JP4404647B2 - Electronic device and electronic component sealing substrate - Google Patents

Electronic device and electronic component sealing substrate Download PDF

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JP4404647B2
JP4404647B2 JP2004012574A JP2004012574A JP4404647B2 JP 4404647 B2 JP4404647 B2 JP 4404647B2 JP 2004012574 A JP2004012574 A JP 2004012574A JP 2004012574 A JP2004012574 A JP 2004012574A JP 4404647 B2 JP4404647 B2 JP 4404647B2
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main surface
electronic component
substrate
conductive adhesive
semiconductor substrate
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JP2005209752A (en
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康雄 福田
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Kyocera Corp
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Kyocera Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/94Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices

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Description

本発明は、微小電子機械機構およびこれに電気的に接続された電極が半導体基板の主面に形成されて成る電子部品を気密に封止した構造の電子装置、および電子装置を封止するための電子部品封止用基板に関するものである。 The present invention relates to an electronic device having a structure in which an electronic component in which a micro-electromechanical mechanism and electrodes electrically connected thereto are formed on a main surface of a semiconductor substrate are hermetically sealed, and to seal the electronic device those related to the electronic component sealing board.

近年、シリコンウェーハ等の半導体基板の主面に、半導体集積回路素子等の微細配線を形成する加工技術を応用して、極めて微小な電子機械機構、いわゆるMEMS(Micro Electromechanical System)を形成した電子部品が注目され、実用化に向けて開発が進められている。   2. Description of the Related Art In recent years, an electronic component that forms a very small electromechanical mechanism, so-called MEMS (Micro Electromechanical System), by applying a processing technology for forming fine wiring such as a semiconductor integrated circuit element on the main surface of a semiconductor substrate such as a silicon wafer. Has been attracting attention, and is being developed for practical use.

このような微小電子機械機構としては、加速度計、圧力センサ、アクチュエータ等のセンサや、微細な鏡面体を可動式に形成したマイクロミラーデバイス、光デバイス、あるいはマイクロポンプ等を組み込んだマイクロ化学システム等、非常に広い分野にわたるものが試作・開発されている。   Such microelectromechanical mechanisms include sensors such as accelerometers, pressure sensors, and actuators, micromirror devices with movable micromirrors, optical devices, microchemical systems incorporating micropumps, etc. Prototypes and developments have been made that span a very wide range of fields.

そのような微小電子機械機構を形成した電子部品は、微小電子機械機構を長期にわたって正常に作動させるために、封止用の部材で気密に封止されて成る電子装置の形態で、外部の機器に実装されて使用される。   An electronic component formed with such a micro electro mechanical mechanism is an external device in the form of an electronic device that is hermetically sealed with a sealing member in order to operate the micro electro mechanical mechanism normally over a long period of time. Implemented in and used.

従来の電子装置の一例を図4に断面図で示す。図4に示す例では、微小電子機械機構22が形成された半導体基板21の主面には、微小電子機械機構22に電力を供給したり、微小電子機械機構22から外部の電気回路に電気信号を送り出したりするための電極23が微小電子機械機構22と電気的に接続されて形成されており、これら半導体基板21、微小電子機械機構22および電極23により、1つの電子部品24が構成される。   An example of a conventional electronic device is shown in a sectional view in FIG. In the example shown in FIG. 4, power is supplied to the main surface of the semiconductor substrate 21 on which the micro electro mechanical mechanism 22 is formed, or an electric signal is transmitted from the micro electro mechanical mechanism 22 to an external electric circuit. Is formed by being electrically connected to the micro electro mechanical mechanism 22, and the semiconductor substrate 21, the micro electro mechanical mechanism 22, and the electrode 23 constitute one electronic component 24. .

なお、この電子部品24は、通常、後述するように半導体基板21の主面に多数個が縦横に配列形成された多数個取りの形態で形成した後、個々の半導体基板21に切断することにより製作されるので、この切断の際に切削粉等の異物が微小電子機械機構22に付着して作動の妨げになることを防止するために、ガラス板25等で覆われて保護されている。   Note that the electronic component 24 is usually formed in a multi-cavity form in which a large number are arranged in a vertical and horizontal direction on the main surface of the semiconductor substrate 21 as described later, and then cut into individual semiconductor substrates 21. Since it is manufactured, in order to prevent foreign matter such as cutting powder from adhering to the microelectromechanical mechanism 22 and hindering the operation during this cutting, it is covered and protected by a glass plate 25 or the like.

そして、電子部品24を、電子部品収納用の凹部Aを有するパッケージ31の凹部A内に収納するとともに、電子部品24の電極23をパッケージ31の電極パッド32にボンディングワイヤ33等の導電性接続材を介して接続した後、パッケージ31の凹部Aを蓋体34で覆って電子部品24を凹部A内に気密封止することにより、電子装置として完成する。この場合、電子部品24は、微小電子機械機構22の動作を妨げないようにするため、中空状態で気密封止する必要がある。   The electronic component 24 is stored in the recess A of the package 31 having the recess A for storing the electronic component, and the electrode 23 of the electronic component 24 is connected to the electrode pad 32 of the package 31 with a conductive connecting material such as a bonding wire 33. Then, the concave portion A of the package 31 is covered with the lid 34 and the electronic component 24 is hermetically sealed in the concave portion A, thereby completing the electronic device. In this case, the electronic component 24 needs to be hermetically sealed in a hollow state so as not to hinder the operation of the microelectromechanical mechanism 22.

この電子装置について、予めパッケージ31の電極パッド32から外表面に導出するようにして形成しておいた配線導体35の導出部分を外部電気回路に接続することにより、気密封止された微小電子機械機構22が、電極23、ボンディングワイヤ33、電極パッド32および配線導体35を介して外部の電気回路と電気的に接続される。   In this electronic device, a microelectronic machine hermetically sealed by connecting a lead-out portion of the wiring conductor 35 previously formed so as to lead out from the electrode pad 32 of the package 31 to an external electric circuit. The mechanism 22 is electrically connected to an external electric circuit through the electrode 23, the bonding wire 33, the electrode pad 32, and the wiring conductor 35.

また、電子部品24は、通常、広面積の半導体基板の主面に多数個を縦横に配列形成させることにより製作されており、この場合の電子装置の製造方法は、従来、以下のようなものであった。すなわち、(1)広面積の半導体基板の主面に、微小電子機械機構22およびこれに電気的に接続された電極23が形成されて成る電子部品領域を多数個、縦横に配列形成した多数個取り電子部品を準備する工程と、(2)各電子部品領域の微小電子機械機構22を、その周囲が中空状態となるようにして、ガラス板25等で覆って封止する工程と、(3)広面積の半導体基板にダイシング加工等の切断加工を施して、各電子部品領域を個々の電子部品24に分割する工程と、(4)個々の電子部品24を、電子部品収納用パッケージ31内に気密封止する工程と、により製作される。   In addition, the electronic component 24 is usually manufactured by arranging a large number of elements vertically and horizontally on the main surface of a large-area semiconductor substrate. In this case, a method for manufacturing an electronic device is conventionally as follows. Met. That is, (1) a large number of electronic component regions each formed by forming a microelectromechanical mechanism 22 and electrodes 23 electrically connected thereto on a main surface of a semiconductor substrate having a large area, and a plurality of electronic component regions arranged vertically and horizontally. (2) a step of covering and sealing the microelectromechanical mechanism 22 in each electronic component region with a glass plate 25 or the like so that the periphery thereof is in a hollow state; and (3) ) A process of cutting a wide area semiconductor substrate such as a dicing process to divide each electronic component region into individual electronic components 24; and (4) the individual electronic components 24 in the electronic component storage package 31. And a hermetic sealing process.

このような従来の製造方法においては、広面積の半導体基板の主面に配列形成された多数の電子部品領域の1個ずつをガラス板25等で封止して保護しておく必要があること、また、一旦ガラス板25で封止した各電子部品領域を、個片の電子部品24に分割した後、改めてパッケージ31内に気密封止するとともに、その電極23をパッケージ31の電極パッド32等に接続して外部接続させる必要があること、等のため、生産性が悪く、実用化が難しいという問題があった。   In such a conventional manufacturing method, it is necessary to seal and protect each of a large number of electronic component regions arranged on the main surface of a large-area semiconductor substrate with a glass plate 25 or the like. Each electronic component region once sealed with the glass plate 25 is divided into individual electronic components 24 and then hermetically sealed in the package 31. The electrode 23 is connected to the electrode pad 32 of the package 31, etc. There is a problem that productivity is poor and it is difficult to put to practical use because it is necessary to connect to the outside and connect externally.

この問題に対し、半導体基板の主面に配列形成された多数個の微小電子機械機構22を一括して覆い、封止するような基板が提案されている。封止用の基板としては、半導体基板を材料とするものや導電性の金属板等を材料にするもの等が知られている。   In order to solve this problem, a substrate has been proposed in which a large number of microelectromechanical mechanisms 22 arrayed on the main surface of a semiconductor substrate are collectively covered and sealed. As a substrate for sealing, a substrate made of a semiconductor substrate, a substrate made of a conductive metal plate or the like is known.

半導体基板を材料とする場合は、例えば、主面に多数個の電子部品領域が配列形成された第1の半導体基板とは別に、電子部品領域の配列に対応させて多数の凹部を配列形成した封止用の第2の半導体基板を準備し、第1の半導体基板の主面上に第2の半導体基板を、第2の半導体基板の凹部が第1の半導体基板の電子部品領域を覆うようにして接合し、第2の半導体基板に内側に第1の半導体基板の電子部品領域(特に微小電子機械機構)を封止するようにした技術が提案されている(例えば、特許文献1参照。)。   In the case of using a semiconductor substrate as a material, for example, apart from the first semiconductor substrate in which a large number of electronic component areas are arranged on the main surface, a large number of recesses are arranged corresponding to the arrangement of the electronic component areas. A second semiconductor substrate for sealing is prepared, the second semiconductor substrate is covered on the main surface of the first semiconductor substrate, and the concave portion of the second semiconductor substrate covers the electronic component region of the first semiconductor substrate. Thus, a technique has been proposed in which the electronic component region (particularly the microelectromechanical mechanism) of the first semiconductor substrate is sealed inside the second semiconductor substrate (see, for example, Patent Document 1). ).

また、導電性を有する金属板等の基板を材料とする場合、導電性を有するカバー用の基板にパターン溝を形成するとともに、このパターン溝をガラスやセラミック材料で充填して平坦化させた後、その上にボンディングパターン(電極パッド等)を形成し、このボンディングパターンに電子部品の電極を接続するとともに導電性のカバー用基板を半導体基板の主面に接合し、その後、電子部品領域をセラミックやガラス等で封着するとともに、ボンディングパターンを外部に導出するための外部配線用電極パターンを形成するようにした技術が提案されている(例えば、特許文献2参照。)。
特開2001−144117号公報 特開2002−43463号公報
When a substrate such as a conductive metal plate is used as a material, a pattern groove is formed in the conductive cover substrate and the pattern groove is filled with glass or a ceramic material and flattened. Then, a bonding pattern (electrode pad, etc.) is formed thereon, the electrodes of the electronic component are connected to the bonding pattern, and a conductive cover substrate is bonded to the main surface of the semiconductor substrate. A technique has been proposed in which an electrode pattern for external wiring for leading a bonding pattern to the outside is formed while sealing with glass or glass (see, for example, Patent Document 2).
JP 2001-144117 A JP 2002-43463 A

しかしながら、このような従来の封止用基板を用いて半導体基板の主面の電子部品領域を気密に封止し電子装置を形成する場合は、多数個の電子部品領域を一括して封止することはできるものの、例えば、半導体基板を材料とした封止用基板の場合、半導体基板の内部に3次元状の配線導体を形成することができないため、封止用の(第2の)半導体基板の、電子部品領域が配列形成された(第1の)半導体基板に接合される主面から対向する他方主面にかけて配線導体を導出することができず、電子部品の電極は、第1の半導体基板の主面に形成された電極の一部を封止部の外側に延出させるとともに、この延出部をボンディングワイヤを介して電子部品収納用パッケージの電極パッドや外部の電気回路に接続する必要があり、実装工程(電子部品領域の封止から電子装置として完成させて外部電気回路に接続するまでの工程)が長く、また、個々の電子装置のサイズが大きくなってしまうという問題が残る。また、電子装置を組み込んだ電子システムの小型化に有利な、表面実装ができないという問題もある。   However, when an electronic device is formed by hermetically sealing the electronic component region on the main surface of the semiconductor substrate using such a conventional sealing substrate, a large number of electronic component regions are collectively sealed. For example, in the case of a sealing substrate made of a semiconductor substrate as a material, a three-dimensional wiring conductor cannot be formed inside the semiconductor substrate. Therefore, a (second) semiconductor substrate for sealing The wiring conductor cannot be led out from the main surface joined to the (first) semiconductor substrate in which the electronic component regions are arranged to the opposite main surface, and the electrode of the electronic component is the first semiconductor A part of the electrode formed on the main surface of the substrate is extended to the outside of the sealing portion, and the extended portion is connected to an electrode pad of an electronic component storage package or an external electric circuit via a bonding wire. Necessary, mounting process ( Child process from sealing parts region to be connected to an external electric circuit to complete as an electronic device) is long and a problem that there remains the size of individual electronic devices increases. There is also a problem that surface mounting is not possible, which is advantageous for downsizing an electronic system incorporating an electronic device.

また、導電性の金属板等を材料とした封止用基板の場合、金属板に電極パッド等の導体パターンを形成することができるように、一旦ガラスやセラミックスで金属板の表面に形成したパターン溝等を埋めて絶縁部を形成したり、その絶縁部の表面に、実装工程の途中で導体部を形成したりする必要があるため、この場合も電子部品の実装工程を短くすることが困難であるという問題がある。   In the case of a sealing substrate made of a conductive metal plate or the like, a pattern once formed on the surface of the metal plate with glass or ceramics so that a conductor pattern such as an electrode pad can be formed on the metal plate. It is difficult to shorten the mounting process of electronic components in this case because it is necessary to form an insulating part by filling a groove or the like, or to form a conductor part on the surface of the insulating part during the mounting process. There is a problem that.

本発明は、上記従来の技術における諸問題に鑑みて完成されたものであり、その目的は半導体基板の主面に形成された微小電子機械機構の封止が容易かつ確実であるとともに、微小電子機械機構と接続された半導体基板の主面に形成されている電極を容易かつ確実に外部接続させることが可能な電子装置およびそのための電子部品封止用基板を提供することにある。   The present invention has been completed in view of the above-described problems in the prior art, and its object is to easily and reliably seal a microelectromechanical mechanism formed on the main surface of a semiconductor substrate. An object of the present invention is to provide an electronic device capable of easily and reliably externally connecting electrodes formed on a main surface of a semiconductor substrate connected to a mechanical mechanism, and an electronic component sealing substrate therefor.

さらに、その目的は微小電子機械機構を表面実装が可能な形態で外部接続させることができるものとすることにある。   Furthermore, the purpose is to enable external connection of the microelectromechanical mechanism in a form that allows surface mounting.

また本発明の他の目的は、このような微小電子機械機構および電極から成る電子部品領域が半導体基板の主面に多数個縦横に配列形成されていたとしても、これらを容易かつ確実に封止することが可能な封止用基板を提供するとともに、この封止用基板を用いて、微小電子機械機構が封止されて成る多数個の電子装置を、例えば表面実装が可能な形態で一括して形成することが可能な電子装置の製造方法を提供することにある。   Another object of the present invention is to provide easy and reliable sealing even if a large number of electronic component regions comprising such micro-electromechanical mechanisms and electrodes are arranged vertically and horizontally on the main surface of the semiconductor substrate. In addition to providing a sealing substrate that can be used, and using the sealing substrate, a large number of electronic devices formed by sealing micro-electromechanical mechanisms can be bundled in a form that can be surface-mounted, for example. Another object of the present invention is to provide an electronic device manufacturing method that can be formed.

本発明の電子装置は、半導体基板と、該半導体基板の主面に設けられた微小電子機械機構と、前記半導体基板の前記主面に設けられ、前記微小電子機械機構に電気的に接続される電極とを有する電子部品と、前記半導体基板の前記主面に接合された一方主面を有する絶縁基体と、前記絶縁基体の前記一方主面から他方主面にかけて前記絶縁基体の内部に設けられた複数の配線導体と、前記半導体基板の前記主面と前記絶縁基体の前記一方主面との間に設けられ、前記配線導体と前記電極とを電気的に接続する第1の導電性接着材と、前記半導体基板の前記主面と前記絶縁基体の前記一方主面との間で、前記第1の導電性接着材を取り囲むように設けられた枠状の第2の導電性接着材と、前記絶縁基体の前記一方主面から他方主面にかけて前記絶縁基体の内部に設けられ、前記一方主面に形成された導体層を介して前記第2の導電性接着材に電気的に接続された前記配線導体の一部とを備える。前記電子部品の前記微小電子機械機構は、前記第2の導電性接着材の内側に気密に封止されている。好ましくは、前記第1の導電性接着材および前記第2の導電性接着材は、溶融温度の差が50℃以下である。 An electronic device according to the present invention includes a semiconductor substrate, a microelectromechanical mechanism provided on the main surface of the semiconductor substrate, and provided on the main surface of the semiconductor substrate and electrically connected to the microelectromechanical mechanism. An electronic component having an electrode, an insulating base having one main surface bonded to the main surface of the semiconductor substrate, and the insulating base provided inside the insulating base from the one main surface to the other main surface. a plurality of wiring conductors, wherein the main surface of the semiconductor substrate and the provided between the one main surface of the insulating substrate, the first conductive adhesive for connecting the before and Sharing, ABS line conductor electrode electrically And a frame-like second conductive adhesive provided so as to surround the first conductive adhesive between the main surface of the semiconductor substrate and the one main surface of the insulating substrate. , From the one main surface of the insulating base to the other main surface, It provided inside the rim base, and a part of the electrically connected to said wiring conductor to said second conductive adhesive over conductor layer formed on the one main surface. The micro electro mechanical mechanism of the electronic component is hermetically sealed inside the second conductive adhesive. Preferably, the difference in melting temperature between the first conductive adhesive and the second conductive adhesive is 50 ° C. or less.

また、前記電子装置において、好ましくは、断面視したときに、前記半導体基板と前記絶縁基体は、両者の接合体に切断加工を施したことによって両端が揃っている。前記電子装置において、好ましくは、断面視したときに、前記第2の導電性接着材は、前記半導体基板および前記絶縁基体の両端の断面より内に位置している。 Also, before Symbol electronic device, preferably, when viewed in cross section, wherein the semiconductor substrate and the insulating substrate are aligned at both ends by having been subjected to cutting processing to conjugate them. Prior Symbol electronic device, preferably, when viewed in cross section, the second conductive adhesive is positioned on the inner side of the cross-section of both ends of the semiconductor substrate and the insulating substrate.

また、本発明の電子部品封止用基板は、半導体基板と、該半導体基板の主面に設けられた微小電子機械機構と、前記半導体基板の前記主面に設けられ、前記微小電子機械機構に電気的に接続される電極とを有する電子部品の前記微小電子機械機構を気密に封止するための電子部品封止用基板であって、前記半導体基板の前記主面に接合される一方主面を有する絶縁基体と、前記絶縁基体の前記一方主面から他方主面にかけて前記絶縁基体の内部に設けられた複数の配線導体と、前記絶縁基体の前記一方主面に設けられ、前記配線導体に電気的に接続された第1の導電性接着材と、前記絶縁基体の前記一方主面に前記第1の導電性接着材を取り囲むように設けられた枠状の第2の導電性接着材と、前記絶縁基体の前記一方主面から他方主面にかけて前記絶縁基体の内部に設けられ、前記一方主面に形成された導体層を介して前記第2の導電性接着材に電気的に接続された前記配線導体の一部とを備えている。好ましくは、前記第1の導電性接着材および前記第2の導電性接着材は、溶融温度の差が50℃以下である。好ましくは、前記第1の導電性接着材の高さが前記第2の導電性接着材の高さと同じである。 An electronic component sealing substrate according to the present invention includes a semiconductor substrate, a microelectromechanical mechanism provided on a main surface of the semiconductor substrate, and a microelectromechanical mechanism provided on the main surface of the semiconductor substrate. An electronic component sealing substrate for hermetically sealing the microelectromechanical mechanism of an electronic component having an electrically connected electrode, wherein the main surface is joined to the main surface of the semiconductor substrate an insulating substrate having said from the one main surface of the insulating substrate and a plurality of wiring conductors provided inside of the insulating base to the other main surface provided on the one main surface of the insulating substrate, prior Sharing, ABS line A first conductive adhesive electrically connected to the conductor, and a frame-shaped second conductive adhesive provided on the one main surface of the insulating base so as to surround the first conductive adhesive. Material and from the one main surface to the other main surface of the insulating substrate. Provided inside the insulating base Te, Ru Tei and a portion of which are electrically connected to the wiring conductor to said second conductive adhesive over conductor layer formed on the one main surface. Preferably, the difference in melting temperature between the first conductive adhesive and the second conductive adhesive is 50 ° C. or less. Preferably, the height of the first conductive adhesive is the same as the height of the second conductive adhesive.

また、本発明の電子部品封止用基板において、好ましくは、前記第2の導電性接着材に電気的に接続された前記配線導体の一部は、前記絶縁基体の内部に設けられた貫通導体を有する。また、好ましくは、前記絶縁基体は、複数の絶縁層を積層して成る積層体であり、前記第2の導電性接着材に電気的に接続された前記配線導体の一部は、前記絶縁層を貫通する貫通導体を有する。また、好ましくは、前記第2の導電性接着材に電気的に接続された前記配線導体の一部は、前記貫通導体前記配線導体が有する他の貫通導体に平行に配置されている。 Further, in the substrate for electronic component sealing of the present invention, preferably, the electrically Some connected the wiring conductor in the second conductive adhesive, through conductor provided inside the insulating substrate Have Preferably, the insulating base is a laminated body formed by laminating a plurality of insulating layers, and a part of the wiring conductor electrically connected to the second conductive adhesive is the insulating layer. A through conductor penetrating through the substrate. Also preferably, said part of the electrically connected to said wiring conductor in the second conductive adhesive, said through conductors are arranged parallel to the other through conductors which said wiring conductor has.

また、本発明の電子部品封止用基板において、好ましくは、前記絶縁基体は、ガラスセラミックス焼結体からなる。本発明の電子部品封止用基板において、好ましくは、断面視したときに、前記第2の導電性接着材は、前記半導体基板および前記絶縁基体の端部より内に位置している。 In the electronic component sealing substrate of the present invention, preferably, the insulating base is made of a glass ceramic sintered body. In the substrate for an electronic component sealing of the present invention, preferably, when viewed in cross section, the second conductive adhesive is positioned at the inner side of the end portion of the semiconductor substrate and the insulating substrate.

本発明の電子装置によれば、絶縁基体の一方主面から他方主面または側面にかけて配線導体を形成するとともに、前記絶縁基体の一方主面に前記配線導体と電気的に接続し、第1の接着材が取着されている接続パッドおよび該接続パッドを取り囲むように枠状の第2の接着材が取着されている電子部品封止用基板と、半導体基板の主面に微小電子機械機構およびこれに電気的に接続されている電極を有する電子部品とを具備し、前記電子部品の電極を前記電子部品封止用基板の接続パッドに第1の接着材を介し接合させるとともに前記半導体基板の主面を前記絶縁基体の一方主面に枠状の第2の接着材を介して接合させ、前記枠状の第2の接着材の内側に前記電子部品の微小電子機械機構を気密に封止して成ることから、第2の接着材の主面を半導体基板の主面に接合させるだけで、電子部品の微小電子機械機構を、第2の接着材と絶縁基体とにより容易かつ確実に封止することができる。また、電子部品の電極が電子部品封止用基板の接続パッドに接続され、接続パッドが配線導体を介して絶縁基体の他方主面または側面に導出されているので、電極を容易かつ確実に外部接続させることができる。   According to the electronic device of the present invention, the wiring conductor is formed from one main surface to the other main surface or the side surface of the insulating base, and electrically connected to the wiring conductor on the one main surface of the insulating base. A connection pad to which an adhesive is attached, an electronic component sealing substrate to which a frame-like second adhesive is attached so as to surround the connection pad, and a microelectromechanical mechanism on the main surface of the semiconductor substrate And an electronic component having an electrode electrically connected thereto, the electrode of the electronic component being joined to a connection pad of the electronic component sealing substrate via a first adhesive and the semiconductor substrate The main surface of the electronic component is joined to one main surface of the insulating base via a frame-shaped second adhesive, and the microelectromechanical mechanism of the electronic component is hermetically sealed inside the frame-shaped second adhesive. Because it stops, the main surface of the second adhesive Only by joining the main surface of the semiconductor substrate, the micro electronic mechanical system of the electronic component can be easily and reliably sealed by the second adhesive material and the insulating substrate. In addition, since the electrodes of the electronic component are connected to the connection pads of the electronic component sealing substrate, and the connection pads are led out to the other main surface or side surface of the insulating base via the wiring conductor, the electrodes can be easily and reliably externally connected. Can be connected.

また、本発明の電子装置は、例えば、電子部品封止用基板の絶縁基体をセラミック多層配線基板等を用いて形成したものとすることにより、配線導体を、接続パッドや第2の接着材が形成、取着されている一方主面から他方主面や側面にかけて、絶縁基体の内部や表面に自由に形成して導出させることができ、この導出された端部に外部接続用の金属バンプを取着させること等により、容易に表面実装することが可能な電子装置となすことができる。   In the electronic device of the present invention, for example, the insulating base of the electronic component sealing substrate is formed using a ceramic multilayer wiring board or the like, so that the wiring conductor is connected to the connection pad or the second adhesive. From one main surface that is formed and attached to the other main surface or side surface, it can be freely formed inside and on the surface of the insulating substrate and led out, and metal bumps for external connection are attached to the derived end portions. By attaching it or the like, an electronic device that can be easily surface-mounted can be obtained.

また、本発明の電子部品封止用基板は、上記構成の電子装置に使用されるものであって、絶縁基体と、該絶縁基体の一方主面から他方主面または側面にかけて導出されている配線導体と、前記絶縁基体の一方主面に形成され、前記配線導体と電気的に接続するとともに第1の接着材が取着されている接続パッドと、前記絶縁基体の一方主面に前記接続パッドを取り囲むように取着されている枠状の第2の接着材とを具備し、前記絶縁基体に、前記配線導体と、第1の接着材が取着されている接続パッドと、枠状の第2の接着材とを一単位とした電子部品封止領域が少なくも一つ形成されていることから、第2の接着材を半導体基板の主面に接合させるだけで微小電子機械機構を容易かつ確実に封止することができるとともに、接続パッドに接続される電極を、配線導体を介して容易かつ確実に外部接続させることができる。   The electronic component sealing substrate of the present invention is used in the electronic device having the above-described configuration, and includes an insulating base and a wiring led out from one main surface to the other main surface or side surface of the insulating base. A conductor, a connection pad formed on one main surface of the insulating base, electrically connected to the wiring conductor and having a first adhesive attached thereto, and the connection pad on one main surface of the insulating base; A frame-shaped second adhesive material that is attached to surround the wiring substrate, the wiring conductor, a connection pad to which the first adhesive material is attached, and a frame-shaped second adhesive material. Since at least one electronic component sealing region with the second adhesive as a unit is formed, the micro-electromechanical mechanism can be easily achieved by simply joining the second adhesive to the main surface of the semiconductor substrate. In addition, it can be securely sealed and connected to the connection pad. The electrodes to be, can be easily and reliably externally connected through the wiring conductor.

また本発明の電子部品封止用基板によれば、絶縁基体に、配線導体と、第1の接着材が取着されている接続パッドと、枠状の第2の接着材とを一単位とした電子部品封止領域を多数個縦横に配列形成しておくと、上記電子部品となる領域が広面積の半導体基板の主面に多数個配列形成されていたとしても、これらの電子部品領域を一括して封止することができ、多数の微小電子機械機構の封止を容易に行うことができる。   According to the electronic component sealing substrate of the present invention, the insulating base has a wiring conductor, a connection pad to which the first adhesive is attached, and a frame-like second adhesive as a unit. If a large number of electronic component sealing regions are arranged in the vertical and horizontal directions, even if a large number of regions to be the electronic components are arranged on the main surface of a large-area semiconductor substrate, these electronic component regions are Sealing can be performed in a lump, and a large number of microelectromechanical mechanisms can be easily sealed.

また、本発明の電子部品封止用基板において、第1の接着材および第2の接着材を、溶融温度の差が50℃以下のものとした場合には、溶融温度の差が小さいので、第1の接着材および第2の接着材を同時に加熱溶融させて、第1の接着材と電子部品の電極との接合、および第2の接着材と半導体基板の主面との接合を同時に、かつ強固に行うことがより容易となり、微小電子機械機構の封止および電子部品の電極の外部接続をより一層確実かつ容易なものとすることができる。   In the electronic component sealing substrate of the present invention, when the first adhesive and the second adhesive have a difference in melting temperature of 50 ° C. or less, the difference in melting temperature is small. The first adhesive and the second adhesive are heated and melted at the same time, and the first adhesive and the electrodes of the electronic component are bonded together, and the second adhesive and the main surface of the semiconductor substrate are bonded simultaneously. Further, it is easier to perform firmly, and the sealing of the micro-electromechanical mechanism and the external connection of the electrodes of the electronic component can be made more reliable and easy.

また、本発明の電子部品封止用基板において、第1の接着材および第2の接着材の高さを同じとした場合には、第1の接着材を介して接合される電極と接続パッドとの間の距離、および第2の接着材を介して接合される絶縁基体の一方主面と半導体基板の主面との間の距離が同じになるため、電極と接続パッドとの電気的接続および微小電子機械機構の封止をより一層容易かつ確実なものとすることができる。   Further, in the electronic component sealing substrate of the present invention, when the heights of the first adhesive and the second adhesive are the same, the electrode and the connection pad that are joined via the first adhesive And the distance between the one main surface of the insulating base and the main surface of the semiconductor substrate joined via the second adhesive are the same, so that the electrical connection between the electrode and the connection pad In addition, the sealing of the microelectromechanical mechanism can be made easier and more reliable.

また、本発明の電子装置の製造方法によれば、上記各工程を具備することから、縦横に配列形成された多数個の電子部品領域について、それぞれの電極の外部接続のための接続と微小電子機械機構の封止とを同時に行なうことができるため、互いに接合された電子部品領域および電子部品封止領域から成る多数個取りの電子装置を、容易かつ確実に作製することができる。   In addition, according to the method for manufacturing an electronic device of the present invention, since each of the above steps is provided, the connection for the external connection of each electrode and the microelectronics are made for a large number of electronic component regions arranged in rows and columns. Since the mechanical mechanism can be sealed at the same time, a multi-piece electronic device composed of the electronic component region and the electronic component sealing region joined to each other can be easily and reliably manufactured.

そして、互いに接合された電子部品領域および電子部品封止領域により構成される各電子装置となる領域毎に分割することにより、電子部品が電子部品封止用基板で気密に封止されて成る個々の電子装置を多数個、同時に製造することができる。   Each of the electronic components is hermetically sealed with an electronic component sealing substrate by dividing each region to be an electronic device composed of the electronic component region and the electronic component sealing region joined together. A large number of electronic devices can be manufactured simultaneously.

この分割の際、電子部品領域の微小電子機械機構は対応する電子部品封止領域によりそれぞれ封止されているので、ダイシング加工等による分割で発生するシリコン等の半導体基板の切削粉が微小電子機械機構に付着するようなことはなく、分割後の電子装置において微小電子機械機構を確実に作動させることができる。   At the time of this division, the microelectromechanical mechanism in the electronic component area is sealed by the corresponding electronic component sealing area, so that the cutting powder of the semiconductor substrate such as silicon generated by the dicing process is transferred to the microelectronic machine. There is no adhesion to the mechanism, and the microelectromechanical mechanism can be reliably operated in the divided electronic device.

また、分割して得られた電子装置は、絶縁基体の他方主面や側面に配線導体が導出されているので、この導出された端部に金属バンプ等の端子を取着するだけで、表面実装等により外部電気回路基板に実装することができるものとなり、実装の工程を非常に短く、かつ容易なものとすることができる電子装置となる。   In addition, since the wiring conductor is led out to the other main surface or side surface of the insulating base, the electronic device obtained by dividing the surface can be obtained simply by attaching a terminal such as a metal bump to the lead end. The electronic device can be mounted on the external electric circuit board by mounting or the like, and the mounting process can be made extremely short and easy.

本発明の電子装置および電子部品封止用基板について以下に詳細に説明する。 For the electronic devices and electronic components for encapsulating board of the present invention will be described in detail below.

図1は本発明の電子装置およびこれに使用される電子部品封止用基板の実施の形態の一例を示す断面図である。   FIG. 1 is a cross-sectional view showing an example of an embodiment of an electronic device of the present invention and an electronic component sealing substrate used in the electronic device.

図1において、1は絶縁基体、2は配線導体、3は接続パッド、4は第1の接着材(第1の導電性接着材、以下同じ。)、5は第2の接着材(第2の導電性接着材、以下同じ。)である。これら絶縁基体1、配線導体2、接続パッド3、第1の接着材4および第2の接着材5により電子部品封止用基板6が形成される。 In FIG. 1, 1 is an insulating substrate, 2 is a wiring conductor, 3 is a connection pad, 4 is a first adhesive (first conductive adhesive, the same applies hereinafter) , and 5 is a second adhesive (second Of the conductive adhesive, the same shall apply hereinafter) . An electronic component sealing substrate 6 is formed by the insulating base 1, the wiring conductor 2, the connection pad 3, the first adhesive 4 and the second adhesive 5.

この電子部品封止用基板6を用いて、半導体基板7の主面(図1の例では下面)に、微小電子機械機構8と電極9とを互いに電気的に接続するようにして形成して成る電子部品10を封止することにより、微小電子機械機構8が外部接続可能な状態で封止されて成る電子装置が形成される。   The electronic component sealing substrate 6 is used to form a microelectromechanical mechanism 8 and an electrode 9 on the main surface (lower surface in the example of FIG. 1) of the semiconductor substrate 7 so as to be electrically connected to each other. By sealing the electronic component 10 formed, an electronic device is formed in which the microelectromechanical mechanism 8 is sealed in a state where it can be externally connected.

絶縁基体1は、微小電子機械機構8を封止するための蓋体として機能するとともに、配線導体2、接続パッド3、第1の接着材4および第2の接着材5を形成、取着するための基体として機能する。   The insulating base 1 functions as a lid for sealing the microelectromechanical mechanism 8 and forms and attaches the wiring conductor 2, the connection pad 3, the first adhesive 4, and the second adhesive 5. It functions as a base for this purpose.

この絶縁基体1は、酸化アルミニウム質焼結体や窒化アルミニウム質焼結体、ムライト質焼結体、炭化珪素質焼結体、窒化珪素質焼結体、ガラスセラミックス焼結体等のセラミックス材料や、ポリイミド、ガラスエポキシ樹脂等の有機樹脂材料、セラミックスやガラス等の無機粉末をエポキシ樹脂等の有機樹脂で結合して成る複合材等により形成される。   This insulating substrate 1 is made of a ceramic material such as an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, a silicon carbide sintered body, a silicon nitride sintered body, a glass ceramic sintered body, or the like. It is formed of an organic resin material such as polyimide or glass epoxy resin, or a composite material formed by bonding inorganic powder such as ceramics or glass with an organic resin such as epoxy resin.

絶縁基体1は、例えば、酸化アルミニウム質焼結体から成る場合であれば、酸化アルミニウムとガラス粉末等の原料粉末をシート上に成形して成るグリーンシートを積層し、焼成することにより形成される。なお、絶縁基体1は、酸化アルミニウム質焼結体で形成するものに限らず、用途や気密封止する電子部品10の特性等に応じて適したものを選択することが好ましい。   If the insulating substrate 1 is made of, for example, an aluminum oxide sintered body, the insulating substrate 1 is formed by laminating and firing a green sheet formed by forming aluminum oxide and a raw material powder such as glass powder on the sheet. . The insulating substrate 1 is not limited to the one formed of an aluminum oxide sintered body, and it is preferable to select a suitable one according to the application and the characteristics of the electronic component 10 to be hermetically sealed.

例えば、絶縁基体1は、後述するように、第2の接着材5を介して半導体基板7と機械的に接合されるので、半導体基板7との接合の信頼性、つまり微小電子機械機構8の封止の気密性を高くするためには、ムライト質焼結体や、例えばガラス成分の種類や添加量を調整することにより熱膨張係数を半導体基板7に近似させるようにした酸化アルミニウム−ホウ珪酸ガラス系等のガラスセラミックス焼結体等のような、半導体基板7との熱膨張係数の差が小さい材料で形成することが好ましい。   For example, since the insulating base 1 is mechanically bonded to the semiconductor substrate 7 via the second adhesive 5 as described later, the reliability of bonding with the semiconductor substrate 7, that is, the micro electro mechanical mechanism 8 In order to increase the hermeticity of sealing, mullite sintered body, for example, aluminum oxide-borosilicate acid whose thermal expansion coefficient is approximated to the semiconductor substrate 7 by adjusting the kind and addition amount of the glass component It is preferable to use a material having a small difference in thermal expansion coefficient from the semiconductor substrate 7, such as a glass ceramic sintered body of glass or the like.

また、絶縁基体1は、配線導体2により伝送される電気信号の遅延を防止するような場合には、ポリイミド、ガラスエポキシ樹脂等の有機樹脂材料、セラミックスやガラス等の無機粉末をエポキシ樹脂等の有機樹脂で結合して成る複合材、または、酸化アルミニウム−ホウ珪酸ガラス系や酸化リチウム系等のガラスセラミックス焼結体等のような比誘電率の小さい材料で形成することが好ましい。   In addition, in the case of preventing the delay of the electrical signal transmitted by the wiring conductor 2, the insulating base 1 is made of an organic resin material such as polyimide or glass epoxy resin, or an inorganic powder such as ceramic or glass such as epoxy resin. It is preferably formed of a composite material formed by bonding with an organic resin, or a material having a low relative dielectric constant such as a sintered glass ceramic such as aluminum oxide-borosilicate glass or lithium oxide.

また、絶縁基体1は、封止する微小電子機械機構8の発熱量が大きく、この熱の外部への放散性を良好とするような場合には、窒化アルミニウム質焼結体等のような熱伝導率の大きな材料で形成することが好ましい。   In addition, the insulating substrate 1 has a large calorific value of the micro-electromechanical mechanism 8 to be sealed, and in the case where the heat dissipating property is good, heat such as an aluminum nitride sintered body is used. It is preferable to form with a material having high conductivity.

また、絶縁基体1の一方主面に、電子部品10の微小電子機械機構8を内側に収めるような凹部1aを形成しておいてもよい。凹部1a内に微小電子機械機構8の一部を収めるようにしておくと、微小電子機械機構8を取り囲むための第2の接着材5の高さを低く抑えることができ、電子装置の低背化に有利なものとなる。 In addition, a concave portion 1 a may be formed on one main surface of the insulating substrate 1 so as to accommodate the microelectromechanical mechanism 8 of the electronic component 10 inside. If a part of the micro electro mechanical mechanism 8 is accommodated in the recess 1a, the height of the second adhesive 5 for enclosing the micro electro mechanical mechanism 8 can be kept low, and the low height of the electronic device can be reduced. This is advantageous for the conversion.

絶縁基体1の一方主面(微小電子機械機構8を封止する側)からは、他方主面または側面に配線導体2が導出されている。   A wiring conductor 2 is led out from one main surface of the insulating substrate 1 (side sealing the micro electro mechanical mechanism 8) to the other main surface or side surface.

また、この絶縁基体1の一方主面側の第2の接着材5の内側の部位には、配線導体2と接続された接続パッド3が形成されている。   In addition, a connection pad 3 connected to the wiring conductor 2 is formed in a portion inside the second adhesive 5 on the one main surface side of the insulating base 1.

これらの配線導体2および接続パッド3は、接続パッド3上に形成される第1の接着材4を介して電子部品10の電極9と電気的に接続され、これを絶縁基体1の他方主面や側面に導出する機能を有する。   The wiring conductor 2 and the connection pad 3 are electrically connected to the electrode 9 of the electronic component 10 via the first adhesive 4 formed on the connection pad 3, and this is connected to the other main surface of the insulating substrate 1. And has a function to derive to the side.

これらの配線導体2および接続パッド3は、銅、銀、金、パラジウム、タングステン、モリブデン、マンガン等の金属材料により形成される。この形成の手段としては、メタライズ層、めっき層、蒸着等の金属を薄膜層として被着させる手段を用いることができる。例えば、タングステンのメタライズ層から成る場合であれば、タングステンのペーストを絶縁基体1となるグリーンシートに印刷してこれをグリーンシートとともに焼成することにより形成される。   These wiring conductors 2 and connection pads 3 are formed of a metal material such as copper, silver, gold, palladium, tungsten, molybdenum, and manganese. As a means for the formation, a means for depositing a metal such as a metallized layer, a plating layer, or vapor deposition as a thin film layer can be used. For example, in the case of a metallized layer of tungsten, it is formed by printing a tungsten paste on a green sheet to be the insulating substrate 1 and firing it together with the green sheet.

第1の接着材4は、電子部品10の電極9と接続パッドとを電気的に接続する機能をなし、錫−銀系、錫−銀−銅系等の半田,金−錫ろう等の低融点ろう材,銀−ゲルマニウム系等の高融点ろう材、導電性有機樹脂等の導電性を有する接合材により形成されている。 The first adhesive 4 has a function of electrically connecting the electrode 9 of the electronic component 10 and the connection pad 3 , such as tin-silver, tin-silver-copper solder, gold-tin solder, etc. It is formed of a low melting point brazing material, a high melting point brazing material such as silver-germanium, and a conductive bonding material such as a conductive organic resin.

この第1の接着材4を電子部品10の電極9に接合することにより、電子部品10の電極9が、第1の接着材4、接続パッド3および配線導体2を介して、絶縁基体1の他方主面または側面に導出される。そして、この導出された端部を外部の電気回路に錫−鉛半田等を介して接合することにより、電子部品10の電極9が外部の電気回路と電気的に接続される。   By bonding the first adhesive 4 to the electrode 9 of the electronic component 10, the electrode 9 of the electronic component 10 is connected to the insulating base 1 via the first adhesive 4, the connection pad 3 and the wiring conductor 2. The other main surface or side surface is derived. And the electrode 9 of the electronic component 10 is electrically connected with an external electric circuit by joining this derived | led-out edge part to an external electric circuit via tin-lead solder etc. FIG.

なお、第1の接着材4は、錫−銀系等の半田、金−錫ろう等の低融点ろう材、銀−ゲルマニウム系等の高融点ろう材等の粉末を有機溶剤、バインダー等とともに混練して作製した導電性ペーストをスクリーン印刷等の手法により、接続パッド3の表面に印刷することにより取着される。   The first adhesive material 4 is made by kneading a powder such as a tin-silver solder, a low-melting solder such as gold-tin solder, or a high-melting solder such as silver-germanium together with an organic solvent and a binder. The conductive paste thus produced is attached by printing on the surface of the connection pad 3 by a technique such as screen printing.

また、絶縁基体1の一方主面には、接続パッド3を取り囲むようにして第2の接着材5が取着されている。   A second adhesive 5 is attached to one main surface of the insulating base 1 so as to surround the connection pad 3.

第2の接着材5は、電子部品10の微小電子機械機構8をその内側に気密封止するための側壁として機能する。   The second adhesive 5 functions as a side wall for hermetically sealing the microelectromechanical mechanism 8 of the electronic component 10 inside thereof.

この第2の接着材5の主面(図1の例では上面)を半導体基板7の主面(図1の例では下面)に接合させることにより、第2の接着材5の内側に微小電子機械機構8が気密封止される。なお、この場合、半導体基板7が底板となり、絶縁基体1が蓋体となる。   The main surface (the upper surface in the example of FIG. 1) of the second adhesive material 5 is bonded to the main surface (the lower surface in the example of FIG. 1) of the semiconductor substrate 7, so that microelectrons are formed inside the second adhesive material 5. The mechanical mechanism 8 is hermetically sealed. In this case, the semiconductor substrate 7 serves as a bottom plate and the insulating substrate 1 serves as a lid.

第2の接着材5は、錫−銀系等の半田、金−錫ろう等の低融点ろう材、銀−ゲルマニウム系等の高融点ろう材等の導電性を有する接合材により形成されており、例えば、第1の接着材4と同様に、ペースト状の錫−銀系等の半田、金−錫ろう等の低融点ろう材、銀−ゲルマニウム系等の高融点ろう材等の導電性を有する接合材をスクリーン印刷等の手法により、絶縁基体1の一方主面に、接続パッド3を取り囲むような枠状に印刷することにより形成される。   The second adhesive 5 is formed of a conductive bonding material such as a tin-silver solder, a low melting solder such as gold-tin solder, or a high melting solder such as silver-germanium. For example, as in the case of the first adhesive 4, the conductivity of paste-like tin-silver solder, low-melting solder such as gold-tin solder, high-melting solder such as silver-germanium, etc. The bonding material is formed by printing on the one main surface of the insulating substrate 1 in a frame shape surrounding the connection pad 3 by a technique such as screen printing.

半導体基板7は、単結晶や多結晶等のシリコン基板等から成り、微小電子機械機構8およびこれに電気的に接続されている電極9が主面に形成されている。   The semiconductor substrate 7 is made of a silicon substrate such as a single crystal or polycrystal, and a microelectromechanical mechanism 8 and an electrode 9 electrically connected thereto are formed on the main surface.

本発明における微小電子機械機構8は、例えば電気スイッチ、インダクタ、キャパシタ、共振器、アンテナ、マイクロリレー、光スイッチ、ハードディスク用磁気ヘッド、マイク、バイオセンサー、DNAチップ、マイクロリアクタ、プリントヘッド、加速度センサ、圧力センサなどの各種センサ、ディスプレイデバイスなどの機能を有する電子装置であり、半導体微細加工技術を基本とした、いわゆるマイクロマシニングで作製される部品であり、1素子あたり10μm〜数100μm程度の寸法を有する。   The micro electro mechanical mechanism 8 in the present invention includes, for example, an electric switch, an inductor, a capacitor, a resonator, an antenna, a micro relay, an optical switch, a magnetic head for a hard disk, a microphone, a biosensor, a DNA chip, a microreactor, a print head, an acceleration sensor, It is an electronic device that has the functions of various sensors such as pressure sensors and display devices, and is a component produced by so-called micromachining based on semiconductor microfabrication technology, and has a size of about 10 μm to several 100 μm per element Have.

また、電極9は、金属等の導体から成り、円形状、四角形状等のパターンに形成されている。なお、電極9と微小電子機械機構との電気的接続は、半導体基板の主面に形成された微細配線等を介して行われる。   The electrode 9 is made of a conductor such as metal and is formed in a pattern such as a circle or a rectangle. The electrical connection between the electrode 9 and the microelectromechanical mechanism is performed via a fine wiring formed on the main surface of the semiconductor substrate.

そして、半導体基板7の主面に微小電子機械機構8およびこれに電気的に接続された電極9が形成されて成る電子部品10について、電極9を第1の接着材4に接合し、半導体基板7の主面を第2の接着材5の主面に接合させることによって、第2の接着材5の内側に電子部品10の微小電子機械機構8が気密封止された電子装置が形成される。   And about the electronic component 10 formed by forming the micro electromechanical mechanism 8 and the electrode 9 electrically connected to the main surface of the semiconductor substrate 7, the electrode 9 is joined to the first adhesive 4, and the semiconductor substrate 7 is joined to the main surface of the second adhesive material 5 to form an electronic device in which the microelectromechanical mechanism 8 of the electronic component 10 is hermetically sealed inside the second adhesive material 5. .

この電子装置のうち配線導体2の導出部分を、半田ボール等の外部端子11を介して外部の電気回路に接続することにより、微小電子機械機構8が外部電気回路と電気的に接続される。   By connecting the lead-out portion of the wiring conductor 2 of this electronic device to an external electric circuit via an external terminal 11 such as a solder ball, the microelectromechanical mechanism 8 is electrically connected to the external electric circuit.

本発明の電子装置によれば、このように、第2の接着材5の主面を半導体基板7の主面に接合させるだけで、電子部品10の微小電子機械機構8を、第2の接着材5と絶縁基体1とにより容易かつ確実に封止することができる。また、電子部品10の電極9が電子部品封止用基板6の接続パッド3に接続され、接続パッド3が配線導体2を介して絶縁基体1の他方主面または側面に導出されているので、電極9を容易かつ確実に外部接続させることができる。   According to the electronic device of the present invention, the microelectromechanical mechanism 8 of the electronic component 10 can be bonded to the second adhesive simply by joining the main surface of the second adhesive 5 to the main surface of the semiconductor substrate 7 as described above. The material 5 and the insulating substrate 1 can be easily and reliably sealed. Further, since the electrode 9 of the electronic component 10 is connected to the connection pad 3 of the electronic component sealing substrate 6, and the connection pad 3 is led out to the other main surface or side surface of the insulating base 1 through the wiring conductor 2, The electrode 9 can be easily and reliably externally connected.

また、本発明の電子装置は、例えば、電子部品封止用基板6の絶縁基体1をセラミック多層配線基板等を用いて形成したものとすることにより、配線導体2を、接続パッド3や第2の接着材5が形成、取着されている一方主面から他方主面や側面にかけて、絶縁基体1の内部や表面に自由に形成して導出させることができ、この導出された端部に外部接続用の金属バンプから成る外部端子11を取着させること等により、容易に表面実装することが可能な電子装置となすことができる。   In the electronic device of the present invention, for example, the insulating base 1 of the electronic component sealing substrate 6 is formed by using a ceramic multilayer wiring board or the like, whereby the wiring conductor 2 is connected to the connection pad 3 or the second wiring board 2. The adhesive 5 is formed and attached to the other main surface or side surface from one main surface to the other main surface or side surface, and can be freely formed and led to the inside of the insulating substrate 1. By attaching the external terminal 11 made of a metal bump for connection, an electronic device that can be easily surface-mounted can be obtained.

なお、図1に示すように、第2の接着材5が接合される絶縁基体1の主面に、接続パッド3と同様の材料により導体層3aを形成しておき、この導体層3aから絶縁基体1の他方主面にかけて配線導体2の一部を導出させるようにしてもよい。この導体層3aから導出された配線導体2の導出部分は、上述の外部端子11等を介して外部電気回路の接地用端子等に接続することができる。   As shown in FIG. 1, a conductor layer 3a is formed on the main surface of the insulating substrate 1 to which the second adhesive material 5 is bonded using the same material as the connection pad 3, and is insulated from the conductor layer 3a. A part of the wiring conductor 2 may be led out to the other main surface of the substrate 1. The lead-out portion of the wiring conductor 2 led out from the conductor layer 3a can be connected to the grounding terminal of the external electric circuit or the like via the external terminal 11 or the like.

また、本発明の電子部品封止用基板6は、上記構成の電子装置の形成に用いられるものであって、図2に示すように、絶縁基体1と、絶縁基体1の一方主面から他方主面または側面にかけて導出されている配線導体2と、絶縁基体1の一方主面に形成され、配線導体2と電気的に接続するとともに第1の接着材4が取着されている接続パッド3と、絶縁基体1の一方主面に接続パッド3を取り囲むように取着されている枠状の第2の接着材5とを具備し、絶縁基体1に、配線導体2と、第1の接着材4が取着されている接続パッド3と、枠状の第2の接着材5とを一単位とした電子部品封止領域6aが少なくも一つ形成されたものである。なお、図2において図1と同じ部位には同じ符号を付している。   The electronic component sealing substrate 6 of the present invention is used for forming an electronic device having the above-described configuration. As shown in FIG. 2, the insulating base 1 and the main surface of the insulating base 1 to the other The wiring conductor 2 led out to the main surface or the side surface and the connection pad 3 formed on one main surface of the insulating base 1 and electrically connected to the wiring conductor 2 and having the first adhesive 4 attached thereto. And a frame-shaped second adhesive 5 attached to one main surface of the insulating base 1 so as to surround the connection pad 3. The wiring base 2 and the first adhesive are attached to the insulating base 1. At least one electronic component sealing region 6a having the connection pad 3 to which the material 4 is attached and the frame-like second adhesive material 5 as one unit is formed. In FIG. 2, the same parts as those in FIG.

本発明の電子部品封止用基板は、上記構成としたことから、第2の接着材5を半導体基板7の主面に接合させるだけで微小電子機械機構8を容易かつ確実に封止することができるとともに、接続パッド3に接続される電極9を、配線導体2を介して容易かつ確実に外部接続させることができる。   Since the electronic component sealing substrate of the present invention has the above-described configuration, it is possible to easily and reliably seal the microelectromechanical mechanism 8 simply by bonding the second adhesive 5 to the main surface of the semiconductor substrate 7. In addition, the electrode 9 connected to the connection pad 3 can be easily and reliably externally connected via the wiring conductor 2.

また本発明の電子部品封止用基板によれば、絶縁基体1に、配線導体2と、第1の接着材4が取着されている接続パッド3と、枠状の第2の接着材5とを一単位とした電子部品封止領域6aを多数個縦横に配列形成しておくと、上記電子部品10となる電子部品領域10aが広面積の半導体基板7の主面に多数個配列形成されていたとしても、これらの電子部品領域10aを一括して封止することができ、多数の微小電子機械機構8の封止を容易に行うことができる。   According to the electronic component sealing substrate of the present invention, the wiring conductor 2, the connection pad 3 to which the first adhesive 4 is attached, and the frame-shaped second adhesive 5 are attached to the insulating base 1. If a large number of electronic component sealing regions 6a are arranged in the vertical and horizontal directions as a unit, a large number of electronic component regions 10a to be the electronic components 10 are formed on the main surface of the semiconductor substrate 7 having a large area. Even in such a case, these electronic component regions 10a can be collectively sealed, and a large number of microelectromechanical mechanisms 8 can be easily sealed.

また、このように、半導体基板7の主面に、微小電子機械機構8およびこれに電気的に接続された電極9が多数個配列形成された、多数個取りの形態で製作される電子部品10を一括して封止しておくと、この半導体基板7(および電子部品封止用基板6)にダイシング加工等の切断加工を施して、個々の電子部品10(電子装置)に分割する際に、切断に伴って発生する切削粉等が微小電子機械機構8に付着してその作動を妨害する、という不具合の発生を効果的に防止することができる。   In addition, in this way, an electronic component 10 manufactured in a multi-cavity form in which a large number of microelectromechanical mechanisms 8 and electrodes 9 electrically connected thereto are arranged on the main surface of the semiconductor substrate 7. Are collectively sealed, the semiconductor substrate 7 (and the electronic component sealing substrate 6) is subjected to a cutting process such as a dicing process and divided into individual electronic components 10 (electronic devices). Thus, it is possible to effectively prevent the occurrence of a problem that cutting powder or the like generated along with cutting adheres to the microelectromechanical mechanism 8 and interferes with its operation.

また本発明の電子部品封止用基板6において、第1の接着材4および第2の接着材5の溶融温度の差を50℃以下した場合には、溶融温度の差が小さいので、第1の接着材4および第2の接着材5を同時に加熱溶融させて、第1の接着材4と電子部品10の電極9との接合、および第2の接着材5と半導体基板7の主面との接合を同時に、かつ強固に行うことがより容易となり、電子部品10の電極9の接続および微小電子機械機構8の封止をより一層確実かつ容易なものとすることができる。 Further, in the electronic component sealing substrate 6 of the present invention, when the difference in melting temperature between the first adhesive 4 and the second adhesive 5 is 50 ° C. or less , the difference in melting temperature is small. The first adhesive 4 and the second adhesive 5 are simultaneously heated and melted to join the first adhesive 4 and the electrode 9 of the electronic component 10, and the main surface of the second adhesive 5 and the semiconductor substrate 7. Can be more easily and securely joined together, and the connection of the electrode 9 of the electronic component 10 and the sealing of the microelectromechanical mechanism 8 can be made more reliable and easy.

従って、本発明の電子部品封止用基板6において、第1の接着材4および第2の接着材5の溶融温度の差は50℃以下しておくことが好ましい。 Accordingly, in the electronic component sealing substrate 6 of the present invention, the difference between the melting temperature of the first adhesive 4 and the second adhesive 5 is preferably kept as 50 ° C. or less.

このような溶融温度の差となる組み合わせとしては、第1の接着材4および第2の接着材5を同じ材料で形成する場合のほか、錫−銀−銅半田と錫−銀−ビスマス半田、錫−銀−銅半田と錫−亜鉛−ビスマス半田等が挙げられる。   As a combination that makes such a difference in melting temperature, in addition to the case where the first adhesive 4 and the second adhesive 5 are formed of the same material, tin-silver-copper solder and tin-silver-bismuth solder, Examples include tin-silver-copper solder and tin-zinc-bismuth solder.

また、本発明の電子部品封止用基板6において、前記第1の接着材4および前記第2の接着材5を同じ高さとした場合には、第1の接着材4と電極9との距離、および第2の接着材5と半導体基板7の主面との距離が同じになるため、電極9に対する電気的接続および気密封止の信頼性をより良好に確保することができる。   In the electronic component sealing substrate 6 of the present invention, when the first adhesive 4 and the second adhesive 5 have the same height, the distance between the first adhesive 4 and the electrode 9 is the same. Since the distance between the second adhesive 5 and the main surface of the semiconductor substrate 7 is the same, the electrical connection to the electrode 9 and the reliability of hermetic sealing can be ensured better.

従って、本発明の電子部品封止用基板6において、前記第1の接着材4および前記第2の接着材5は同じ高さとすることが好ましい。   Therefore, in the electronic component sealing substrate 6 of the present invention, it is preferable that the first adhesive 4 and the second adhesive 5 have the same height.

次に、このような電子部品封止用基板6を用いた電子装置の製造方法について、図3(a)〜(e)に基づいて説明する。図3は本発明の電子装置の製造方法の実施の形態の一例をそれぞれ工程順に示した断面図であり、図3において図1および図2と同じ部位には同じ符号を付してある。   Next, a method for manufacturing an electronic device using such an electronic component sealing substrate 6 will be described with reference to FIGS. FIG. 3 is a sectional view showing an example of an embodiment of an electronic device manufacturing method according to the present invention in the order of steps. In FIG. 3, the same parts as those in FIGS.

まず、図3(a)に示すように、半導体基板7の主面に、微小電子機械機構8およびこれに電気的に接続された電極9が形成されて成る電子部品領域10aを多数個、縦横に配列形成した多数個取り電子部品10bを準備する。   First, as shown in FIG. 3A, a large number of electronic component regions 10a each having a microelectromechanical mechanism 8 and electrodes 9 electrically connected thereto are formed on the main surface of the semiconductor substrate 7. A multi-cavity electronic component 10b arranged in an array is prepared.

半導体基板7は、例えば単結晶や多結晶等のシリコン基板から成る。   The semiconductor substrate 7 is made of a silicon substrate such as a single crystal or polycrystal.

このシリコン基板の表面に酸化シリコン層を形成するとともに、フォトリソグラフィ等の微細配線加工技術を応用して、微小な振動体等の微小電子機械機構8および円形状パターン等の導体から成る電極9が形成された電子部品領域10aを多数個、縦横に配列形成することにより多数個取り電子部品10bが形成される。なお、この例においては、微小電子機械機構8と電極9とは、それぞれ半導体基板7の主面に形成された微細配線(図示せず)を介して電気的に接続されている。   A silicon oxide layer is formed on the surface of the silicon substrate, and by applying a fine wiring processing technique such as photolithography, a micro electromechanical mechanism 8 such as a minute vibrating body and an electrode 9 made of a conductor such as a circular pattern are provided. A plurality of electronic component regions 10a are formed by arranging a large number of formed electronic component regions 10a vertically and horizontally. In this example, the microelectromechanical mechanism 8 and the electrode 9 are electrically connected via fine wiring (not shown) formed on the main surface of the semiconductor substrate 7, respectively.

次に、図3(b)に示すように、絶縁基体1に、配線導体2と、第1の接着材4が取着されている接続パッド3と、枠状の第2の接着材5とを一単位とした電子部品封止領域6aを多数個、縦横に配列形成した電子部品封止用基板6を準備する。   Next, as shown in FIG. 3 (b), the wiring conductor 2, the connection pad 3 to which the first adhesive 4 is attached, and the frame-like second adhesive 5 are attached to the insulating base 1. An electronic component sealing substrate 6 is prepared in which a large number of electronic component sealing regions 6a are arranged in a vertical and horizontal direction.

配線導体2は、接続パッド3に接続するとともにこれを外部に導出するために、接続パッド3から絶縁基体1の他方主面または側面にかけて導出されるようにして形成される。   The wiring conductor 2 is formed so as to be led out from the connection pad 3 to the other main surface or side surface of the insulating base 1 in order to connect to the connection pad 3 and lead it to the outside.

一方主面から他方主面または側面に導出された配線導体2が形成された絶縁基体1は、例えば、絶縁基体1が酸化アルミニウム質焼結体から成り、配線導体2がタングステンのメタライズ層から成る場合であれば、酸化アルミニウム、酸化珪素、酸化カルシウム等の原料粉末を、有機樹脂・バインダとともに混練してスラリーを得て、このスラリーをドクターブレード法やリップコータ法等によりシート状に成形して複数のグリーンシートを形成し、このグリーンシートの表面に、および必要に応じてグリーンシートにあらかじめ形成しておいた貫通孔内に、タングステンのメタライズペーストを印刷塗布、充填し、その後、これらのグリーンシートを積層して焼成することにより形成することができる。   Insulating base 1 on which wiring conductor 2 led out from one main surface to the other main surface or side face is formed, for example, insulating base 1 is made of an aluminum oxide sintered body, and wiring conductor 2 is made of a metallized layer of tungsten. In some cases, a raw material powder such as aluminum oxide, silicon oxide, calcium oxide or the like is kneaded with an organic resin / binder to obtain a slurry, and the slurry is formed into a sheet shape by a doctor blade method, a lip coater method, or the like. A green metal sheet is formed, and a metallized paste of tungsten is printed on the surface of the green sheet and, if necessary, in the through holes previously formed in the green sheet, filled, and then these green sheets Can be formed by laminating and firing.

なお、これらのグリーンシートのうち、一部のものに打ち抜き加工を施して四角形状等の開口部を形成しておき、これを一方主面側の最表層に配置し、または最表層から内部に向かって数層積層するようにして、焼成後の絶縁基体1の一方主面に、電子部品領域10aの配列に対応する凹部1aが配列形成されるようにしておいてもよい。このように凹部1aを形成しておくと、この凹部1aの内側に微小電子機械機構8を収めることができるので、微小電子機械機構8を取り囲むための第2の接着材5の高さを低く抑えることができ、電子装置の低背化に有利なものとなる。   Of these green sheets, some of them are punched to form square-shaped openings, etc., which are arranged on the outermost layer on one main surface side, or from the outermost layer to the inside. A plurality of layers may be laminated so that the recesses 1a corresponding to the arrangement of the electronic component regions 10a may be formed on one main surface of the fired insulating base 1 in an array. If the concave portion 1a is formed in this way, the micro electro mechanical mechanism 8 can be accommodated inside the concave portion 1a, so that the height of the second adhesive 5 for surrounding the micro electro mechanical mechanism 8 is lowered. This can be suppressed, which is advantageous for reducing the height of the electronic device.

また、接続パッド3は、通常、配線導体2と同様の材料から成り、例えば、タングステンのペーストを絶縁基体1となるグリーンシートのうち最表面に、配線導体2となる印刷されたタングステンペーストと接続されるようにして、かつ多数個が縦横に配列形成されるようにして、スクリーン印刷法等により印刷しておくことにより形成される。   Further, the connection pad 3 is usually made of the same material as that of the wiring conductor 2. For example, a tungsten paste is connected to the printed tungsten paste to be the wiring conductor 2 on the outermost surface of the green sheet to be the insulating base 1. In this manner, a large number are arranged in rows and columns and printed by screen printing or the like.

この接続パッド3に錫−銀系等の半田、金−錫ろう等の低融点ろう材、銀−ゲルマニウム系等の高融点ろう材等から成る第1の接着材4が取着される。第1の接着材4は、例えば、錫−銀系等の半田から成る場合であれば、この半田のペーストを接続パッド3上にスクリーン印刷法等により印刷することにより形成される。   A first adhesive 4 made of a tin-silver solder, a low melting solder such as gold-tin solder, a high melting solder such as silver-germanium, or the like is attached to the connection pad 3. If the first adhesive 4 is made of, for example, tin-silver solder, the first adhesive 4 is formed by printing the solder paste on the connection pads 3 by a screen printing method or the like.

また、絶縁基体1の主面には、接続パッド3を取り囲むようにして、錫−銀系等の半田、金−錫ろう等の低融点ろう材、銀−ゲルマニウム系等の高融点ろう材等から成る枠状の第2の接着材5が取着されている。   Further, on the main surface of the insulating substrate 1, surrounding the connection pads 3, solder such as tin-silver solder, low melting point solder such as gold-tin solder, high melting point solder such as silver-germanium, etc. A frame-like second adhesive material 5 is attached.

第2の接着材5は、例えば、錫−銀系等の半田から成る場合であれば、この半田のペーストを絶縁基体1上にスクリーン印刷法等により所定の枠状のパターンに印刷することにより形成される。   If the second adhesive 5 is made of, for example, tin-silver solder, the solder paste is printed on the insulating substrate 1 in a predetermined frame pattern by screen printing or the like. It is formed.

次に、図3(c)に示すように、多数個取り電子部品10bを電子部品封止用基板6に対し各電子部品領域10aと各電子部品封止領域6aとを対応させて重ね合わせ、電極9を第1の接着材4に接合するとともに、微小電子機械機構8の周囲の半導体基板7の主面を第2の接着材5の主面に接合して、微小電子機械機構8を第2の接着材5の内側に気密封止する。   Next, as shown in FIG. 3 (c), the multi-piece electronic component 10b is superimposed on the electronic component sealing substrate 6 so that each electronic component region 10a and each electronic component sealing region 6a correspond to each other. The electrode 9 is bonded to the first adhesive 4, and the main surface of the semiconductor substrate 7 around the micro electro mechanical mechanism 8 is bonded to the main surface of the second adhesive 5, so that the micro electro mechanical mechanism 8 is 2 is hermetically sealed inside the adhesive 5.

ここで、電極と第1の接着材4との接合、および第2の接着材5と微小電子機械機構8の周囲の半導体基板7の主面との接合は、例えば、第1の接着材4と第2の接着材5とがともに錫−銀系半田から成る場合であれば、電極上に第1の接着材4と第2の接着材5とを位置合わせして載せ、これらを約200℃〜300℃程度の温度のリフロー炉中で熱処理すること等により行なわれる。 Here, the bonding between the electrode 9 and the first adhesive 4 and the bonding between the second adhesive 5 and the main surface of the semiconductor substrate 7 around the microelectromechanical mechanism 8 are, for example, the first adhesive 4 and the second adhesive 5 are both made of tin-silver solder, the first adhesive 4 and the second adhesive 5 are aligned and placed on the electrode 9 , For example, the heat treatment is performed in a reflow furnace at a temperature of about 200 ° C. to 300 ° C.

このように、本発明の電子装置の製造方法によれば、電子部品領域10aの電極の外部導出のための接合と、微小電子機械機構8の気密封止のための接合とを同時に行なうこともできるため、数時間程度を要する半田(ろう)付け等の接合の工程を、従来の製造方法に比べて、確実に少なくとも1工程減らすことができるので、電子装置の生産性を非常に高めることができる。 As described above, according to the method for manufacturing an electronic device of the present invention, bonding for leading out the electrode 9 in the electronic component region 10a and bonding for hermetic sealing of the microelectromechanical mechanism 8 are simultaneously performed. Therefore, it is possible to reliably reduce at least one step of joining such as soldering that requires several hours as compared with the conventional manufacturing method, so that the productivity of electronic devices is greatly increased. Can do.

この場合、第1の接着材4および第2の接着材5の溶融温度の差を50℃以下しておくと、第1の接着材4と電子部品10の電極9との接合、および第2の接着材5と半導体基板7の主面との接合を同時に行う際、溶融・接合温度の差が小さいので、第1の接着材4および第2の接着材5を同時に加熱溶融させて、第1の接着材4と電子部品10の電極9との接合、および第2の接着材5と半導体基板7の主面との接合を同時に、かつ強固に行うことがより容易となり、電子部品10の電極9の接続および微小電子機械機構8の封止をより一層確実かつ容易になうことができる。 In this case, if the difference in melting temperature between the first adhesive 4 and the second adhesive 5 is set to 50 ° C. or less , the bonding between the first adhesive 4 and the electrode 9 of the electronic component 10, and the first when the Hare simultaneously row bond the second major surface of the adhesive 5 and the semiconductor substrate 7, the difference in melting and bonding temperature is low, heating and melting the first adhesive 4 and the second adhesive member 5 at the same time Te, bonded to the electrode 9 of the first adhesive 4 and the electronic component 10, and a second junction between the main surface of the adhesive 5 and the semiconductor substrate 7 simultaneously and firmly rows that Ukoto becomes easier can Nau more reliably and easily line more connection and sealing of the micro electronic mechanical system 8 of the electrode 9 of the electronic component 10.

従って、本発明の電子装置の製造方法において、第1の接着材4および第2の接着材5は、溶融温度の差を50℃以下しておくことが好ましい。 Accordingly, in the manufacturing method of the electronic apparatus of the present invention, the first adhesive 4 and the second adhesive 5, it is preferable to the 50 ° C. or less the difference in melting temperature.

また、第1の接着材4および第2の接着材5の高さを同じとした場合には、第1の接着材4を介して接合される電極9と接続パッド3との間の距離、および第2の接着材5を介して接合される絶縁基体1の一方主面と半導体基板7の主面との間の距離が同じになるため、電極9と接続パッド3との電気的接続および微小電子機械機構8の気密封止の信頼性をより良好に確保することができる。   Further, when the height of the first adhesive 4 and the second adhesive 5 is the same, the distance between the electrode 9 and the connection pad 3 joined via the first adhesive 4, Since the distance between one main surface of the insulating substrate 1 and the main surface of the semiconductor substrate 7 joined through the second adhesive 5 is the same, the electrical connection between the electrode 9 and the connection pad 3 and The reliability of the hermetic sealing of the micro electro mechanical mechanism 8 can be ensured more favorably.

従って、本発明の電子装置の製造方法において、第1の接着材4および第2の接着材5を同じ高さとしておくことが好ましい。   Therefore, in the method for manufacturing an electronic device according to the present invention, it is preferable that the first adhesive 4 and the second adhesive 5 are set at the same height.

なお、前記第1の接着材4および前記第2の接着材5について同じ高さとする手段としては、例えば、第1の接着材をスクリーン印刷法により印刷する場合であれば、印刷する接合材ペーストの塗布厚みにより調節することができる。 In addition, as a means to make the said 1st adhesive material 4 and the said 2nd adhesive material 5 the same height, if it is a case where the 1st adhesive material 4 is printed by the screen printing method, for example, the bonding material to print It can be adjusted by the coating thickness of the paste.

なお、上記のようにして微小電子機械機構を封止した際、半導体基板7の主面に接合され微小電子機械機構8を封止する側壁として機能するのが、錫−銀系等の半田、金−錫ろう等の低融点ろう材、銀−ゲルマニウム系等の高融点ろう材等の導電性を有する接合材等により形成された枠状の第2の接着材5であり、このような接合材等を半導体基板7の主面に強固に接合させることができるため、微小電子機械機構の気密封止の信頼性を優れたものとすることができる。 In addition, when the micro electro mechanical mechanism 8 is sealed as described above, a tin-silver solder or the like functions as a side wall that is bonded to the main surface of the semiconductor substrate 7 and seals the micro electro mechanical mechanism 8. A second adhesive material 5 having a frame shape formed of a conductive bonding material such as a low melting point brazing material such as gold-tin brazing, a high melting point brazing material such as silver-germanium, and the like. Since the bonding material and the like can be firmly bonded to the main surface of the semiconductor substrate 7, the reliability of the hermetic sealing of the microelectromechanical mechanism can be improved.

そして、図3(d)に示すように、互いに接合された多数個取り電子部品10bおよび電子部品封止用基板6を電子部品封止領域6a毎に分割して、各電子部品10が電子部品封止用基板6で封止されて成る個々の電子装置を得る。   Then, as shown in FIG. 3 (d), the multi-piece electronic component 10b and the electronic component sealing substrate 6 joined to each other are divided into electronic component sealing regions 6a, and each electronic component 10 is an electronic component. Individual electronic devices sealed with the sealing substrate 6 are obtained.

互いに接合された、多数個取り電子部品10bおよび電子部品封止用基板6の接合体の切断は、この接合体に対して、ダイシング加工等の切断加工を施すことにより行なうことができる。   The joined body of the multi-piece electronic component 10b and the electronic component sealing substrate 6 joined to each other can be cut by performing a cutting process such as dicing on the joined body.

本発明の電子装置の製造方法においては、このダイシング加工等の切断加工の際に、各微小電子機械機構8は第2の接着材5の内側で、この第2の接着材5と半導体基板7と絶縁基体1とにより気密封止されているので、半導体基板7や絶縁基体1等の切断に伴って発生するシリコンやセラミックス等の切削粉等が微小電子機械機構8に付着することはなく、完成した電子装置において、微小電子機械機構8を確実に正常に作動させることができる。   In the method for manufacturing an electronic device according to the present invention, each microelectromechanical mechanism 8 is inside the second adhesive material 5 during the cutting process such as dicing, and the second adhesive material 5 and the semiconductor substrate 7. And the insulating base 1 are hermetically sealed, so that cutting powder such as silicon and ceramics generated when the semiconductor substrate 7 and the insulating base 1 are cut does not adhere to the microelectromechanical mechanism 8. In the completed electronic device, the microelectromechanical mechanism 8 can be reliably operated normally.

このように、本発明の電子装置の製造方法によれば、従来のように、半導体基板7の主面に多数個を縦横に配列形成した電子部品領域10aを切断する際に、その微小電子機械機構8をガラス板等で覆って保護するような工程を別途追加する必要はなく、この、保護のためだけという工程を確実に削除することができるので、電子装置の生産性を非常に高いものとすることができる。   As described above, according to the method for manufacturing an electronic device of the present invention, when cutting the electronic component region 10a in which a large number are vertically and horizontally formed on the main surface of the semiconductor substrate 7 as in the prior art, the microelectronic machine is cut. It is not necessary to add a separate process for protecting the mechanism 8 by covering it with a glass plate or the like, and it is possible to reliably eliminate this process only for protection, so that the productivity of the electronic device is extremely high. It can be.

また、このようにして製造された電子装置は、すでに気密封止されているとともに、その電極9が配線導体2を介して外部に導出された状態であるので、これを別途パッケージ内に実装するような工程を追加する必要はなく、配線導体2の導出された部分を外部の電気回路に半田ボール等の外部端子11を介して接続するだけで、外部電気回路基板に実装して使用することができる。   Further, the electronic device manufactured in this way is already hermetically sealed, and the electrode 9 is in a state of being led out to the outside through the wiring conductor 2, so that this is separately mounted in a package. There is no need to add such a process, and the portion where the wiring conductor 2 is led out is simply connected to an external electric circuit via an external terminal 11 such as a solder ball, and mounted on an external electric circuit board for use. Can do.

また、この場合、配線導体2は、絶縁基体1の他方主面または側面に導出されているので、外部電気回路に表面実装の形態で接続することができ、高密度に実装することや、外部電気回路の基板を効果的に小型化することができる。   Further, in this case, since the wiring conductor 2 is led out to the other main surface or side surface of the insulating base 1, it can be connected to an external electric circuit in the form of surface mounting, and can be mounted at a high density, The substrate of the electric circuit can be effectively downsized.

なお、本発明は上述の実施の形態の例に限定されるものではなく、本発明の要旨の範囲内であれば、種々の変形は可能である。   In addition, this invention is not limited to the example of above-mentioned embodiment, A various deformation | transformation is possible if it is in the range of the summary of this invention.

例えば、上述の実施の形態の例では一つの電子装置内に一つの微小電子機械機構を気密封止したが、一つの電子装置内に複数の微小電子機械機構を気密封止してもよい。   For example, in the example of the above-described embodiment, one microelectromechanical mechanism is hermetically sealed in one electronic device, but a plurality of microelectromechanical mechanisms may be hermetically sealed in one electronic device.

また、図1に示した例では、配線導体2は絶縁基体1の他方主面側に導出しているが、これを、側面に導出したり、側面および他方主面の両方に導出したりしてもよい。また、この導出された部分の外部電気回路への電気的な接続は、外部端子として半田ボールを介して行なうものに限らず、リード端子や導電性接着剤等を介して行なってもよい。   Further, in the example shown in FIG. 1, the wiring conductor 2 is led out to the other main surface side of the insulating base 1, but this is led out to the side surface or led to both the side surface and the other main surface. May be. Further, the electrical connection of the derived portion to an external electric circuit is not limited to being performed via a solder ball as an external terminal, and may be performed via a lead terminal, a conductive adhesive, or the like.

本発明の電子装置および電子部品封止用基板の実施の形態の一例を示す断面図である。It is sectional drawing which shows an example of embodiment of the electronic device of this invention, and the board | substrate for electronic component sealing. 本発明の電子部品封止用基板の実施の形態の他の例を示す断面図である。It is sectional drawing which shows the other example of embodiment of the board | substrate for electronic component sealing of this invention. (a)〜(d)は、本発明の電子装置の製造方法の実施の形態の一例をそれぞれ工程順に示した断面図である。(A)-(d) is sectional drawing which showed an example of embodiment of the manufacturing method of the electronic device of this invention in order of the process, respectively. 従来の電子装置および電子部品封止用基板の一例を示す断面図である。It is sectional drawing which shows an example of the conventional electronic device and a substrate for electronic component sealing.

符号の説明Explanation of symbols

1・・・・絶縁基体
2・・・・配線導体
3・・・・接続パッド
3a・・・導体層
4・・・・第1の接着材
5・・・・第2の接着材
6・・・・電子部品封止用基板
6a・・・電子部品封止領域
6b・・・電子部品封止用基板
7・・・・半導体基板
8・・・・微小電子機械機構
9・・・・電極
10・・・電子部品
10a・・電子部品領域
10b・・電子部品
DESCRIPTION OF SYMBOLS 1 ... Insulating base | substrate 2 ... Wiring conductor 3 ... Connection pad 3a ... Conductor layer 4 ... 1st adhesive material 5 ... 2nd adhesive material 6 ... .... Electronic component sealing substrate 6a ... Electronic component sealing region 6b ... Electronic component sealing substrate 7 ... Semiconductor substrate 8 ... Micro-electromechanical mechanism 9 ... Electrode 10 ... Electronic parts 10a ... Electronic parts area 10b ... Electronic parts

Claims (12)

半導体基板と、該半導体基板の主面に設けられた微小電子機械機構と、前記半導体基板の前記主面に設けられ、前記微小電子機械機構に電気的に接続される電極とを有する電子部品と、
前記半導体基板の前記主面に接合された一方主面を有する絶縁基体と、
前記絶縁基体の前記一方主面から他方主面にかけて前記絶縁基体の内部に設けられた複数の配線導体と、
前記半導体基板の前記主面と前記絶縁基体の前記一方主面との間に設けられ、前記配線導体と前記電極とを電気的に接続する第1の導電性接着材と、
前記半導体基板の前記主面と前記絶縁基体の前記一方主面との間で、前記第1の導電性接着材を取り囲むように設けられた枠状の第2の導電性接着材と、
前記絶縁基体の前記一方主面から他方主面にかけて前記絶縁基体の内部に設けられ、前記一方主面に形成された導体層を介して前記第2の導電性接着材に電気的に接続された前記配線導体の一部
を備え、
前記電子部品の前記微小電子機械機構は、前記第2の導電性接着材の内側に気密に封止されていことを特徴とする電子装置。
An electronic component comprising: a semiconductor substrate; a microelectromechanical mechanism provided on the main surface of the semiconductor substrate; and an electrode provided on the main surface of the semiconductor substrate and electrically connected to the microelectromechanical mechanism. ,
An insulating substrate having one main surface bonded to the main surface of the semiconductor substrate;
A plurality of wiring conductors provided inside the insulating base from the one main surface to the other main surface of the insulating base;
Provided between said main surface and said one main surface of the insulating substrate of the semiconductor substrate, a first conductive adhesive for connecting the before and Sharing, ABS line conductor electrode electrically,
A frame-shaped second conductive adhesive provided so as to surround the first conductive adhesive between the main surface of the semiconductor substrate and the one main surface of the insulating base;
Wherein from the one main surface of the insulating substrate to the other main surface provided inside the insulating substrate, electrically connected to said second conductive adhesive over conductor layer formed on the one main surface and a portion of the wiring conductor,
Wherein the micro electronic mechanical system of an electronic component, an electronic device, wherein the Ru Tei hermetically sealed inside the second conductive adhesive.
前記第1の導電性接着材および前記第2の導電性接着材は、溶融温度の差が50℃以下である請求項1に記載の電子装置。   The electronic device according to claim 1, wherein the first conductive adhesive and the second conductive adhesive have a difference in melting temperature of 50 ° C. or less. 断面視したときに、前記半導体基板と前記絶縁基体は、両者の接合体に切断加工を施したことによって両端が揃っている請求項1又は請求項2に記載の電子装置。 When viewed in cross section, the semiconductor substrate and the insulating substrate, the electronic device according to claim 1 or claim 2 are aligned at both ends by having been subjected to cutting processing to conjugate them. 断面視したときに、前記第2の導電性接着材は、前記半導体基板および前記絶縁基体の両端の断面より内に位置している請求項に記載の電子装置。 When viewed in cross section, the second conductive adhesive, the electronic device according to claim 3 which is located on the inner side of the cross-section of both ends of the semiconductor substrate and the insulating substrate. 半導体基板と、該半導体基板の主面に設けられた微小電子機械機構と、前記半導体基板の前記主面に設けられ、前記微小電子機械機構に電気的に接続される電極とを有する電子部品の前記微小電子機械機構を気密に封止するための電子部品封止用基板であって、
前記半導体基板の前記主面に接合される一方主面を有する絶縁基体と、
前記絶縁基体の前記一方主面から他方主面にかけて前記絶縁基体の内部に設けられた複数の配線導体と、
前記絶縁基体の前記一方主面に設けられ、前記配線導体に電気的に接続された第1の導電性接着材と、
前記絶縁基体の前記一方主面に前記第1の導電性接着材を取り囲むように設けられた枠状の第2の導電性接着材と、
前記絶縁基体の前記一方主面から他方主面にかけて前記絶縁基体の内部に設けられ、前記一方主面に形成された導体層を介して前記第2の導電性接着材に電気的に接続された前記配線導体の一部
を備えていことを特徴とする電子部品封止用基板。
An electronic component comprising: a semiconductor substrate; a microelectromechanical mechanism provided on a main surface of the semiconductor substrate; and an electrode provided on the main surface of the semiconductor substrate and electrically connected to the microelectromechanical mechanism. An electronic component sealing substrate for hermetically sealing the microelectromechanical mechanism,
An insulating substrate having one main surface bonded to the main surface of the semiconductor substrate;
A plurality of wiring conductors provided inside the insulating base from the one main surface to the other main surface of the insulating base;
Wherein provided on the one main surface of the insulating substrate, a first conductive adhesive which is electrically connected to the front Sharing, ABS line conductors,
A frame-like second conductive adhesive provided on the one main surface of the insulating base so as to surround the first conductive adhesive;
Wherein from the one main surface of the insulating substrate to the other main surface provided inside the insulating substrate, electrically connected to said second conductive adhesive over conductor layer formed on the one main surface electronic component sealing substrate, wherein the Ru Tei and a portion of the wiring conductor.
前記第1の導電性接着材および前記第2の導電性接着材は、溶融温度の差が50℃以下である請求項5に記載の電子部品封止用基板。   The electronic component sealing substrate according to claim 5, wherein the first conductive adhesive and the second conductive adhesive have a difference in melting temperature of 50 ° C. or less. 前記第1の導電性接着材の高さが前記第2の導電性接着材の高さと同じである請求項5又は請求項6に記載の電子部品封止用基板。   The electronic component sealing substrate according to claim 5 or 6, wherein a height of the first conductive adhesive is the same as a height of the second conductive adhesive. 前記第2の導電性接着材に電気的に接続された前記配線導体の一部は、前記絶縁基体の内部に設けられた貫通導体を有する請求項5から請求項7のいずれかに記載の電子部品封止用基板。 8. The electron according to claim 5, wherein a part of the wiring conductor electrically connected to the second conductive adhesive has a through conductor provided inside the insulating base. Component sealing substrate. 前記絶縁基体は、複数の絶縁層を積層して成る積層体であり、
前記第2の導電性接着材に電気的に接続された前記配線導体の一部は、前記絶縁層を貫通する貫通導体を有する請求項5から請求項8のいずれかに記載の電子部品封止用基板。
The insulating base is a laminate formed by laminating a plurality of insulating layers,
9. The electronic component sealing according to claim 5, wherein a part of the wiring conductor electrically connected to the second conductive adhesive has a through conductor penetrating the insulating layer. Substrate.
前記第2の導電性接着材に電気的に接続された前記配線導体の一部は、前記貫通導体記配線導体が有する他の貫通導体に平行に配置されている請求項8又は請求項9に記載の電子部品封止用基板。 The special electrically connected to said wiring conductor in the second conductive adhesive, wherein the through conductor is pre Sharing, ABS lines claim 8 is arranged parallel to the other through conductors having conductor or The electronic component sealing substrate according to claim 9 . 前記絶縁基体は、ガラスセラミックス焼結体からなる請求項5から請求項10のいずれかに記載の電子部品封止用基板。   The electronic component sealing substrate according to claim 5, wherein the insulating base is made of a glass ceramic sintered body. 断面視したときに、前記第2の導電性接着材は、前記半導体基板および前記絶縁基体の端部より内に位置している請求項5から請求項11のいずれかに記載の電子部品封止用基板。 When viewed in cross section, the second conductive adhesive, the electronic component sealing according to claims 5 which is located at the inner side of the end portion of the semiconductor substrate and the insulating substrate to claim 11 Stopping board.
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