JP4459683B2 - Maskless exposure system - Google Patents

Maskless exposure system Download PDF

Info

Publication number
JP4459683B2
JP4459683B2 JP2004104992A JP2004104992A JP4459683B2 JP 4459683 B2 JP4459683 B2 JP 4459683B2 JP 2004104992 A JP2004104992 A JP 2004104992A JP 2004104992 A JP2004104992 A JP 2004104992A JP 4459683 B2 JP4459683 B2 JP 4459683B2
Authority
JP
Japan
Prior art keywords
exposure
spatial light
light modulator
camera
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2004104992A
Other languages
Japanese (ja)
Other versions
JP2005292323A (en
Inventor
義久 大坂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Via Mechanics Ltd
Original Assignee
Hitachi Via Mechanics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Via Mechanics Ltd filed Critical Hitachi Via Mechanics Ltd
Priority to JP2004104992A priority Critical patent/JP4459683B2/en
Publication of JP2005292323A publication Critical patent/JP2005292323A/en
Application granted granted Critical
Publication of JP4459683B2 publication Critical patent/JP4459683B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Description

本発明は、複数のミラーを備える空間的光変調器と露光対象物とを相対的に移動させながら前記ミラーを制御して、前記露光対象物上に所望のパターンを露光させるマスクレス露光装置に関する。 The present invention, spatial light modulator and an exposure object by controlling the mirror while relatively moving on the object of exposure to expose a desired pattern luma Sukuresu exposure apparatus having a plurality of mirrors About.

近年、パターンマスクを使用することなく、空間的光変調器を用いてプリント基板、半導体、液晶表面の感光性ドライフィルムまたは液状レジスト等の露光対象物（以下、「基板」という。）に直接露光する技術が実用化されている。   In recent years, an exposure object (hereinafter referred to as “substrate”) such as a printed circuit board, a semiconductor, a photosensitive dry film on a liquid crystal surface, or a liquid resist is directly exposed using a spatial light modulator without using a pattern mask. This technology has been put into practical use.

高精細な露光を行うためには、空間的光変調器と露光対象物および画像処理装置のカメラの位置を精度よく求めておく必要がある。そこで、従来は、予めカメラの空間的光変調器に対する位置を高精度に定めておき、露光対象物上に設けられた位置合わせマークをカメラにより撮像し、空間的光変調器と露光対象物との位置関係を求めてから露光していた。
特開平１１−３２０９６８号公報 In order to perform high-definition exposure, it is necessary to accurately obtain the positions of the spatial light modulator, the exposure object, and the camera of the image processing apparatus. Therefore, conventionally, the position of the camera relative to the spatial light modulator is determined with high accuracy in advance, and the alignment mark provided on the exposure object is imaged by the camera, and the spatial light modulator, the exposure object, and The exposure was performed after obtaining the positional relationship.
JP-A-11-320968

ところで、空間的光変調器における複数のミラーの相対位置は予め把握できるが、カメラの光軸と空間的光変調器のミラーのいずれかの中心との距離を直接測定することは困難である。   By the way, although the relative positions of the plurality of mirrors in the spatial light modulator can be grasped in advance, it is difficult to directly measure the distance between the optical axis of the camera and the center of any one of the mirrors of the spatial light modulator.

そこで、従来は、空間的光変調器により露光対象物を露光した後、露光箇所をカメラで測定することによりカメラの光軸と空間的光変調器との距離を求めていた。   Therefore, conventionally, after exposing an exposure object with a spatial light modulator, the distance between the optical axis of the camera and the spatial light modulator is obtained by measuring the exposure location with a camera.

しかし、現像処理前の露光箇所をカメラで確認することは困難である。このため、露光させた露光対象物を露光させた位置から外して現像し、現像した露光対象物を再び元の位置に戻して露光箇所を測定しなければならず、作業性が低かった。また、露光対象物を露光させた位置から移動させるため、位置決め精度を向上させることが困難であった。さらに、温度や外部応力等によりカメラの空間的光変調器に対する位置が変化して、露光位置精度が低下することがあった。   However, it is difficult to confirm the exposure location before development processing with a camera. For this reason, the exposed exposure object must be removed from the exposed position and developed, and the developed exposure object must be returned to the original position to measure the exposed portion, resulting in poor workability. Further, since the exposure object is moved from the exposed position, it is difficult to improve the positioning accuracy. Furthermore, the position of the camera relative to the spatial light modulator may change due to temperature, external stress, or the like, and the exposure position accuracy may deteriorate.

また、複数の空間的光変調器を協調させて露光する場合、温度や外部応力等により空間的光変調器相互の位置が変化して、露光されるパターンの合わせ精度が低下した。   Further, when exposure is performed in cooperation with a plurality of spatial light modulators, the positions of the spatial light modulators change due to temperature, external stress, and the like, and the alignment accuracy of the exposed pattern is lowered.

本発明の目的は、上記課題を解決し、カメラと空間的光変調器あるいは複数の空間的光変調器の相対的な位置を容易かつ精度よく求めることができ、加工精度を向上させることができるマスクレス露光装置を提供するにある。 The object of the present invention is to solve the above-mentioned problems, and to easily and accurately obtain the relative position of the camera and the spatial light modulator or the plurality of spatial light modulators, and to improve the processing accuracy. It is to provide a mask-less exposure equipment.

上記した課題を解決するため、本発明は、複数のミラーを備える空間的光変調器と、前記空間的光変調器側に配置されたカメラと、前記空間的光変調器と露光対象物を相対的に移動させる移動手段と、を備え、前記空間的光変調器と前記露光対象物とを相対的に移動させながら前記ミラーを制御して、前記露光対象物上に所望のパターンを露光させるマスクレス露光装置において、前記空間的光変調器を複数設けると共に、前記複数の空間的光変調器を、隣接する前記複数の空間的光変調器の互いの露光範囲が一部重なるようにして配置し、予め前記カメラの中心座標を求めて、前記露光対象物に光源の光に感光して変色するフォトクロミック感材を塗布しておき、前記露光対象物の位置決め用基準マークから所定の距離だけシフトした点に前記移動手段を移動させて前記空間的光変調器のデータ基準点に一致させ、前記空間的光変調器により前記露光対象物の位置決め用基準マークから所定の距離だけシフトした点を露光し、この露光した点を前記カメラの中心に位置決めし、露光した点の前記カメラの中心に対する画素数のずれを求めることにより前記空間的光変調器のデータ基準点を求め、他の空間的光変調器に対しても、同様の手順によりそれぞれの空間的光変調器のデータ基準点を求め、前記複数の空間的光変調器のうち、隣接する空間的光変調器の露光範囲が重なる部分について一方の空間的光変調器の描画データの前記重なる部分にオフのデータを加えて、前記隣接する空間的光変調器の露光範囲が重ならないように制御して露光することを特徴とする。 To solve the problems described above, the onset Ming, spatial and optical modulator, a camera arranged in the spatial light modulator side, the spatial light modulator and exposure light object comprising a plurality of mirrors Moving means for relatively moving, and exposing the desired pattern on the exposure object by controlling the mirror while relatively moving the spatial light modulator and the exposure object In the maskless exposure apparatus to be provided, a plurality of the spatial light modulators are provided, and the plurality of spatial light modulators are arranged such that the exposure ranges of the adjacent spatial light modulators partially overlap each other. Place the camera in advance, obtain the center coordinates of the camera, and apply a photochromic sensitive material that changes color by exposure to light from the light source to the exposure object, and a predetermined distance from the reference mark for positioning the exposure object To the shifted point The moving means is moved so as to coincide with the data reference point of the spatial light modulator, and a point shifted by a predetermined distance from the positioning reference mark of the exposure object is exposed by the spatial light modulator. The exposure point is positioned at the center of the camera, and a data reference point of the spatial light modulator is obtained by obtaining a deviation in the number of pixels from the center of the exposure point to the camera center, and other spatial light modulators are obtained. Also, the data reference point of each spatial light modulator is obtained by the same procedure, and one of the plurality of spatial light modulators is overlapped with the portion where the exposure ranges of adjacent spatial light modulators overlap. Off data is added to the overlapping portion of the drawing data of the optical light modulator, and exposure is performed so that the exposure ranges of the adjacent spatial light modulators do not overlap.

カメラの光軸および各露光装置のデータ基準点を精度よく求めることができるので、精度に優れる露光をすることができる。   Since the optical axis of the camera and the data reference point of each exposure apparatus can be obtained with high accuracy, exposure with excellent accuracy can be performed.

図１は本発明の全体構成図である。
コントロールユニット１は、シーケンス制御部１ａ、描画データ制御部１ｂ、位置制御部１ｃおよび補正値計算部１ｄとから構成され、露光装置全体の動作制御、空間的光変調器の制御、ステージの位置制御およびカメラからの入力に基づく補正制御を行う。 FIG. 1 is an overall configuration diagram of the present invention.
The control unit 1 includes a sequence control unit 1a, a drawing data control unit 1b, a position control unit 1c, and a correction value calculation unit 1d, and controls the operation of the entire exposure apparatus, controls the spatial light modulator, and controls the position of the stage. Further, correction control based on input from the camera is performed.

ドライバー回路２は、描画データ制御部１ｂから出力されたパターンの描画データに基づいて空間的光変調器３に制御データ信号（オンオフ信号）を出力する。   The driver circuit 2 outputs a control data signal (on / off signal) to the spatial light modulator 3 based on the pattern drawing data output from the drawing data control unit 1b.

空間的光変調器３には、微細なミラー（図示を省略）がＹ方向に複数個、Ｘ方向に１列または複数列配置されている。各ミラーはドライバー回路２からオン信号を受けると予め定められた角度だけ回転し、光源４から供給される光をステージ８上に載置された露光対象物（以下、「ワーク」という。）９上にスポット状に照射する。   In the spatial light modulator 3, a plurality of fine mirrors (not shown) are arranged in the Y direction and one or a plurality of rows in the X direction. Each mirror rotates by a predetermined angle when receiving an ON signal from the driver circuit 2, and the exposure object (hereinafter referred to as “work”) 9 placed on the stage 8 with the light supplied from the light source 4. Irradiate a spot on the top.

光源４は、一定波長の光を空間的光変調器３に供給する。   The light source 4 supplies light having a constant wavelength to the spatial light modulator 3.

カメラ５は、撮像した像を画素単位の電気信号に変換し、画像処理装置６に出力する。   The camera 5 converts the captured image into an electrical signal in units of pixels and outputs it to the image processing device 6.

画像処理装置６は、カメラ５から出力された電気信号を画像処理し、その結果を補正値計算部１ｄに出力する。   The image processing device 6 performs image processing on the electrical signal output from the camera 5 and outputs the result to the correction value calculation unit 1d.

ステージ制御装置（ＣＮＣ）７はステージ８の位置を制御する。ステージ８は原点Ｏ（０，０）を基準としてＸＹ方向にそれぞれ１μｍ単位で位置決めされる。   A stage controller (CNC) 7 controls the position of the stage 8. The stage 8 is positioned in units of 1 μm in the XY directions with reference to the origin O (0, 0).

次に、カメラと空間的光変調器の位置を確認する確認手順について説明する。
図２は、露光装置における露光部の構成を模式的に示す図であり、（ａ）は平面図、（ｂ）は正面図である。
なお、ステージ８上に設けられた位置決め用基準マークＡの中心Ａは、Ｏ（０，０）を原点とする固定座標系の原点Ｏに配置されている。また、原点がＯである座標系におけるカメラ５の中心Ｃの設計上の座標は（ｘｃ，ｙｃ）であり、空間的光変調器３のデータ基準点Ｅ（空間的光変調器３の端部に配置されたミラーの中心）の設計上の座標は（ｘｅ，ｙｅ）である。 Next, a confirmation procedure for confirming the positions of the camera and the spatial light modulator will be described.
2A and 2B are diagrams schematically showing a configuration of an exposure unit in the exposure apparatus, where FIG. 2A is a plan view and FIG. 2B is a front view.
The center A of the positioning reference mark A provided on the stage 8 is disposed at the origin O of the fixed coordinate system having O (0, 0) as the origin. The design coordinate of the center C of the camera 5 in the coordinate system where the origin is O is (xc, yc), and the data reference point E of the spatial light modulator 3 (the end of the spatial light modulator 3) (Xe, ye) is a design coordinate of the center of the mirror arranged at (x).

はじめに、中心Ｃの実際の座標（ｘｃ，ｙｃ）を求める。   First, the actual coordinates (xc, yc) of the center C are obtained.

先ず、ステージ８をＸ方向にｘｃ、Ｙ方向にｙｃ移動させ、カメラ５により位置決め用基準マークＡを撮像する。画像処理装置６は、カメラ５から出力された電気信号を画像処理し、中心Ａの中心Ｃに対するＸ方向のずれｇｘ１とＹ方向のずれｇｙ１を画素数で求め、補正計算部１ｄに出力する。   First, the stage 8 is moved xc in the X direction and yc in the Y direction, and the positioning reference mark A is imaged by the camera 5. The image processing device 6 performs image processing on the electrical signal output from the camera 5, obtains a deviation gx1 in the X direction and a deviation gy1 in the Y direction with respect to the center C of the center A by the number of pixels, and outputs it to the correction calculation unit 1 d.

次に、ステージ８をＸ方向に１ｍｍ、Ｙ方向に１ｍｍ移動させた後、再び位置決め用基準マークＡを撮像し、中心Ａの中心Ｃに対するＸ方向のずれｇｘ２とＹ方向のずれｇｙ２を画素で求め、補正計算部１ｄに出力する。   Next, after the stage 8 is moved 1 mm in the X direction and 1 mm in the Y direction, the positioning reference mark A is imaged again, and the X-direction deviation gx2 and the Y-direction deviation gy2 of the center A with respect to the center C are detected by pixels. Obtained and output to the correction calculation unit 1d.

補正計算部１ｄは、式１，２により画素単位をステージの移動単位に換算する換算係数ｋｘ、ｋｙを求めてから、式３，４により、Ｘｃ，Ｙｃを求める。
ｋｘ＝１／（ｇｘ２−ｇｘ１）・・・（式１）
ｋｙ＝１／（ｇｙ２−ｇｙ１）・・・（式２）
Ｘｃ＝ｘｃ＋ｇｘ１・ｋｘ・・・（式３）
Ｙｃ＝ｙｃ＋ｇｙ１・ｋｙ・・・（式４）
以上の手順によりカメラ５の中心Ｃの座標が正確に求められる。 The correction calculation unit 1d obtains conversion coefficients kx and ky for converting the pixel unit to the stage movement unit by Equations 1 and 2, and then obtains Xc and Yc by Equations 3 and 4.
kx = 1 / (gx2-gx1) (Formula 1)
ky = 1 / (gy2-gy1) (Formula 2)
Xc = xc + gx1 · kx (Expression 3)
Yc = yc + gy1 · ky (Formula 4)
The coordinates of the center C of the camera 5 are accurately obtained by the above procedure.

次に、データ基準点Ｅの実際の座標（Ｘｅ、Ｙｅ）を求める。
予め、ワーク９表面の後述するＭ点の周囲には光源４からの光により感光して変色するフォトクロミック感材を塗布しておく。
描画データ制御部１ｂは中心ＡからＹ方向にｙｍずれたＭ点に測定用マークを描画するためのデータをドライバー回路２に送り、ステージ８を移動させて、Ｍ点を設計上のデータ基準点Ｅに一致させた後、空間的光変調器３により、ワーク９を露光する。次に、ステージ８を移動させて、露光したＭ点を中心Ｃに位置決めし、露光したＭ点の中心Ｃに対する画素数のずれを求める。 Next, the actual coordinates (Xe, Ye) of the data reference point E are obtained.
In advance, a photochromic photosensitive material that is exposed to light from the light source 4 and changes its color is applied to the periphery of the later-described M point on the surface of the work 9.
The drawing data control unit 1b sends data for drawing a measurement mark to the M point shifted from the center A in the Y direction to the driver circuit 2, moves the stage 8, and sets the M point as a design data reference point. After matching with E, the work 9 is exposed by the spatial light modulator 3. Next, the stage 8 is moved to position the exposed M point at the center C, and the deviation of the number of pixels with respect to the center C of the exposed M point is obtained.

いま、Ｍ点の中心Ｃに対するＸ方向の画素数のずれがｇｘ３、Ｙ方向の画素数のずれがｇｙ３であったとすると、式５，６によりデータ基準点Ｅの実際の座標（Ｘｅ、Ｙｅ）を求めることができる。
Ｘｅ＝ｘｅ＋ｇｘ３・ｋｘ・・・（式５）
Ｙｅ＝ｙｅ＋ｇｙ３・ｋｙ・・・（式６）
以上の手順により、カメラ５の中心Ｃおよびデータ基準点Ｅの実際の座標が求められたので、例えば、ワーク９の表面に配置された加工用基準マークの座標をカメラ５で読み取り、空間的光変調器３により露光すれば、精度に優れるパターンを描画することができる。 Now, assuming that the deviation of the number of pixels in the X direction with respect to the center C of the M point is gx3 and the deviation of the number of pixels in the Y direction is gy3, the actual coordinates (Xe, Ye) of the data reference point E according to equations 5 and 6 Can be requested.
Xe = xe + gx3 · kx (Formula 5)
Ye = ye + gy3 · ky (formula 6)
With the above procedure, the actual coordinates of the center C and the data reference point E of the camera 5 are obtained. For example, the coordinates of the processing reference mark placed on the surface of the workpiece 9 are read by the camera 5 to obtain spatial light. If exposure is performed by the modulator 3, a pattern with excellent accuracy can be drawn.

なお、上記確認手順を、予め定める時間毎に定期的にあるいは室温の変化に応じて行うようにすると、加工精度を高水準に維持することができる。   In addition, if the confirmation procedure is performed periodically at predetermined time intervals or according to changes in room temperature, the processing accuracy can be maintained at a high level.

次に、空間的光変調器を複数配置する場合について説明する。
図３は、本発明に係る他の露光装置における露光部の構成を模式的に示す平面図であり、図２における露光装置３に加えて露光装置３１，３２が配置されている。なお、露光装置３１，３２以外の構成要素および寸法関係は図２と同じである。また、露光装置３、露光装置３１および露光装置３２はそれぞれ別の支持部材に支持されている。 Next, a case where a plurality of spatial light modulators are arranged will be described.
FIG. 3 is a plan view schematically showing a configuration of an exposure unit in another exposure apparatus according to the present invention, in which exposure apparatuses 31 and 32 are arranged in addition to the exposure apparatus 3 in FIG. The constituent elements other than the exposure apparatuses 31 and 32 and the dimensional relationship are the same as those in FIG. Further, the exposure apparatus 3, the exposure apparatus 31, and the exposure apparatus 32 are supported by separate support members, respectively.

露光装置３、３１、３２のデータ基準点の座標Ｅ（Ｘｅ、Ｙｅ）、Ｅ１（Ｘｅ１、Ｙｅ１）、Ｅ２（Ｘｅ２、Ｙｅ２）は、上記の場合と同様に、露光装置３，３１，３２により露光を行い、露光箇所をカメラ５により撮像し、画像処理することにより求めることができる。   The coordinates E (Xe, Ye), E1 (Xe1, Ye1), E2 (Xe2, Ye2) of the data reference points of the exposure apparatuses 3, 31, 32 are determined by the exposure apparatuses 3, 31, 32, as in the above case. It can be obtained by performing exposure, imaging the exposed portion with the camera 5, and image processing.

ところで、露光装置３、露光装置３１および露光装置３２がそれぞれ別の部材に支持されている場合、支持部材の熱変形により、隣接する空間的光変調器の間隔が変化する。
そこで、露光装置３、露光装置３１および露光装置３２を、同図に示すように、予め露光装置３と露光装置３１および露光装置３１と露光装置３２の露光範囲が、それぞれ一部（ｄｗ）重なるように配置しておく。 By the way, when the exposure apparatus 3, the exposure apparatus 31, and the exposure apparatus 32 are each supported by another member, the space | interval of an adjacent spatial light modulator changes with the thermal deformation of a support member.
Therefore, as shown in the figure, the exposure apparatus 3, the exposure apparatus 31, and the exposure apparatus 32 are partially overlapped in advance (dw) with the exposure ranges of the exposure apparatus 3, the exposure apparatus 31, and the exposure apparatus 31 and the exposure apparatus 32, respectively. Arrange so that.

また、露光装置３、３１、３２の露光範囲をそれぞれｗとすると、露光装置３の露光範囲をＹｅからＹｅ１の直前（すなわち、Ｙｅ１に最も近いミラー）まで、露光装置３１の露光範囲をＹｅ１からＹｅ２の直前（すなわち、Ｙｅ２に最も近いミラー）まで、露光装置３２の露光範囲をＹｅ２から予め定める範囲（図示の場合、ｗ−ｄｗ）までとする。   Also, assuming that the exposure ranges of the exposure apparatuses 3, 31, and 32 are w, respectively, the exposure range of the exposure apparatus 3 is from Ye to immediately before Ye1 (that is, the mirror closest to Ye1), and the exposure range of the exposure apparatus 31 is from Ye1. The exposure range of the exposure apparatus 32 is set from Ye2 to a predetermined range (w-dw in the figure) until just before Ye2 (that is, the mirror closest to Ye2).

このようにすると、露光装置３と露光装置３１あるいは露光装置３１と露光装置３２の相対位置がＹ方向にずれても露光箇所は重複しない。したがって、品質に優れる露光結果を得ることができる。   In this way, even if the relative positions of the exposure apparatus 3 and the exposure apparatus 31 or the exposure apparatus 31 and the exposure apparatus 32 are shifted in the Y direction, the exposed portions do not overlap. Therefore, an exposure result with excellent quality can be obtained.

なお、露光装置３、３１、３２に指示する露光データとしては、各露光装置の露光範囲毎に出力してもよいし、あるいは例えば、露光装置３に対する露光データとして、ＹｅからＹｅ１の直前までの範囲の描画データにＹｅ１からｗまでのオフのデータ（オフデータ。図中に斜線で示す。）を加えたものとしてもよい。   In addition, as exposure data instruct | indicating to the exposure apparatuses 3, 31, and 32, you may output for every exposure range of each exposure apparatus, for example, as exposure data with respect to the exposure apparatus 3, from Ye to immediately before Ye1 It is also possible to add the off data (off data, indicated by diagonal lines in the figure) from Ye1 to w to the drawing data in the range.

また、露光装置３、３１、３２はＸ方向にずれらして配置されているので、ステージをＸ方向に移動させて露光する場合、露光装置３、３１、３２の露光開始時期は異なる。そこで、図４に示すように、例えば、露光装置３１に対してはＸｅからＸｅ１の範囲に対してオフデータを、露光装置３２に対してはＸｅからＸｅ２の範囲に対してオフデータを、それぞれ指示するようにすると、露光開始のタイミングを同一にすることができる。   Further, since the exposure apparatuses 3, 31, and 32 are arranged so as to be shifted in the X direction, when the exposure is performed by moving the stage in the X direction, the exposure start timing of the exposure apparatuses 3, 31, and 32 is different. Therefore, as shown in FIG. 4, for example, with respect to the exposure apparatus 31, off data for the range of Xe to Xe1, and for the exposure apparatus 32, off data for the range of Xe to Xe2, respectively. When instructed, the exposure start timing can be made the same.

なお、ワーク９の露光範囲が露光装置３、３１、３２が一度に露光できる幅よりも広い場合には、図示の領域を露光した後、ステージ８をステージをＹ方向に移動させて露光する。   If the exposure range of the workpiece 9 is wider than the exposure apparatus 3, 31, 32 can be exposed at one time, the stage 8 is moved in the Y direction after exposure of the illustrated area.

なお、上記では、感光物質としてフォトクロミック感材を用いたが、蓄光物質等、露光により変色する物質であればよい。   In the above description, the photochromic light-sensitive material is used as the photosensitive material. However, any material that changes color by exposure, such as a phosphorescent material, may be used.

また、位置決め用基準マークＡの中心Ａを座標系の原点Ｏに配置したが、他の場所であってもよい。   Further, although the center A of the positioning reference mark A is arranged at the origin O of the coordinate system, it may be at another location.

本発明の全体構成図である。1 is an overall configuration diagram of the present invention. 本発明に係る露光装置における露光部の構成を模式的に示す図である。It is a figure which shows typically the structure of the exposure part in the exposure apparatus which concerns on this invention. 本発明に係る他の露光装置における露光部の構成を模式的に示す平面図である。It is a top view which shows typically the structure of the exposure part in the other exposure apparatus which concerns on this invention. 本発明における描画データの構成を説明する図である。It is a figure explaining the structure of the drawing data in this invention.

符号の説明Explanation of symbols

３ 空間的光変調器
５ カメラ
９ 露光対象物（ワーク） 3 Spatial light modulator 5 Camera 9 Object to be exposed (work)

Claims (1)

複数のミラーを備える空間的光変調器と、前記空間的光変調器側に配置されたカメラと、前記空間的光変調器と露光対象物を相対的に移動させる移動手段と、を備え、前記空間的光変調器と前記露光対象物とを相対的に移動させながら前記ミラーを制御して、前記露光対象物上に所望のパターンを露光させるマスクレス露光装置において、
前記空間的光変調器を複数設けると共に、前記複数の空間的光変調器を、隣接する前記複数の空間的光変調器の互いの露光範囲が一部重なるようにして配置し、
予め前記カメラの中心座標を求めて、前記露光対象物に光源の光に感光して変色するフォトクロミック感材を塗布しておき、前記露光対象物の位置決め用基準マークから所定の距離だけシフトした点に前記移動手段を移動させて前記空間的光変調器のデータ基準点に一致させ、前記空間的光変調器により前記露光対象物の位置決め用基準マークから所定の距離だけシフトした点を露光し、この露光した点を前記カメラの中心に位置決めし、露光した点の前記カメラの中心に対する画素数のずれを求めることにより前記空間的光変調器のデータ基準点を求め、他の空間的光変調器に対しても、同様の手順によりそれぞれの空間的光変調器のデータ基準点を求め、
前記複数の空間的光変調器のうち、隣接する空間的光変調器の露光範囲が重なる部分について一方の空間的光変調器の描画データの前記重なる部分にオフのデータを加えて、前記隣接する空間的光変調器の露光範囲が重ならないように制御して露光することを特徴とするマスクレス露光装置。 Includes a spatial light modulator comprising a plurality of mirrors, a camera arranged in the spatial light modulator side, a moving means for moving the spatial light modulator and exposure light object, a, In a maskless exposure apparatus that controls the mirror while relatively moving the spatial light modulator and the exposure object to expose a desired pattern on the exposure object.
A plurality of the spatial light modulators are provided, and the plurality of spatial light modulators are arranged so that the exposure ranges of the adjacent spatial light modulators partially overlap each other.
The center coordinate of the camera is obtained in advance, and a photochromic sensitive material that changes color by being exposed to light from a light source is applied to the exposure target, and shifted by a predetermined distance from the reference mark for positioning the exposure target. Moving the moving means to match the data reference point of the spatial light modulator, and exposing the point shifted by a predetermined distance from the reference mark for positioning of the exposure object by the spatial light modulator, This exposed point is positioned at the center of the camera, and a data reference point of the spatial light modulator is obtained by obtaining a deviation of the number of pixels from the exposed point with respect to the center of the camera. For the data reference point of each spatial light modulator by the same procedure,
Among the plurality of spatial light modulators, an OFF data is added to the overlapping portion of the drawing data of one spatial light modulator for a portion where the exposure ranges of adjacent spatial light modulators overlap, and the adjacent spatial light modulators are adjacent to each other. A maskless exposure apparatus, wherein exposure is performed while controlling so that the exposure ranges of the spatial light modulator do not overlap.
JP2004104992A 2004-03-31 2004-03-31 Maskless exposure system Expired - Lifetime JP4459683B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004104992A JP4459683B2 (en) 2004-03-31 2004-03-31 Maskless exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004104992A JP4459683B2 (en) 2004-03-31 2004-03-31 Maskless exposure system

Publications (2)

Publication Number Publication Date
JP2005292323A JP2005292323A (en) 2005-10-20
JP4459683B2 true JP4459683B2 (en) 2010-04-28

Family

ID=35325342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004104992A Expired - Lifetime JP4459683B2 (en) 2004-03-31 2004-03-31 Maskless exposure system

Country Status (1)

Country Link
JP (1) JP4459683B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4195413B2 (en) * 2004-04-28 2008-12-10 株式会社 インテグレイテッド ソリューションズ Exposure apparatus and pattern forming method
JP5392110B2 (en) * 2010-01-25 2014-01-22 Ｔｄｋ株式会社 Electrode forming method for chip type electronic component
WO2013056238A2 (en) 2011-10-14 2013-04-18 University Of Utah Research Foundation Programmable photolithography
US9269149B2 (en) * 2014-05-08 2016-02-23 Orbotech Ltd. Calibration of a direct-imaging system

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3530692B2 (en) * 1996-11-06 2004-05-24 キヤノン株式会社 Scanning exposure apparatus and device manufacturing method using the same
JP2001308001A (en) * 1999-10-05 2001-11-02 Nikon Corp Latent image forming method, latent image detecting method, exposure method, device aligner, resist and substrate
JP2001244176A (en) * 2000-02-28 2001-09-07 Nikon Corp Method of exposure and aligner, and method of manufacturing microdevice
JP2001330963A (en) * 2000-05-19 2001-11-30 Sharp Corp Alignet, manufacturing method using the same and electronic component
JP2003080604A (en) * 2001-09-10 2003-03-19 Fuji Photo Film Co Ltd Laminate shaping apparatus
JP4279053B2 (en) * 2002-06-07 2009-06-17 富士フイルム株式会社 Exposure head and exposure apparatus

Also Published As

Publication number Publication date
JP2005292323A (en) 2005-10-20

Similar Documents

Publication Publication Date Title
JP5630634B2 (en) Exposure method and apparatus, and device manufacturing method
TWI690777B (en) Exposure system, exposure method and manufacturing method of display panel substrate
KR101678039B1 (en) Maskless exposure apparatus, method for determining start position and orientation of exposure scan in maskless lithography
JP2010191127A (en) Exposure apparatus, exposure method, and method for manufacturing panel substrate for display
JP2018500605A (en) Maskless exposure apparatus having alignment
KR101764169B1 (en) Maskless exposure apparatus and method for getting spot beam position using the same
JP2011158718A (en) Exposure apparatus, exposure method and method for manufacturing panel substrate for display
JP4459683B2 (en) Maskless exposure system
KR100396146B1 (en) Position fitting apparatus and methods
JP2012242630A (en) Exposure apparatus, exposure method, manufacturing method for display panel substrate and inspection method for exposure apparatus
JP2023164945A (en) Exposure apparatus and alignment method
JP5687165B2 (en) Proximity exposure apparatus, substrate positioning method for proximity exposure apparatus, and display panel substrate manufacturing method
JP2013195778A (en) Exposure device, exposure method, and method of manufacturing display panel substrate
JP5288977B2 (en) Exposure apparatus and device manufacturing method
JP5305967B2 (en) Exposure apparatus, exposure method, and manufacturing method of display panel substrate
JP2005197338A (en) Aligning method and treatment equipment
JP2012008243A (en) Exposure device and exposure method, display panel board manufacturing apparatus, and display panel board manufacturing method
JP4184983B2 (en) Alignment method
JP2011007975A (en) Exposure device, exposure method, and method of manufacturing display panel substrate
JPH09129547A (en) Scanning-type exposure system, device and manufacture thereof
JP5430335B2 (en) Exposure apparatus, exposure method, and manufacturing method of display panel substrate
JP5166681B2 (en) Step-type proximity exposure system
US9395631B2 (en) Multi-beam pattern generators employing yaw correction when writing upon large substrates, and associated methods
JP2022124335A (en) Lithography device and article production method
JPH10162145A (en) Arithmetic unit for calculating correction data of center coordinate data of registered pattern in pattern matching method, and laser plotting device using it

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060828

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090417

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090519

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090721

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090915

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091116

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100126

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100210

R150 Certificate of patent or registration of utility model

Ref document number: 4459683

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130219

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140219

Year of fee payment: 4

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313532

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250