TW200719094A - Laser beam/uv-irradiation peripheral exposure apparatus and method therefor - Google Patents
Laser beam/uv-irradiation peripheral exposure apparatus and method thereforInfo
- Publication number
- TW200719094A TW200719094A TW095137696A TW95137696A TW200719094A TW 200719094 A TW200719094 A TW 200719094A TW 095137696 A TW095137696 A TW 095137696A TW 95137696 A TW95137696 A TW 95137696A TW 200719094 A TW200719094 A TW 200719094A
- Authority
- TW
- Taiwan
- Prior art keywords
- laser beam
- substrate
- moving
- irradiation
- exposure apparatus
- Prior art date
Links
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005321256 | 2005-11-04 | ||
JP2006246269A JP4491447B2 (ja) | 2005-11-04 | 2006-09-12 | レーザビーム・紫外線照射周辺露光装置およびその方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200719094A true TW200719094A (en) | 2007-05-16 |
TWI350948B TWI350948B (zh) | 2011-10-21 |
Family
ID=38209776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095137696A TW200719094A (en) | 2005-11-04 | 2006-10-13 | Laser beam/uv-irradiation peripheral exposure apparatus and method therefor |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4491447B2 (zh) |
KR (1) | KR100931714B1 (zh) |
TW (1) | TW200719094A (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101006747B1 (ko) * | 2008-07-24 | 2011-01-10 | (주)미래컴퍼니 | 솔라셀 패널 제조장치 및 제조방법 |
JP2011013512A (ja) * | 2009-07-03 | 2011-01-20 | Orc Manufacturing Co Ltd | 周辺露光装置 |
JP5747305B2 (ja) * | 2011-03-02 | 2015-07-15 | 株式会社ブイ・テクノロジー | 露光装置及びマイクロレンズアレイ構造体 |
KR102225208B1 (ko) * | 2019-05-13 | 2021-03-09 | 디아이티 주식회사 | 반도체 표면처리 시스템 및 방법 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000294501A (ja) * | 1999-04-09 | 2000-10-20 | Nikon Corp | 周辺露光装置及び方法 |
JP2000294500A (ja) * | 1999-04-09 | 2000-10-20 | Nikon Corp | 周辺露光装置及び方法 |
JP3091460B1 (ja) * | 1999-12-10 | 2000-09-25 | 東レエンジニアリング株式会社 | 露光装置 |
JP4342663B2 (ja) * | 1999-12-20 | 2009-10-14 | 株式会社オーク製作所 | 周辺露光装置 |
JP2001201862A (ja) * | 2000-01-19 | 2001-07-27 | Nikon Corp | 周辺露光装置 |
JP3321733B2 (ja) * | 2000-09-20 | 2002-09-09 | 東レエンジニアリング株式会社 | 露光装置 |
JP2002365811A (ja) * | 2001-06-08 | 2002-12-18 | Mitsubishi Corp | フォトレジスト塗布基板の露光方法及び装置 |
US20040241340A1 (en) * | 2001-10-25 | 2004-12-02 | Kenji Sato | Method and device for marking identification code by laser beam |
JP3547418B2 (ja) * | 2001-10-25 | 2004-07-28 | 三菱商事株式会社 | レーザビームによる液晶パネルのマーキング方法及び装置 |
KR20060053045A (ko) * | 2004-11-13 | 2006-05-19 | 삼성전자주식회사 | 갈바노미터 스캐너를 이용한 레이저 마킹 장치 및 방법 |
JP4664102B2 (ja) * | 2005-03-18 | 2011-04-06 | 東レエンジニアリング株式会社 | 露光装置及び露光方法 |
-
2006
- 2006-09-12 JP JP2006246269A patent/JP4491447B2/ja not_active Expired - Fee Related
- 2006-10-13 TW TW095137696A patent/TW200719094A/zh not_active IP Right Cessation
- 2006-11-02 KR KR1020060108027A patent/KR100931714B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20070048616A (ko) | 2007-05-09 |
KR100931714B1 (ko) | 2009-12-14 |
TWI350948B (zh) | 2011-10-21 |
JP4491447B2 (ja) | 2010-06-30 |
JP2007148362A (ja) | 2007-06-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |