JP2004317641A5 - - Google Patents
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- Publication number
- JP2004317641A5 JP2004317641A5 JP2003108961A JP2003108961A JP2004317641A5 JP 2004317641 A5 JP2004317641 A5 JP 2004317641A5 JP 2003108961 A JP2003108961 A JP 2003108961A JP 2003108961 A JP2003108961 A JP 2003108961A JP 2004317641 A5 JP2004317641 A5 JP 2004317641A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- substituent
- halogen
- aminoalkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004432 carbon atom Chemical group C* 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 3
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 2
- 125000003172 aldehyde group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 125000004103 aminoalkyl group Chemical group 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- SDXAWLJRERMRKF-UHFFFAOYSA-N 3,5-dimethyl-1h-pyrazole Chemical compound CC=1C=C(C)NN=1 SDXAWLJRERMRKF-UHFFFAOYSA-N 0.000 description 1
- -1 Group Chemical group 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003108961A JP4411624B2 (ja) | 2003-04-14 | 2003-04-14 | 非有機溶剤型レジスト剥離剤組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003108961A JP4411624B2 (ja) | 2003-04-14 | 2003-04-14 | 非有機溶剤型レジスト剥離剤組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004317641A JP2004317641A (ja) | 2004-11-11 |
| JP2004317641A5 true JP2004317641A5 (enExample) | 2006-06-08 |
| JP4411624B2 JP4411624B2 (ja) | 2010-02-10 |
Family
ID=33470271
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003108961A Expired - Fee Related JP4411624B2 (ja) | 2003-04-14 | 2003-04-14 | 非有機溶剤型レジスト剥離剤組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4411624B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7550075B2 (en) | 2005-03-23 | 2009-06-23 | Tokyo Electron Ltd. | Removal of contaminants from a fluid |
| US7442636B2 (en) | 2005-03-30 | 2008-10-28 | Tokyo Electron Limited | Method of inhibiting copper corrosion during supercritical CO2 cleaning |
| US7399708B2 (en) * | 2005-03-30 | 2008-07-15 | Tokyo Electron Limited | Method of treating a composite spin-on glass/anti-reflective material prior to cleaning |
| JP4758187B2 (ja) * | 2005-09-26 | 2011-08-24 | 関東化学株式会社 | フォトレジスト残渣及びポリマー残渣除去液 |
| WO2008090418A1 (en) * | 2007-01-22 | 2008-07-31 | Freescale Semiconductor, Inc. | Liquid cleaning composition and method for cleaning semiconductor devices |
| KR20110079835A (ko) * | 2008-10-10 | 2011-07-08 | 아쿠아 사이언스 가부시키카이샤 | 박리액 및 대상물 세정 방법 |
| JP5498768B2 (ja) * | 2009-12-02 | 2014-05-21 | 東京応化工業株式会社 | リソグラフィー用洗浄液及び配線形成方法 |
-
2003
- 2003-04-14 JP JP2003108961A patent/JP4411624B2/ja not_active Expired - Fee Related
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