JP4355497B2 - アルファ−メチルスチレンオリゴマーのアルファ−ヒドロキシカルボニル誘導体固体混合物およびその使用 - Google Patents

アルファ−メチルスチレンオリゴマーのアルファ−ヒドロキシカルボニル誘導体固体混合物およびその使用 Download PDF

Info

Publication number
JP4355497B2
JP4355497B2 JP2002583363A JP2002583363A JP4355497B2 JP 4355497 B2 JP4355497 B2 JP 4355497B2 JP 2002583363 A JP2002583363 A JP 2002583363A JP 2002583363 A JP2002583363 A JP 2002583363A JP 4355497 B2 JP4355497 B2 JP 4355497B2
Authority
JP
Japan
Prior art keywords
alpha
compound
formula
mixture
solid mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2002583363A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004527542A5 (enExample
JP2004527542A (ja
Inventor
マルコ ヴィスコンティ,
ガブリエレ ノルチーニ,
バッシ, ジュゼッペ リ
Original Assignee
ランベルティ ソシエタ ペル アチオニ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ランベルティ ソシエタ ペル アチオニ filed Critical ランベルティ ソシエタ ペル アチオニ
Publication of JP2004527542A publication Critical patent/JP2004527542A/ja
Publication of JP2004527542A5 publication Critical patent/JP2004527542A5/ja
Application granted granted Critical
Publication of JP4355497B2 publication Critical patent/JP4355497B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/78Separation; Purification; Stabilisation; Use of additives
    • C07C45/81Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C07C49/83Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00Post-polymerisation treatments
    • C08F6/06Treatment of polymer solutions
    • C08F6/12Separation of polymers from solutions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
JP2002583363A 2001-04-24 2002-04-03 アルファ−メチルスチレンオリゴマーのアルファ−ヒドロキシカルボニル誘導体固体混合物およびその使用 Expired - Lifetime JP4355497B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT2001VA000011A ITVA20010011A1 (it) 2001-04-24 2001-04-24 Miscele solide di derivati alfa-idrossicarbonilici di oligomeri dell'alfa-metilstirene e loro uso.
PCT/EP2002/003674 WO2002085832A2 (en) 2001-04-24 2002-04-03 Solid mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene oligomers and their use

Publications (3)

Publication Number Publication Date
JP2004527542A JP2004527542A (ja) 2004-09-09
JP2004527542A5 JP2004527542A5 (enExample) 2005-12-22
JP4355497B2 true JP4355497B2 (ja) 2009-11-04

Family

ID=11460852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002583363A Expired - Lifetime JP4355497B2 (ja) 2001-04-24 2002-04-03 アルファ−メチルスチレンオリゴマーのアルファ−ヒドロキシカルボニル誘導体固体混合物およびその使用

Country Status (12)

Country Link
US (1) US6995290B2 (enExample)
EP (1) EP1389177B1 (enExample)
JP (1) JP4355497B2 (enExample)
KR (1) KR100877045B1 (enExample)
CN (1) CN1288123C (enExample)
AT (1) ATE410402T1 (enExample)
BR (1) BR0209159A (enExample)
CA (1) CA2442997C (enExample)
DE (1) DE60229234D1 (enExample)
ES (1) ES2314063T3 (enExample)
IT (1) ITVA20010011A1 (enExample)
WO (1) WO2002085832A2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004163904A (ja) * 2002-09-30 2004-06-10 Rohm & Haas Electronic Materials Llc 改善された光開始剤
JP4589916B2 (ja) * 2003-05-05 2010-12-01 チバ ホールディング インコーポレーテッド 1−フェニルインダン光開始剤の製造方法
ITVA20060021A1 (it) * 2006-05-02 2007-11-03 Lamberti Spa Processo per la preparazione di miscele di derivati alfa-idrossicarbonilici di oligomeri dell'alfa-metilstirene
US8507726B2 (en) 2008-11-03 2013-08-13 Basf Se Photoinitiator mixtures
IT1393223B1 (it) 2009-03-11 2012-04-11 Lamberti Spa Procedimento per la preparazione di miscele cristalline di derivati alfa-idrossicarbonilici di dimeri dell'alfa-metilstirene
CN102060684B (zh) 2010-11-12 2014-07-16 深圳市有为化学技术有限公司 对位或间位官能团化芳香酮类化合物、其制备方法及其光聚合引发剂
US20140347429A1 (en) 2011-12-21 2014-11-27 Sericol Limited Inks
KR102089834B1 (ko) * 2014-06-10 2020-04-24 아이지엠 레진스 이탈리아 에스.알.엘. 페닐인단 화합물의 제조 방법
KR102454846B1 (ko) 2014-06-10 2022-10-13 아이지엠 레진스 이탈리아 에스.알.엘. 페닐인단 광개시제의 제조 방법
CN112698547B (zh) * 2019-10-23 2022-02-22 常州强力电子新材料股份有限公司 一种光固化组合物及其应用

