JP4478302B2 - 干渉装置及びそれを搭載した半導体露光装置 - Google Patents

干渉装置及びそれを搭載した半導体露光装置 Download PDF

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Publication number
JP4478302B2
JP4478302B2 JP2000199435A JP2000199435A JP4478302B2 JP 4478302 B2 JP4478302 B2 JP 4478302B2 JP 2000199435 A JP2000199435 A JP 2000199435A JP 2000199435 A JP2000199435 A JP 2000199435A JP 4478302 B2 JP4478302 B2 JP 4478302B2
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JP
Japan
Prior art keywords
path length
optical path
fizeau
light beam
light
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Expired - Lifetime
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JP2000199435A
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English (en)
Japanese (ja)
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JP2002013908A (ja
JP2002013908A5 (enExample
Inventor
千種 大内
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000199435A priority Critical patent/JP4478302B2/ja
Priority to US09/893,636 priority patent/US6661522B2/en
Publication of JP2002013908A publication Critical patent/JP2002013908A/ja
Priority to US10/693,880 priority patent/US6961132B2/en
Publication of JP2002013908A5 publication Critical patent/JP2002013908A5/ja
Application granted granted Critical
Publication of JP4478302B2 publication Critical patent/JP4478302B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062—Active error reduction, i.e. varying with time
    • G01B9/02064—Active error reduction, i.e. varying with time by particular adjustment of coherence gate, i.e. adjusting position of zero path difference in low coherence interferometry
    • G01B9/02065—Active error reduction, i.e. varying with time by particular adjustment of coherence gate, i.e. adjusting position of zero path difference in low coherence interferometry using a second interferometer before or after measuring interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP2000199435A 2000-06-30 2000-06-30 干渉装置及びそれを搭載した半導体露光装置 Expired - Lifetime JP4478302B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000199435A JP4478302B2 (ja) 2000-06-30 2000-06-30 干渉装置及びそれを搭載した半導体露光装置
US09/893,636 US6661522B2 (en) 2000-06-30 2001-06-29 Interference system and semiconductor exposure apparatus having the same
US10/693,880 US6961132B2 (en) 2000-06-30 2003-10-28 Interference system and semiconductor exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000199435A JP4478302B2 (ja) 2000-06-30 2000-06-30 干渉装置及びそれを搭載した半導体露光装置

Publications (3)

Publication Number Publication Date
JP2002013908A JP2002013908A (ja) 2002-01-18
JP2002013908A5 JP2002013908A5 (enExample) 2007-08-16
JP4478302B2 true JP4478302B2 (ja) 2010-06-09

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ID=18697454

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000199435A Expired - Lifetime JP4478302B2 (ja) 2000-06-30 2000-06-30 干渉装置及びそれを搭載した半導体露光装置

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Country Link
US (2) US6661522B2 (enExample)
JP (1) JP4478302B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4478302B2 (ja) * 2000-06-30 2010-06-09 キヤノン株式会社 干渉装置及びそれを搭載した半導体露光装置
DE10123844A1 (de) * 2001-04-09 2002-10-17 Bosch Gmbh Robert Interferometrische Messvorrichtung
JP2004271305A (ja) * 2003-03-07 2004-09-30 Canon Inc 測定装置、露光装置及びデバイス製造方法
JP4387359B2 (ja) * 2003-09-26 2009-12-16 カール・ツァイス・エスエムティー・アーゲー 光学特性の測定方法、及び波面検出系を備えた投影露光システム
JP2005156403A (ja) * 2003-11-27 2005-06-16 Canon Inc シアリング干渉を利用した測定方法及び装置、それを利用した露光方法及び装置、並びに、デバイス製造方法
JP2006112903A (ja) * 2004-10-14 2006-04-27 Olympus Corp 紫外光光源ユニット及びこれを用いた干渉計並びに干渉計の調整方法
JP2006319064A (ja) * 2005-05-11 2006-11-24 Canon Inc 測定装置、露光方法及び装置
JP2007036193A (ja) * 2005-06-23 2007-02-08 Canon Inc 露光装置
JP2008108852A (ja) 2006-10-24 2008-05-08 Canon Inc 投影露光装置、光学部品及びデバイス製造方法
JP5932306B2 (ja) * 2011-11-16 2016-06-08 ギガフォトン株式会社 極端紫外光生成装置
CN102749188B (zh) * 2012-07-19 2014-12-17 苏州慧利仪器有限责任公司 应用于光学系统的检测装置
CN103697822B (zh) * 2013-12-26 2016-09-14 北京信息科技大学 光学三角测头的光路系统
CN103940588B (zh) * 2014-03-21 2016-06-29 哈尔滨工程大学 基于光学相干偏振测量的偏振衰落抑制装置的抑制方法
CN103900797B (zh) * 2014-03-28 2016-05-04 哈尔滨工程大学 带有光程扫描位置和速度校正的光学相干域偏振测量装置
CN104006948B (zh) * 2014-06-12 2016-06-22 天津大学 基于多峰分裂周期解调保偏光纤偏振耦合点位置的方法
CN105758329A (zh) * 2014-12-18 2016-07-13 财团法人金属工业研究发展中心 光学式表面轮廓扫描系统
CN116105594A (zh) * 2022-12-20 2023-05-12 上海现代先进超精密制造中心有限公司 一种适应检测面反射率实现高干涉对比度的菲索干涉仪

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4627731A (en) * 1985-09-03 1986-12-09 United Technologies Corporation Common optical path interferometric gauge
US4938596A (en) * 1989-01-05 1990-07-03 The University Of Rochester Phase conjugate, common path interferometer
US5815268A (en) * 1996-06-28 1998-09-29 Raytheon Company Lithographic lens wavefront and distortion tester
US5898501A (en) * 1996-07-25 1999-04-27 Nikon Corporation Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens
US6650421B2 (en) * 1997-08-26 2003-11-18 Nikon Corporation Method and apparatus for inspecting optical device
US6037579A (en) * 1997-11-13 2000-03-14 Biophotonics Information Laboratories, Ltd. Optical interferometer employing multiple detectors to detect spatially distorted wavefront in imaging of scattering media
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
JP3796368B2 (ja) * 1999-03-24 2006-07-12 キヤノン株式会社 投影露光装置
JP3796369B2 (ja) * 1999-03-24 2006-07-12 キヤノン株式会社 干渉計を搭載した投影露光装置
US6266147B1 (en) * 1999-10-14 2001-07-24 The Regents Of The University Of California Phase-shifting point diffraction interferometer phase grating designs
JP4478302B2 (ja) * 2000-06-30 2010-06-09 キヤノン株式会社 干渉装置及びそれを搭載した半導体露光装置

Also Published As

Publication number Publication date
JP2002013908A (ja) 2002-01-18
US20040085548A1 (en) 2004-05-06
US6961132B2 (en) 2005-11-01
US20020024005A1 (en) 2002-02-28
US6661522B2 (en) 2003-12-09

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