周辺露光装置
JP2001201862A (ja) * 2000-01-19 2001-07-27 Nikon Corp 周辺露光装置
JP3321733B2 (ja) * 2000-09-20 2002-09-09 東レエンジニアリング株式会社 露光装置
JP2002365811A (ja) * 2001-06-08 2002-12-18 Mitsubishi Corp フォトレジスト塗布基板の露光方法及び装置
KR20040044554A (ko) * 2001-10-25 2004-05-28 토레이 엔지니어링 컴퍼니, 리미티드 레이저빔에 의한 식별코드의 마킹 방법 및 장치
JP3547418B2 (ja) * 2001-10-25 2004-07-28 三菱商事株式会社 レーザビームによる液晶パネルのマーキング方法及び装置
KR20060053045A (ko) * 2004-11-13 2006-05-19 삼성전자주식회사 갈바노미터 스캐너를 이용한 레이저 마킹 장치 및 방법
JP4664102B2 (ja) * 2005-03-18 2011-04-06 東レエンジニアリング株式会社 露光装置及び露光方法

Also Published As

Publication number Publication date
TW200719094A (en) 2007-05-16
KR100931714B1 (ko) 2009-12-14
JP2007148362A (ja) 2007-06-14
TWI350948B (enExample) 2011-10-21
KR20070048616A (ko) 2007-05-09

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