JP4297831B2 - 配向の制御されたミクロ相分離構造膜の製法 - Google Patents

配向の制御されたミクロ相分離構造膜の製法 Download PDF

Info

Publication number
JP4297831B2
JP4297831B2 JP2004133301A JP2004133301A JP4297831B2 JP 4297831 B2 JP4297831 B2 JP 4297831B2 JP 2004133301 A JP2004133301 A JP 2004133301A JP 2004133301 A JP2004133301 A JP 2004133301A JP 4297831 B2 JP4297831 B2 JP 4297831B2
Authority
JP
Japan
Prior art keywords
polymer
block copolymer
substrate
electric field
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004133301A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005314526A (ja
JP2005314526A5 (enExample
Inventor
智一 彌田
香織 鎌田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
National Institute of Japan Science and Technology Agency
Original Assignee
Japan Science and Technology Agency
National Institute of Japan Science and Technology Agency
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Science and Technology Agency, National Institute of Japan Science and Technology Agency filed Critical Japan Science and Technology Agency
Priority to JP2004133301A priority Critical patent/JP4297831B2/ja
Publication of JP2005314526A publication Critical patent/JP2005314526A/ja
Publication of JP2005314526A5 publication Critical patent/JP2005314526A5/ja
Application granted granted Critical
Publication of JP4297831B2 publication Critical patent/JP4297831B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Treatments Of Macromolecular Shaped Articles (AREA)
JP2004133301A 2004-04-28 2004-04-28 配向の制御されたミクロ相分離構造膜の製法 Expired - Fee Related JP4297831B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004133301A JP4297831B2 (ja) 2004-04-28 2004-04-28 配向の制御されたミクロ相分離構造膜の製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004133301A JP4297831B2 (ja) 2004-04-28 2004-04-28 配向の制御されたミクロ相分離構造膜の製法

Publications (3)

Publication Number Publication Date
JP2005314526A JP2005314526A (ja) 2005-11-10
JP2005314526A5 JP2005314526A5 (enExample) 2007-03-08
JP4297831B2 true JP4297831B2 (ja) 2009-07-15

Family

ID=35442288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004133301A Expired - Fee Related JP4297831B2 (ja) 2004-04-28 2004-04-28 配向の制御されたミクロ相分離構造膜の製法

Country Status (1)

Country Link
JP (1) JP4297831B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108589048A (zh) * 2018-05-02 2018-09-28 北京服装学院 利用静电纺丝大面积制备定向毛细力驱动高效集水疏水/亲水Janus复合纤维膜的方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7964209B2 (en) * 2004-12-07 2011-06-21 Boston Scientific Scimed, Inc. Orienting polymer domains for controlled drug delivery
US7347953B2 (en) * 2006-02-02 2008-03-25 International Business Machines Corporation Methods for forming improved self-assembled patterns of block copolymers
JP4621160B2 (ja) * 2006-03-30 2011-01-26 キヤノン株式会社 構造体の製造方法
US8446660B2 (en) 2008-07-28 2013-05-21 Funai Electric Advanced Applied Technology Research Institute Inc. Electrochromic display device
AU2010324532B2 (en) 2009-11-25 2015-02-26 Cms Innovations Pty Ltd Membrane and membrane separation system
JP5598970B2 (ja) * 2010-06-18 2014-10-01 凸版印刷株式会社 微細構造体の製造方法、複合体
CN102691175B (zh) * 2012-05-07 2014-10-29 北京航空航天大学 一种具有单向透水性能的复合纤维膜及其制备方法
JP6524704B2 (ja) * 2015-02-26 2019-06-05 住友ベークライト株式会社 遷移金属錯体を含有するブロック共重合体
KR101943193B1 (ko) * 2017-03-29 2019-01-28 송승원 고분자-세라믹 하이브리드 코팅 조성물과 이를 이용한 이차전지 분리막 제조방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3187197B2 (ja) * 1993-03-25 2001-07-11 出光興産株式会社 強誘電性高分子液晶を用いた液晶光学素子及びその階調表示方法
JPH08240796A (ja) * 1995-03-02 1996-09-17 Idemitsu Kosan Co Ltd 液晶組成物、それを用いた液晶素子及びその製造法
JP2939506B2 (ja) * 1998-07-03 1999-08-25 富士ゼロックス株式会社 記録方法
JP3979470B2 (ja) * 2002-09-11 2007-09-19 財団法人理工学振興会 ブロック共重合体、及びミクロ相分離構造膜の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108589048A (zh) * 2018-05-02 2018-09-28 北京服装学院 利用静电纺丝大面积制备定向毛细力驱动高效集水疏水/亲水Janus复合纤维膜的方法

Also Published As

Publication number Publication date
JP2005314526A (ja) 2005-11-10

Similar Documents

Publication Publication Date Title
Lee et al. Highly aligned ultrahigh density arrays of conducting polymer nanorods using block copolymer templates
JP4403238B2 (ja) ミクロ相分離構造膜、及びその製造方法
JP5598970B2 (ja) 微細構造体の製造方法、複合体
Zhang et al. Controlled placement of CdSe nanoparticles in diblock copolymer templates by electrophoretic deposition
JP5082101B2 (ja) ナノポーラス基板の製造方法
Osuji et al. Alignment of self-assembled hierarchical microstructure in liquid crystalline diblock copolymers using high magnetic fields
Olszowka et al. Electric field alignment of a block copolymer nanopattern: direct observation of the microscopic mechanism
Wang et al. Electric-field-assisted assembly of polymer-tethered gold nanorods in cylindrical nanopores
De Moel et al. Polymeric nanofibers prepared from self-organized supramolecules
JP3979470B2 (ja) ブロック共重合体、及びミクロ相分離構造膜の製造方法
JP4297831B2 (ja) 配向の制御されたミクロ相分離構造膜の製法
Xu et al. A templateless, surfactantless, simple electrochemical route to a dendritic gold nanostructure and its application to oxygen reduction
Grande et al. Surface-grafted polymers from electropolymerized polythiophene RAFT agent
Kiriy et al. Palladium wire-shaped nanoparticles from single synthetic polycation molecules
Zhang et al. Organic− Inorganic Hybrid Materials by Self-Gelation of Block Copolymer Assembly and Nanoobjects with Controlled Shapes Thereof
JP5988258B2 (ja) 微細構造体の製造方法、複合体の製造方法
Chen et al. Confined self-assembly enables stabilization and patterning of nanostructures in liquid-crystalline block copolymers
Jiang et al. One-step synthesis of oriented polyaniline nanorods through electrochemical deposition
Fahmi et al. Spatially correlated metallic nanostructures on self-assembled diblock copolymer templates
Sun et al. Self-Assembly of Hierarchical Silicon-Containing Block Copolymers with Cross-Linkable 3 nm Smectic Motifs for Nanopatterning and Osmotic Energy Conversion Membranes
JP6120213B2 (ja) 微細構造体の製造方法、複合体の製造方法
Nagano et al. Formation of a highly ordered dot array of surface micelles of a block copolymer via liquid crystal-hybridized self-assembly
JP2006273890A (ja) 異方性イオン伝導性高分子膜
JP6311292B2 (ja) 変形材料、変形材料の製造方法およびアクチュエーター
JP2015054876A (ja) 変形材料、変形材料の製造方法およびアクチュエーター

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070122

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070122

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20081203

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081208

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090116

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090216

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090318

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090413

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090414

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120424

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees