JP4390456B2 - 電解コンデンサーおよびその作製方法 - Google Patents

電解コンデンサーおよびその作製方法 Download PDF

Info

Publication number
JP4390456B2
JP4390456B2 JP2002566510A JP2002566510A JP4390456B2 JP 4390456 B2 JP4390456 B2 JP 4390456B2 JP 2002566510 A JP2002566510 A JP 2002566510A JP 2002566510 A JP2002566510 A JP 2002566510A JP 4390456 B2 JP4390456 B2 JP 4390456B2
Authority
JP
Japan
Prior art keywords
film
valve metal
vacuum
surface area
high specific
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002566510A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004524686A5 (enExample
JP2004524686A (ja
Inventor
カツィル ディナ
フィンケルステイン スヴィ
Original Assignee
アクタール リミテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by アクタール リミテッド filed Critical アクタール リミテッド
Publication of JP2004524686A publication Critical patent/JP2004524686A/ja
Publication of JP2004524686A5 publication Critical patent/JP2004524686A5/ja
Application granted granted Critical
Publication of JP4390456B2 publication Critical patent/JP4390456B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/04Electrodes or formation of dielectric layers thereon
    • H01G9/042Electrodes or formation of dielectric layers thereon characterised by the material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/15Solid electrolytic capacitors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/162Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/68Capacitors having no potential barriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/0029Processes of manufacture
    • H01G9/0032Processes of manufacture formation of the dielectric layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/0029Processes of manufacture
    • H01G9/0036Formation of the solid electrolyte layer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0315Oxidising metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
JP2002566510A 2001-02-22 2002-02-21 電解コンデンサーおよびその作製方法 Expired - Fee Related JP4390456B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IL141592A IL141592A (en) 2001-02-22 2001-02-22 Electrolytic capacitors and method for making them
PCT/IL2002/000140 WO2002067278A2 (en) 2001-02-22 2002-02-21 Electrolytic capacitors and method for making them

Publications (3)

Publication Number Publication Date
JP2004524686A JP2004524686A (ja) 2004-08-12
JP2004524686A5 JP2004524686A5 (enExample) 2006-01-05
JP4390456B2 true JP4390456B2 (ja) 2009-12-24

Family

ID=11075164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002566510A Expired - Fee Related JP4390456B2 (ja) 2001-02-22 2002-02-21 電解コンデンサーおよびその作製方法

Country Status (5)

Country Link
EP (1) EP1382048A4 (enExample)
JP (1) JP4390456B2 (enExample)
AU (1) AU2002233612A1 (enExample)
IL (1) IL141592A (enExample)
WO (1) WO2002067278A2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100873426B1 (ko) * 2003-03-31 2008-12-11 도요 알루미늄 가부시키가이샤 콘덴서 음극용포일 및 그 제조 방법
US7149076B2 (en) 2003-07-15 2006-12-12 Cabot Corporation Capacitor anode formed of metallic columns on a substrate
JP4561428B2 (ja) * 2004-07-05 2010-10-13 住友金属鉱山株式会社 多孔質バルブ金属薄膜、その製造方法および薄膜キャパシタ
JP4561293B2 (ja) * 2004-10-08 2010-10-13 住友金属鉱山株式会社 薄膜キャパシタおよび薄膜抵抗を有する回路部品ならびにその製造方法
IL173121A (en) * 2006-01-12 2011-07-31 Dina Katsir Electrodes, membranes, printing plate precursors and other articles including multi-strata porous coatings
JP2008258230A (ja) * 2007-03-31 2008-10-23 Nippon Chemicon Corp 固体電解コンデンサ
JP5012996B2 (ja) * 2008-04-08 2012-08-29 株式会社村田製作所 コンデンサおよびその製造方法
JP5816794B2 (ja) 2010-02-15 2015-11-18 パナソニックIpマネジメント株式会社 電極箔の製造方法
JP5692726B2 (ja) * 2010-08-31 2015-04-01 国立大学法人 鹿児島大学 アルミニウム薄膜の製造方法
IL295436A (en) * 2020-02-06 2022-10-01 Saras Micro Devices Inc Modified metal foil capacitors and methods of making the same

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895548A (enExample) * 1972-03-17 1973-12-07
JPS6057693B2 (ja) * 1979-05-29 1985-12-16 松下電器産業株式会社 金属酸化物コンデンサ
GB2056501A (en) * 1979-08-09 1981-03-18 Standard Telephones Cables Ltd Porous metal films
US4453199A (en) 1983-06-17 1984-06-05 Avx Corporation Low cost thin film capacitor
US4970626A (en) * 1987-07-30 1990-11-13 Matsushita Electric Industrial Co., Ltd. Electrolytic capacitor and method of preparing it
JPH01119012A (ja) * 1987-10-30 1989-05-11 Marcon Electron Co Ltd 固体電解コンデンサ
US5851871A (en) 1987-12-23 1998-12-22 Sgs-Thomson Microelectronics, S.R.L. Process for manufacturing integrated capacitors in MOS technology
JP2764745B2 (ja) * 1989-07-21 1998-06-11 オムロン株式会社 混成回路基板およびその製造方法
JPH0444204A (ja) * 1990-06-08 1992-02-14 Nippon Chemicon Corp 電解コンデンサ用アルミニウム電極
JP3155750B2 (ja) * 1990-06-08 2001-04-16 日本ケミコン株式会社 電解コンデンサ用アルミニウム電極の製造方法
DE4207368A1 (de) * 1991-08-06 1993-02-11 Biotronik Mess & Therapieg Stimmulationselektrode
FR2688092B1 (fr) * 1992-02-14 1994-04-15 Traitement Metaux Alliages Sa Feuille pour electrode de condensateur electrolytique et procede de fabrication.
US5357399A (en) * 1992-09-25 1994-10-18 Avx Corporation Mass production method for the manufacture of surface mount solid state capacitor and resulting capacitor
US5589416A (en) 1995-12-06 1996-12-31 Lucent Technologies Inc. Process for forming integrated capacitors
US6287673B1 (en) * 1998-03-03 2001-09-11 Acktar Ltd. Method for producing high surface area foil electrodes
DE19817405A1 (de) * 1998-04-20 1999-10-21 Becromal Spa Verfahren zur Herstellung einer Anode für elektrolytische Kondensatoren und so hergestellte Anoden
IT1307557B1 (it) * 1999-04-14 2001-11-14 Becromal Spa Elettrodi per condensatori elettrolitici e loro processo difabbricazione mediante evaporazione sotto vuoto.

Also Published As

Publication number Publication date
IL141592A (en) 2007-02-11
WO2002067278A3 (en) 2002-12-27
EP1382048A2 (en) 2004-01-21
IL141592A0 (en) 2002-03-10
AU2002233612A1 (en) 2002-09-04
WO2002067278A2 (en) 2002-08-29
JP2004524686A (ja) 2004-08-12
EP1382048A4 (en) 2008-05-28

Similar Documents

Publication Publication Date Title
JP3746627B2 (ja) 高表面積フォイル電極の製造法
US4309810A (en) Porous metal films
JP4390456B2 (ja) 電解コンデンサーおよびその作製方法
WO2009125620A1 (ja) コンデンサおよびその製造方法
US6865071B2 (en) Electrolytic capacitors and method for making them
EP1808876B1 (en) Electrodes, membranes, printing plate precursors and other articles including multi-strata porous coatings, and method for their manufacture
JP4561428B2 (ja) 多孔質バルブ金属薄膜、その製造方法および薄膜キャパシタ
JP2004524686A5 (enExample)
GB2056503A (en) Porous metal films
CN114946000B (zh) 电解电容器以及电解电容器的制造方法
US9001497B2 (en) Electrode foil and capacitor using same
JPS6353688B2 (enExample)
WO2007077612A1 (ja) 多孔質バルブ金属薄膜、その製造方法および薄膜キャパシタ
JP4665854B2 (ja) バルブ金属複合電極箔およびその製造方法
JP2008252019A (ja) 薄膜キャパシタの製造方法
JP4665866B2 (ja) バルブ金属複合電極箔の製造方法
JP5573362B2 (ja) 電極箔とこの電極箔を用いたコンデンサおよび電極箔の製造方法
JP5223517B2 (ja) 箔状の多孔質バルブ金属陽極体およびその製造方法
JPH0750229A (ja) 固体電解コンデンサー及びその製造方法
RU2391442C1 (ru) Способ получения анодной фольги
JP2008047755A (ja) バルブ金属複合電極箔の製造方法
JPH03147312A (ja) 電解コンデンサ用アルミニウム電極の製造方法
JPH03131013A (ja) 電解コンデンサ用アルミニウム電極の製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050118

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050201

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050224

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070611

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070727

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20071023

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20071030

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20071122

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20071130

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20071218

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20071226

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080124

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081010

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090106

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090114

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090209

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090217

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090220

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090918

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20091006

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121016

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131016

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees