JPH10271913A - Generation of mushroom bed of cortinellus shiitake - Google Patents

Generation of mushroom bed of cortinellus shiitake

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Publication number
JPH10271913A
JPH10271913A JP9290387A JP29038797A JPH10271913A JP H10271913 A JPH10271913 A JP H10271913A JP 9290387 A JP9290387 A JP 9290387A JP 29038797 A JP29038797 A JP 29038797A JP H10271913 A JPH10271913 A JP H10271913A
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JP
Japan
Prior art keywords
bed
cultivation
mushrooms
mushroom
bacterial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9290387A
Other languages
Japanese (ja)
Other versions
JP3087171B2 (en
Inventor
Sadayuki Inoue
貞行 井上
Sumio Ayusawa
澄夫 鮎澤
Katsumasa Eda
克昌 枝
Shigeo Takano
茂雄 高野
Katsuaki Onodera
勝昭 小野寺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HOTSUKEN KK
Original Assignee
HOTSUKEN KK
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Priority to JP09290387A priority Critical patent/JP3087171B2/en
Publication of JPH10271913A publication Critical patent/JPH10271913A/en
Application granted granted Critical
Publication of JP3087171B2 publication Critical patent/JP3087171B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a method for germination of a mushroom bed of Cortinellus shiitake, capable of continuously germinating highquality mushrooms from the top of a mushroom bed without damaging the mushroom bed. SOLUTION: In a germination process after the completion of culture of mushroom bed cultivation of Cortinellus shiitake, the top of a culture container is removed, only the top of a mushroom bed is exposed, the other parts are left as a culture container with retaining somewhat gap between the side and the bottom part of the mushroom bed and the parts. Water is poured into the gap so as to suppress the germination of mushroom from the side and the bottom of the mushroom bed and to germinate mushrooms only from the top of the mushroom bed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、しいたけ菌床栽培
の培養完了後の発生工程において、菌床を損傷させるこ
となく、優良品質のきのこを菌床の上面から継続的に発
生させるしいたけ菌床の発生方法に関する。
TECHNICAL FIELD The present invention relates to a shiitake mushroom bed which continuously produces excellent quality mushrooms from the upper surface of the mushroom bed without damaging the mushroom bed in a generation step after completion of the cultivation of the mushroom bed. The method of occurrence.

【0002】[0002]

【従来の技術】これまでの常法である菌床を裸にして全
面を露出させる発生方法においては、きのこの発生を促
す2通りの方式があり、いずれかの方法が採用されてい
る。第一の方式は、菌床が乾燥しないよう毎日1〜3時
間程度、多量に連続して散水を行い、きのこが発生して
くるのを待つという方式で「散水方式」と呼ばれてい
る。この場合には、きのこが長時間に亙り少しずつ発生
する分散的な発生となる。この散水方式には、散水する
ための大量の水が必要なこと、毎日の散水のため、発生
してくるきのこが、95%というような水分の多いきの
ことなり、日持ちが悪いという品質上の問題点がある。
2. Description of the Related Art In a conventional method of exposing the entire surface of a fungus bed to nakedness, there are two methods for promoting the occurrence of mushrooms, and either method is employed. The first method is a method in which a large amount of water is continuously sprayed for about 1 to 3 hours every day so as not to dry the bacterial bed, and the system waits for the occurrence of mushrooms, which is called a "watering method". In this case, the mushrooms are generated in a distributed manner in which the mushrooms are gradually generated for a long time. This sprinkling method requires a large amount of water to sprinkle water, and the mushrooms that occur due to daily sprinkling are mushrooms with a high moisture content of 95%, which is a quality problem of poor shelf life. There is a point.

【0003】第二の方式は、原木栽培と同様に菌床を浸
水することにより、菌床への水の補給と水温による低温
刺激を与えて、きのこの発生を促す方式で「浸水方式」
と呼ばれ、20日〜30日に1回程度浸水を繰り返す。
この場合には刺激により集中的な発生となる。この浸水
方式では、水分が85%〜90%の優良な品質のきのこ
の生長収穫ができるが、裸にした菌床の水分管理が難し
く、一般に乾燥し過ぎて次回の発生が不良となること、
さらに浸水時の窒息で菌床の活力が低下して菌床の寿命
が短くなり、一代の発生量が少ないという問題点があ
る。
[0003] The second method is a method in which a fungus bed is submerged in the same manner as in log cultivation, whereby water is supplied to the fungus bed and a low-temperature stimulus is given by the water temperature to promote the occurrence of mushrooms.
It is called about once every 20 to 30 days.
In this case, the stimulus causes intensive generation. In this flooding method, it is possible to grow mushrooms of excellent quality with a water content of 85% to 90%, but it is difficult to control the moisture content of the bare bacterial bed, and it is generally too dry to cause the next generation to occur.
Furthermore, there is a problem that the viability of the bacterial bed is reduced by suffocation at the time of inundation, the life of the bacterial bed is shortened, and the amount of generation in the first generation is small.

【0004】そしてこれらいずれの方式においても、菌
床の全面からきのこが発生するので、側面から発生する
きのこが互いに接触して変形が起こるのを防ぐため、発
生室における菌床の配置の仕方は、菌床どうしの間隔を
数cm〜10cm程度開けて並べる方法が一般に行われてい
る。このため発生室の収容密度が低く、広い面積の発生
室が必要となるという問題点がある。
[0004] In any of these methods, mushrooms are generated from the entire surface of the microbial bed, so that the mushrooms generated from the side surfaces are prevented from coming into contact with each other and deforming. Generally, a method of arranging bacterial beds at intervals of about several cm to 10 cm is generally used. For this reason, there is a problem that the accommodation density of the generation chamber is low and a generation chamber having a large area is required.

【0005】菌床の全面から発生するのを抑制する技術
として、特開昭63−276421が提案されている。
この方法は、合成樹脂製袋を栽培容器として長円柱状に
菌床を成形し、上部中央には浅い穴を設けることで、菌
床上部を早く完熟させ、発生工程では菌床の上面を露出
させ、当該露出面からのみきのこを生長収穫する。この
方法によると、中下段の部分は穴がないので熟成が遅れ
て未熟の状態にあり、菌床上部以外の部分からはきのこ
の発生を抑制することができる。
Japanese Patent Application Laid-Open No. 63-276421 has been proposed as a technique for suppressing generation from the entire surface of a bacterial bed.
This method uses a synthetic resin bag as a cultivation container, forms a bacterial bed in an oval column shape, and provides a shallow hole at the center of the upper part to quickly mature the upper part of the bacterial bed, exposing the upper surface of the bacterial bed in the generation process. Then, grow mushrooms from the exposed surface. According to this method, the middle and lower tiers have no holes, so that ripening is delayed and they are in an immature state, and the occurrence of mushrooms from portions other than the upper portion of the bacterial bed can be suppressed.

【0006】しかし、1番〜2番発生では熟成の進んだ
菌床上部からきのこが発生するが、やがて下部も熟成し
てくるようになり、培地の分解により菌床側面と袋の間
に隙間ができ、この隙間のできた部分に原基が形成さ
れ、3番以降の発生では側面にもきのこが発生してくる
ようになる。従って、3番発生以降の管理は側面の袋を
取り除いて管理することが必要となり、菌床の全面を露
出して発生管理するのと同様の問題がおこる。また、こ
の方法は菌床の形状が長円柱状に限定されるのに対し、
最近、大きいきのこが発生しやすいように大きい菌床
(培地重量が2.5kg〜3kg程度)を使い、更に収容密
度を高めるため角型の菌床が多く採用されており、この
角型の菌床では仕込み時から菌床側面と袋の間に隙間が
できており、1番発生から菌床側面にきのこが発生す
る。即ち、菌床上面のみからの発生が継続せず、また角
型の菌床には不適なため、一般には採用されるに至って
いない。
[0006] However, in the case of No. 1 or No. 2, mushrooms are generated from the upper part of the aged bacterial bed, but the lower part also matures over time, and the space between the side surface of the bacterial bed and the bag is formed due to decomposition of the medium. The primordium is formed in the space where the gap is formed, and mushrooms are generated on the side surface in the case of the third and subsequent generations. Therefore, after the third occurrence, it is necessary to remove and manage the bag on the side, and the same problem as in the case of exposing and controlling the entire surface of the bacterial bed occurs. In addition, in this method, while the shape of the bacterial bed is limited to a long columnar shape,
Recently, large bacterial beds (medium weight of about 2.5 kg to 3 kg) are used to easily generate large mushrooms, and square bacterial beds are often used to further increase the storage density. On the floor, a gap is formed between the side of the bacterial bed and the bag from the time of preparation, and mushrooms occur on the side of the bacterial bed from the first occurrence. That is, since generation from only the upper surface of the bacterial bed does not continue, and it is unsuitable for a square bacterial bed, it has not been generally adopted.

【0007】このように現時点では、幾多の問題点を抱
えながらも、菌床の全面露出による方法が広く行われて
いる実情にある。
[0007] As described above, at present, there are many problems, but the method of exposing the entire surface of the bacterial bed is widely used.

【0008】[0008]

【発明が解決しようとする課題】本発明は従来のかかる
問題点を解消するためになされたもので、円柱状及び角
型を問わずどんな形状の菌床であっても、簡易な方法に
より、上面のみを露出させた菌床の水分を適正に保持し
て、優良な品質のきのこが上面からのみ継続的に発生す
るしいたけ菌床の発生方法を提供する。
SUMMARY OF THE INVENTION The present invention has been made in order to solve the conventional problems, and it is possible to use a simple method for a bacterial bed of any shape irrespective of a columnar or square shape. Provided is a method for generating a shiitake mushroom bed in which mushrooms of excellent quality are continuously generated only from the upper surface while appropriately retaining moisture of the bacterial bed with only the upper surface exposed.

【0009】[0009]

【課題を解決するための手段】上記目的を達成するた
め、本発明は、しいたけ菌床栽培の培養完了後の発生工
程において、栽培容器の上部を取除いて菌床上面のみを
露出させ、その他の部分は菌床側面及び底面部分との間
に若干の隙間を保持させて栽培容器として残し、その隙
間に注水することで菌床側面及び底面からのきのこの発
生を抑制し、菌床上面からのみ発生させることを特徴と
するしいたけ菌床の発生方法である。
Means for Solving the Problems In order to achieve the above-mentioned object, the present invention provides a method for removing the upper part of a cultivation vessel and exposing only the upper surface of a bacterium in a developing step after completion of cultivation of a shiitake bacterium. The part is kept as a cultivation container by holding a slight gap between the bacterial bed side and the bottom part, suppressing the occurrence of mushrooms from the bacterial bed side and bottom by pouring water into the gap, from the bacterial bed top This is a method for generating a bed of Shiitake mushrooms, characterized in that the bed is generated.

【0010】また上記構成において、栽培容器の上部を
取除いて菌床上面のみを露出させたうえ、その 栽培容
器の上縁部を外側から伸縮体で軽く絞ることにより菌床
側面と前記上縁部内壁との空間を狭くして成るしいたけ
菌床の発生方法である。
[0010] In the above structure, the upper part of the cultivation container is removed to expose only the upper surface of the cultivation bed, and the upper edge portion of the cultivation container is lightly squeezed from the outside with an elastic body, so that the side surface of the bacterium bed and the upper edge are removed. This is a method for generating a shiitake mushroom bed by narrowing the space between the inner wall and the inner wall.

【0011】また上記各構成において、培養完了前の少
なくとも3日間乃至発生工程に入った直後の少なくとも
5日間の期間を23℃〜30℃の温度帯で管理して菌床
上面の露出時に加わる開放刺激によるきのこの発生を抑
制し、その後随時に10℃〜20℃の温度に下げること
で、菌床上面からのみ効果的に発生させるしいたけ菌床
の発生方法である。
[0011] In each of the above structures, at least 3 days before the completion of the culture and at least 5 days immediately after the start of the development step are controlled in a temperature range of 23 ° C to 30 ° C, and the opening added when the upper surface of the bacterial bed is exposed is controlled. This is a method of generating a Shiitake mushroom bed that effectively generates mushrooms only from the upper surface of the bacterial bed by suppressing the occurrence of mushrooms due to stimulation and then lowering the temperature to 10 ° C. to 20 ° C. as needed.

