JP4409972B2 - Culture management method for Shiitake fungus bed top surface generation - Google Patents

Culture management method for Shiitake fungus bed top surface generation Download PDF

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JP4409972B2
JP4409972B2 JP2004016530A JP2004016530A JP4409972B2 JP 4409972 B2 JP4409972 B2 JP 4409972B2 JP 2004016530 A JP2004016530 A JP 2004016530A JP 2004016530 A JP2004016530 A JP 2004016530A JP 4409972 B2 JP4409972 B2 JP 4409972B2
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fungus bed
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茂雄 高野
澄夫 鮎澤
克昌 枝
隆弘 山内
新栄 木下
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株式会社北研
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本発明は、しいたけ菌床栽培の培養及び発生準備工程において、しいたけ菌床の上面に特定してしいたけ菌を発生させるしいたけ菌床の培養管理方法に関する。 The present invention relates to a method for cultivating shiitake mushroom beds, which causes specific shiitake mushrooms to be generated on the upper surface of the shiitake mushroom beds in the cultivation and generation preparation step for shiitake mushroom beds.

菌床上面に特定してきのこを発生させる方法においては、特許文献1(以下先行技術1という)がある。その内容は、「菌床の培養終了後に栽培容器上部を取り除いて菌床の容器の間隙に給水し、更に一定期間23〜35℃の温度で管理することで、菌床底面や側面のきのこの発芽を開始できる状態の菌床を操作して底面や側面の発芽を抑制し、上面のみの原基を生かす方法」を旨としている。即ち、培養が完了して充分熟成した原基を有する状態に至った菌床を対象とし、これに高温処理を施すことで菌床の底面や側面の発芽を抑制しようとする方法である。   Patent Document 1 (hereinafter referred to as Prior Art 1) is known as a method for generating mushrooms on the upper surface of the fungus bed. The contents are as follows: “After the cultivation of the fungus bed is completed, the upper part of the cultivation container is removed, water is supplied to the gap between the fungus bed containers, and further managed at a temperature of 23 to 35 ° C. for a certain period of time. The method is to “manage the fungus bed in a state where germination can be started to suppress the germination of the bottom surface and the side surface and make use of only the upper surface of the primordium”. That is, it is a method for controlling germination on the bottom and side surfaces of a fungus bed by subjecting the fungus bed to a state having a well-ripened primordium after completion of culture and subjecting it to high temperature treatment.

しかし、この方式では、
(a)すでに充分熟成した原基の発芽を抑制することがポイントになるため、給水のタイミングが遅れたり、23〜35℃の高温が維持ができない等の僅かの刺激でもあると、上面以外からもきのこが発芽してしまう難点があり、
(b)さらに、一定数量の菌床を23〜35℃の高温に維持管理するには、栽培室全体に専用の温度管理施設が必要とされるので、大型の暖房施設等を設ける等の必要が生じ、経済的に負担が非常に大きいものとなり、
(b)昼夜を通しての菌床の温度管理には、繊細な配慮と複雑な管理体制が不可欠となり、人的な労働環境にも負担の大なるものとなる、
等の問題を生じる。
特願3087171号
However, with this method,
(A) Since the point is to suppress the germination of the well-ripened primordium, the timing of water supply is delayed, and it is also a slight stimulus such as the high temperature of 23 to 35 ° C. cannot be maintained. There is a difficulty that mushrooms germinate,
(B) Furthermore, in order to maintain and manage a certain number of fungal beds at a high temperature of 23 to 35 ° C., a dedicated temperature management facility is required for the entire cultivation room, so it is necessary to provide a large heating facility, etc. Resulting in a very large financial burden,
(B) Delicate consideration and a complicated management system are indispensable for the temperature control of the fungus bed throughout the day and night, and the burden on the human work environment is also increased.
This causes problems.
Japanese Patent Application No.3087171

本発明は従来のかかる問題を解決するためになされたもので、一定期間23〜35℃に保つ高温管理等を必要とすることなく、比較的簡潔で且つ確実に菌床上面からのみきのこを発生させることのできる方法を開発しようとするものである。 The present invention has been made to solve such a conventional problem, and generates mushrooms from the upper surface of the fungus bed in a relatively simple and reliable manner without the need for high temperature control or the like maintained at 23 to 35 ° C. for a certain period of time. It is intended to develop a method that can be allowed to.

上記目的を達成するために、請求項1記載のしいたけ菌床上面発生のための培養管理方法は、しいたけ菌床栽培の培養途中であって、菌床全体に菌糸が蔓延して培地の養分を分解・吸収し始める頃ではあるが、原基は殆ど形成されていない段階において、栽培容器の菌床側面及び底面部分との隙間に給水等して、菌床側面及び底面部分に沿った木材組織の内部を飽水状態としたまま培養を継続し、当該飽水状態によって菌床側面及び底面からのきのこの発生を抑制し、菌床上面からのみきのこを発生させることを特徴とする。 In order to achieve the above object, the culture management method for generating the upper surface of a shiitake fungus bed according to claim 1 is the middle of the cultivation of shiitake fungus bed cultivation, and the mycelium spreads throughout the fungus bed and the nutrient of the medium is increased. Although it is about the time when it begins to decompose and absorb, at the stage where almost no primordial is formed, the wood structure along the side and bottom part of the fungus bed by supplying water to the gap between the side and the bottom part of the cultivation container Culturing is continued while the inside of the plant is saturated, and the generation of mushrooms from the side and bottom of the fungus bed is suppressed by the saturated state, and mushrooms are generated from the top surface of the fungus bed.

請求項2記載の発明は、しいたけ菌床栽培の培養途中であって原基のほぼ未形成段階において、栽培容器の上面に給水用穴を配備することを特徴とする。 The invention described in claim 2 is characterized in that a water supply hole is provided on the upper surface of the cultivation container in the middle of the cultivation of shiitake fungus bed cultivation and in a substantially unformed stage of the primordium.

本発明は以上のように構成されるので、しいたけ菌床栽培の栽培培養途中であって原基のほぼ未形成段階において、培容器の菌床側面及び底面部分との隙間に給水等して木材組織内部を飽水状態とするので、水分の過剰により空気が過少となり、菌糸が窒息状態となり、菌床側面及び底面からのきのこの発生が抑制され、菌床上面からのみ選択的にきのこが発生する。このとき、菌床を23〜35℃の高温に維持管理する必要がなく、暖房等の大型施設を不要とし、設備の簡略化が可能となる。
形成された原基からのきのこの発生は、上面のみに選択的に集中され底面及び側面から出るのが除かれる分、一個々の個重が重く、ボリュームのある高品質のきのこが得られ、同時に、収穫の手間が少なく、高単価で販売できるので収益性の非常に良いものとなる。
Since the present invention is configured as described above, in the middle of cultivation culture of shiitake fungus bed cultivation and in the almost unformed stage of the primordium, water is supplied to the gap between the side surface and the bottom surface portion of the culture container, and the wood Since the inside of the tissue is saturated, excess air causes air to become scarce, hyphae become suffocated, mushrooms from the side and bottom of the fungus bed are suppressed, and mushrooms are selectively generated only from the top of the fungus bed. To do. At this time, it is not necessary to maintain and manage the fungus bed at a high temperature of 23 to 35 ° C., a large facility such as heating is not required, and the equipment can be simplified.
The occurrence of mushrooms from the formed primordial is selectively concentrated only on the top surface and removed from the bottom and side surfaces, so that each individual weight is heavy, and a high-quality mushroom with a large volume is obtained, At the same time, it is very profitable because it requires less labor and can be sold at a high unit price.

請求項2記載の発明によれば、栽培袋上面を切除せずに栽培容器の上面に給水用穴を開けて給水するようにすれば、上面が過乾燥となることもなく、散水を行わずとも良いので効率的となる。 According to the invention of claim 2, if water is supplied by opening a water supply hole on the upper surface of the cultivation container without excising the upper surface of the cultivation bag, the upper surface is not overdried and watering is not performed. Both are efficient.

本発明のしいたけ菌床の培養管理方法は、次の(イ)〜(ハ)の工程から成る。
(イ)初期菌糸成長による培養工程
菌床の水分を適当に保ち、菌床の細胞間隙にある自由水を利用して菌糸が伸び、温度も20±1℃の菌糸の成長に適した環境とし、菌床内での菌糸の成長を促す。しかし、未だ原基は充分には形成されていない段階にある。
この段階とは、僅かの原基は存しても良いが、刺激が与えられてもきのこ発生の殆ど見られない状態の段階をいう。
(ロ)菌床側面及び底面部分の木材組織の飽水状態化工程
次に、菌床全体に菌糸が蔓延し、培地の養分を分解・吸収し始める頃ではあるが、未だ原基は形成されていない段階となったら、栽培容器1の上面を全開放若しくは一部開放させて、菌床の底面及び側面にかけて水を満した状態とする。
即ち、菌床の底面及び側面から水分が吸収され、その菌床の細胞組織内は飽水状態となり、水分の過剰により空気が過少となり、菌糸が窒息状態となるようにする。
しかし、このとき菌床の底面及び側面から水分が吸収されるが、その吸収は菌床の底面及び側面の辺縁部にとどまり、菌床内部にまで深く浸透するものではない。従って、菌床内部にあっては、引き続き菌糸の成長に適した温度と水分量等の環境が保たれ、菌糸の順調な成長により、徐々に菌床上面に原基が形成されていく。ここで上面とは、水の浸らない上部も含む意味である。
上記の状態で菌床上面に充分原基が形成されるまで20±1℃の環境で培養を継続する。
(ハ)低温刺激工程
栽培容器1を低温に保ち、その低温刺激により原基の発芽を促す。
(ニ)きのこの発生工程
上記(ロ)で述べた通り、栽培容器の底面及び側面の辺縁部には原基が未成熟であるので、ここからきのこの発生はない。
一方、上面は適切な水分と温度の環境にあるから、ここからきのこが勢いよく発芽する。
即ち、菌床側面及び底面からのきのこの発生を抑制し、菌床上面からのみ選択的にきのこが発生するものとなる。
しかも、形成された原基からのきのこの発生は、上面に集中されるので、底面及び側面から出る無駄がない分、一個の個重の重い、高品質のきのこが得られる。
更に、当該上面を、散水等で湿度を適湿に保てば、益々個重の大きな、高品質のきのこが得られるものとなる。
The shiitake mushroom bed culture management method of the present invention comprises the following steps (a) to (c).
(B) Cultivation process by initial hyphal growth Keeping the water in the mycelium appropriately, the hypha grows using free water in the cell space of the mycelium, and the environment is suitable for growing mycelium at a temperature of 20 ± 1 ° C. , Promote the growth of mycelia in the fungus bed. However, the primordial group is not yet fully formed.
This stage refers to a stage where little primordium may exist, but mushrooms are hardly observed even when a stimulus is given.
(B) Saturation process of the wood structure on the side and bottom of the fungus bed Next, the hyphae spread throughout the fungus bed, and it is about the time when the nutrients in the medium begin to be decomposed and absorbed, but the primordium is still formed. If it is not in the stage, the upper surface of the cultivation container 1 is fully opened or partially opened, and is filled with water over the bottom and side surfaces of the fungus bed.
That is, moisture is absorbed from the bottom and side surfaces of the fungus bed, the cell tissue of the fungus bed is saturated, air is reduced due to excess moisture, and the hyphae are suffocated.
However, at this time, moisture is absorbed from the bottom and side surfaces of the fungus bed, but the absorption remains at the edge of the bottom and side surfaces of the fungus bed and does not penetrate deeply into the inside of the fungus bed. Accordingly, in the inside of the mycelium, the environment suitable for the growth of mycelia and the environment such as the amount of water is continuously maintained, and the primordial base is gradually formed on the upper surface of the mycelia by the smooth growth of the mycelia. Here, the upper surface means an upper portion where water is not immersed.
In the above state, the culture is continued in an environment of 20 ± 1 ° C. until a sufficient primordium is formed on the upper surface of the fungus bed.
(C) Low temperature stimulation process The cultivation container 1 is kept at a low temperature, and the germination of the primordial is promoted by the low temperature stimulation.
(D) Mushroom generation process As described in (b) above, since the primordial is immature at the bottom and side edges of the cultivation container, no mushroom is generated from here.
On the other hand, mushrooms germinate vigorously from here because the upper surface is in an environment of appropriate moisture and temperature.
That is, the occurrence of mushrooms from the side and bottom surfaces of the fungus bed is suppressed, and mushrooms are selectively generated only from the upper surface of the fungus bed.
Moreover, since the generation of mushrooms from the formed primordial is concentrated on the upper surface, there is no waste from the bottom surface and the side surface, so that a heavy, high-quality mushroom can be obtained.
Furthermore, if the upper surface is kept at a suitable humidity by watering or the like, high-quality mushrooms with higher individual weight can be obtained.

次いで、上記工程からなる本発明の実施の形態を、図1、図2および表1に基づいて説明する。 Next, an embodiment of the present invention comprising the above steps will be described with reference to FIGS.

(その1)第1図に示すような菌床10を用意した。この菌床10は、栽培容器1にポリプリピレン製袋にフィルター2が装着された栽培袋を使用し、横20cm、縦12cm、高さ17cm重量約2,700gの角型に培地を成型し、常法により殺菌、冷却、接種を行った。種菌は北研600号を使用した。培養は20±1℃で、60日間管理し、同環境で栽培袋上方に穴を開けて袋内部に給水して菌床の底部及び側面が水に浸かる状態とし、さらに同環境で40日間培養を継続した。その後15℃の発生室に移動して栽培袋上部を切り取り、菌床同士の設置間隔を1cm取り、きのこの発生を行なった。このとき、輪ゴム10の位置より上部の菌床上面8に水9が登らないように排水孔11を設けた。
即ち、上記(イ)の工程を20±1℃で60日間管理し、(ロ)の工程を栽培袋の上方に穴を開ける方法を用い、20±1℃で40日間管理し、(ハ)の工程を15℃で行い、(ニ)の工程で菌床同士の間隔を1cmとしてきのこの発生を行ったものである。
(Part 1) A fungus bed 10 as shown in FIG. 1 was prepared. The fungus bed 10 uses a cultivation bag in which a filter 2 is attached to a polypropylene bag in the cultivation container 1, and a medium is molded into a square shape having a width of 20 cm, a length of 12 cm, a height of 17 cm and a weight of about 2,700 g. Sterilized, cooled and inoculated by the method. Kitaken No. 600 was used as the inoculum. Cultivation is controlled at 20 ± 1 ° C for 60 days. In the same environment, a hole is made above the cultivation bag and water is supplied to the inside of the bag so that the bottom and sides of the fungus bed are immersed in water. Continued. After that, it moved to the generation room at 15 ° C., and the upper part of the cultivation bag was cut off, and 1 cm was placed between the fungus beds to generate mushrooms. At this time, the drain hole 11 was provided so that the water 9 would not climb to the upper surface 8 of the fungus bed above the position of the rubber band 10.
That is, the process (b) is managed at 20 ± 1 ° C. for 60 days, and the process (b) is managed at 20 ± 1 ° C. for 40 days using a method of making a hole above the cultivation bag. This step was performed at 15 ° C., and mushrooms were generated in the step (d) by setting the distance between the bacterial beds to 1 cm.

(その2)その1と同様の菌床を、培養は20±1℃で、40日間管理し、同環境で栽培袋上方に穴を開けて袋内部に給水して菌床の底部及び側面が水に浸かる状態とし、さらに同環境で60日間培養を継続した。その後15℃の発生室に移動して栽培袋上部を切り取り、菌床同士の設置間隔を1cm取り、きのこの発生を行なった。
即ち、上記(イ)の工程を20±1℃で40日間管理し、(ロ)の工程を栽培袋の上方に穴を開ける方法を用い、20±1℃で60日間管理し、(ハ)の工程を15℃で行い、(ニ)の工程で菌床同士の間隔を1cmとしてきのこの発生を行ったものである。
(Part 2) The same fungus bed as that No. 1 is cultured at 20 ± 1 ° C for 40 days, and in the same environment, a hole is made above the cultivation bag and water is supplied to the inside of the bag. The culture was continued for 60 days in the same environment. After that, it moved to the generation room at 15 ° C., and the upper part of the cultivation bag was cut off, and 1 cm was placed between the fungus beds to generate mushrooms.
That is, the process (b) is managed at 20 ± 1 ° C. for 40 days, and the process (b) is managed at 20 ± 1 ° C. for 60 days using a method of making a hole above the cultivation bag. This step was performed at 15 ° C., and mushrooms were generated in the step (d) by setting the distance between the bacterial beds to 1 cm.

(その3)その1と同様の菌床を、培養は20±1℃で、60日間管理し、同環境で栽培袋上面を切り取り、菌床側面と栽培袋フィルムの間隙に給水した後散水を毎日1回として、さらに同環境で40日間培養を継続した。その後15℃の発生室に移動して栽培袋上部を切り取り、菌床同士の設置間隔を1cm取り、きのこの発生を行った。
即ち、上記(イ)の工程を20±1℃で60日間管理し、(ロ)の工程を、栽培袋上面を切り取り、菌床側面と栽培袋フィルムの間隙に給水した後散水を毎日1回行う方法を用い、20±1℃で40日間管理し、(ハ)の工程を15℃で行い、(ニ)の工程で菌床同士の間隔を1cmとしてきのこの発生を行ったものである。
(Part 3) The same fungus bed as that No. 1 was cultured at 20 ± 1 ° C. for 60 days, and the upper surface of the cultivation bag was cut out in the same environment, and water was supplied to the gap between the side of the fungus bed and the cultivation bag film. The culture was continued once a day for 40 days in the same environment. Then, it moved to the generation room at 15 ° C., and the upper part of the cultivation bag was cut off, and the interval between the bacteria beds was set at 1 cm to generate mushrooms.
That is, the process (a) is managed at 20 ± 1 ° C. for 60 days, and the process (b) is performed by cutting off the upper surface of the cultivation bag and supplying water to the gap between the side surface of the fungus bed and the cultivation bag film once every day. Using the method to be performed, it was controlled at 20 ± 1 ° C. for 40 days, the step (c) was carried out at 15 ° C., and the mushrooms were generated in the step (d) with the interval between the bacterial beds being 1 cm.

(対照例1)その1と同様の菌床を、培養は20±1℃で、100日間管理し、同環境で栽培袋上面を切り取り、15℃の発生室に移動し、菌床側面と栽培フィルムの間隙に給水して菌床同士の設置間隔を1cm取り、きのこの発生を行なった。
即ち、上記(イ)の工程を20±1℃で100日間管理し、(ロ)の工程を行わず、(ハ)の工程を15℃で行い、(ニ)の工程で菌床同士の間隔を1cmとしてきのこの発生を行ったものであり、培養が終了し完熟した菌床に高温処理を行わずに給水して栽培を行った方法である。
(Control Example 1) The same fungus bed as that No. 1 was cultured at 20 ± 1 ° C for 100 days, and the upper surface of the cultivation bag was cut out in the same environment and moved to the 15 ° C generation room. Mushrooms were generated by supplying water to the gap between the films and taking 1 cm between the bacteria beds.
That is, the process (b) is managed at 20 ± 1 ° C. for 100 days, the process (b) is not performed, the process (c) is performed at 15 ° C., and the interval between the bacterial beds in the process (d). This is a method in which mushrooms were generated with a 1 cm length, and the cultivation was completed by supplying water to the fully ripened fungus bed without performing high temperature treatment.

