JP4303749B2 - Negative resist composition for organic insulating film of high aperture ratio liquid crystal display device - Google Patents

Description

  The present invention relates to a negative resist composition for an organic insulating film of a high aperture ratio liquid crystal display element, and more specifically, when an organic insulating film of a high aperture ratio liquid crystal display element is formed, it is developed with an alkaline developer to form a pattern. The present invention relates to a negative resist composition for an organic insulating film, which is excellent in adhesive strength with metal, UV transmittance, remaining film ratio, flatness and pattern stability.

In general, a liquid crystal display (hereinafter referred to as LC)
Called D. ) Is used for display devices such as televisions and graphic displays. In particular,
For each pixel, a thin film transistor (hereinafter referred to as “Thin Film Transistor”)
An active matrix LCD provided with a switching element such as FT has a high-speed response characteristic and enables a large number of pixels. Therefore, a CRT (Cathode Ray Tube) is used.
This greatly contributes to the realization of high-quality, large-size and color display screens comparable to e).

In an LCD, improvement of the aperture ratio is a priority for obtaining a high-quality display screen. Here, the aperture ratio refers to the actual light transmission ratio with respect to the area of the pixel electrode.
While the demand for the size and high resolution of the TFT-LCD is increasing, a method for improving the transmissivity of the liquid crystal has been developed by keeping up with the increase in battery efficiency. Methods for improving the transmittance of the liquid crystal are broadly classified into a method of improving the aperture ratio of the liquid crystal panel, a method of improving the transmittance of the polarizing plate, and a method of improving the transmittance of the color filter. Among such methods, as a method of improving the aperture ratio of the liquid crystal panel, an ITO (Indium Tin Oxide) electrode made of a transparent metal called a pixel electrode is disposed on the TFT over the entire pixel region. A technique is used in which pixels are arranged and the area of the pixel electrode is increased. By using this technology, the aperture ratio of the existing TFT-LCD is reduced to 50-60.
% To about 80-85%.

Hereinafter, in order to help understanding of the high aperture ratio TFT-LCD, it will be described in detail with reference to the drawings.
FIG. 1 is a plan view showing a unit cell of a TFT-LCD having a conventional high aperture ratio. Referring to FIG. 1, the gate lines 2 are arranged in the lateral direction, and the storage electrode lines 4 are arranged in parallel to the positions separated by a predetermined gap. The data line 8 is arranged to pass through the gate line 2 and the storage electrode line 4 vertically.

  A semiconductor layer 6 is formed in a pattern on the gate line 2 adjacent to the data line 8, and is formed together with the drain electrode 9 a drawn from the data line 8 and the data line 8. The source electrode 9b is disposed on the semiconductor layer 6 so as to face each other and overlap a predetermined part.

  On the other hand, a pixel electrode 12 made of ITO is disposed in a pixel region defined by the gate line 2 and the data line 8, where the pixel electrode 12 is in contact with the source electrode 9b, and the data line 8 and the gate. The entire pixel region is arranged so as to overlap with a part of the line 2.

2 is a cross-sectional view taken along line II-II ′ of FIG. As shown, a gate electrode 2a and a storage electrode 4a are formed on the lower substrate 20 at a position spaced apart from the gate electrode 2a, and a gate insulating film 5 is formed on the upper front surface of the lower substrate 20. The A semiconductor layer 6 is formed on the gate insulating film 5 in the form of a pattern through a known process, and a drain electrode 9a and a source electrode 9b formed together when the data line 8 is formed on the semiconductor layer 6 are mutually connected. Formed apart.

  In addition, an organic insulating film 10 having a low dielectric constant is applied to the upper surface of the lower substrate 20 on which the above-described structure is formed, and a contact hole (not shown) for exposing the source electrode is formed in the organic insulating film 10. The pixel electrode 12 is formed on the organic insulating film 10 so as to be in contact with the source electrode 9b through a contact hole at the portion corresponding to the pixel region and at the same time overlap with the gate electrode 2a and a part of the data line 8. Is done. Here, the organic insulating film 10 functions to insulate between the pixel electrode 12 and the data line 8 and planarize the lower layer.

In FIG. 1, it is usual to use a positive resist as the insulating thin film layer when forming the organic insulating film described above. However, the positive resist has poor adhesion to the metal, and the residual film ratio after development is low, so that the flatness of the pattern is poor. In particular, in order to increase the transmittance, a UV bleaching process must be performed. As a result, the defect rate and tack time due to an increase in the process increase, resulting in a decrease in yield and production.
[Disclosure of the Invention]
Therefore, the technical problem to be solved by the present invention is that when an organic insulating film of a high aperture ratio liquid crystal display element is formed, the pattern can be formed by developing with an alkali developer, and adhesion with metal, UV transmission An object of the present invention is to provide a negative resist composition having very good rate, remaining film rate, flatness and pattern stability.

  In order to achieve the above technical problem, the present invention provides a binder resin 5 to 5 selected from the group consisting of a binder resin represented by the following general formula 1, a binder resin represented by the following general formula 2, and a mixture thereof. A negative resist composition for an organic insulating film of a high aperture ratio liquid crystal display device comprising 40 parts by weight, 2 to 200 parts by weight of a multifunctional monomer having an ethylenically unsaturated bond and 0.005 to 20 parts by weight of a photoinitiator is provided. To do.

Hereinafter, the present invention will be described in more detail.
The negative resist composition for an organic insulating film of the high aperture ratio liquid crystal display element of the present invention is selected from the group consisting of a binder resin represented by the following general formula 1, a binder resin represented by the following general formula 2, and a mixture thereof. 5 to 40 parts by weight of the binder resin, 2 to 200 parts by weight of a multifunctional monomer having an ethylenically unsaturated bond, and 0.005 to 20 parts by weight of a photoinitiator are contained.

In the above general formula 1, X is a hydrogen atom or a methyl group, and Y ¹ has 1 to 1 carbon atoms.
6 is an alkyl group or a hydroxyalkyl group, and Y ² is any one selected from compounds represented by the following chemical formulas (I) to (XX).

In the above chemical formulas (I) to (XX), R ₁ is hydrogen or a methyl group, R ₂ is an alkylene group having 1 to 10 carbon atoms, and R ₃ is 1 to 10 carbon atoms. It is a residual group of hydrocarbons, R ₄ is hydrogen or a methyl group, R ₅ is an alkylene group having 1 to 10 carbon atoms, and k is an integer of 0 to 10.

In the above general formula 2, the polymerization unit A is benzyl methacrylate (BZMA), styrene (Styrene), alpha-methyl styrene (α-methyl styrene), isobornyl acrylate (isobornyl acrylate) and isobornyl methacrylate. Acrylate (IBMA), dicyclopentanyl acrylate (Dicyclopentanyl acrylate), dicyclopentanyl methacrylate (DCPMa), dicyclopentenyl acrylate (Dicyclopentenyl acrylate) from methacrylate), dicyclopentanylethyl acrylate (from dicyclopentanylethyl methacrylate), dicyclopentenylethyl acrylate (from dicyclopentylethyl acrylate) is one of any chosen, B is glycidyl methacrylate (glycidyl methacrylate; GMA), hydroxyethyl methacrylate (hydroxyethyl methacrylate; HEMA), acrylamide Any one selected from the group consisting of (Acryl amide; ACAMi), C is acrylic acid (AA) or methacrylic acid (MAA), and the binder resin of the general formula 2 is a polymerization unit A , B and C may be random copolymers that are not constrained by the order of arrangement.

The binder resin represented by the above general formula 1 is a copolymer of a monomer containing a carboxylic acid and a monomer having a double bond, and the composition of the present invention containing such a copolymer was applied. When the post pattern is formed, there is no defect such as a post-development residue, and the flattening rate is very excellent. In other words, Y ¹ in the above general formula 1 is an alkyl group or a hydroxyalkyl group having ¹ to 16 carbon atoms, which helps to improve the adhesion, and Y ² is an acrylic copolymer containing an aromatic group. Unlike the conventional binder resin made of resin, it not only increases the residual film rate including a bulky alicyclic structure, but also has a high glass transition temperature, so it has excellent heat resistance.

  The binder resin represented by the general formula 1 should have an average molecular weight of 2,000 to 50,000, a polydispersity of 1.0 to 5.0, and an acid value of 10 to 400 KOHmg / g. It is more preferable to use a polymer having an average molecular weight of 5,000 to 40,000, a dispersity of 1.6 to 3.0, and an acid value of 20 to 150 KOHmg / g.

  Moreover, when using the binder resin represented by the general formula 2, the same effect as when using the binder resin represented by the general formula 1 is obtained. In the binder resin represented by the above general formula 2, it is possible to introduce different kinds of polymerized units within a range that does not impair the object of the present invention. For example, an alkyl group such as D in the following general formula 3 An alkyl acrylate or alkyl methacrylate having a number of 1 to 16 can be further introduced. More specifically, examples of such a repeating unit include methyl methacrylate, butyl methacrylate, lauryl methacrylate, methyl acrylate, butyl acrylate, lauryl acrylate, and styrene.

The average molecular weight of the binder resin represented by the general formula 2 is preferably 2,000 to 100,000, the dispersity is 1.0 to 5.0, and the acid value is preferably 15 to 400 KOHmg / g. More preferably, the molecular weight is 5,000 to 40,000, the dispersity is 1.6 to 3.0, and the acid value is 30 to 150 KOH mg / g.

  In particular, when the binder resin represented by the general formula 1 and the binder resin represented by the general formula 2 are mixed and used, the compatibility between the photosensitive agent and the binder resin in the composition is increased and the resistance of the pattern is increased. Not only is cracking improved, but there is no whitening.

Examples of the multifunctional monomer having an ethylenically unsaturated bond include ethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate having 2 to 14 ethylene oxide groups, trimethylolpropane di (meth) acrylate, trimethyl Orpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, 2 to 1 propylene oxide groups
4 propylene glycol di (meth) acrylate, dipentaerythritol penta (
A compound obtained by esterifying a polyhydric alcohol and an α, β-unsaturated carboxylic acid selected from the group consisting of (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol tri (meth) acrylate; Compounds obtained by adding (meth) acrylic acid to glycidyl group-containing compounds such as trimethylolpropane triglycidyl ether acrylic acid adduct and bisphenol A diglycidyl ether acrylic acid adduct; phthalates of β-hydroxyethyl (meth) acrylate Acid diesters, adducts of hydroxyl- and ethylenically unsaturated compounds such as toluene diisocyanate adducts of β-hydroxyethyl (meth) acrylate with polyvalent carboxylic acids or polyisocyanates; methyl (meth) acrylates , Ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate and other (meth) acrylic acid alkyl esters selected from one or two or more can be used in combination. Its content is 2 to 200 parts by weight, preferably 5 to 50 parts by weight.

  The multifunctional monomer, which is a polysynthetic compound having an ethylenically unsaturated bond, has a high heat resistance, a high transparency, a high planarization rate and a pattern by appropriately adjusting the composition ratio with the binder resin according to the present invention. It is possible to produce a negative resist for an organic insulating film of a high aperture ratio liquid crystal display element capable of maintaining stability.

  As the photoinitiator, an acetophenone or benphenone type is usually used, but if the photoinitiator itself has a color, the photoinitiator itself acts to lower transparency, so that appropriate sensitivity is obtained in the wavelength band used for exposure. High transparency can be realized by using a photoinitiator itself having no color. In general, a photoinitiator for a crosslinking reaction using an acrylic multifunctional monomer is used in accordance with the wavelength of ultraviolet rays to be used. However, since the mercury lamp, which is the most widely used ultraviolet wavelength, has a wavelength of 310 to 420 nm, this wavelength region is used. A photoinitiator that generates radicals is used.

Examples of such photoinitiators include Irgacure 369, Irgacure 651,
It is desirable to use acetophenone and benzophenone series and triazine series such as Irgacure 907, TPO, CGI124, EPD / BMS mixed system. For example, benzophenone, phenylbiphenyl ketone, 1-hydroxy-1-benzoylcyclohexane, benzyldimethyl ketal, 1-benzyl-1-dimethylamino-1- (4-morpholino-benzoyl) propane, 2-morpholyl-2- (4- Methylmercapto) benzoylpropane, thioxanthone, 1-chloro-4-proxythioxanthone, isopropylthioxanthone, diethylthioxanthone, ethylanthraquinone, 4-benzoyl-4-methyldiphenyl sulfide, benzoin butyl ether, 2-hydroxy-2-benzoylpropane 2-hydroxy-2- (4-isopropyl) benzoylpropane, 4-butylbenzoyltrichloromethane, 4-phenoxybenzoyldichlorometa , Methyl benzoylformate, 1,7-bis (9-acridinyl) heptane, 9-n-butyl-3,6-bis (2-morpholino-isobutyroyl) carbazole, 2-methyl-4,6-bis (trichloromethyl) ) -S-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2-naphthyl-4,6-bis (trichloromethyl) -s-triazine. Such a photoinitiator has a content for increasing the transparency and minimizing the dose, and it is more effective to use 0.005 to 20 parts by weight, preferably 0.5 to 10 parts by weight. is there.

In addition, it is desirable to further add a silicon-based compound having an epoxy group or an amine group to the negative resist composition of the present invention, but such a silicon-based compound has an adhesive force between the ITO electrode and the negative resist composition. Improve and increase heat resistance after curing. Silicon compounds having such an epoxy group or amine group include (3-glycidoxypropyl) trimethoxysilane, (3-glycidoxypropyl) triethoxysilane, and (3-glycidoxypropyl) methyldimethoxy. Silane, (3-glycidoxypropyl) methyldiethoxysilane, (3-glycidoxypropyl) dimethylmethoxysilane, (3-glycidoxypropyl) dimethylethoxysilane, 3,4-epoxybutyltrimethoxysilane, 3 , 4-epoxybutyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, aminopropyltrimethoxysilane, etc. Each alone or in combination Can be used, its content is 0.0001 to 3 parts by weight, preferably from 0.005 to 0.1 parts by weight.

  In addition, to the negative resist composition for an organic insulating film of the high aperture ratio liquid crystal display element of the present invention, compatible additions such as a photosensitizer, a thermal polymerization inhibitor, an antifoaming agent, and a leveling agent are added as necessary. An agent can be added.

The negative resist composition for an organic insulating film of a high aperture ratio liquid crystal display element of the present invention is formed by adding a solvent, spin-coating on a substrate, and then irradiating with an ultraviolet ray using a mask and developing with an alkaline developer. Although a film is formed, it is desirable to add a solvent so that the viscosity is in the range of 2 to 30 cps. More desirably, the viscosity is adjusted to 10 to 25 cps so that there is no pin hole in the thin film after coating.
It is more advantageous to adjust the thickness of the thin film. Such a solvent is not only used for adding, mixing and dissolving a binder resin, a photosensitizer and other additives, but also used for obtaining an excellent coating property and a transparent thin film, Considering compatibility with binder resin, photosensitizer and other compounds, ethyl acetate, butyl acetate, diethylene glycol dimethyl ether, diethylene glycol dimethyl ethyl ether, methyl methoxypropionate, ethyl ethoxypropionate (EEP), ethyl lactate, propylene Glycol methyl ether acetate (PGMEA), propylene glycol methyl ether, propylene glycol propyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol methyl acetate, Ethylene glycol ethyl acetate, acetone, methyl isobutyl ketone, cyclohexanone, dimethylformamide (DMF), N, N-dimethylacetamide (DMAc), N-methyl-2-pyrrolidone (NMP), γ-butyrolactone, diethyl ether, ethylene glycol Dimethyl ether, diglyme, tetrahydrofuran (THF), methanol, ethanol, propanol, iso-propanol, methyl cellosolve, ethyl cellosolve, diethylene glycol methyl ether, diethylene glycol ethyl ether, dipropylene glycol methyl ether, toluene, xylene, hexane, A solvent selected from heptane and octane may be used alone or a mixture of at least one solvent may be used.

  Hereinafter, the present invention will be described in detail by way of examples and comparative examples in order to specifically describe the present invention. However, the examples according to the present invention can be modified in various forms, and the scope of the present invention should not be construed as being limited to the following examples. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the invention to those skilled in the art.

<Example 1>
Into a reaction mixing tank provided with an ultraviolet blocking film and a stirrer, a binder resin and a multifunctional monomer dipentaerythritol hexa / penta-acrylate are added according to the composition and content described in Table 1 below, and a photoinitiator is added. Irgacure 369, (3-glycidoxypropyl) trimethoxy (ethoxy) silane, 0.1 to 3% by weight of total resin solids
A known photosensitizer, thermal polymerization inhibitor, antifoaming agent and leveling agent were sequentially added to produce a resist composition for an organic insulating film, and then stirred at room temperature. Subsequently, a solvent was added to the composition to adjust the viscosity of the resist composition to 15 cps.

In embodiments, the binder resin has the general formula 1 described above (in X in the general formula 1 a methyl group, Y ¹ is a methyl group) is a Y ² are each a chemical formula (I) or formula (VI) The compounds are represented by chemical formula (1-I) to chemical formula (1-VI), where R ₁ and R ₂ are all methyl groups.

<Examples 2 to 25>
A negative resist composition for an organic insulating film of a high aperture ratio liquid crystal display device in the same manner except that the components and contents of the composition of Example 1 were changed according to the compositions described in Tables 1 and 2 below. The thing was manufactured.

<Comparative Examples 1 to 4>
Using the binder resin represented by the following general formula 4 instead of the binder resin of Example 1 above, except that the components and contents of the composition were changed according to the composition described in Table 3 below. A negative resist composition for an organic insulating film of a high transmittance liquid crystal display element was produced by the method described above.

  In the above general formula 4, p is 0.3, q is 0.2, and r is 0.5.

  In Table 1, the binder resin of general formula 1 has an average molecular weight of 15,000, a dispersity of 2.5 and an acid value of 100, and the binder resin of general formula 2 has an average molecular weight of 20,000, a dispersity of 2.5 and an acid value of 110. It is.

  In Table 2, the binder resin of general formula 1 has an average molecular weight of 15,000, a dispersity of 2.5 and an acid value of 110, and the binder resin of general formula 2 has an average molecular weight of 10,000, a dispersity of 2.5 and an acid value of 100. It is.

In Table 3, the binder resin of the general formula 4 has an average molecular weight of 20,000, a dispersity of 2.5, and an acid of 100.
In the above examples and comparative examples, the negative resist composition is applied on a substrate such as a silicon wafer or a glass plate, and the thermal characteristics of the resist composition are examined. The transmittance (T%, 400
nm), flatness (Uniformity), remaining film rate, pattern formation, and other performance evaluations were performed. The results are shown in Tables 4 and 5 below.

(1) Thermal characteristics A negative resist composition was applied on a substrate at a speed of 800 rpm for 8 seconds using a spin coater, then prebaked at 100 ° C. for 1 minute, and exposed at 365 nm for 15 seconds. Then, post-baking was performed at 220 ° C. for 30 minutes to form a resist film, which was put in an autoclave and aged at 100 ° C. for 1 hour. The specimen aged in the autoclave is scratched with a cross hatch cutter so that the substrate is exposed, and then attached with an adhesive tape and then detached. If 80 of the 100 cells are attached to the tape and not detached from the substrate, it is judged as “good”, and if not, it is judged as “bad”.

(2) UV Transmittance A negative resist composition was applied on a substrate at a speed of 800 rpm for 8 seconds using a spin coater, and then prebaked at 100 ° C. for 1 minute to obtain a TMAH 2.38% solution in 60%. After spray development for 2 seconds, rinse with pure water (DI Water) for 60 seconds, blown with compressed air, and postbaked at 220 ° C. for 30 minutes to give a resist of about 3.5 to 4.0 μm A film was formed, UV was transmitted, and the transmittance in the 400 nm region was measured.

(3) Residual film ratio After the negative resist composition is spin-coated on the substrate and pre-baked (Pre-Bake), the thickness and the post-bake (Post-Bake) are used to remove the solvent. The ratio (%) to the thickness of the formed film was measured.

(4) Pattern formation A silicon wafer on which a negative resist pattern was formed was cut from the vertical direction of the hole pattern, and the result of observation with an electron microscope from the cross-sectional direction of the pattern was shown. When the side wall of the pattern was standing at an angle of 55 ° or more with respect to the substrate and the film was not reduced, it was judged as “good”, and when the film was found to be reduced, it was judged as “film reduction”.

(5) Chemical resistance After a negative resist composition is applied on a substrate using a spin coater, a resist film formed through processes such as pre-bake and post-bake is stripped. (Stripper) After immersing in an etchant solution at 40 ° C. for 10 minutes, the resist film was observed for changes in transmittance and thickness. When there was no change in transmittance and thickness, it was judged as “good”, and when there was a change in transmittance and thickness, it was judged as “bad”.

  As can be seen from the above results, the negative resist composition for the organic insulating film of the high aperture ratio liquid crystal display element of the present invention is not only excellent in heat resistance, but also metal and inorganic, unlike the conventional resist composition. It can be seen that the adhesive strength, UV transmittance, remaining film rate, flatness and pattern stability are extremely excellent.

As described above, the negative resist composition for an organic insulating film of a high aperture ratio liquid crystal display device according to the present invention not only has excellent heat resistance when forming an organic insulating film, but also has an adhesive force with a metal and an inorganic material and a residual film. The rate, flatness and pattern stability are very good. Moreover, since the transmittance is higher than that of the positive resist, the brightness of the backlight can be adjusted, the battery efficiency can be increased, and the influence on the abnormal color feeling and the change of the color difference meter can be minimized. . Furthermore, the negative resist composition for an organic insulating film of the present invention can be easily converted into an organic insulating film having the required specific physical properties by changing the structure and composition ratio of the binder resin within the range defined by the present invention. Can be manufactured.

  The embodiments described in the present specification and the configurations shown in the drawings are only the most preferred embodiments of the present invention, and do not represent all the technical ideas of the present invention. It should be understood that there can be various equivalents and variations that can be substituted.

The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate the presently preferred embodiment of the invention and, together with the detailed description of the preferred embodiment, serve to explain the principles of the invention. Fulfill.
FIG. 1 is a plan view showing a unit cell of a TFT LCD having a conventional high aperture ratio. 2 is a cross-sectional view taken along line II-II ′ of FIG.

Claims (7)

(S1) On a lower substrate of a thin film transistor (TFT) liquid crystal display element on which a gate electrode, a source electrode, and a drain electrode are formed, a binder resin represented by the following general formula 1 and a binder represented by the following general formula 2 5 to 40 parts by weight of a binder resin selected from the group consisting of a resin and a mixture thereof, 2 to 200 parts by weight of a polyfunctional monomer having an ethylenically unsaturated bond, 0.005 to 20 parts by weight of a photoinitiator, Applying a negative resist composition containing 0.0001 to 3 parts by weight of a silicon-based compound containing an epoxy group or an amine group to form a resist film;
(S2) irradiating the resist film with ultraviolet rays using a mask;
(S3) developing the exposed resist film to form a contact hole; and
(S4) a method of forming an organic insulating film of a high aperture ratio thin film transistor (TFT) liquid crystal display element, comprising: thermosetting the resist film in which the contact hole is formed to form an organic insulating film; ;

In the general formula 1, X is a hydrogen atom or a methyl group, Y ¹ is an alkyl group or a hydroxyalkyl group having 1 to 16 carbon atoms, and Y ² is represented by the following chemical formulas (I) to (XX) Any one selected from the compounds represented by:

In the above chemical formulas (I) to (XX), R ₁ is hydrogen or a methyl group, R ₂ is an alkylene group having 1 to 10 carbon atoms, and R ₃ is 1 to 10 carbon atoms. A residual group of hydrocarbons, R ₄ is hydrogen or a methyl group, R ₅ is an alkylene group having 1 to 10 carbon atoms, and k is an integer of 0 to 10;

In the general formula 2, the polymerization unit A is benzyl methacrylate, styrene, alpha-methyl styrene, isobornyl acrylate, and isobornyl methacrylate. ), Dicyclopentanyl acrylate, dicyclopentanyl methacrylate, dicyclopentenyl acrylate, dicyclopentenyl acrylate, dicyclopentenyl diacrylate. Nylethyl acrylate (Dicyclopentenylethyl acrylate), Dicyclopentanyl ethyl methacrylate (Dicyclopentenyl ethyl acrylate), or Dicyclopentenyl ethyl methacrylate (Dicyclopentenyl ethyl methacrylate). one is and, B is glycidyl methacrylate (glycidyl methacrylate), hydroxyethyl methacrylate (hydroxyethyl methacrylate), one selected from the group consisting of acrylamide (Acryl Amide) There, C is or acrylic acid, a methacrylic acid, a binder resin of the general formula 2 contains random copolymer which is not bound to the sequence order of the polymerized units A, B and C.   The binder resin represented by the general formula 1 has an average molecular weight of 5,000 to 40,000, a dispersity of 1.6 to 3.0, and an acid value of 20 to 150 KOHmg / g. The method for forming an organic insulating film of a high aperture ratio thin film transistor (TFT) liquid crystal display element according to claim 1.   The binder resin represented by the general formula 2 has an average molecular weight of 5,000 to 40,000, a dispersity of 1.6 to 3.0, and an acid value of 30 to 150 KOHmg / g. The method for forming an organic insulating film of a high aperture ratio thin film transistor (TFT) liquid crystal display element according to claim 1.   The polyfunctional monomer having an ethylenically unsaturated bond includes ethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate having 2 to 14 ethylene oxide groups, trimethylolpropane di (meth) acrylate, Methylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, propylene glycol di (meth) acrylate having 2 to 14 propylene oxide groups, dipentaerythritol penta (meth) Obtained by esterifying polyhydric alcohol and α, β-unsaturated carboxylic acid selected from the group consisting of acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol tri (meth) acrylate Compound obtained by adding (meth) acrylic acid to a glycidyl group-containing compound including trimethylolpropane triglycidyl ether acrylic acid adduct or bisphenol A diglycidyl ether acrylic acid adduct; β-hydroxyethyl (meth) An adduct of an ester compound or a polyisocyanate of a polyvalent carboxylic acid with a compound having a hydroxyl group and an ethylenically unsaturated bond, including a phthalic diester of acrylate or a toluene diisocyanate adduct of β-hydroxyethyl (meth) acrylate; (Meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate or (meth) acrylic acid alkyl ester containing 2-ethylhexyl (meth) acrylate; any one or more selected from the above, Item 2. A method for forming an organic insulating film of a high aperture ratio thin film transistor (TFT) liquid crystal display element according to Item 1.   Silicon compounds containing the above epoxy group or amine group are (3-glycidyloxypropyl) trimethoxysilane, (3-glycidyloxypropyl) triethoxysilane, (3-glycidyloxypropyl) methyldimethoxysilane, (3-glycidyl). (Oxypropyl) methyldiethoxysilane, (3-glycidyloxypropyl) dimethylmethoxysilane, (3-glycidyloxypropyl) dimethylethoxysilane, 3,4-epoxybutyltrimethoxysilane, 3,4-epoxybutyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, any one or more selected from the group consisting of 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane and aminopropyltrimethoxysilane High aperture ratio thin layer transistor (TFT) method of forming an organic insulating film of the liquid crystal display device according to claim 1, characterized in that it comprises.   The method for forming an organic insulating film of a high aperture ratio thin film transistor (TFT) liquid crystal display device according to claim 1, wherein a solvent is further added to the negative resist composition so as to have a viscosity of 2 to 30 cps.   The above solvents are ethyl acetate, butyl acetate, diethylene glycol dimethyl ether, diethylene glycol dimethyl ethyl ether, methyl methoxypropionate, ethyl ethoxypropionate (EEP), ethyl lactate, propylene glycol methyl ether acetate (PGMEA), propylene glycol methyl ether, Propylene glycol propyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol methyl acetate, diethylene glycol ethyl acetate, acetone, methyl isobutyl ketone, cyclohexanone, dimethylformamide (DMF), N, N-dimethylacetamide (DMAc), N-methyl-2 -Pyrrolidone (NMP), γ-butyrolactone Diethyl ether, ethylene glycol dimethyl ether, diglyme, tetrahydrofuran (THF), methanol, ethanol, propanol, iso-propanol, methyl cellosolve, ethyl cellosolve, diethylene glycol methyl ether, diethylene glycol ethyl ether, dipropylene glycol methyl ether, toluene, xylene The method for forming an organic insulating film of a high aperture ratio thin film transistor (TFT) liquid crystal display element according to claim 6, comprising at least one selected from the group consisting of hexane, hexane, heptane, and octane .

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