JP4411624B2 - 非有機溶剤型レジスト剥離剤組成物 - Google Patents

非有機溶剤型レジスト剥離剤組成物 Download PDF

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Publication number
JP4411624B2
JP4411624B2 JP2003108961A JP2003108961A JP4411624B2 JP 4411624 B2 JP4411624 B2 JP 4411624B2 JP 2003108961 A JP2003108961 A JP 2003108961A JP 2003108961 A JP2003108961 A JP 2003108961A JP 4411624 B2 JP4411624 B2 JP 4411624B2
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Japan
Prior art keywords
group
carbon atoms
resist
acid
composition
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Expired - Fee Related
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JP2003108961A
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English (en)
Japanese (ja)
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JP2004317641A (ja
JP2004317641A5 (enExample
Inventor
瑞樹 武井
佳孝 西嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nagase Chemtex Corp
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Nagase Chemtex Corp
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Priority to JP2003108961A priority Critical patent/JP4411624B2/ja
Publication of JP2004317641A publication Critical patent/JP2004317641A/ja
Publication of JP2004317641A5 publication Critical patent/JP2004317641A5/ja
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Publication of JP4411624B2 publication Critical patent/JP4411624B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
JP2003108961A 2003-04-14 2003-04-14 非有機溶剤型レジスト剥離剤組成物 Expired - Fee Related JP4411624B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003108961A JP4411624B2 (ja) 2003-04-14 2003-04-14 非有機溶剤型レジスト剥離剤組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003108961A JP4411624B2 (ja) 2003-04-14 2003-04-14 非有機溶剤型レジスト剥離剤組成物

Publications (3)

Publication Number Publication Date
JP2004317641A JP2004317641A (ja) 2004-11-11
JP2004317641A5 JP2004317641A5 (enExample) 2006-06-08
JP4411624B2 true JP4411624B2 (ja) 2010-02-10

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ID=33470271

Family Applications (1)

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JP2003108961A Expired - Fee Related JP4411624B2 (ja) 2003-04-14 2003-04-14 非有機溶剤型レジスト剥離剤組成物

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JP (1) JP4411624B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7550075B2 (en) 2005-03-23 2009-06-23 Tokyo Electron Ltd. Removal of contaminants from a fluid
US7442636B2 (en) 2005-03-30 2008-10-28 Tokyo Electron Limited Method of inhibiting copper corrosion during supercritical CO2 cleaning
US7399708B2 (en) * 2005-03-30 2008-07-15 Tokyo Electron Limited Method of treating a composite spin-on glass/anti-reflective material prior to cleaning
JP4758187B2 (ja) * 2005-09-26 2011-08-24 関東化学株式会社 フォトレジスト残渣及びポリマー残渣除去液
WO2008090418A1 (en) * 2007-01-22 2008-07-31 Freescale Semiconductor, Inc. Liquid cleaning composition and method for cleaning semiconductor devices
WO2010041333A1 (ja) * 2008-10-10 2010-04-15 アクアサイエンス株式会社 剥離液及び対象物洗浄方法
JP5498768B2 (ja) * 2009-12-02 2014-05-21 東京応化工業株式会社 リソグラフィー用洗浄液及び配線形成方法

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Publication number Publication date
JP2004317641A (ja) 2004-11-11

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