JP4309874B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4309874B2
JP4309874B2 JP2005227675A JP2005227675A JP4309874B2 JP 4309874 B2 JP4309874 B2 JP 4309874B2 JP 2005227675 A JP2005227675 A JP 2005227675A JP 2005227675 A JP2005227675 A JP 2005227675A JP 4309874 B2 JP4309874 B2 JP 4309874B2
Authority
JP
Japan
Prior art keywords
exposure
exposed
photomask
alignment mark
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2005227675A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007041447A (ja
Inventor
康一 梶山
由雄 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
V Technology Co Ltd
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Priority to JP2005227675A priority Critical patent/JP4309874B2/ja
Priority to KR1020087003346A priority patent/KR101308691B1/ko
Priority to PCT/JP2006/314545 priority patent/WO2007018029A1/ja
Priority to CN2006800288313A priority patent/CN101238416B/zh
Priority to TW95127838A priority patent/TWI391796B/zh
Publication of JP2007041447A publication Critical patent/JP2007041447A/ja
Priority to HK08111633.2A priority patent/HK1119784A1/xx
Application granted granted Critical
Publication of JP4309874B2 publication Critical patent/JP4309874B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2005227675A 2005-08-05 2005-08-05 露光装置 Active JP4309874B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2005227675A JP4309874B2 (ja) 2005-08-05 2005-08-05 露光装置
KR1020087003346A KR101308691B1 (ko) 2005-08-05 2006-07-24 노광 장치 및 피노광체
PCT/JP2006/314545 WO2007018029A1 (ja) 2005-08-05 2006-07-24 露光装置及び被露光体
CN2006800288313A CN101238416B (zh) 2005-08-05 2006-07-24 曝光装置及被曝光体
TW95127838A TWI391796B (zh) 2005-08-05 2006-07-28 曝光裝置及被曝光體
HK08111633.2A HK1119784A1 (en) 2005-08-05 2008-10-22 Exposure device and object to be exposed

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005227675A JP4309874B2 (ja) 2005-08-05 2005-08-05 露光装置

Publications (2)

Publication Number Publication Date
JP2007041447A JP2007041447A (ja) 2007-02-15
JP4309874B2 true JP4309874B2 (ja) 2009-08-05

Family

ID=37727218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005227675A Active JP4309874B2 (ja) 2005-08-05 2005-08-05 露光装置

Country Status (6)

Country Link
JP (1) JP4309874B2 (zh)
KR (1) KR101308691B1 (zh)
CN (1) CN101238416B (zh)
HK (1) HK1119784A1 (zh)
TW (1) TWI391796B (zh)
WO (1) WO2007018029A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009251290A (ja) * 2008-04-07 2009-10-29 V Technology Co Ltd 露光装置
JP5282515B2 (ja) * 2008-10-01 2013-09-04 大日本印刷株式会社 カラーフィルタの製造装置
JP5261847B2 (ja) 2009-06-16 2013-08-14 株式会社ブイ・テクノロジー アライメント方法、アライメント装置及び露光装置
JP5382456B2 (ja) * 2010-04-08 2014-01-08 株式会社ブイ・テクノロジー 露光方法及び露光装置
TWI571710B (zh) * 2014-12-30 2017-02-21 力晶科技股份有限公司 曝光機台對準光源裝置內的模組作動監控方法及監控系統
JP6904662B2 (ja) * 2016-01-29 2021-07-21 株式会社アドテックエンジニアリング 露光装置
JP6298108B2 (ja) * 2016-07-08 2018-03-20 キヤノントッキ株式会社 アライメントマークの検出方法、アライメント方法及び蒸着方法
JP7344047B2 (ja) * 2019-08-22 2023-09-13 株式会社ジェーイーエル 基板の位置合わせ方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0766113A (ja) * 1993-08-31 1995-03-10 Sanyo Electric Co Ltd レチクル及び位置合わせ用バーニアの形成方法
JPH09127702A (ja) * 1995-10-30 1997-05-16 Dainippon Printing Co Ltd 大サイズ基板用露光装置および露光方法
US6798516B1 (en) * 1996-11-14 2004-09-28 Nikon Corporation Projection exposure apparatus having compact substrate stage
JP2003043939A (ja) * 2001-08-01 2003-02-14 Sanyo Electric Co Ltd 画像表示装置
TW200301848A (en) * 2002-01-09 2003-07-16 Nikon Corp Exposure apparatus and exposure method
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置
CN1480985A (zh) * 2002-09-04 2004-03-10 旺宏电子股份有限公司 确定晶片对准标记外围辅助图形的方法及所用光刻胶掩模
EP1482373A1 (en) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4214849B2 (ja) * 2003-06-30 2009-01-28 株式会社ニコン 露光方法及び露光装置

Also Published As

Publication number Publication date
KR101308691B1 (ko) 2013-09-13
HK1119784A1 (en) 2009-03-13
KR20080032175A (ko) 2008-04-14
WO2007018029A1 (ja) 2007-02-15
TW200707139A (en) 2007-02-16
TWI391796B (zh) 2013-04-01
JP2007041447A (ja) 2007-02-15
CN101238416B (zh) 2010-08-18
CN101238416A (zh) 2008-08-06

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