TWI350948B - - Google Patents

Info

Publication number
TWI350948B
TWI350948B TW095137696A TW95137696A TWI350948B TW I350948 B TWI350948 B TW I350948B TW 095137696 A TW095137696 A TW 095137696A TW 95137696 A TW95137696 A TW 95137696A TW I350948 B TWI350948 B TW I350948B
Authority
TW
Taiwan
Application number
TW095137696A
Other languages
Chinese (zh)
Other versions
TW200719094A (en
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW200719094A publication Critical patent/TW200719094A/zh
Application granted granted Critical
Publication of TWI350948B publication Critical patent/TWI350948B/zh

Links

TW095137696A 2005-11-04 2006-10-13 Laser beam/uv-irradiation peripheral exposure apparatus and method therefor TW200719094A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005321256 2005-11-04
JP2006246269A JP4491447B2 (ja) 2005-11-04 2006-09-12 レーザビーム・紫外線照射周辺露光装置およびその方法

Publications (2)

Publication Number Publication Date
TW200719094A TW200719094A (en) 2007-05-16
TWI350948B true TWI350948B (enExample) 2011-10-21

Family

ID=38209776

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095137696A TW200719094A (en) 2005-11-04 2006-10-13 Laser beam/uv-irradiation peripheral exposure apparatus and method therefor

Country Status (3)

Country Link
JP (1) JP4491447B2 (enExample)
KR (1) KR100931714B1 (enExample)
TW (1) TW200719094A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101006747B1 (ko) * 2008-07-24 2011-01-10 (주)미래컴퍼니 솔라셀 패널 제조장치 및 제조방법
JP2011013512A (ja) * 2009-07-03 2011-01-20 Orc Manufacturing Co Ltd 周辺露光装置
JP5747305B2 (ja) * 2011-03-02 2015-07-15 株式会社ブイ・テクノロジー 露光装置及びマイクロレンズアレイ構造体
KR102225208B1 (ko) * 2019-05-13 2021-03-09 디아이티 주식회사 반도체 표면처리 시스템 및 방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000294500A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP2000294501A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP3091460B1 (ja) * 1999-12-10 2000-09-25 東レエンジニアリング株式会社 露光装置
JP4342663B2 (ja) * 1999-12-20 2009-10-14 株式会社オーク製作所 周辺露光装置
JP2001201862A (ja) * 2000-01-19 2001-07-27 Nikon Corp 周辺露光装置
JP3321733B2 (ja) * 2000-09-20 2002-09-09 東レエンジニアリング株式会社 露光装置
JP2002365811A (ja) * 2001-06-08 2002-12-18 Mitsubishi Corp フォトレジスト塗布基板の露光方法及び装置
KR20040044554A (ko) * 2001-10-25 2004-05-28 토레이 엔지니어링 컴퍼니, 리미티드 레이저빔에 의한 식별코드의 마킹 방법 및 장치
JP3547418B2 (ja) * 2001-10-25 2004-07-28 三菱商事株式会社 レーザビームによる液晶パネルのマーキング方法及び装置
KR20060053045A (ko) * 2004-11-13 2006-05-19 삼성전자주식회사 갈바노미터 스캐너를 이용한 레이저 마킹 장치 및 방법
JP4664102B2 (ja) * 2005-03-18 2011-04-06 東レエンジニアリング株式会社 露光装置及び露光方法

Also Published As

Publication number Publication date
JP4491447B2 (ja) 2010-06-30
TW200719094A (en) 2007-05-16
KR100931714B1 (ko) 2009-12-14
JP2007148362A (ja) 2007-06-14
KR20070048616A (ko) 2007-05-09

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees