JP4388588B2 - クロロシランの反応蒸留 - Google Patents
クロロシランの反応蒸留 Download PDFInfo
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- JP4388588B2 JP4388588B2 JP2008504112A JP2008504112A JP4388588B2 JP 4388588 B2 JP4388588 B2 JP 4388588B2 JP 2008504112 A JP2008504112 A JP 2008504112A JP 2008504112 A JP2008504112 A JP 2008504112A JP 4388588 B2 JP4388588 B2 JP 4388588B2
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- chlorosilane
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- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 title claims description 37
- 239000005046 Chlorosilane Substances 0.000 title claims description 34
- 238000000066 reactive distillation Methods 0.000 title 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 43
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 31
- DKAGJZJALZXOOV-UHFFFAOYSA-N hydrate;hydrochloride Chemical class O.Cl DKAGJZJALZXOOV-UHFFFAOYSA-N 0.000 claims description 30
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 26
- -1 chlorosiloxane Chemical class 0.000 claims description 19
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 14
- 238000004821 distillation Methods 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 7
- 230000003301 hydrolyzing effect Effects 0.000 claims description 6
- 238000009835 boiling Methods 0.000 claims description 2
- 230000003134 recirculating effect Effects 0.000 claims description 2
- 238000004064 recycling Methods 0.000 claims description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 18
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 18
- 238000006460 hydrolysis reaction Methods 0.000 description 12
- 125000004122 cyclic group Chemical group 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 9
- 230000007062 hydrolysis Effects 0.000 description 9
- 239000008346 aqueous phase Substances 0.000 description 6
- 239000012467 final product Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005342 ion exchange Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000005048 methyldichlorosilane Substances 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical group C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000013505 freshwater Substances 0.000 description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- UACGRVDRVCFSEA-UHFFFAOYSA-N butyl-dichloro-methylsilane Chemical compound CCCC[Si](C)(Cl)Cl UACGRVDRVCFSEA-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- NJKDOKBDBHYMAH-UHFFFAOYSA-N dibutyl(dichloro)silane Chemical compound CCCC[Si](Cl)(Cl)CCCC NJKDOKBDBHYMAH-UHFFFAOYSA-N 0.000 description 1
- YUKZTICWNSSDIL-UHFFFAOYSA-N dichloro(cyclohexyl)silane Chemical compound Cl[SiH](Cl)C1CCCCC1 YUKZTICWNSSDIL-UHFFFAOYSA-N 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- UOZZKLIPYZQXEP-UHFFFAOYSA-N dichloro(dipropyl)silane Chemical compound CCC[Si](Cl)(Cl)CCC UOZZKLIPYZQXEP-UHFFFAOYSA-N 0.000 description 1
- GYWBHBXGYTYXRG-UHFFFAOYSA-N dichloro-methyl-octadecylsilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](C)(Cl)Cl GYWBHBXGYTYXRG-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- PDYPRPVKBUOHDH-UHFFFAOYSA-N ditert-butyl(dichloro)silane Chemical compound CC(C)(C)[Si](Cl)(Cl)C(C)(C)C PDYPRPVKBUOHDH-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229940050176 methyl chloride Drugs 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011814 protection agent Substances 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 238000004148 unit process Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
- C07F7/0872—Preparation and treatment thereof
- C07F7/0874—Reactions involving a bond of the Si-O-Si linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/10—Process efficiency
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Polymers (AREA)
Description
ジメチルジクロロシラン及び低共沸性塩酸を、それぞれF及び0.17Fの質量流量にて第1の超共沸性塩酸蒸留塔Aに供給した。ジメチルジクロロシランは第1の塔A内に存在する水と反応して、シクロシロキサン、クロロシロキサン、飽和塩酸水、及び塩化水素ガスを形成した。第1の塔Aは、10〜12psig及び約−3℃〜22℃で操作した。第1の塔Aのシクロシロキサン/クロロシロキサン生成物を、0〜3psig及び約100〜110℃で操作した第2の低共沸性塩酸蒸留塔Bに、0.57Fの流量で供給した。塩化物を含まない新たな水を第2の塔Bに0.14Fの流量で供給した。第2の塔Bに供給されるクロロシロキサンを、塩化物を含まない水で洗浄して実質的に塩化物を含まないシロキサンにし、得られた塩酸を、5パーセントのHCl水を含有する流れとして第2の塔Bから除去した。5パーセントのHCl水を含有する流れを熱交換器Dにおいて加熱し、一部を10〜20パーセントのHCl水として0.17Fの流量で第1の塔Aに供給して、ジメチルジクロロシランを加水分解した。5パーセントのHCl水の残りの部分は、熱交換器Dにおいて蒸発させ、5パーセント未満のHCl水の蒸気として第2の塔Bの下部へ再循環させた。第1の塔Aは、熱を加えて第1の塔Aの上部から出るHClガスを蒸発させるための熱交換器Cを有した。第2の塔B内に存在する洗浄したシロキサンを、95パーセントより多いD3−D5、すなわちヘキサメチシクロトリシロキサン(hexamethycyclotrisiloxane)D3、オクタメチルシクロテトラシロキサンD4、及びデカメチルシクロペンタシロキサンD5を含有する実質的に塩化物を含まないシクロシロキサンの流れと、実質的に塩化物を含まないシロキサンの流れとに同時に分離した。不揮発性の流れは、最終生成物として回収することができるか、又は上記のように、触媒の存在下でヘキサメチルジシロキサン等の適切な末端保護剤とさらに反応させて、低及び中程度の粘度のトリメチシロキシ末端ポリジメチルシロキサンを得ることができる。
Claims (3)
- クロロシランの加水分解方法であって、
(i)1つ以上のクロロシランを第1の超共沸性塩酸蒸留塔に供給すると共に、シクロシロキサン及び線状クロロシロキサンを前記第1の塔から除去すること、
(ii)実質的に塩化物を含まない水を第2の低共沸性塩酸蒸留塔に供給すること、
(iii)前記第1の塔の上部からHClガスを除去すること、
(iv)前記第1の塔の下部から飽和HCl水を除去すると共に、前記第1の塔の上部へ前記飽和HCl水を再循環させること、
(v)前記第1の塔からの前記シクロシロキサン及び前記線状クロロシロキサンを前記第2の塔に供給すること、
(vi)実質的に塩化物を含まないシクロシロキサンを前記第2の塔の上部から除去すると共に、実質的に塩化物を含まない不揮発性シロキサンを前記第2の塔の下部から除去すること、並びに
(vii)HCl水を前記第2の塔の下部から除去すると共に、前記HCl水を前記第1の塔へ再循環させること
を含む、クロロシランの加水分解方法。 - 前記第2の塔において、揮発性及び不揮発性のシクロシロキサン及び線状クロロシロキサンを、それぞれの沸点よりも低い温度及び圧力で分離すること、
前記第2の塔の下部から除去される前記HCl水を部分的に蒸発させ、前記加熱HCl水の第1の液体部分を前記第1の塔へ再循環させ、第2の蒸気部分を前記第2の塔の下部へ再循環させること
をさらに含み、前記第2の塔に供給される実質的に塩化物を含まない水が、前記第1の塔に供給されるクロロシランの量に対して必要とされる化学量論的な量よりも少ない量から、前記第1の塔に供給されるクロロシランの量に対して必要とされる化学量論的な量よりも多い量までの範囲の量である、請求項1に記載のクロロシランの加水分解方法。 - 1〜36パーセントのHCl水を外部供給源から前記第1の塔に供給すること、及び前記外部供給源からのHClを前記第1の塔の上部からHClガスとして回収することをさらに含み、前記第2の塔の下部から除去される前記HCl水が、共沸濃度未満のHCl水を含有する流れである、請求項1に記載のクロロシランの加水分解方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US66613905P | 2005-03-29 | 2005-03-29 | |
US67321305P | 2005-04-20 | 2005-04-20 | |
PCT/US2006/009508 WO2006104702A1 (en) | 2005-03-29 | 2006-03-15 | Reactive distillation of chlorosilanes |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008534590A JP2008534590A (ja) | 2008-08-28 |
JP2008534590A5 JP2008534590A5 (ja) | 2009-05-07 |
JP4388588B2 true JP4388588B2 (ja) | 2009-12-24 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008504112A Active JP4388588B2 (ja) | 2005-03-29 | 2006-03-15 | クロロシランの反応蒸留 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7479567B2 (ja) |
