TWI296739B - Method for forming an organic insulator of high aperture tft lcd - Google Patents

Description

1296739 IX. Description of the Invention: [Technical Field] The present invention relates to a method for forming an organic insulator of a liquid crystal display having a high aperture ratio, and more particularly to a method for forming a negative photoresist group t high opening ratio Lc * & I when the edge of the body is 'developed through a book-developing solution, whereby the allowable metal adhesion, UV transmittance, _ rate, uniformity and graph = good [previous technology] 』 'LCD (liquid crystal display) is used as a device for every TV or graphic display. In particular, an active matrix LCD having a switching element (e.g., a film (film), a crystal) per pixel can have a fast response characteristic and provide a large number of elements, so it greatly contributes to realization with a CRT (cathode ray) Tube) - Good quality, large size and color display screen. In order to use a LCD to obtain a high quality display, the improvement of the high aperture ratio is of the utmost importance. Here, the aperture ratio is defined as the true transmittance of a pixel electrode region. In TFT-LCDs, there is an increasing demand for large size and high quality, but increased battery efficiency cannot cope with this demand, so a method for improving liquid crystal transmittance is being developed. In order to improve the transmittance of the liquid crystal, many methods have been used to, for example, improve the aperture ratio of the liquid crystal panel, improve the transmittance of the polarizing plate, and improve the transmittance of the color filter. Among them, in terms of the method for improving the aperture ratio of the liquid crystal panel, the ITO (Indium Tin Oxide) 1296739 pixel is based on the method of "money-making electricity purchase material like money" above the entire pixel area - on the TFT, And then enlarge the size of the pixel. When using this technology, the existing TFT-LCD reading 0, Xuan Xuό 7 Tian Hao opening ratio improved by about 50 to 60%, or even 80 to 85%. At this point, for further understanding, a TFT having a high aperture ratio will be described in detail with reference to the drawings. Fig. 1 is a plan view showing a unit (four) of a conventional hunger CD having a high aperture ratio. Referring to Figure 1, the gate line 2 is in the lateral direction, and the storage electrode line 4 = parallel 嶋 2 feeding _ 2 _ above. The data line 8 is vertically across the gate line 2 and the storage electrode line*. The semiconductor layer 6 #, the vacant __ 8 bits = upper, the recording pole 9a (self-funded_extracted) and the source % (and the data line) are relatively located on the semiconductor layer 6, and thus partially weighted the most. At this time, the pixel made by TM is in the pixel region separated by the gate electrode 1. At this time, the pixel electrode 12 is in contact with the source % = standing on the positive pixel region, and further with the partial data line 8 and the interpolar line. The figure takes the dragon in Figure 1, the section taken from the line. As shown in FIG. 2, the gate electrode a is on the bottom substrate 20, and the storage electrode is formed at a position away from the center of the center (four). On the bottom substrate 2 (), the pole insulator 5. The semi-conducting ^ ^ on the # junction surface forms a gate. Yu Ting ==ΓΓTole insulators 5 are formed apart from each other. The formation of the immersed 9a dipole 1296739 in addition, has a low dielectric when on the upper surface of 20. The organic insulator insulator 10 is applied to the bottom substrate. The pixel electrode 12 is formed in a contact hole having a source to be exposed (a contact hole at a position of the non-exposed region and the edge 10, and further penetrates with respect to the image line 8. Here, the organic contact, and the portion The pole 2a and the role of the data and the flattened bottom layer. The plate 1 plays the self-lean line 8 and the insulating pixel electrode 12 is shown in Fig. 1. When an organic insulator is formed, the positive light is applied to the metal substrate. Therefore, the homogeneity of the homogeneous sub-soil 'is deteriorated after the development of the low-film m. In particular, since the transmittance must be improved, the number of processes is increased, which is caused by the difference in the white action time. The rate and the reduction of money. Asked the rate and contact of ^ [invention] Provide ==:::, the coating of the defect, the dowel, the non-uniform hook and the insulator of the coating machine, the edge contour of the layer, when The high opening ratio (10) is well documented and the development of the developing solution is good, so as to allow the formation of the metal viscous, υ 透 透 透 稳定性 。 。 。 胰 胰 胰 胰 胰 胰 胰 胰 胰 胰 胰 胰 胰 胰 胰 胰 胰Purpose, the present invention provides a liquid for high aperture ratio Crystalline 1296739: The method for forming an organic insulator, which comprises X. The weight of the adhesive resin of the structure of the following formula 1 and the composition of the mixture of the second formula: 曰 and its mixture Adhesive resin; 2 to 2 parts by weight of polyuterine monomer having insufficient 2 groups; and _~2G parts by weight of the correcting agent formed on the lower substrate of the LCD. [Comprehensive mode] The present invention will be described in detail The following is a method for forming an organic insulator for a south aperture ratio liquid crystal display. The second step is to form a photoresist layer on the thin film transistor liquid crystal substrate, and the lower substrate includes a gate electrode. a source-encapsulated electrode and a drain electrode, wherein the photoresist layer is coated with a group of 5 to 40 parts by weight selected from the group consisting of a viscous resin having the following structure and having the structure of the following formula 2胄 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Irradiating the photoresist layer with an ultraviolet light transmission-mask; Step 3: Providing - development step To remove the photoresist layer after the exposure to form a - W pores and Step four: the money to warm square contact hole having a hardened photoresist layer, an organic insulator to form a Formula 1 ..

XXX 1296739

COOY1 COOH COOY2 In Formula 1, X is a hydrogen atom or a fluorenyl group, Y1 is an alkyl group having 1 to 16 carbon atoms or a hydroxyalkyl group, and Y2 is selected from the structures having the following chemical formulae (I) to (XX) a group of compounds.

chJ-co-o·

CH2==C—CO—0-3⁄4—

Ch2=c-co-o-r2-<

CO-O-Rr·1

(I) (Π)an) (IV) (V) (VI) (W (10)) (DO 1296739 onJ-oo-L·

chU-一

chJ-co-L,

CH2J1-oo-o-R2-o-(co-na-o, K-ca-^

R2-0(CO-R3-0)k-CO-N

Rs CH2=C-C0-0-R2-0~(CO-R2—〇)k-

chJ-co-o-. -R2—0-(C0-R3-0)k-C0-N R4

(X) (XI) (ΧΠ)(xm) (XIV) (XV) (XVI) (XVH) (XVin) (XIX) (XX)

In the chemical formulae (I) to (XX), Ri is a hydrogen atom or a fluorenyl group, R2 is an alkylene group having 1 to 10 carbon atoms, R3 is a hydrocarbon having 1 to 10 carbon atoms, and R4 is hydrogen 10 1296739 An atom or a fluorenyl group, & is a hydrocarbon having 1 to 1 carbon atoms, and k is an integer 〇 to 10. Formula 2

In Formula 2, the repeating unit oxime is selected from the group consisting of methacrylate, styrene, styrene, isobornyl acrylate, isobornyl methacrylate, and acrylic acid. Cyclopentyl ester, dicyclopentyl decyl acrylate (DcpMa), dicyclopentenyl acrylate, dicyclopentenyl methacrylate, dicyclopentyl ethoxy acrylate, dicyclopentyl ethoxy acrylate a group consisting of a base ester, dicyclopentenyl ethoxylate acrylate, dicyclopentenyl ethoxy methacrylate, and the like, and B is selected from the group consisting of glycidyl methacrylate (GMA) and hydroxyethyl methacrylate. a group consisting of ester (HEMa), dimethylamino methacrylate, propylene s_ACAMi), and C is an acrylic core) (MAA), and the towel has a transfer agent resin of 2 turns, regardless of A, Random copolymer of B and C order. The adhesive resin having the structure of the general formula 1 is composed of a single carboxylic acid

1296739 structure (not like the stomach of the shirt (4) called to improve the film retention and heat resistance (according to the high glass transition temperature) resin), by the structure of the structure of the adhesive structure of the structure of the tree , _~50, _ the average eight sons "_〇_ and 1 () ~ 4 () () coffee mg / gram of acid value = 5,000 ~ 40,000 average molecular weight /, the value of the acid field of the field of the field. (a). 0% dispersion and 20,_ Further, the adhesive resin having the structure of the formula 2 shows almost the same effect as the adhesive resin of the formula i. The adhesive resin of the formula 2 (four), the type of the pot is repeated A single core, for example, an acrylic or methyl postal ester having 2 to 2 groups of mercapto groups as shown in the following formula 3 (D) may be included in the range of (4). (may be methyl methacrylate, methyl methacrylate, methyl acrylate, methacrylate, butyl acetonate, lauric acid, styrene, etc.)

The adhesive resin having the structure of the general formula 2 preferably has 2, 〇〇〇~1〇〇, an average molecular weight of ruthenium, a dispersion of 1.0 to 5.0, and an acid value of 15 to 4 〇〇K 〇H mg/g. . It is better to have an average molecular weight of 5,000 to 40,000! 6~3 〇Various dispersion and 3〇~15〇 K〇H mg/g acid value. 12 1296739 In particular, when the adhesive resin of the formula 1 is used and the adhesive resin of the formula 2 is known, the hardness of the pattern can be improved, and the whitening is now & The compatibility between the blocking components is increased. The polyfunctional monomer containing an unsaturated functional group comprises at least a compound selected from the group consisting of: a compound obtained by a hydration reaction of a polyhydric alcohol with a slightly unsaturated acid, which is selected from the group consisting of ethylene glycol ^Methyl)propene_, polyethylene glycol di(methyl)propyl acetoate having 2 to 14 oxyethylene groups, trimethyl propylene bis(meth) propylene _, trimethyl methacrylate Propylene tris(meth)acrylate, pentaerythritol tris(meth) propylene, pentaerythritol tetra(meth)acrylate §, propylene glycol di(meth)acrylate having 2 to 14 propylene oxide groups, second season a group of fine alcohols (methyl succinate), dipentaerythritol hexa(methyl (tetra) acrylate and dipentaerythritol tris (meth) acrylate; via addition (fluorenyl) acrylate to glycidyl groups The compound obtained by the compound is selected from the group consisting of a tri-glycidyl triglycidyl acid adduct and a bis-glycidyl diglycidyl ether acrylic adduct; a polycarboxylic acid or a polyisocyanate; An ester compound of an adduct with a compound having a woven group and an unsaturated lipid group, Selecting a group of (meth)acrylic acid|3_hydroxyethyl ester and (mercapto)acrylic acid p_ perylene diacetate toluene diisocyanate adduct of acid vinegar; and (meth)acrylic vinegar, It is selected from the group consisting of methyl methacrylate, ethyl (meth) acrylate, butyl ketone (meth) acrylate, and 2-ethyl hexanoic acid (meth) acrylate. It is 2 to 200 parts by weight, and preferably 5 to 5 parts by weight. By adjusting the ratio of the polyfunctional monomer containing the above unsaturated aliphatic group to the adhesive tree 13 1296739, the ratio can be formed to have high heat resistance. A photoresist composition for an organic insulator of a fine-mouth LCD, which has high transparency, good uniformity, and pattern stability. Further, a photoinitiator of the acetophenone or benzophenone type is usually used. The initiator reduces the cross-difference, so that by having a suitable sensitivity at the exposure wavelength and having no color of light itself (4), high transparency can be obtained. - Generally speaking, at the intersection of the acrylic polyfunctional monomer The photoinitiator used in the coupling reaction is selected taking into account the UV wavelength used. In the case of a mercury lamp (the most commonly used one) having a wavelength of 310 to 420 house micrometers, it is preferable to use a photoinitiator which generates a group in this wavelength range. For this photoinitiator, it is preferred to use acetophenone. , benzophenone or three types of photoinitiators, such as Irgacure 369, Irgacure 651, Irgacure 907, TPO, CGI124 and EPD/BMS mixtures, such as benzophenone, phenyl biphenyl ketone, hydroxy hydroxy fluorenyl ring Hexane, dimethyl ketal, 1-yl-small dimethylamino-1_(4-m-yl-indenyl)propane, 2-mercapto-2-(4-fluorenyl) decylpropane, sulfur Thioxanthone, 1-chlorobupropoxy thioxanthone, isopropyl thioxanthone, monoethylthiomethane, ethyl, 4-mercapto-4-methyl Diphenylthiol, benzoin butyl ether, 2_trans-base_2_Coyl-propyl:): finished, 2_transyl 2_(4-isopropyl) decylpropane, 4-butylhydrazine Trichloromethane, 4-phenoxymercaptodichlorodecane, decyl decyl decanoate, 1,7-bis(9-pyridine)heptane, 9-n-butylene 6-bis(2-吗基-isobutyl base), 2-mercapto-4,6-bis(trichloroindenyl)-s·three, 2-phenyl-4,6-bis(trichloromethane) Base)-s-tris, 2-yl_4,6-bis(trichloroindenyl)-s_three. In order to improve the brightness of the lens and to minimize the exposure amount, the photoinitiator is contained in an amount of 0.005 to 2 parts by weight, and preferably 5% to 1 part by weight. The anthrone compound containing an epoxy group or an amine group is preferably further added to the negative photoresist of the present invention. The Shixi _ 匕 compound improves the adhesion between the ΙΤ0 electrode and the composition and the heat resistance after hardening. The anthrone compound comprises a compound selected from the group consisting of (1 glycidoxypropyl) trimethoxy Wei, glycidoxypropyl) triethoxylate, & glycidoxypropyl)methyltrimethoxy Wei, (IV) glycidoxypropyl) methyl

Diethoxy Wei, (3 · glycidoxypropyl) II? Methoxy wei, & glycidoxypropyl) dimethyl ethoxy wei, 3,4 epoxide butyl trimethoxy oxalate, 3,4 epoxide butyl triethoxy Kewei, 2_(3,4-epoxycyclohexyl)ethyltrimethyllate-based sulfonium, 2_(3,4-epoxycyclohexyl)ethyltriethoxylate, aminopropyltrimethoxy At least one of the groups consisting of Kewei. The content of the phase compound is from 0.0001 to 3 parts by weight, and preferably from 1 to 5 parts by weight. In addition, it is necessary to use additives such as photosensitizers, thermal polymerization paste inhibitors, defoamers and leveling agents in the negative light-compliant towel of this book. By adding the solvent in sequence, spin coating on the substrate, using the mask to illuminate the X-ray and the gift of the Lai County liquid (10) 彡, the surface of the _ _ _ 绝 绝 . . . . . 成 成 LCD LCD LCD LCD LCD Lai. Add solvent to make; (9) (four) degrees. The lion is to the chest house / ^ (4) without needle-like f# layer thickness). _included from vinegar _ vinegar, vinegar (four), diethylene glycol diethylene, diethylene glycol dimethyl?

15 1296739 Alkyl ether, decyl decyl propionate, ethyl ethoxy propionate (EEp), ethyl lactate, propylene glycol decyl ether acetate (PGMEA), propylene glycol decyl ether, propylene glycol propyl ether, Cerium-based cellosolve acetate, ethyl cellosolve acetate, diethylene glycol methyl acetate, diethylene glycol ethyl acetate, acetone, mercaptoisobutyl ketone, cyclohexanone , · Amidoxime (DMF), N,N-dimercaptoacetic acid amine (dmac), N-mercapto-2-l-burnone (NMP), γ-butyrolactone, diethyl ether, B Diethylene dimercapto-, diethylene glycol dimethyl (dilyme), tetrahydrofuran (THF), methanol, ethanol, isopropanol, thiol cellosolve, ethyl cellosolve, diacetyl At least one of the group consisting of alcohol hydrazino group, diethylene glycol ethyl ether, mono propylene monopropyl methyl ether, methyl benzoate, monomethyl benzene, hexanol, gamma, and octyl. The invention will be described in detail as follows. However, the particular embodiments of the present invention are intended to be illustrative, and are intended to be illustrative only. And retouching. AMM1 According to the composition and content of Table 1, an adhesive resin and a pentaerythritol hexa/pentaacrylate as a polyfunctional monomer were added to a reactor equipped with a υν filter and a stirring gas. Next, Irgacure 369 is added as a photoinitiator, (3_glycidoxypropyl) diethyl lactyl (ethoxy), and 1 to 3 wt% of an additive, such as a well-known photosensitizer, heat. Polymerization inhibitor, antifoaming agent and leveling agent (the total solid content of the resin resin is 16 1296739 Y, whereby the negative photoresist composition for the organic insulator is used for clothing. Then, the negative photoresist composition is stirred at room temperature. Next, a solvent is added to the composition towel so that the yield is 15 centipoise (cps). - In the specific example 1, the adhesive resin is represented by a chemical formula (丨. to (1_νι), where X and Y1 Both are methyl groups, and γ2 are each of Chemical Formulas 1 to (vi) (wherein and 2 are methyl groups). AM Examples 2 to 2 5 In addition to changing the types of the compositions according to Tables 1 and 2 In addition, the negative photoresist composition was produced in the same manner as in the specific example 1. The upper layer was compared with the examples 1 to 4 except that the adhesive resin of the formula 4 was used instead of the adhesive resin of the formula 1, and according to Table 3 In addition to changing the type and content of the composition, the negative photoresist composition is produced in the same manner as in the specific example. . ≪ Formula 4 >

17 1296739 where P is 〇·3, q is 〇·2, and r is 0.5. Table 1

The adhesive resin of the formula 1 in the table has an average molecular weight of (8), more

The dispersity was 2.5 and the acid value was the same; and the adhesive resin of the formula 2 had an average molecular weight of 20,000, a polydispersity of 2.5, and an acid value of 11 (). 18 1296739 Table 2

Specific examples of adhesive lion _) multi-functional monomer (w (%) Shi Xi _ 匕 ^ # ^ / 〇) photoinitiator (wt%) additive (wt%) dissolved Qi 1 -1 (5) pass Formula 2 (15) (Sty/LMA/MMA) Dipentaerythritol hexa/f-propene fluorene 20) och3 H3CO-Si-OCH3 (ch2)?nh(ch2)3nh2 IRGACU RE369 (2) Acetone-based surfactant 1 Diethylene glycol dimethyl b: 3⁄43⁄4 19 Assign 1-IV(5) Formula 2(15) (IXPBO/HEMAMMA ) \w, 'Vw* *^/〇' *4& (0.03) (0.03) (to 100) 20 offer 1-V(5) Formula 2 (15) (Sty/OMA/MMA) 21 it^l-VI(5) Formula 2 (15) (DCPMA/GMA/MMA) 22 Assign 1 ·Π(5) Assign 2(20) (BMA/ACAMi/MMA) 23 Assign 1 to 2(15) (Sty/HEMA/MMA) 24 Formula 1-V(5) Formula 2(15) ( BZMA/GMA/MMA) 25 ϋ^1ΛΊ(5) Formula 2(15) (DCPMA/GMA/MMA) —~-—— Multi-component in Table 2, the adhesive resin of Formula 1 has an average The molecular weight is I 〇 (8), the degree of dispersion is 2.5, and the acid value is 110; and the adhesive resin of the formula 2 has an average of 10,000, a polydispersity of 2.5, and an acid value of 1 Å. Table 3 Photoinitiator (wt%)

More than a single adhesive (wt%) of the adhesive resin (wt%) Shi Xi 19 1296739 Example ----- """------ ------- 1 Fu 4 ( 20) Dipentaerythritol hexa/f-propyl _ mirror (20) och3 H3C〇-Si-OCH3 (CH2)2NH(CH2)3NH2 (0.03) IRGACU RE369 (2) Anthrone-based surfactant (0.03) 1-2 Glycol dimercaptoethyl (to 100)) 2 4(24) 3 ii^4(20) 4 Fu 4(24) ------- ——--- In Table 3, Formula 4 The adhesive resin has an average molecular weight of 2Q, (10) 〇, a polydispersity of 2.5, and an acid value of 11 G; and the adhesive resin of Formula 2 has an average molecular weight of 105,000, a polydispersity of 2.5, and an acid value of 10 Å. The evaluation of the negative photoresist composition according to these specific examples and comparative examples was carried out on a substrate (e.g., a Shih-jing glass substrate). The thermal properties and transmittance of the composition (T% 'in 400 house micro-mining), uniformity, and abdomen of yours, Xuanyi "J pancreas preservation rate and pattern display were tested as follows. The results are shown in Tables 4 and 5. Thermal property

The negative photoresist is made up on the substrate by a rotary coater (800 rpm, 8 seconds), and it is baked! In minutes, it was exposed at 365 nm for two seconds, and after baking for 30 minutes, it formed a photoresist layer. Then, the photo-resist layer formed by the collapse is described, and it is cooked for a minute under the boot. The H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H If 8 of the units are not removed from the substrate, it means "good", otherwise it is "poor". 20 • 1296739 (2) UV transmittance The negative photoresist composition is applied to the substrate by a rotary coater (800 rpm, 8 seconds) and pre-baked at l〇〇t: Minutes, subtraction with 2.38% TMAH solution for 60 seconds 'washed with DI water, blown with pressurized air, and at 22 Torr. Bake for 30 minutes after simmering. Therefore, a photoresist layer of about 3.5 to 4.0 μm is formed. The UV transmittance at 400 nm was measured. (3) Film retention ratio The negative photoresist composition was spin-coated on a substrate. The thickness ratio (%) between the layers formed by prebaking and postbaking was separately measured. (4) Pattern formation The microscope is observed at 55 in the cross-section of the pattern. And if the thickness is not reduced, it means (reduced decrease). Taking out the stone wafer forming the negative photoresist pattern along the axis of the hole pattern, and taking the electron

The sentence is a sacrifice. If the angle between the inner wall of the pattern and the substrate is large, it means "good". If the thickness is reduced, the negative photoresist composition is applied to the substrate by rTR (5) chemical resistance without a spin coater, pre-baked and

Then post-baking the agent and the money engraved any change of 1296739 degrees. If there is no change in light transmittance and thickness, it means "good", otherwise it is "poor". Table 4 Specific examples Adhesive UV transmittance (400nm) (%) Membrane retention (%) Patterned chemical resistance 1 Good 98 90 Jia Jia 2 Jia 98 90 Jia Jia 3 Jia 96 90 Jia Jia 4 Jia 96 90 Best Jia 5 Jia 97 90 Jia Jia 6 Jia 97 90 Jia Jia 7 Jia 96 88 Jia Jia 8 Jia 96 89 Jia Jia 9 Jia 97 89 Jia Jia 10 Jia 97 90 Jia Jia 11 Jia 97 88 Jia Jia 12 Jia 97 87 Jia Jia 13 Good 97 87 Jia Jia 14 Jia 97 88 Jia Jia 15 Jia 97 89 Jia Jia 16 Jia 97 89 Jia Jia 17 Jia 98 89 Jia Jia 18 Jia 96 89 Jia Jia 19 Jia 98 90 Jia Jia 20 Jia 97 90 Jia Jia 21 Jia 97 90 Jia Jia 22 Jia 96 90 Jia Jia 23 Jia 96 89 Jia Jia 24 Jia 96 89 Jia Jia

22 1296739

ϋ

As described above, the negative light accompanying product of (4) shows (4) metal and inorganic materials: good adhesion, UV transmittance, film retention, uniformity and pattern stability, and good heat resistance (and conventional knowledge) The composition of the photoresist is different). Industrial Applicability, as described above, when forming an organic insulator, the negative photoresist composition of the present invention exhibits good adhesion to metal and inorganic materials, υν transmittance, film retention, uniformity, and pattern stability. And good heat resistance. Furthermore, since the transmittance is higher than that of the photoresist, it can be controlled to be light-free, thereby improving the efficiency of the battery and minimizing the influence of chromaticity. Further, the negative photoresist composition of the present invention can form an organic insulator having a special physical property by changing the structure and composition ratio of the adhesive resin in the present invention. The invention has been described in detail above. However, it should be understood that the detailed description and the specific embodiments of the present invention are intended to be illustrative only, as those skilled in the art, as described in the Detailed Description, from the Detailed Description, Many changes and refinements within. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a unit of a conventional TFT-LCD having a high aperture ratio. Figure 2 is a cross-sectional view taken along line ΙΙ-ΙΓ of Figure 1. [Description of main component symbols] 2 · Gate line 2a: Gate 4: Storage electrode line 4a: Storage electrode 6: Semiconductor layer 8: Data line 9a: Gate 9b: Source 10: Organic insulator 12: Pixel electrode 20 : bottom substrate 24

Claims (1)

1296739 X. The scope of application for patents: The species used for the Nankou Peak, the right to see the 7F benefits, · ί·73. And a photoresist electrode, wherein the photoresist layer is coated, and the X group is 5 to 4 parts by weight, and is selected from the group consisting of an adhesive resin having the structure of the following formula 1, an adhesive resin having the structure of the following formula 2, and Adhesive group consisting of a mixture of 2 to 200 parts by weight of a polyfunctional monomer having an unsaturated aliphatic group; and a negative photoresist of 5 to 2 parts by weight of a photoinitiator Formed; <Formula 1> X yy Wherein X is a hydrogen atom or a fluorenyl group, γι is an alkyl group having 1 to 16 carbon atoms or a burned group and Y 2 is selected from the group consisting of compounds having the following chemical formulas (I) to (XX); (I) 25 1296739 ch2J-co-o Ch2=c-co-o-r2- ch2JWb, QH2=C—C〇—0R2, chJ-co-L, R4 CH2=C—CO—N_R2—O-Rr V, 0H ChH CH2J1-C0-0-R2-0-(C0-R2-0)K-CC>-S: R5 R2 一o一(C〇-R3—0}k-CCK~N (Π)(瓜) (IV) (V) (VI)(W) 01) (K) (X) (XI) (ΧΠ) (ΧΙΠ) ?1 ^ CH2==C_CO—0—R2—0—(CO—R2—0)k—CO—N r5 -R2—0-(C0-R3-0)k-C0-N R4 26 (XIV) (XV) 1296Ί39 -o-oh2 Hi (XVI) CH^^C-CO-CKRj Hi CH2-0—GO OH (XVH) GHg5^—CO~〇~ ^ch2— , ch2—cTc (xvm) OH (XIX) chJ-c〇- —CH2, . a ch/ OH (XX) wherein Ri is a ruthenium atom or a methyl group, and r2 is an extended alkyl group having from 1 to 1 slave atom, and is privately owned, having 1 to 1 carbon atom, 2 s 1A, or a ruthenium atom or Methyl, private, a hydrocarbon having 1 G carbon atoms, and k is an integer 〇 to 1 (); <Formula 2> 夂 夂 兀 兀 系 系 系 自由 自由 、 、 、 、 、 、 、 、 、 、 、 自由 自由 自由 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱 曱夂1% 酉, propyl dicyclopentan acetate, methyl acrylate 2 27 1296739 cyclopentenyl ester, dicyclopentyl ethoxylate propionate, dicyclopentyl ethoxy methacrylate a group consisting of a base ester, dicyclopentenyl ethoxylate acrylate and dicyclopentanyl ethoxy methacrylate, and B is selected from the group consisting of glycidyl methacrylate, hydroxyethyl methacrylate, and dimethyl a group consisting of arylamino methacrylate and acrylamide and C is acrylic acid or methacrylic acid, wherein the adhesive resin having the structure of Formula 2 contains random copolymers in the order of A, B and C; Step 2 Providing an exposure step for illuminating the photoresist layer with a UV light through a mask; Step 2: providing a development step to remove the exposed photoresist layer to form a contact hole; and Step 4: α Heating means to harden the photoresist layer with contact holes to form an organic Edge of the body. Acid value of 10~400 ΚΟΗmg/g. t for high aperture ratio liquid crystal display 'the amount of the adhesive L having the structure of the general formula 1, the dispersion of 1·0~5.0 and 15~400 ΚΟΗmg/g acid value. In the high aperture ratio liquid crystal display, the amount of the adhesive F having the structure of the general formula 2, the dispersion degree of 1.0 to 5.0·0, and the high-opening ratio liquid crystal display 1296739 as described in the first application of the patent scope A method for molding an organic insulator, wherein the oxime monomer containing an unsaturated aliphatic group comprises at least one compound selected from the group consisting of: esterification reaction of a polyol with an α,β-unsaturated carboxylic acid The compound obtained is selected from the group consisting of ethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate having 2 to 14 oxidized vinyl groups, and trimethylolpropane bis (曱 )) · propylene 曰 曰 曰 二, two methyl propyl tris (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, with 2 to 14 oxidation a group of propylene groups such as propanol mono(methyl) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa(meth) acrylate, and dipentaerythritol tris(decyl) acrylate ; via addition (fluorenyl) acrylic acid with glycidol a compound prepared from a compound of a group selected from the group consisting of trimethylolpropane triglycidyl ether acrylic acid adduct and bisphenol A diglycidyl ether acrylic acid adduct; polycarboxylic acid or An ester compound of an adduct of a polyisocyanate with a compound having a hydroxyl group and an unsaturated aliphatic group, which is selected from the group consisting of p-hydroxyethyl (meth)acrylate and β-hydroxyethyl (meth)acrylate. a group of acid diesters of an indane diisocyanate adduct; and an alkyl (meth)acrylate selected from the group consisting of methyl (meth)acrylate, ethyl (meth)acrylate, ethyl (meth) A group consisting of propyl succinate, (2-mercapto) acrylic acid 2-ethylhexyl. 5. The method for forming an organic insulator according to the high-opening rate liquid crystal display 29 1296739 as described in claim 1, wherein the negative photoresist further comprises an epoxy or an amine. a group of oxacin compounds. 6. The method for molding an organic insulator of a (4) high open ratio liquid crystal display according to claim 5, wherein the derivative containing a Wei or an amine group comprises a compound selected from the group consisting of (3' glycidoxypropyl group) Trimethoxy zebra, (3_scale glycerol oxypropyl) monoethoxy zebra, (3, glycidoxypropyl) methyl dimethyl milyl, (3-glycidoxy propyl Methyl diethoxy stone Xi Xuan, (iv) glycidoxypropyl) two? Base group Wei, (iv) glycidoxypropyl) dimethylene ethoxylated nightmare, 3,4_epoxy butyl trimethoxy sulphur, 3,4_epoxy butyl triethoxy Kewei, 2_(3,4-epoxycyclohexyl)ethyltrimethoxywei, 2-(3,4-epoxycyclohexyl)ethyltriethoxywei and aminopropyltrimethoxysilane At least one of the group consisting of annihilation. 7. The method of forming an organic insulator for a high aperture ratio liquid crystal display according to the fourth aspect of the invention, wherein the negative photoresist further comprises a solvent such that the viscosity is 2 to 30 centipoise (cps). 8. The method for molding an organic insulator having a high aperture ratio liquid crystal display according to claim 7, wherein the solvent comprises a solvent selected from the group consisting of ethyl acetate, butyl acetate, and diethylene glycol diethylene glycol. Ether, diethylene glycol didecyl ethyl ether, decyl methoxy propionate, ethyl ethoxy propionate (EEP), ethyl lactate, propylene glycol decyl ether acetate (PGMEA) , propylene glycol methyl ether, propylene glycol propyl scale, thiol cellosolve acetate, ethyl cellosolve acetate, diethylene glycol 30 1296739 diol thioglycolate, diethylene glycol ethyl acetate , acetone, mercaptoisobutyl ketone, cyclohexanone, dimethylformamide (DMF), N,N-dimercaptoacetamide (DMAc), N-methyl-2-pyrrolidone (NMP) , γ-butyrolactone, diethyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether (diglyme), tetrafuran (THF), decyl alcohol, ethanol, isopropanol, thiol-based cellosolve , ethyl cellosolve, diethylene glycol methyl ether, diethylene glycol ethyl ether, dipropylene glycol decyl ether, toluene, diphenyl, hexane, heptane and octane In the group At least one. , 1296739 VII. Designated representative map: (1) The representative representative of the case is: ( ). (2) Brief description of the symbol of the representative figure: The invention has no designated representative figure, so there is no component symbol. 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: 〇-CH2'CH 〇-CH2/ (XX)