JP4374972B2 - 酸化タンタルのエッチング用組成物 - Google Patents
酸化タンタルのエッチング用組成物 Download PDFInfo
- Publication number
- JP4374972B2 JP4374972B2 JP2003343126A JP2003343126A JP4374972B2 JP 4374972 B2 JP4374972 B2 JP 4374972B2 JP 2003343126 A JP2003343126 A JP 2003343126A JP 2003343126 A JP2003343126 A JP 2003343126A JP 4374972 B2 JP4374972 B2 JP 4374972B2
- Authority
- JP
- Japan
- Prior art keywords
- tantalum oxide
- acid
- tantalum
- etching
- etching composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Description
HF:フッ化水素
NH4OH:アンモニア
OA:シュウ酸
CA:クエン酸
HPO:過酸化水素
TaOx:酸化タンタル
SiOx:酸化シリコン
実施例1〜8、比較例1〜4
シリコンウェハ上に、TaOxをCVD(化学気相成長)法で50nmの厚みで成膜した基板、並びに熱酸化膜(SiOx)を300nmの厚みで成膜したシリコンウエハを作成した。これらの各基板を表1に示す条件下、エッチング組成物(表1の組成物において残部は水)にポリエチレン容器中で5分浸漬し、水洗、乾燥した。浸漬前後のTaOx,SiOxを光学式膜厚測定装置で測定した。浸漬条件及びエッチング特性の結果を表1に示す。なおエッチング特性の評価は下記の様に行った。
○:50nm(酸化タンタルの残存なし)
△:25〜49nm
×:0〜24nm
SiOxのエッチング量
○:0〜30nm
×:31nm〜300nm
Claims (2)
- 0.001〜0.5重量%のフッ化水素、5〜15重量%の過酸化水素、0〜21重量%の多価カルボン酸、酸であるフッ化水素及び多価カルボン酸の当量の合計より少ないアンモニアを含んでなるpH(室温25℃)が1〜6.9の酸化タンタルのエッチング用組成物。
- 多価カルボン酸が、シュウ酸、クエン酸、リンゴ酸、酒石酸、フタル酸、マレイン酸から成る群より選ばれる少なくとも一種である請求項1に記載のエッチング用組成物。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003343126A JP4374972B2 (ja) | 2003-10-01 | 2003-10-01 | 酸化タンタルのエッチング用組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003343126A JP4374972B2 (ja) | 2003-10-01 | 2003-10-01 | 酸化タンタルのエッチング用組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005109318A JP2005109318A (ja) | 2005-04-21 |
JP4374972B2 true JP4374972B2 (ja) | 2009-12-02 |
Family
ID=34537195
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003343126A Expired - Fee Related JP4374972B2 (ja) | 2003-10-01 | 2003-10-01 | 酸化タンタルのエッチング用組成物 |
Country Status (1)
Country | Link |
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JP (1) | JP4374972B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015005660A (ja) * | 2013-06-21 | 2015-01-08 | 東京エレクトロン株式会社 | 酸化タンタル膜の除去方法および除去装置 |
JP6121959B2 (ja) * | 2014-09-11 | 2017-04-26 | 株式会社東芝 | エッチング方法、物品及び半導体装置の製造方法、並びにエッチング液 |
EP4098771A4 (en) * | 2020-01-30 | 2023-06-14 | Resonac Corporation | METAL COMPOUND REMOVAL PROCESS |
-
2003
- 2003-10-01 JP JP2003343126A patent/JP4374972B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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JP2005109318A (ja) | 2005-04-21 |
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