EP (1) | EP1863823B1 (ja) |
JP (1) | JP4388588B2 (ja) |
KR (1) | KR101208324B1 (ja) |
CN (1) | CN101133068B (ja) |
WO (1) | WO2006104702A1 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007064888A2 (en) * | 2005-11-30 | 2007-06-07 | University Of Akron | Synthesis of cycloaliphatic substituted silane monomers and polysiloxanes for photo-curing |
CN102382305B (zh) * | 2010-09-02 | 2013-01-02 | 上海安赐机械设备有限公司 | 一种烷基氯硅烷水解装置及其水解工艺 |
AU2012209345A1 (en) * | 2011-01-25 | 2013-06-13 | Dow Corning Corporation | Method of preparing a diorganodihalosilane |
DE102013201851A1 (de) | 2013-02-05 | 2014-08-21 | Wacker Chemie Ag | Hydrolyse von Organochlorsilanen im Rohrbündelreaktor |
US9962657B2 (en) | 2014-03-25 | 2018-05-08 | Dow Corning Corporation | Method of and system for separating volatile siloxane from feed mixture |
CN106006557B (zh) * | 2016-05-18 | 2018-06-15 | 昆明理工大学 | 一种氯硅烷残液生产氯化氢气体的方法 |
CN106397474B (zh) * | 2016-08-29 | 2018-11-09 | 山东东岳有机硅材料股份有限公司 | 一种降低二甲基二氯硅烷水解物中含酸量的方法 |
KR102269810B1 (ko) * | 2017-05-16 | 2021-06-29 | 와커 헤미 아게 | 유기폴리실록산 수지의 제조 방법 |
CN112076529A (zh) * | 2020-09-24 | 2020-12-15 | 南通星球石墨股份有限公司 | 一种脱除有机硅副产盐酸中硅氧烷的装置及方法 |
CN114011356B (zh) * | 2021-11-12 | 2023-05-26 | 新疆晶硕新材料有限公司 | 二甲基二氯硅烷水解产物的处理方法和装置 |
CN113996256B (zh) * | 2021-11-12 | 2023-11-14 | 新疆晶硕新材料有限公司 | 二甲基二氯硅烷水解产物的处理方法和装置 |
CN113880877B (zh) * | 2021-11-12 | 2023-10-24 | 新疆晶硕新材料有限公司 | 二甲基二氯硅烷水解产物的处理方法和装置 |
CN115069182B (zh) * | 2022-05-26 | 2024-02-27 | 中国化学赛鼎宁波工程有限公司 | 一种有机硅高沸物的处理系统及方法 |
CN115193146B (zh) * | 2022-07-14 | 2024-01-12 | 内蒙古恒业成有机硅有限公司 | 一种二甲基二氯硅烷水解油水分层罐 |
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US2719859A (en) * | 1950-09-21 | 1955-10-04 | Wacker Chemie Gmbh | Method for the hydrolysis of organosilicon compounds |
US3983148A (en) * | 1975-08-29 | 1976-09-28 | Union Carbide Corporation | Process for producing cyclic siloxanes |
US4382145A (en) * | 1981-09-02 | 1983-05-03 | General Electric Company | Method of hydrolyzing organochlorosilanes |
US4609751A (en) * | 1981-12-14 | 1986-09-02 | General Electric Company | Method of hydrolyzing chlorosilanes |
GB2112407B (en) | 1981-12-14 | 1985-06-19 | Gen Electric | Method of hydrolyzing chlorosilanes |
JPH028223A (ja) * | 1988-06-27 | 1990-01-11 | Toshiba Silicone Co Ltd | オルガノクロロシランの加水分解方法 |
US5075479A (en) * | 1991-05-20 | 1991-12-24 | Dow Corning Corporation | Anhydrous hydrogen chloride evolving one-step process for producing siloxanes |
JP3436075B2 (ja) * | 1997-05-28 | 2003-08-11 | 信越化学工業株式会社 | オルガノクロロシランの連続加水分解方法 |
US7208617B2 (en) | 2004-10-05 | 2007-04-24 | Dow Corning Corporation | Hydrolysis of chlorosilanes |
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US7479567B2 (en) | 2009-01-20 |
WO2006104702A1 (en) | 2006-10-05 |
EP1863823B1 (en) | 2012-09-26 |
CN101133068B (zh) | 2012-11-07 |
KR101208324B1 (ko) | 2012-12-05 |
KR20070114793A (ko) | 2007-12-04 |
EP1863823A1 (en) | 2007-12-12 |
CN101133068A (zh) | 2008-02-27 |
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