JP4314091B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

Info

Publication number
JP4314091B2
JP4314091B2 JP2003345891A JP2003345891A JP4314091B2 JP 4314091 B2 JP4314091 B2 JP 4314091B2 JP 2003345891 A JP2003345891 A JP 2003345891A JP 2003345891 A JP2003345891 A JP 2003345891A JP 4314091 B2 JP4314091 B2 JP 4314091B2
Authority
JP
Japan
Prior art keywords
slider
surface plate
stage
reticle
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003345891A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005116627A (ja
JP2005116627A5 (enExample
Inventor
伸司 大石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003345891A priority Critical patent/JP4314091B2/ja
Priority to US10/947,288 priority patent/US7088429B2/en
Publication of JP2005116627A publication Critical patent/JP2005116627A/ja
Priority to US11/434,104 priority patent/US7259836B2/en
Publication of JP2005116627A5 publication Critical patent/JP2005116627A5/ja
Application granted granted Critical
Publication of JP4314091B2 publication Critical patent/JP4314091B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2003345891A 2003-10-03 2003-10-03 露光装置及びデバイス製造方法 Expired - Fee Related JP4314091B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003345891A JP4314091B2 (ja) 2003-10-03 2003-10-03 露光装置及びデバイス製造方法
US10/947,288 US7088429B2 (en) 2003-10-03 2004-09-23 Stage device for positioning an object, in which a static pressure bearing and a pressurizing magnet suspend a slider
US11/434,104 US7259836B2 (en) 2003-10-03 2006-05-16 Stage device for positioning an object, in which a static pressure bearing and a pressurizing magnet suspend a slider

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003345891A JP4314091B2 (ja) 2003-10-03 2003-10-03 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005116627A JP2005116627A (ja) 2005-04-28
JP2005116627A5 JP2005116627A5 (enExample) 2009-04-16
JP4314091B2 true JP4314091B2 (ja) 2009-08-12

Family

ID=34386353

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003345891A Expired - Fee Related JP4314091B2 (ja) 2003-10-03 2003-10-03 露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (2) US7088429B2 (enExample)
JP (1) JP4314091B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4478470B2 (ja) * 2004-01-26 2010-06-09 キヤノン株式会社 位置決めステージ装置
DE102005015627A1 (de) * 2005-04-06 2006-10-12 Carl Zeiss Smt Ag Optische Abbildungsvorrichtung
US7978307B2 (en) * 2006-05-04 2011-07-12 Asml Netherlands B.V. Gas bearing, and lithographic apparatus provided with such a bearing
JP5151989B2 (ja) * 2006-11-09 2013-02-27 株式会社ニコン 保持装置、位置検出装置及び露光装置、並びにデバイス製造方法
JP2008141074A (ja) * 2006-12-04 2008-06-19 Canon Inc 露光装置及びその制御方法並びにデバイス製造方法
CN102257437B (zh) * 2009-11-25 2014-05-28 恩斯克科技有限公司 预对准装置以及预对准方法
CN103034065B (zh) * 2011-09-29 2014-12-17 上海微电子装备有限公司 磁浮重力补偿器及光刻装置
DE102014005897B3 (de) * 2014-04-25 2015-09-17 Mecatronix Ag Vorrichtung zum Halten, Positionieren und/oder Bewegen eines Objekts
JP6845305B2 (ja) * 2016-09-13 2021-03-17 エーエスエムエル ネザーランズ ビー．ブイ． 位置決めシステムおよびリソグラフィ装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5684856A (en) * 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
JP2714502B2 (ja) * 1991-09-18 1998-02-16 キヤノン株式会社 移動ステージ装置
EP0632568B1 (en) * 1993-06-24 1998-08-26 Canon Kabushiki Kaisha Controller for a multiphase motor
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
JP3810039B2 (ja) * 1998-05-06 2006-08-16 キヤノン株式会社 ステージ装置
JP2000077503A (ja) 1998-08-28 2000-03-14 Nikon Corp ステージ装置及び露光装置
DE60032568T2 (de) * 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
JP3814453B2 (ja) * 2000-01-11 2006-08-30 キヤノン株式会社 位置決め装置、半導体露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
US7259836B2 (en) 2007-08-21
JP2005116627A (ja) 2005-04-28
US20050073668A1 (en) 2005-04-07
US7088429B2 (en) 2006-08-08
US20060203223A1 (en) 2006-09-14

Similar Documents

Publication Publication Date Title
KR101096479B1 (ko) 스테이지 장치, 노광 장치, 및 디바이스 제조 방법
CN100380585C (zh) 平台装置与曝光装置,以及元件制造方法
JP4458322B2 (ja) 露光装置およびデバイス製造方法
US8325326B2 (en) Stage unit, exposure apparatus, and exposure method
EP3866184B1 (en) Carrier system, exposure apparatus and carry-in method
US8009275B2 (en) Movable stage apparatus
JP5348630B2 (ja) 露光装置及びデバイス製造方法
JP5141979B2 (ja) ステージ装置および露光装置
US7288859B2 (en) Wafer stage operable in a vacuum environment
JP5505871B2 (ja) 移動体装置及び露光装置
JP2013511822A (ja) 露光装置及び露光方法並びにデバイス製造方法
JP5348628B2 (ja) 露光装置、露光方法及びデバイス製造方法
WO2001027978A1 (en) Substrate, stage device, method of driving stage, exposure system and exposure method
US6781669B2 (en) Methods and apparatuses for substrate transporting, positioning, holding, and exposure processing, device manufacturing method and device
HK1220808A1 (zh) 移动体装置和曝光装置以及器件制造方法
JP4314091B2 (ja) 露光装置及びデバイス製造方法
JP2013098355A (ja) 移動体装置及び露光装置、並びにデバイス製造方法
JPWO2004075268A1 (ja) 移動方法、露光方法及び露光装置、並びにデバイス製造方法
JP4314054B2 (ja) 露光装置及びデバイスの製造方法
JP4393150B2 (ja) 露光装置
JP2013506270A (ja) ステージ装置、露光装置、駆動方法及び露光方法並びにデバイス製造方法
US20110001953A1 (en) Transport apparatus and exposure apparatus
WO2014136143A1 (ja) 移動体装置及び露光装置、並びにデバイス製造方法
JP5233483B2 (ja) ステージ装置及び露光装置並びにデバイス製造方法
US7692768B2 (en) Iron core motor driven automatic reticle blind

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061002

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061002

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20081010

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090304

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090508

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090518

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120522

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees