JP4433987B2 - Radiation image conversion panel - Google Patents

Description

  The present invention relates to a radiation image (hereinafter also referred to as radiation image) conversion panel using a stimulable phosphor (hereinafter also simply referred to as a phosphor), and more specifically, vapor deposition with improved adhesion. The present invention relates to a radiation image conversion panel having a photostimulable phosphor layer formed by a method (gas phase method).

  In recent years, a method of imaging a radiation image by a radiation image conversion panel using a photostimulable phosphor has been used.

  The stimulable phosphor layer of the radiation image conversion panel used in this radiation image conversion method is required to have high radiation absorption rate and light conversion rate, good image graininess, and high sharpness. .

  Various adjustments have been made so far in order to improve sensitivity and image quality by adjusting a plurality of factors related to sensitivity and image quality. Among them, for example, formation as a means for improving the sharpness of a radiographic image Attempts have been made to improve sensitivity and sharpness by controlling the shape of the photostimulable phosphor.

  As one of these attempts, for example, Japanese Patent Application Laid-Open No. 61-142497 discloses a stimulable fluorescence comprising a fine pseudo-columnar block formed by depositing a stimulable phosphor on a support having a fine uneven pattern. There is a method using a body layer.

  Further, as described in JP-A-61-142500, a crack between columnar blocks obtained by depositing a photostimulable phosphor on a support having a fine pattern was further developed by applying a shock treatment. A method of using a radiation image conversion panel having a photostimulable phosphor layer, and further a surface of the photostimulable phosphor layer formed on the surface of a support as described in JP-A-62-39737. A method using a radiation image conversion panel in which a pseudo-columnar shape is formed by cracking from the side, and further, as described in JP-A-62-110200, a photostimulable phosphor layer having a cavity by vapor deposition on the upper surface of a support There has also been proposed a method in which a cavity is grown by heat treatment and a crack is formed after the formation.

Also, radiation image conversion having a photostimulable phosphor layer on a support (hereinafter referred to as a substrate) formed by a vapor deposition method on which elongated columnar crystals having a certain inclination with respect to the normal direction of the support are formed. A panel has been proposed. (For example, see Patent Document 1)
In attempts to control the shape of these photostimulable phosphor layers, all of the photostimulable phosphor layers are made columnar to suppress the lateral diffusion of photostimulated excitation light (or photostimulated luminescence). Since it can reach the support surface while repeating reflection at the crack (columnar crystal) interface, it has a feature that the sharpness of an image by stimulated emission can be remarkably increased.

In the radiation image conversion panel having the photostimulable phosphor layer formed by vapor phase growth (deposition), the relationship between the sensitivity and the sharpness is improved, but the pseudo-columnar or columnar photostimulable phosphor crystal is also used. Attempts have been made to further improve the image quality by suppressing reflection and refraction at the layer interface in the radiation image conversion panel by further combining a low refractive index layer with the phosphor layer composed of the above. (For example, see Patent Document 2)
However, the photostimulable phosphor layer made of these columnar photostimulable phosphor crystals has an elongated columnar crystal formed on the substrate, so that the adhesion (adhesion) to the substrate may not be sufficient. After forming, it was easy to peel off and it was necessary to improve durability.
JP-A-2-58000 Japanese Patent Laid-Open No. 1-1131498

  Accordingly, the present invention has been made in view of the above problems, and an object of the present invention is to provide a radiation image conversion panel having improved adhesion (adhesiveness) between a support and a stimulable phosphor layer. is there.

  The above object of the present invention is achieved by the following configurations.

( 1 )
And SP values met the radiographic image conversion panel having a fluorescent material layer on a have and a glass transition point aluminum substrate coated with a polymer which is 30 to 100 ° C. 8.0 to 12.0, at least one layer the radiation image conversion panel fluorescent body layer is characterized by being formed to a thickness of 50μm~20mm by vapor deposition method (gas phase method).
(2)
2. The radiation image conversion panel according to 1, wherein the phosphor is a compound represented by the following general formula (1).
General formula (1)
M ¹ X · aM ² X ′ ₂ · bM ³ X ″ ₃ : eA
[Wherein, M ¹ is at least one alkali metal atom selected from Li, Na, K, Rb and Cs, and M ² is at least one selected from Li, Na, K, Rb and Cs other than M ^1. M ³ is selected from Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Al, Ga and In At least one trivalent metal atom, wherein X, X ′ and X ″ are each at least one halogen atom selected from F atom, Cl atom, Br atom and I atom, and A is Eu, Tb , In, Ce, Tm, Dy, Pr, Ho, Nd, Yb, Er, Gd, Lu, Sm, Y, Tl, Na, Ag, Cu and Mg, and at least one metal atom, a, b, e It represents a numerical value in the range of 0 ≦ a <0.5, 0 ≦ b <0.5, and 0 <e ≦ 0.2.]
(3)
The radiation image conversion panel according to 1 or 2, wherein the polymer is a polyester resin.

  The radiation image conversion panel according to the present invention has an excellent effect in adhesion (adhesiveness) between the support and the stimulable phosphor layer.

  Hereinafter, the present invention will be described in more detail.

  The present invention is a radiation characterized in that at least one layer is formed on a support by a vapor deposition method (vapor phase method) to a thickness of 50 μm to 20 mm, and the support is an aluminum substrate coated with a polymer. This is an image conversion panel, and the object of the present invention can be achieved by these configurations.

  Examples of the polymer to be coated with the polymer include proteins such as gelatin, derivative gelatin, colloidal albumin, and casein; cellulose compounds such as carboxymethylcellulose, diacetylcellulose, and triacetylcellulose; sugar derivatives such as agar, sodium alginate, and starch derivatives. Synthetic hydrophilic colloids such as polyvinyl alcohol, poly-N-vinyl pyrrolidone, polyester resins, polyacrylic acid copolymers, polyacrylamide or derivatives and partial hydrolysates thereof, polyvinyl acetate, polyacrylonitrile, polyacrylic esters And other vinyl polymers and copolymers thereof, natural products such as rosin and shellac and derivatives thereof, and many other synthetic resins.

  Also used are emulsions of styrene-butadiene copolymer, polyacrylic acid, polyacrylate ester and derivatives thereof, polyvinyl acetate, vinyl acetate-acrylate copolymer, polyolefin, olefin-vinyl acetate copolymer, etc. be able to. In addition, organic semiconductors such as carbonate-based, polyester-based, urethane-based, epoxy-based resin, polyvinyl chloride, polyvinylidene chloride and polypyrrole can also be used. Moreover, these binders can also be used in mixture of 2 or more types. Among these, a polyester resin is preferable.

  Specific examples of polyester resins include polybasic acids such as phthalic anhydride, terephthalic acid, isophthalic acid, tetrachlorophthalic anhydride, hexachloroendomethylenetetrahydrophthalic anhydride, dimethylenetetrahydrophthalic acid, succinic acid, adipic acid, Saturated polybasic acids such as sebacic acid, etc., or polybasic acids such as unsaturated polybasic acids such as maleic acid, maleic anhydride, fumaric acid, itaconic acid, citraconic anhydride and the like, for example, ethylene glycol, diethylene glycol, triethylene Dihydric alcohols such as glycol, propylene glycol, 1,3-butylene glycol, 2,3-butylene glycol, 1,4-butylene glycol, trimethylene glycol and tetramethylene glycol, and trihydric alcohols such as glycerin and trimethylolpropane Polyester resins obtained by condensation reaction with polyols such as polyalcohols such as pentaerythritol, dipentaerythritol, mannitol and sorbit, and bisphenols such as 2,2-diphenylpropane (bisphenol A) It is done.

  The polymer film thickness is preferably from 0.1 to 20 μm, more preferably from 0.5 to 5 μm.

  Furthermore, in this invention, it is preferable that the solubility parameter (SP) value of the polymer which coat | covers an aluminum substrate is 8.0-12.0 from the point which has the effect of this invention more.

  Moreover, it is preferable that the glass transition point (Tg) is 30 to 100 ° C. from the standpoint of further achieving the effects of the present invention.

  When the SP value is less than 8.0, the adhesiveness of the phosphor is lowered, and the corrosion resistance of Al exceeding 12.0 is deteriorated.

  When the glass transition point (Tg) is less than 30 ° C., the cracking resistance of the stimulable phosphor is lowered, and when it exceeds 100 ° C., the adhesive property of the stimulable phosphor is lowered.

  Solubility parameters (SP values) are described in, for example, POLYMER ENGINEERING AND SIENCE, 1974, Vol. 14, NO2, P147-154 (ROBERT F. FEDORS) as described in the following equation.

SP = (ΔEv / V) 1/2 where ΔEv is the evaporation energy and V is the molar volume.

  The stimulable phosphor layer of the present invention preferably has a protective layer.

  The protective layer may be formed by directly applying a protective layer coating solution on the photostimulable phosphor layer, or a protective layer separately formed in advance may be adhered on the photostimulable phosphor layer. Alternatively, a means for forming a stimulable phosphor layer on a separately formed protective layer may be taken.

  Materials for the protective layer include cellulose acetate, nitrocellulose, polymethyl methacrylate, polyvinyl butyral, polyvinyl formal, polycarbonate, polyester, polyethylene terephthalate, polyethylene, polyvinylidene chloride, nylon, polytetrafluoroethylene, polytrifluoride-chloride. Usual protective layer materials such as ethylene, tetrafluoroethylene-hexafluoropropylene copolymer, vinylidene chloride-vinyl chloride copolymer, vinylidene chloride-acrylonitrile copolymer are used. In addition, a transparent glass substrate can be used as a protective layer.

In addition, this protective layer may be formed by laminating inorganic substances such as SiC, SiO ₂ , SiN, Al ₂ O ₃ by vapor deposition, sputtering, or the like.

  The thickness of these protective layers is preferably 0.1 to 2000 μm.

  The support of the present invention uses an aluminum substrate.

  Next, the stimulable phosphor represented by the general formula (1) preferably used in the present invention will be described.

In the photostimulable phosphor represented by the general formula (1), M ^I represents at least one alkali metal atom selected from each atom such as Na, K, Rb and Cs. At least one alkali metal atom selected from each atom is preferred, and a Cs atom is more preferred.

M ² is at least one metal atom selected from Li, Na, K, Rb and Cs other than M ¹ , and at least one alkali metal atom selected from each atom of Rb and Cs is preferable, and more preferably Cs atom.

M ³ is at least selected from each atom such as Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Al, Ga and In. One kind of trivalent metal atom is represented, and among these, trivalent metal atoms selected from each atom such as Y, Ce, Sm, Eu, Al, La, Gd, Lu, Ga and In are preferred. is there.

  A is at least one selected from the atoms of Eu, Tb, In, Ce, Tm, Dy, Pr, Ho, Nd, Yb, Er, Gd, Lu, Sm, Y, Tl, Na, Ag, Cu, and Mg. Metal atom. Of these, an Eu metal atom is preferable.

  From the viewpoint of improving the photostimulable emission brightness of the photostimulable phosphor, X, X ′, and X ″ each represent at least one halogen atom selected from F, Cl, Br, and I atoms. At least one halogen atom selected from Br is preferable, and at least one halogen atom selected from Br and I atoms is more preferable.

  In the present invention, CsBr: Eu is preferable as the stimulable phosphor.

  The photostimulable phosphor represented by the general formula (1) of the present invention is produced, for example, by the production method described below.

As a phosphor material, for example,
(A) At least one compound selected from NaF, NaCl, NaBr, NaI, KF, KCl, KBr, KI, RbF, RbCl, RbBr, RbI, CsF, CsCl, CsBr and CsI is used.

_{(B) MgF 2, MgCl 2} , MgBr 2, MgI 2, CaF 2, CaCl 2, CaBr 2, CaI 2, SrF 2, SrCI 2, SrBr 2, SrI 2, BaF 2, BaCl 2, BaBr 2, BaBr 2 2H ₂ O, BaI ₂ , ZnF ₂ , ZnCl ₂ , ZnBr ₂ , ZnI ₂ , CdF ₂ , CdCl ₂ , CdBr ₂ , CdI ₂ , CuF ₂ , CuCl ₂ , CuBr ₂ , CuI, NiF ₂ , NiCl ₂ , NiBr _At least one or two or more compounds selected from ₂ and NiI ₂ compounds are used.

(C) At least one or two or more compounds selected from compounds of AlCl ₃ , GaBr ₃ and InCl ₃ are used.

  (D) As the raw material of the activation part, Eu, Tb, In, Cs, Ce, Tm, Dy, Pr, Ho, Nd, Yb, Er, Gd, Lu, Sm, Y, Tl, Na, Ag, Cu and A compound having a metal atom selected from each atom such as Mg is used.

In the compound represented by the general formula (I), a is 0 ≦ a <0.5, preferably 0 ≦ a <0.01, and b is 0 ≦ b <0.5, preferably 0 ≦ b ≦. 10 ⁻² and e are 0 <e ≦ 0.2, preferably 0 <e ≦ 0.1.

  The phosphor materials (a) to (d) are weighed so as to have a mixed composition in the above numerical range, and sufficiently mixed using a mortar, ball mill, mixer mill or the like.

  After firing once under the above firing conditions, the fired product is taken out from the electric furnace and pulverized, and then the fired product powder is again filled in a heat-resistant container and placed in the electric furnace, and again under the same firing conditions as described above. If the firing is performed, the emission luminance of the phosphor can be further increased. When the fired product is cooled to the room temperature from the firing temperature, the desired fluorescence can also be obtained by removing the fired product from the electric furnace and allowing it to cool in the air. The body can be obtained, but it may be cooled in the same weakly reducing atmosphere or neutral atmosphere as at the time of firing. In addition, by moving the fired product from the heating part to the cooling part in an electric furnace and quenching in a weak reducing atmosphere, neutral atmosphere or weak oxidizing atmosphere, the emission luminance due to the phosphor phosphors obtained can be increased. It can be further increased.

  Further, the photostimulable phosphor layer of the present invention is formed by a vapor phase growth method.

  Vapor deposition methods, sputtering methods, CVD methods, ion plating methods, and others can be used as the vapor phase growth method of the photostimulable phosphor.

  In the present invention, for example, the following methods can be mentioned.

In the vapor deposition method of the first method, first, after the support is installed in the vapor deposition apparatus, the inside of the apparatus is evacuated to a degree of vacuum of about 1.333 × 10 ⁻⁴ Pa.

  Next, at least one of the photostimulable phosphor is heated and evaporated by a resistance heating method, an electron beam method, or the like to grow the photostimulable phosphor on the surface of the support to a desired thickness.

  As a result, a photostimulable phosphor layer containing no binder is formed, but it is also possible to form the photostimulable phosphor layer in a plurality of times in the vapor deposition step.

  In the vapor deposition step, it is possible to co-evaporate using a plurality of resistance heaters or electron beams to synthesize the desired photostimulable phosphor on the support and simultaneously form the photostimulable phosphor layer. is there.

  After the vapor deposition, the radiation image conversion panel of the present invention is manufactured by providing a protective layer on the side opposite to the support side of the photostimulable phosphor layer as necessary. In addition, after forming a photostimulable phosphor layer on a protective layer, a procedure for providing a support may be taken.

  Furthermore, in the vapor deposition method, the vapor deposition target (support, protective layer or intermediate layer) may be cooled or heated as necessary during vapor deposition.

Further, the stimulable phosphor layer may be heat-treated after the vapor deposition. In the vapor deposition method, reactive vapor deposition may be performed by introducing a gas such as O ₂ or H ₂ as necessary.

In the sputtering method as the second method, like the vapor deposition method, after a support having a protective layer or an intermediate layer is placed in the sputtering apparatus, the inside of the apparatus is once evacuated to about 1.333 × 10 ⁻⁴ Pa. The degree of vacuum is set, and then an inert gas such as Ar or Ne is introduced into the sputtering apparatus as a sputtering gas to obtain a gas pressure of about 1.333 × 10 ⁻¹ Pa. Next, the stimulable phosphor layer is grown to a desired thickness on the support by sputtering using the stimulable phosphor as a target.

  Various applied treatments can be used in the sputtering step as in the vapor deposition method.

  The third method is a CVD method, and the fourth method is an ion plating method.

  The growth rate of the stimulable phosphor layer in the vapor phase growth is preferably 0.05 μm / min to 300 μm / min. When the growth rate is less than 0.05 μm / min, the productivity of the radiation image conversion panel of the present invention is low, which is not preferable. If the growth rate exceeds 300 μm / min, it is difficult to control the growth rate.

  When the radiation image conversion panel is obtained by the above-described vacuum deposition method, sputtering method, etc., since there is no binder, the packing density of the photostimulable phosphor can be increased, which is preferable in terms of sensitivity and resolution. An image conversion panel is obtained and preferred.

  The crucible for vapor deposition differs depending on the heating method such as resistance heating method, halogen heating method EB (electron beam) method and the like.

  The film thickness of the photostimulable phosphor layer varies depending on the purpose of use of the radiation image conversion panel and the type of stimulable phosphor, but is preferably 50 μm to 1 mm from the viewpoint of obtaining the effects described in the present invention. Preferably it is 50-800 micrometers.

  In the present invention, before forming the photostimulable phosphor layer, the support surface is subjected to energy treatment such as plasma treatment, corona discharge treatment, glow discharge treatment, laser treatment, ozone oxidation treatment, and ultraviolet treatment. Also good.

  In the present invention, the gap between the columnar crystals may be filled with a filler or the like, and the stimulable phosphor layer may be reinforced, and a high light absorption substance, a high light reflectance substance or the like may be filled. In addition to providing the reinforcing effect, this is effective in reducing the light diffusion in the lateral direction of the stimulated excitation light incident on the stimulable phosphor layer.

  A highly reflective substance refers to a substance having a high reflectivity with respect to stimulated excitation light (500 to 900 nm, particularly 600 to 800 nm). For example, white pigments such as aluminum, magnesium, silver, indium, and other metals In addition, a color material in the green to red region can be used. White pigments can also reflect stimulated emission.

Examples of the white pigment include TiO ₂ (anatase type, rutile type), MgO, PbCO ₃ · Pb (OH) ₂ , BaSO ₄ , Al ₂ O ₃ , M (II) FX (where M (II) is Ba). , Sr, and Ca, and X is a Cl atom or a Br atom.), CaCO ₃ , ZnO, Sb ₂ O ₃ , SiO ₂ , ZrO ₂ , lithopone (BaSO ₄ ZnS), magnesium silicate, basic silicate, basic lead phosphate, aluminum silicate and the like.

  These white pigments have a strong hiding power and a high refractive index, so that it is possible to easily scatter scattered light by reflecting or refracting light, and to significantly improve the sensitivity of the resulting radiation image conversion panel. it can.

  In addition, as a material having a high light absorption rate, for example, carbon black, chromium oxide, nickel oxide, iron oxide, and the like and a blue color material are used. Among these, carbon black absorbs stimulated light emission.

  The color material may be either an organic or inorganic color material.

  Examples of organic colorants include Zavon First Blue 3G (Hoechst), Estrol Brill Blue N-3RL (Sumitomo Chemical), D & C Blue No. 1 (made by National Aniline), Spirit Blue (made by Hodogaya Chemical), Oil Blue No. 1 603 (made by Orient), Kitten Blue A (made by Ciba Geigy), Eisen Katyron Blue GLH (made by Hodogaya Chemical), Lake Blue AFH (made by Kyowa Sangyo), Primocyanin 6GX (made by Inabata Sangyo), Brill Acid Green 6BH (Hodogaya) Chemical Blue), Cyan Blue BNRCS (Toyo Ink), Lionoyl Blue SL (Toyo Ink), etc. are used.

  In addition, the color index No. 24411, 23160, 74180, 74200, 22800, 23154, 23155, 24401, 14830, 15050, 15760, 15707, 17941, 74220, 13425, 13361, 13420, 11836, 74140, 74380, 74350, 74460, etc. There are also materials.

Examples of the inorganic color material include inorganic pigments such as ultramarine, for example, cobalt blue, cerulean blue, chromium oxide, and TiO ₂ —ZnO—Co—NiO.

  That is, the surface of these supports may be a smooth surface, or the surface of the support may be a matte surface for the purpose of improving the adhesion to the stimulable phosphor layer.

  The emission wavelength range of the photostimulable phosphor of the present invention is 300 to 500 nm, while the photostimulable excitation wavelength range is 500 to 900 nm, which satisfies the above-mentioned conditions at the same time. Recently, downsizing of diagnostic devices has progressed. A semiconductor laser that has a high output power and is easy to be compacted is preferably used for reading an image of the radiation image conversion panel, and the wavelength of the laser light is preferably 680 nm. The stimulable phosphor incorporated in the panel exhibits very good sharpness when using an excitation wavelength of 680 nm.

  That is, all of the photostimulable phosphors of the present invention emit light having a main peak at 500 nm or less, the photostimulated excitation light is easily separated, and coincides well with the spectral sensitivity of the light receiver, so that light can be received efficiently. The sensitivity of the image receiving system can be increased.

Examples of lasers include He-Ne laser, He-Cd laser, Ar ion laser, Kr ion laser, N ₂ laser, YAG laser and its second harmonic, ruby laser, semiconductor laser, various dye lasers, copper vapor There are metal vapor lasers such as lasers. Normally, a continuous wave laser such as a He—Ne laser or an Ar ion laser is desirable, but a pulsed laser can also be used if the scanning time and pulse of one pixel of the panel are synchronized.

  In addition, when using a method of separating light emission delay as disclosed in JP-A-59-22046, it is preferable to use a pulsed laser rather than a continuous wave laser.

  Among the various laser light sources described above, the semiconductor laser is particularly preferably used because it is small and inexpensive and does not require a modulator.

  For example, in the case of a practically preferable combination in which the photostimulation excitation wavelength is 500 to 900 nm and the photostimulation emission wavelength is 300 to 500 nm, examples of the filter include C-39, C-40, and V-40 manufactured by Toshiba Corporation. Purple-blue glass filters such as V-42, V-44, Corning 7-54, 7-59, Spectrofilm BG-1, BG-3, BG-25, BG-37, BG-38, etc. Can be used. If an interference filter is used, a filter having an arbitrary characteristic can be selected and used to some extent. Any photoelectric conversion device may be used as long as it can convert a change in light quantity into a change in electronic signal, such as a photoelectric tube, a photomultiplier tube, a photodiode, a phototransistor, a solar cell, or a photoconductive element.

  EXAMPLES The present invention will be specifically described below with reference to examples, but the embodiments of the present invention are not limited to these examples.

(Example)
<< Preparation of Radiation Image Conversion Panel Samples 1-7 (Sample Nos. 1-7) >>
As shown below, the surface of the 0.5 mm thick aluminum plate support (average surface roughness 0.02 μm) has the stimulable phosphor (CsBr: Eu) using the vapor deposition apparatus shown in FIG. A photostimulable phosphor layer was formed.

  The resin coating on the aluminum substrate was performed using a spin coater so that the film thickness was 1.5 μm. In addition, after the coating, heat treatment was performed at 150 ° C. for 1 hour.

Once the vacuum chamber is evacuated, Ar gas is introduced and the degree of vacuum is adjusted to 1.0 × 10 ⁻² Pa, and the surface temperature of the support is kept at 100 ° C. Evaporation was performed until the thickness of the stimulable phosphor layer reached 400 μm to form a radiation image conversion panel sample.

In the vapor deposition apparatus shown in FIG. 1, the vapor deposition source is disposed on the normal line orthogonal to the center of the support, and the distance d ₁ (60 cm) between the support and the vapor deposition source is set. During the vapor deposition, the vapor deposition operation was performed while rotating the support.

  Next, this phosphor layer was heat-treated at a temperature of 150 ° C. In a dry air atmosphere, the periphery of the protective layer having a support and borosilicate glass was sealed with an adhesive to obtain a radiation image conversion panel sample 1 having a structure in which the phosphor layer was sealed.

  Next, as shown in Table 1, a radiographic image conversion panel sample was prepared in the same manner as the radiographic image conversion panel sample 1 (sample No. 1) except that the coating resin (with or without polymer coating), SP value, Tg, etc. were changed. 2-7 (sample No. 2-7) were produced.

  About the obtained samples 1-7, the impact test, adhesiveness, and corrosion resistance were evaluated.

  (Impact test): An iron ball having a diameter of 20 mm was naturally dropped from a height of 30 cm onto the phosphor layer side of each obtained radiation image conversion panel sample, and then X-rays were bombarded under an imaging condition of 80 kV / 200 mas. It was read with Regius 150 (manufactured by Konoka Minolta) and the impact on the phosphor was evaluated according to the following evaluation criteria by the image.

5: No cracking (no change in density)
4: Cracking occurs (no change in concentration)
3: Cracking occurs (concentration fluctuation less than 10 STP)
2: Cracking occurs (concentration fluctuation: 10 STP or more and less than 50 STEP)
1: Cracking occurs (concentration fluctuation of 50 STP or more)
The photostimulable phosphor layer was observed with an optical microscope.

  If rank 4 or higher, there is no practical problem.

(Evaluation of corrosion resistance)
Each sample was allowed to stand at 30 ° C. and 80% for 1 week, then the phosphor layer was peeled off, and the corrosion state of the substrate was evaluated using an optical microscope. If it is rank 4 or higher, there is no problem.

Corrosion rank: Number of corrosions with a diameter of 50 μm or more (per 100 mm square)
5: 0 pieces 4: 1 pieces 3: 2 to less than 6 2: 6 to less than 11 1:11 or more (adhesive evaluation)
Each of the protective layer peripheral portions of the radiation image conversion panel samples 1 to 4 having the prepared stimulable phosphor layer on the aluminum substrate is sealed with an adhesive, and each of the stimuli before the phosphor layer is sealed. Using the sample, the following test was conducted to evaluate the adhesion to the substrate.

  Adhesive tape was applied to the phosphor layer coating surface of each of the radiation image conversion panel samples 1 to 7 before sealing, and the area percentage of the phosphor layer adhering to the substrate when the tape was peeled off was measured. Adhesion was evaluated according to the criteria shown. The evaluation results are shown in Table 1.

5: Area where the phosphor layer adheres to the substrate is 100%
4: The area where the phosphor layer adheres to the substrate is 95% or more and less than 100% 3: The area where the phosphor layer adheres to the substrate is 80% or more and less than 95% 2: The area where the phosphor layer adheres to the substrate is 60% Less than -80% 1: The area where the phosphor layer adheres to the substrate is less than 60%. The rank is preferably 4 or more, but practically no problem if it is 3 or more.

  As is apparent from Table 1, the sample of the present invention is superior to the comparative sample.

It is the schematic which shows an example of the vapor deposition apparatus used for formation of the photostimulable phosphor layer of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Deposition apparatus 2 Vacuum chamber 3 Support body rotation mechanism (support body rotation function)
4 Support 5 Evaporation Source 6 Support Surface Temperature Control Heater

Claims (3)

And SP values met the radiographic image conversion panel having a fluorescent material layer on a have and a glass transition point aluminum substrate coated with a polymer which is 30 to 100 ° C. 8.0 to 12.0, at least one layer the radiation image conversion panel fluorescent body layer is characterized by being formed to a thickness of 50μm~20mm by vapor deposition method (gas phase method). The radiation image conversion panel according to claim 1, wherein the phosphor is a compound represented by the following general formula (1).
General formula (1)
M ¹ X · aM ² X ′ ₂ · bM ³ X ″ ₃ : eA
[Wherein, M ¹ is at least one alkali metal atom selected from Li, Na, K, Rb and Cs, and M ² is at least one selected from Li, Na, K, Rb and Cs other than M ^1. M ³ is selected from Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Al, Ga and In At least one trivalent metal atom, X, X ′ and X ″ are each at least one halogen atom selected from F atom, Cl atom, Br atom and I atom, and A is Eu, Tb , In, Ce, Tm, Dy, Pr, Ho, Nd, Yb, Er, Gd, Lu, Sm, Y, Tl, Na, Ag, Cu and Mg, and at least one metal atom, a, b, e It represents a numerical value in the range of 0 ≦ a <0.5, 0 ≦ b <0.5, and 0 <e ≦ 0.2.] The radiation image conversion panel according to claim 1, wherein the polymer is a polyester resin.

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