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2722264C2 (de) * 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
US4987159A (en) * 1990-04-11 1991-01-22 Fratelli Lamberti S.P.A. Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use

Also Published As

Publication number Publication date
ITVA20010011A1 (it) 2002-10-24
EP1389177B1 (en) 2008-10-08
CA2442997C (en) 2009-07-07
KR20040014497A (ko) 2004-02-14
CN1288123C (zh) 2006-12-06
US6995290B2 (en) 2006-02-07
BR0209159A (pt) 2004-08-03
JP2004527542A (ja) 2004-09-09
ES2314063T3 (es) 2009-03-16
ATE410402T1 (de) 2008-10-15
KR100877045B1 (ko) 2008-12-31
EP1389177A2 (en) 2004-02-18
US20040116549A1 (en) 2004-06-17
CN1529688A (zh) 2004-09-15
WO2002085832A2 (en) 2002-10-31
CA2442997A1 (en) 2002-10-31
DE60229234D1 (de) 2008-11-20
WO2002085832A3 (en) 2002-12-27

Similar Documents

Publication Publication Date Title
JP5722777B2 (ja) 重合可能光開始剤及び放射線硬化性組成物
JP4600600B1 (ja) 新規オキシムエステル化合物およびそれを含んでなるラジカル重合開始剤および重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法
EP2161290B1 (en) Radiation curable compositions
KR102385824B1 (ko) 신규한 3-케토쿠마린, 이들의 제조방법 및 광중합 반응에서 광개시제로서의 이들의 용도
JP4355497B2 (ja) アルファ−メチルスチレンオリゴマーのアルファ−ヒドロキシカルボニル誘導体固体混合物およびその使用
JP4975449B2 (ja) 官能化光開始剤
JPS6281345A (ja) 共重合性光開始剤
JPS5994B2 (ja) 感光性組成物
JP2736678B2 (ja) ベンゾフエノン誘導体
CN113518774B (zh) 一种新的二芳酰基咔唑化合物及其作为增感剂的应用
US9409861B2 (en) Mercapto benzophenone compounds, compositions and preparation method thereof
WO2019101142A1 (zh) 二丁基芴基衍生物与其作为光引发剂的应用
JP2000509391A (ja) チオキサントンとその誘導体を製造するプロセス
CN100360518C (zh) 一种噻吨酮-2-羧酸酯光引发剂
JP2017179006A (ja) 活性エネルギー線硬化型インクジェットインキ組成物
CN101568553B (zh) 新型可辐射固化的组合物
CN105218372A (zh) (4-苯基苯甲酰基)苯甲酸酯及其作为光引发剂的用途
EP2858969B1 (en) Copolymerizable photoinitiators
JPH0572898B2 (enExample)
US20040122125A1 (en) Lactone compounds as novel photoinitiators
CS214670B2 (cs) Způsob fotopolymerace nenasycených sloučenin

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050401

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050406

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080219

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080304

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20080604

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20080611

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080704

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080930

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20081226

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090109

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090202

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090209

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090227

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090306

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090721

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090803

R150 Certificate of patent or registration of utility model

Ref document number: 4355497

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120807

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120807

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130807

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term