【0012】さらに上記各構成において栽培容器の下部
に排水小孔を開設し、菌床側面及び底面と栽培容器の隙
間に注水した水の自然減量による空気の送込みと完全排
水後の補給注水による水の送込みを間断に繰り返すこと
で、菌床全面の活性化を図り、継続的なきのこの発生を
促すしいたけ菌床の発生方法である。
In each of the above constructions, a drainage hole is provided at the lower part of the cultivation container, and air is supplied by natural reduction of the water injected into the clearance between the side and bottom surfaces of the bacteria bed and the cultivation container, and replenishment after complete drainage. This is a method of generating a shiitake mushroom bed that repeatedly activates the whole surface of the bacterial bed by interrupting the supply of water and promotes continuous mushroom generation.

【0013】[0013]

【実施の形態】Embodiment

(その1)第1図に示すような菌床10を用意した。こ
の菌床10は栽培容器にポリプロピレン製袋にフィルタ
−が装着された栽培袋を使用し、横20cm縦12cm高さ
17cm重量約2700gの角型に培地を成形し、常法に
より殺菌、冷却、接種を行った。種菌は北研600号を
使用した。培養は20℃±1℃で100日間管理し、1
5℃の環境で栽培袋上面を切り取り、第3図に示すよう
に菌床同士の設置間隔を1cmとり、菌床側面と栽培袋フ
ィルムの隙間に注水した後散水を3日に1回としてきの
この発生を行った。
(Part 1) A bacterial bed 10 as shown in FIG. 1 was prepared. This bacterial bed 10 uses a cultivation bag in which a filter is mounted on a polypropylene bag in a cultivation container, forms a medium into a square shape having a width of 20 cm, a length of 12 cm, a height of 17 cm and a weight of about 2700 g, and is sterilized and cooled by a conventional method. Inoculation was performed. Hokuken 600 was used as the inoculum. Culture is controlled at 20 ° C ± 1 ° C for 100 days.
Cut off the top of the cultivation bag in an environment of 5 ° C, set the spacing between the bacterial beds as 1cm as shown in Fig. 3, pour water into the gap between the side of the bacterial bed and the cultivation bag film, and spray water once every three days, then mushrooms Occurred.

【0014】(その2)(その1)と同様の菌床を、培
養は20℃±1℃で80日間管理し、81日目から85
日目までを25℃とした。25℃の環境で栽培袋上面を
切り取り、図2に示すように菌床同士の設置間隔を1cm
として菌床側面と栽培袋フィルムの隙間に注水し、1日
に1回の散水をしながら15日間管理をして、20℃と
25℃の管理期間を合わせて100日間とした。その後
温度を15℃に低下させて、散水を3日に1回としてき
のこの発生を行った。
(Part 2) The same bacterial bed as in (Part 1) is cultured at 20 ° C. ± 1 ° C. for 80 days.
The temperature was 25 ° C. until the day. Cut the top of the cultivation bag in an environment of 25 ° C., and set the spacing between the bacterial beds to 1 cm as shown in FIG.
Water was injected into the gap between the side of the fungus bed and the cultivation bag film, and water was sprayed once a day for 15 days, and the management period at 20 ° C. and 25 ° C. was 100 days. Thereafter, the temperature was lowered to 15 ° C., and watering was performed once every three days to generate mushrooms.

【0015】(その3)栽培袋上面切り取り時にあわせ
てふくろ低部に小孔を開けて他の環境は(その2)と同
様に管理し、きのこの発生を行った。
(Part 3) At the time of cutting the upper surface of the cultivation bag, small holes were made in the lower part of the owl, and other environments were managed in the same manner as in (Part 2), and mushrooms were generated.

【0016】(その4)栽培袋上部切取り時にあわせて
上部切取り済みである栽培袋の上縁部を外側より弱い伸
縮率の輪ゴムで軽く絞り、その他の環境は(その3)と
同様に管理し、きのこを発生させた。輪ゴムによる上縁
部の絞り込みにより菌床側面と前記上縁部内壁との空間
がより狭くなる結果、栽培容器内の乾燥が有効に防止さ
れ、菌床全面の活性化が助長されて継続的なきのこの発
生が促される。
(Part 4) The upper edge of the cultivation bag, which has been cut off at the time of cutting the upper part of the cultivation bag, is lightly squeezed with a rubber band having a lower elasticity than the outside, and the other environment is managed in the same manner as (Part 3). , Caused mushrooms. As a result of narrowing the space between the bacterial bed side surface and the upper edge inner wall by narrowing the upper edge portion by a rubber band, drying in the cultivation container is effectively prevented, and activation of the entire bacterial bed is promoted and continued. The occurrence of mushrooms is encouraged.

【0017】(対照例)菌床を20℃±1℃で100日
間培養し、栽培袋全部を取り除き、菌床同士の間隔を1
0cm空けて設置した。その後の温度を15℃に低下させ
て、第1回目のきのこ発生及び収穫の後、3時間程度の
浸水管理を行って第2回目以降のきのこの発生を行っ
た。
(Control) The bacterial bed was cultured at 20 ° C. ± 1 ° C. for 100 days, all the cultivation bags were removed, and the distance between the bacterial beds was 1
It was set 0cm apart. Thereafter, the temperature was lowered to 15 ° C., and after the first mushroom generation and harvesting, flood control was performed for about 3 hours to perform the second and subsequent mushroom generations.

【0018】その結果を下記の表1に示す。The results are shown in Table 1 below.

【0019】[0019]

【表1】 試験数 1菌床1世代当りの芽数 きのこの 1菌床の 上面 側面 底面 合計 平均個重 平均発生量 (その1) 1000 41 8 0 49 24g 1176g (その2) 1000 47 1 0 48 24g 1152g (その3) 1000 55 1 0 56 23g 1288g (その4) 1000 58 0 0 58 23g 1334g 対照例 1000 13 68 11 92 12g 1104g[Table 1] Number of tests Number of buds per generation per bacterial bed Top surface Side surface Bottom of mushrooms Total average individual weight Average generation amount (Part 1) 1000 4180 49 24 g 1176 g (Part 2) 1000 47 10 48 24 g 1152 g (Part 3) 1000 55 10 56 23 g 1288 g (Part 4) 1000 5800 58 23 g 1334 g Control example 1000 13 68 11 92 12 g 1104 g

【0020】上記の結果から明らかなように、各実施の
形態は対照例に比べ大幅に菌床上面からの発生芽数が多
く、比率も高い。また、実施態様の比較では、その1<
その2<その3の順に菌床上面からのきのこの発生率が
高くなっている。さらに、きのこの平均個重が対照例1
2gに比較して実施の態様は23〜24gと約2倍の重
さでボリュ−ムのある良品質のきのこが多く、収穫の手
間が少なく高単価で販売できるため収益性が非常に良い
ことを示しており、きのこの総重量も多い。
As is clear from the above results, the number of buds generated from the upper surface of the bacterial bed is much higher in each embodiment than in the control example, and the ratio is high. Further, in comparison of the embodiments, 1 <
The occurrence rate of mushrooms from the upper surface of the bacterial bed increases in the order of 2 <3. Furthermore, the average individual weight of the mushrooms was the control example 1.
In comparison with 2 g, the embodiment is 23 to 24 g, which is about twice as heavy, has many mushrooms of good quality with volume, and has a very high profitability because it can be sold at a high unit price with little labor for harvesting. Shows that the total weight of the mushroom is also high.

【0021】[0021]

【再び実施の形態】[Embodiment again]

(その5)前記の各実施の態様は、栽培環境を空調によ
ってコントロ−ルした場合を示したが、自然栽培にも応
用が可能である。その1と同様の菌床10を冬〜春にか
けて準備し、自然環境において培養を行い、夏場の25
℃を超える高温時期に栽培袋の上部分を切り取り、袋の
底部分に小孔を開けて散水管理を行った。散水は1日に
1回の割合で、菌床側面と袋フィルムの間に水が溜まる
程度に行い、溜まった水は、底部分の小孔から数分間で
排出された。上記のような管理を行いながら秋期の気温
の低下を持つと、最低温度が15℃を下回るころから、
菌床上面のみからきのこの発生が確認された。また、対
照区として高温時期に袋をすべて取り去り、菌床を裸の
状態で散水管理を行ってきたものは、発生時期は同様で
あったが、きのこの発生は菌床の全面から行われた。
(Part 5) In each of the embodiments described above, the case where the cultivation environment is controlled by air conditioning is shown, but it is also applicable to natural cultivation. A fungal bed 10 similar to the first one is prepared from winter to spring, and cultured in a natural environment.
The upper part of the cultivation bag was cut off at a high temperature exceeding ℃, and a small hole was made in the bottom of the cultivation bag to perform watering management. Watering was performed once a day to the extent that water was collected between the side surface of the bacterial bed and the bag film, and the collected water was discharged from the small hole at the bottom in a few minutes. If the temperature falls in the fall during the above management, the minimum temperature will fall below 15 ° C.
The occurrence of mushrooms was confirmed only from the upper surface of the bacterial bed. In addition, as a control, all the bags were removed during the high temperature period, and the sprinkling control was performed with the bacterial bed naked, but the occurrence time was the same, but the mushroom was generated from the entire surface of the bacterial bed .

【0022】その結果を下記の表2に示す。The results are shown in Table 2 below.

【0023】[0023]

【表2】 試験数 1菌床1世代当りの芽数 きのこの 1菌床の 上面 側面 底面 合計 平均個重 平均発生量 (その5) 1000 56 4 0 60 22g 1320g 対照例 1000 5 66 13 84 15g 1260g[Table 2] Number of tests Number of buds per generation per bacterial bed Top surface Side surface Bottom of mushroom bed Total average individual weight Average generation amount (Part 5) 1000 56 40 60 22 g 1320 g Control example 1000 5 66 13 84 15 g 1260g

【0024】対照例に比べ大幅に菌床上面からの発生芽
数が多く、比率も高い。また、きのこの平均個重も対照
例に比較して重くボリュ−ムのある良品質のきのこが採
れている。
The number of buds generated from the upper surface of the bacterial bed is much higher than that of the control, and the ratio is high. Also, the average individual weight of the mushrooms is heavier than that of the control, and a good quality mushroom with a volume is obtained.

【0025】本発明は、以上のように構成されているの
で、露出した菌床の上面は新鮮な空気に触れて、上部表
面に準備されていた原基は適正な環境で、きのこへと生
長し、側面及び底面の原基は、菌床側面と袋の隙間に注
水して水と接触させることでその生長活動を抑制するも
のである。なお、栽培容器の上部を取除いて菌床上面の
みを露出させたうえ、その 栽培容器の上縁部を外側か
ら伸縮体で軽く絞ることにより菌床側面と前記上縁部内
壁との空間を狭くした
[0025] Since the present invention is configured as described above, the upper surface of the exposed bacterial bed is exposed to fresh air, and the primordium prepared on the upper surface grows into mushrooms in an appropriate environment. On the other hand, the primordium on the side surface and the bottom surface suppresses the growth activity by injecting water into the gap between the side surface of the fungus bed and the bag and bringing it into contact with water. In addition, after removing the upper part of the cultivation container and exposing only the upper surface of the cultivation bed, the upper edge of the cultivation container is lightly squeezed with an elastic body from the outside to thereby reduce the space between the bacterium bed side surface and the inner wall of the upper edge. Narrowed

【0026】菌床の側面及び底面が余りにも長時間に亘
って水と接触していると、部分的に水分過多となるの
で、栽培容器の下部に排水用の小孔から水が抜けること
により空気に入替わる状態を間断に繰り返すことが容易
にできる。また、余分な水は排水用の小孔から速やかに
抜けるので、菌床の上から直接散水するという簡易な方
法で側面と栽培容器の隙間へ注水ができる。散水も隙間
が一時的に満水となる程度で充分なので、多量の水は、
必要としない。菌床側面が栽培容器に包まれていること
で容易に水分が保持できて過乾燥になることがなく、側
面隙間の水と空気の交互の入替えによりしいたけ菌糸は
健康に活動し、菌床内の水分状態は適正に保たれて寿命
が長くなり、菌床上面から継続してきのこを発生するの
に効果的である。
If the side and bottom surfaces of the microbial bed have been in contact with water for too long a period of time, there will be a partial excess of water. The state in which the air is replaced can be easily repeated intermittently. In addition, since excess water quickly escapes from the small holes for drainage, water can be injected into the gap between the side surface and the cultivation container by a simple method of spraying water directly from the bacterial bed. Sprinkling is enough that the gap is temporarily full, so a lot of water
do not need. The side of the fungus bed is wrapped in a cultivation container, so that moisture can be easily retained and it does not become over-dried. The water condition is maintained properly and the life is prolonged, which is effective for continuously generating mushrooms from the upper surface of the bacterial bed.

【0027】このように栽培容器の一部を取り除いて菌
床上面を露出させることは、側面にある原基にも刺激を
加えることであり、一方、菌床側面と容器の隙間への注
水はこの部分の原基の生長を抑制することであり、抑制
力が刺激より強いことが必要となる。例えば、菌床の移
動後に露出させる場合、移動方法によっては強い振動の
刺激が加わり、きのこが発生してくる可能性が高まる。
そこで抑制をより確実にするために、培養完了の少なく
とも3日前から23℃〜35℃の温度帯で管理し、その
後、栽培容器の一部を取り除いて菌床上面を露出させ、
菌床側面と容器の隙間に注水する作業を行い、その後も
続けて3日間以上23℃〜35℃の温度帯で管理するこ
とによりきのこが発生しにくい温度条件下に置き、菌床
上面を露出させたときに加わる一時的な開放刺激による
きのこの発生を避けることができ、その後発生させたい
時点で10℃〜20℃の温度に下げることで、上面から
のみ効果的に発生させることができる。
The removal of a part of the cultivation container to expose the upper surface of the bacterial bed in this way is to stimulate the primordium on the side surface, while water is injected into the gap between the side surface of the bacterial bed and the container. This is to suppress the growth of the primordium in this part, and it is necessary that the inhibitory force be stronger than the stimulus. For example, in the case of exposing after the movement of the bacterial bed, a strong vibration stimulus is applied depending on the moving method, and the possibility of occurrence of mushrooms increases.
Therefore, in order to more reliably suppress, at least 3 days before the completion of the cultivation, the temperature is controlled in a temperature zone of 23 ° C. to 35 ° C., and then a part of the cultivation container is removed to expose the upper surface of the bacterial bed,
Perform the work of injecting water into the gap between the side of the bacterial bed and the container, and then keep the temperature in the temperature zone of 23 ° C to 35 ° C for at least 3 days after that, place it under conditions where mushrooms are unlikely to occur, and expose the upper surface of the bacterial bed It is possible to avoid the occurrence of mushrooms due to the temporary opening stimulus applied at the time of the release, and to reduce the temperature to 10 ° C. to 20 ° C. at the time of the subsequent generation, thereby effectively generating the mushrooms only from the upper surface.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明方法の手順を示す模式図。FIG. 1 is a schematic view showing the procedure of the method of the present invention.

