JP4309874B2 - 露光装置 - Google Patents
露光装置 Download PDFInfo
- Publication number
- JP4309874B2 JP4309874B2 JP2005227675A JP2005227675A JP4309874B2 JP 4309874 B2 JP4309874 B2 JP 4309874B2 JP 2005227675 A JP2005227675 A JP 2005227675A JP 2005227675 A JP2005227675 A JP 2005227675A JP 4309874 B2 JP4309874 B2 JP 4309874B2
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- exposed
- photomask
- alignment mark
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000003384 imaging method Methods 0.000 claims description 64
- 230000003287 optical effect Effects 0.000 claims description 59
- 238000012790 confirmation Methods 0.000 claims description 14
- 238000001514 detection method Methods 0.000 claims description 11
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 50
- 230000032258 transport Effects 0.000 description 33
- 238000005286 illumination Methods 0.000 description 11
- 239000011159 matrix material Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 230000005856 abnormality Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 230000008602 contraction Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005227675A JP4309874B2 (ja) | 2005-08-05 | 2005-08-05 | 露光装置 |
KR1020087003346A KR101308691B1 (ko) | 2005-08-05 | 2006-07-24 | 노광 장치 및 피노광체 |
PCT/JP2006/314545 WO2007018029A1 (ja) | 2005-08-05 | 2006-07-24 | 露光装置及び被露光体 |
CN2006800288313A CN101238416B (zh) | 2005-08-05 | 2006-07-24 | 曝光装置及被曝光体 |
TW95127838A TWI391796B (zh) | 2005-08-05 | 2006-07-28 | 曝光裝置及被曝光體 |
HK08111633.2A HK1119784A1 (en) | 2005-08-05 | 2008-10-22 | Exposure device and object to be exposed |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005227675A JP4309874B2 (ja) | 2005-08-05 | 2005-08-05 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007041447A JP2007041447A (ja) | 2007-02-15 |
JP4309874B2 true JP4309874B2 (ja) | 2009-08-05 |
Family
ID=37727218
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005227675A Active JP4309874B2 (ja) | 2005-08-05 | 2005-08-05 | 露光装置 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP4309874B2 (zh) |
KR (1) | KR101308691B1 (zh) |
CN (1) | CN101238416B (zh) |
HK (1) | HK1119784A1 (zh) |
TW (1) | TWI391796B (zh) |
WO (1) | WO2007018029A1 (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009251290A (ja) * | 2008-04-07 | 2009-10-29 | V Technology Co Ltd | 露光装置 |
JP5282515B2 (ja) * | 2008-10-01 | 2013-09-04 | 大日本印刷株式会社 | カラーフィルタの製造装置 |
JP5261847B2 (ja) | 2009-06-16 | 2013-08-14 | 株式会社ブイ・テクノロジー | アライメント方法、アライメント装置及び露光装置 |
JP5382456B2 (ja) * | 2010-04-08 | 2014-01-08 | 株式会社ブイ・テクノロジー | 露光方法及び露光装置 |
TWI571710B (zh) * | 2014-12-30 | 2017-02-21 | 力晶科技股份有限公司 | 曝光機台對準光源裝置內的模組作動監控方法及監控系統 |
JP6904662B2 (ja) * | 2016-01-29 | 2021-07-21 | 株式会社アドテックエンジニアリング | 露光装置 |
JP6298108B2 (ja) * | 2016-07-08 | 2018-03-20 | キヤノントッキ株式会社 | アライメントマークの検出方法、アライメント方法及び蒸着方法 |
JP7344047B2 (ja) * | 2019-08-22 | 2023-09-13 | 株式会社ジェーイーエル | 基板の位置合わせ方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0766113A (ja) * | 1993-08-31 | 1995-03-10 | Sanyo Electric Co Ltd | レチクル及び位置合わせ用バーニアの形成方法 |
JPH09127702A (ja) * | 1995-10-30 | 1997-05-16 | Dainippon Printing Co Ltd | 大サイズ基板用露光装置および露光方法 |
US6798516B1 (en) * | 1996-11-14 | 2004-09-28 | Nikon Corporation | Projection exposure apparatus having compact substrate stage |
JP2003043939A (ja) * | 2001-08-01 | 2003-02-14 | Sanyo Electric Co Ltd | 画像表示装置 |
TW200301848A (en) * | 2002-01-09 | 2003-07-16 | Nikon Corp | Exposure apparatus and exposure method |
JP2004012903A (ja) * | 2002-06-07 | 2004-01-15 | Fuji Photo Film Co Ltd | 露光装置 |
CN1480985A (zh) * | 2002-09-04 | 2004-03-10 | 旺宏电子股份有限公司 | 确定晶片对准标记外围辅助图形的方法及所用光刻胶掩模 |
EP1482373A1 (en) * | 2003-05-30 | 2004-12-01 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4214849B2 (ja) * | 2003-06-30 | 2009-01-28 | 株式会社ニコン | 露光方法及び露光装置 |
-
2005
- 2005-08-05 JP JP2005227675A patent/JP4309874B2/ja active Active
-
2006
- 2006-07-24 WO PCT/JP2006/314545 patent/WO2007018029A1/ja active Application Filing
- 2006-07-24 CN CN2006800288313A patent/CN101238416B/zh active Active
- 2006-07-24 KR KR1020087003346A patent/KR101308691B1/ko active IP Right Grant
- 2006-07-28 TW TW95127838A patent/TWI391796B/zh not_active IP Right Cessation
-
2008
- 2008-10-22 HK HK08111633.2A patent/HK1119784A1/xx unknown
Also Published As
Publication number | Publication date |
---|---|
KR101308691B1 (ko) | 2013-09-13 |
HK1119784A1 (en) | 2009-03-13 |
KR20080032175A (ko) | 2008-04-14 |
WO2007018029A1 (ja) | 2007-02-15 |
TW200707139A (en) | 2007-02-16 |
TWI391796B (zh) | 2013-04-01 |
JP2007041447A (ja) | 2007-02-15 |
CN101238416B (zh) | 2010-08-18 |
CN101238416A (zh) | 2008-08-06 |
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