JP4464097B2 - 配線構造および露光装置 - Google Patents

配線構造および露光装置 Download PDF

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Publication number
JP4464097B2
JP4464097B2 JP2003337253A JP2003337253A JP4464097B2 JP 4464097 B2 JP4464097 B2 JP 4464097B2 JP 2003337253 A JP2003337253 A JP 2003337253A JP 2003337253 A JP2003337253 A JP 2003337253A JP 4464097 B2 JP4464097 B2 JP 4464097B2
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JP
Japan
Prior art keywords
fixed component
thin plate
component
exposure apparatus
wiring structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003337253A
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English (en)
Japanese (ja)
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JP2005108960A5 (enExample
JP2005108960A (ja
Inventor
隆夫 宇梶
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003337253A priority Critical patent/JP4464097B2/ja
Priority to US10/950,409 priority patent/US7294906B2/en
Publication of JP2005108960A publication Critical patent/JP2005108960A/ja
Publication of JP2005108960A5 publication Critical patent/JP2005108960A5/ja
Priority to US11/865,887 priority patent/US7955938B2/en
Application granted granted Critical
Publication of JP4464097B2 publication Critical patent/JP4464097B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP2003337253A 2003-09-29 2003-09-29 配線構造および露光装置 Expired - Fee Related JP4464097B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003337253A JP4464097B2 (ja) 2003-09-29 2003-09-29 配線構造および露光装置
US10/950,409 US7294906B2 (en) 2003-09-29 2004-09-28 Wiring technique
US11/865,887 US7955938B2 (en) 2003-09-29 2007-10-02 Wiring technique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003337253A JP4464097B2 (ja) 2003-09-29 2003-09-29 配線構造および露光装置

Publications (3)

Publication Number Publication Date
JP2005108960A JP2005108960A (ja) 2005-04-21
JP2005108960A5 JP2005108960A5 (enExample) 2006-11-09
JP4464097B2 true JP4464097B2 (ja) 2010-05-19

Family

ID=34533135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003337253A Expired - Fee Related JP4464097B2 (ja) 2003-09-29 2003-09-29 配線構造および露光装置

Country Status (2)

Country Link
US (2) US7294906B2 (enExample)
JP (1) JP4464097B2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4464097B2 (ja) * 2003-09-29 2010-05-19 キヤノン株式会社 配線構造および露光装置
JP5020662B2 (ja) * 2006-05-26 2012-09-05 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
JP5318235B2 (ja) * 2006-05-26 2013-10-16 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
DE102009005340A1 (de) * 2009-01-16 2010-07-22 Carl Zeiss Smt Ag EUV-Lithographieanlage und Kabel dafür
US8754779B2 (en) 2010-08-18 2014-06-17 Snap-On Incorporated System and method for displaying input data on a remote display device
US8983785B2 (en) 2010-08-18 2015-03-17 Snap-On Incorporated System and method for simultaneous display of waveforms generated from input signals received at a data acquisition device
US8560168B2 (en) 2010-08-18 2013-10-15 Snap-On Incorporated System and method for extending communication range and reducing power consumption of vehicle diagnostic equipment
US9330507B2 (en) 2010-08-18 2016-05-03 Snap-On Incorporated System and method for selecting individual parameters to transition from text-to-graph or graph-to-text
US8463953B2 (en) 2010-08-18 2013-06-11 Snap-On Incorporated System and method for integrating devices for servicing a device-under-service
US9633492B2 (en) 2010-08-18 2017-04-25 Snap-On Incorporated System and method for a vehicle scanner to automatically execute a test suite from a storage card
US9117321B2 (en) 2010-08-18 2015-08-25 Snap-On Incorporated Method and apparatus to use remote and local control modes to acquire and visually present data
JP6640040B2 (ja) 2016-06-23 2020-02-05 株式会社ニューフレアテクノロジー 伝熱板および描画装置
EP3577651A1 (en) * 2017-02-06 2019-12-11 Kodak Alaris Inc. Method for creating audio tracks for accompanying visual imagery
JP2020046581A (ja) * 2018-09-20 2020-03-26 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06267486A (ja) 1993-03-17 1994-09-22 Toshiba Corp 荷電ビーム装置
JP3167090B2 (ja) * 1995-03-10 2001-05-14 キヤノン株式会社 基板受け渡し装置及び半導体製造装置
JP3814359B2 (ja) * 1996-03-12 2006-08-30 キヤノン株式会社 Ｘ線投影露光装置及びデバイス製造方法
US6002987A (en) * 1996-03-26 1999-12-14 Nikon Corporation Methods to control the environment and exposure apparatus
JPH11307430A (ja) * 1998-04-23 1999-11-05 Canon Inc 露光装置およびデバイス製造方法ならびに駆動装置
JP2000049066A (ja) * 1998-07-27 2000-02-18 Canon Inc 露光装置およびデバイス製造方法
JP2001093821A (ja) 1999-09-24 2001-04-06 Toshiba Corp 製造装置組立部品、製造装置組立部品の製造方法、半導体製造装置及び電子ビーム露光装置
JP3870002B2 (ja) * 2000-04-07 2007-01-17 キヤノン株式会社 露光装置
JP4383626B2 (ja) * 2000-04-13 2009-12-16 キヤノン株式会社 位置決め装置および露光装置
JP2002280283A (ja) * 2001-03-16 2002-09-27 Canon Inc 基板処理装置
JP2004356222A (ja) * 2003-05-27 2004-12-16 Canon Inc ステージ装置及びその制御方法、露光装置、並びにデバイス製造方法
JP4464097B2 (ja) * 2003-09-29 2010-05-19 キヤノン株式会社 配線構造および露光装置

Also Published As

Publication number Publication date
US7294906B2 (en) 2007-11-13
US20080030699A1 (en) 2008-02-07
US20050095818A1 (en) 2005-05-05
JP2005108960A (ja) 2005-04-21
US7955938B2 (en) 2011-06-07

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