(対照例2)その1と同様の菌床を、培養は20±1℃で、100日間管理し、101日目から115日目までを25℃とした。25℃の環境で栽培袋上面を切り取り、菌床同士の設置間隔を1cmとして菌床側面と栽培フィルムの間隙に給水し、1日に1回の散水をしながら15日間管理して、20℃と25℃の管理期間に合わせて115日間とした。その後温度を15℃に低下させて、きのこの発生を行った。
即ち、上記(イ)の工程を20±1℃で100日間管理し、(ロ)の工程を、25℃で150日間管理し、栽培袋上面を切り取り菌床側面と栽培袋フィルムの間隙に給水し、1日1回の散水を行う方法を用い、(ハ)の工程を15℃で行い、(ニ)の工程で菌床同士の間隔を1cmとしてきのこの発生を行ったものであり、高温処理による抑制処理を施した背景技術に記載した栽培方法であり、先行技術1に基づく栽培方法である。
(Control 2) The same fungus bed as that No. 1 was cultured at 20 ± 1 ° C. for 100 days, and the temperature from the 101st day to the 115th day was 25 ° C. Cut the upper surface of the cultivation bag in an environment of 25 ° C, set the interval between the bacterial beds to 1 cm, supply water to the gap between the side of the bacterial bed and the cultivation film, and manage for 15 days with watering once a day, 20 ° C And 115 days in accordance with the management period of 25 ° C. Thereafter, the temperature was lowered to 15 ° C. to generate mushrooms.
That is, the process (b) is managed at 20 ± 1 ° C. for 100 days, the process (b) is managed at 25 ° C. for 150 days, the upper surface of the cultivation bag is cut off, and water is supplied to the gap between the fungus bed side and the cultivation bag film. In addition, using the method of watering once a day, the step (c) was performed at 15 ° C., and the mushrooms were generated in the step (d) with the interval between the bacterial beds being 1 cm. It is the cultivation method described in the background art which performed the suppression process by a process, and is a cultivation method based on the prior art 1. FIG.

その結果を表1に示す。

Figure 0004409972
The results are shown in Table 1.
Figure 0004409972

上記試験の結果、対照例1は側面からの発芽数が多数であるのに対し、本発明処理を施したその1〜3には側面からの発芽は殆ど見られなかった。又、高温処理を施した対照例2も側面からの発芽は少なかった。このことから、本発明方法には著しい原基の発芽抑制効果が認められ、且つ、高温処理を施さずとも高温処理を施した対照例2と同等の発芽抑制効果のあることが確認された。 As a result of the above test, while Control Example 1 has a large number of germinations from the side surface, almost no germination from the side surface was observed in those 1-3 subjected to the treatment of the present invention. Moreover, the control example 2 which performed the high temperature process also had few germination from the side surface. From this, it was confirmed that the method of the present invention has a remarkable primordial germination inhibitory effect and has the same germination inhibitory effect as that of Control Example 2 in which high temperature treatment was performed without high temperature treatment.

本発明は以上のように構成されるので、しいたけ菌床栽培の途中であって原基のほぼ未形成段階において、菌床側面及び底面部分との隙間には給水等して木材組織内部を飽水状態とするので、水分の過剰により空気が過少となり、菌糸が窒息状態となり、菌床側面及び底面からのきのこの発生が抑制される。
一方、該底面及び側面の辺縁部を除いた菌床内部では、引き続き菌糸の成長に適した温度と水分量等の環境が保たれ、菌糸の順調な成長で徐々に菌床上面に原基が形成されていくので、低温刺激後には開放された菌床上面からのみ選択的にきのこが発生する。
そして、上記工程にあって菌床を23〜35℃の高温に維持管理する必要はまったくなく、大型の暖房施設等を設ける等の必要は生じず、簡潔な栽培施設で足り、設備の簡略化が可能となる。
又、繊細な温度管理への神経を要さないので、工程の簡略化につながる。
Since the present invention is configured as described above, in the middle of shiitake fungus bed cultivation and in the almost unformed stage of the primordial base, the inside of the wood tissue is saturated by supplying water or the like to the gap between the side surface and the bottom surface portion of the fungus bed. Since it is in the water state, the air becomes excessive due to the excess of moisture, the hyphae become suffocated, and the generation of mushrooms from the side and bottom surfaces of the fungus bed is suppressed.
On the other hand, in the inside of the fungus bed excluding the bottom and side edges, the environment suitable for the growth of mycelium and the environment such as the amount of water is maintained, and the primordial base gradually rises to the upper surface of the fungus bed with the smooth growth of the mycelium. Since mushrooms are formed, mushrooms are selectively generated only from the upper surface of the opened fungus bed after low temperature stimulation.
In the above process, it is not necessary to maintain and manage the fungus bed at a high temperature of 23 to 35 ° C., and it is not necessary to provide a large heating facility or the like. A simple cultivation facility is sufficient, and the equipment is simplified. Is possible.
Moreover, since the nerve for delicate temperature control is not required, it leads to simplification of the process.

更に、容器上面においては原基形成の初期段階から充分な空気が供給されるため優良な原基形成が行われるので、生育するきのこの品質を向上させ得る。 Further, since sufficient air is supplied from the initial stage of the primordial formation on the upper surface of the container, excellent primordial formation is performed, so that the quality of growing mushrooms can be improved.

さらに、栽培袋上部を切除せずに栽培容器の上面に給水用穴を開けて給水するようにすれば、上面が過乾燥となることもなく、散水を行わずとも良いので効率的となる。 Furthermore, if water is supplied by opening a water supply hole on the upper surface of the cultivation container without excising the upper portion of the cultivation bag, the upper surface does not become excessively dry, and it is not necessary to spray water.

又、形成された原基からのきのこの発生は、上面のみに選択的に集中され底面及び側面から出るのが除かれる分、一個々の個重が重く、ボリュームのある高品質のきのこが得られ、同時に、収穫の手間が少なく、高単価で販売できるので収益性の非常に良いものとなる。 In addition, the generation of mushrooms from the formed primordium is concentrated selectively only on the top surface and removed from the bottom and side surfaces, so that each individual weight is heavy and a high quality mushroom with a large volume is obtained. At the same time, it is very profitable because it requires little labor and can be sold at a high unit price.

本発明は、しいたけ菌床の上面に特定してきのこを発生させるしいたけ菌床の培養管理方法に利用できるものであるが、同様の原理でハタケジメジ等にも応用の可能なものである。 The present invention can be applied to a method for cultivating shiitake mushroom beds that specifically generate mushrooms on the upper surface of shiitake mushroom beds, but can also be applied to hatakejiji and the like on the same principle.

本発明の1実施例を示す栽培容器の一形態図One form figure of the cultivation container which shows one Example of this invention しいたけ菌床上面発生のための培養成長させる一形態図One form of culture growth for upper surface generation of shiitake mushroom bed

符号の説明Explanation of symbols

1 栽培容器
2 フィルター
3 菌床
4 原基ができていない未熟な菌床
5 給水用穴
6 給水ホース
7 給水
8 菌床上面
9 水
10 輪ゴム
11 排水孔
12 しいたけ
DESCRIPTION OF SYMBOLS 1 Cultivation container 2 Filter 3 Bacteria bed 4 Immature fungi bed without primordial base 5 Water supply hole 6 Water supply hose 7 Water supply 8 Bacteria bed upper surface 9 Water 10 Rubber band 11 Drainage hole 12 Shiitake mushroom

Claims (2)

しいたけ菌床栽培の培養途中であって、菌床全体に菌糸が蔓延して培地の養分を分解・吸収し始める頃ではあるが、原基は殆ど形成されていない段階において、
栽培容器の菌床側面及び底面部分との隙間に給水等して、菌床側面及び底面部分に沿った木材組織の内部を飽水状態としたまま培養を継続し、
当該飽水状態によって菌床側面及び底面からのきのこの発生を抑制し、菌床上面からのみきのこを発生させることを特徴とするしいたけ菌床の培養管理方法。
In the middle of the cultivation of Shiitake fungus bed cultivation, the mycelium spreads throughout the fungus bed and begins to decompose and absorb the nutrients of the medium, but at the stage where almost no primordial is formed,
Supply water to the gap between the fungus bed side and bottom part of the cultivation container, and continue culturing while the inside of the wood tissue along the fungus bed side and bottom part is saturated,
A method for cultivating shiitake mushroom beds, characterized in that mushrooms are suppressed from the side and bottom surfaces of the fungus bed and mushrooms are generated from the upper surface of the fungus bed by the saturated water state.
しいたけ菌床栽培の培養途中であって原基のほぼ未形成段階において、栽培容器の上面に給水用穴を配備する請求項1記載のしいたけ菌床の養管理方法。 The method for cultivating shiitake mushroom beds according to claim 1, wherein a water supply hole is provided on the upper surface of the cultivation container in the middle of culturing of shiitake mushroom bed cultivation and in a substantially unformed primordial stage.
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