【図2】本発明方法を実施した場合の発生室における栽
培容器の配置状態を示す略図的側面図。
FIG. 2 is a schematic side view showing an arrangement state of a cultivation container in a generation chamber when the method of the present invention is performed.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 高野 茂雄 栃木県下都賀郡壬生町駅東町7番3号株式 会社北研内 (72)発明者 小野寺 勝昭 岩手県胆沢郡胆沢町若柳字愛宕517 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shigeo Takano 7-3 Higashicho, Mibucho-eki, Shimotsuga-gun, Tochigi Pref.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 しいたけ菌床栽培の培養完了後の発生工
程において、栽培容器の上部を取除いて菌床上面のみを
露出させ、その他の部分は菌床側面及び底面部分との間
に若干の隙間を保持させて栽培容器として残し、その隙
間に注水することで菌床側面及び底面からのきのこの発
生を抑制し、菌床上面からのみ発生させることを特徴と
するしいたけ菌床の発生方法。
In the generation step after the completion of cultivation of Shiitake mushroom bed cultivation, the top of the cultivation vessel is removed to expose only the top of the mushroom bed, and other parts are slightly spaced between the side and bottom of the mushroom bed. A method of generating a Shiitake mushroom bed, wherein a mushroom from the side and bottom surfaces of a bacterial bed is suppressed by retaining a gap and left as a cultivation container, and water is injected into the gap to generate mushrooms only from the upper surface of the bacterial bed.
【請求項2】 栽培容器の上部を取除いて菌床上面のみ
を露出させたうえ、その栽培容器の上縁部を外側から伸
縮体で軽く絞ることにより菌床側面と前記上縁部内壁と
の空間を狭くした請求項1記載のしいたけ菌床の発生方
法。
2. The method according to claim 2, wherein only the upper surface of the cultivation container is exposed by removing the upper portion of the cultivation container, and the upper edge portion of the cultivation container is lightly squeezed with an elastic body from the outside, so that the bacterium bed side surface and the upper edge portion inner wall are separated. The method according to claim 1, wherein the space is narrowed.
【請求項3】 培養完了前の少なくとも3日間及び/又
は発生工程管理後の少なくとも3日間の期間を23℃〜
35℃の温度帯で管理して菌床上面の露出時に加わる開
放刺激によるきのこの発生を抑制し、その後随時に10
℃〜20℃の温度に下げることで、菌床上面からのみ効
果的に発生させる請求項1又は2記載のしいたけ菌床の
発生方法。
3. The method of claim 3, wherein the period of at least 3 days before the completion of the culture and / or at least 3 days after the control of the development step is from 23 ° C.
The temperature was controlled at a temperature of 35 ° C. to suppress the occurrence of mushrooms due to the open stimulus applied when the upper surface of the bacterial bed was exposed.
The method according to claim 1, wherein the temperature is reduced to a temperature of from 20 ° C. to 20 ° C. to effectively generate only the upper surface of the bacterial bed.
【請求項4】 栽培容器の下部に排水小孔を開設し、菌
床側面及び底面と栽培容器の隙間に注水した水の自然減
量による空気の送込みと完全排水後の補給注水による水
の送込みを間断に繰り返すことで、菌床全面の活性化を
図り、継続的なきのこの発生を促す請求項1ないし3の
うちいずれか一項記載のしいたけ菌床の発生方法。
4. A drain hole is provided at the lower part of the cultivation container, and air is supplied by natural reduction of water injected into the gap between the cultivation container and the side and bottom of the fungus bed, and water is supplied by replenishing water after complete drainage. The method of claim 1, wherein activation of the entire surface of the bacterial bed is promoted by repeatedly interrupting the mushrooming to promote continuous mushroom generation.
JP09290387A 1997-01-31 1997-10-06 Generation method of Shiitake mushroom bed Expired - Lifetime JP3087171B2 (en)

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JP9-33174 1997-01-31
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6334274B1 (en) * 1997-02-17 2002-01-01 Kabushiki Kaisha Hokken Method of sawdust-based cultivation shitake (Cortinellus shitake)
US6367191B1 (en) 1999-10-26 2002-04-09 Kabushiki Kaisha Hokken Method of sawdust-based cultivation of shiitake (Cortinellus shiitake) and a cultivation water tank used for the method
JP2005204604A (en) * 2004-01-26 2005-08-04 Hokken Co Ltd Method for cultivating lentinus edodes mushroom bed and cultivating container
JP2006141288A (en) * 2004-11-19 2006-06-08 Hokken Co Ltd Mushroom culture medium and apparatus for producing the same
JP2008283990A (en) * 2008-09-04 2008-11-27 Kazuyuki Eda Method for culturing cortinellus shiitake
JP2009296888A (en) * 2008-06-10 2009-12-24 Kazuyuki Eda Method for cultivating shiitake mushroom
JP2016093159A (en) * 2014-11-17 2016-05-26 株式会社北研 Method of cultivating mushroom bed shiitake

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6334274B1 (en) * 1997-02-17 2002-01-01 Kabushiki Kaisha Hokken Method of sawdust-based cultivation shitake (Cortinellus shitake)
US6367191B1 (en) 1999-10-26 2002-04-09 Kabushiki Kaisha Hokken Method of sawdust-based cultivation of shiitake (Cortinellus shiitake) and a cultivation water tank used for the method
JP2005204604A (en) * 2004-01-26 2005-08-04 Hokken Co Ltd Method for cultivating lentinus edodes mushroom bed and cultivating container
JP2006141288A (en) * 2004-11-19 2006-06-08 Hokken Co Ltd Mushroom culture medium and apparatus for producing the same
JP2009296888A (en) * 2008-06-10 2009-12-24 Kazuyuki Eda Method for cultivating shiitake mushroom
JP2008283990A (en) * 2008-09-04 2008-11-27 Kazuyuki Eda Method for culturing cortinellus shiitake
JP2016093159A (en) * 2014-11-17 2016-05-26 株式会社北研 Method of cultivating mushroom bed shiitake

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