JP4383796B2 - ナノ構造体、及びその製造方法 - Google Patents

ナノ構造体、及びその製造方法 Download PDF

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Publication number
JP4383796B2
JP4383796B2 JP2003288940A JP2003288940A JP4383796B2 JP 4383796 B2 JP4383796 B2 JP 4383796B2 JP 2003288940 A JP2003288940 A JP 2003288940A JP 2003288940 A JP2003288940 A JP 2003288940A JP 4383796 B2 JP4383796 B2 JP 4383796B2
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Japan
Prior art keywords
substrate
columnar structure
nanostructure
film
columnar
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Expired - Fee Related
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JP2003288940A
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English (en)
Japanese (ja)
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JP2005052956A (ja
JP2005052956A5 (enExample
Inventor
透 田
和彦 福谷
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Canon Inc
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Canon Inc
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Priority to JP2003288940A priority Critical patent/JP4383796B2/ja
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Publication of JP2005052956A5 publication Critical patent/JP2005052956A5/ja
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  • Thin Magnetic Films (AREA)
  • ing And Chemical Polishing (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP2003288940A 2003-08-07 2003-08-07 ナノ構造体、及びその製造方法 Expired - Fee Related JP4383796B2 (ja)

Priority Applications (1)

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JP2003288940A JP4383796B2 (ja) 2003-08-07 2003-08-07 ナノ構造体、及びその製造方法

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Application Number Priority Date Filing Date Title
JP2003288940A JP4383796B2 (ja) 2003-08-07 2003-08-07 ナノ構造体、及びその製造方法

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JP2005052956A JP2005052956A (ja) 2005-03-03
JP2005052956A5 JP2005052956A5 (enExample) 2006-09-21
JP4383796B2 true JP4383796B2 (ja) 2009-12-16

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JP2003288940A Expired - Fee Related JP4383796B2 (ja) 2003-08-07 2003-08-07 ナノ構造体、及びその製造方法

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Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4681939B2 (ja) * 2005-05-24 2011-05-11 キヤノン株式会社 ナノ構造体の製造方法
JP4681938B2 (ja) * 2005-05-24 2011-05-11 キヤノン株式会社 ナノ構造体の製造方法
JP2007111816A (ja) * 2005-10-19 2007-05-10 National Institute For Materials Science 多機能ナノワイヤとその製造方法、多機能ナノワイヤを用いた濃縮方法
JP5016957B2 (ja) * 2006-03-17 2012-09-05 キヤノン株式会社 凹凸構造を有する型及び光学素子用型の製造方法並びに光学素子
DE102006021940A1 (de) * 2006-05-11 2007-11-22 Forschungszentrum Karlsruhe Gmbh Element, Verfahren zu seiner Herstellung und seine Verwendung
KR100803213B1 (ko) * 2006-06-27 2008-02-14 삼성전자주식회사 패턴된 자기기록매체 및 그 제조방법
JP4871809B2 (ja) * 2006-08-11 2012-02-08 キヤノン株式会社 パターンドメディア、磁気記録媒体の製造方法及び基体の製造方法
JP4745917B2 (ja) 2006-08-25 2011-08-10 株式会社日立製作所 磁気記録媒体及び磁気記録再生装置
ATE541303T1 (de) * 2008-01-11 2012-01-15 Uvis Light Ab Verfahren zur herstellung einer feldemissionsanzeige
MY153444A (en) * 2008-08-05 2015-02-13 Smoltek Ab Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale
JP5894780B2 (ja) * 2011-12-13 2016-03-30 昭和電工株式会社 磁気記録媒体の製造方法
JP2014106996A (ja) * 2012-11-29 2014-06-09 Toshiba Corp 垂直磁気記録媒体、及びその製造方法
JP2015135713A (ja) * 2014-01-17 2015-07-27 株式会社東芝 垂直磁気記録媒体、その製造方法、及び磁気記録再生装置
JP7520434B2 (ja) * 2021-09-13 2024-07-23 国立研究開発法人科学技術振興機構 規則化合金強磁性ナノワイヤ構造体及びその製造方法

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