JP4295592B2 - Production method of duplicate plate - Google Patents

Description

  The present invention relates to a method for producing a duplicate plate by embossing a relief pattern such as a relief hologram or a diffraction grating, and in particular, forming a plurality of original relief patterns on the same plane (hereinafter referred to as `` multi-faceted ''). The present invention also relates to a method for producing a large-area replica.

  Relief holograms, diffraction gratings, and the like are configured by recording interference fringes generated by interference of laser light as relief patterns composed of fine irregularities. This relief pattern is formed as hundreds to thousands of fine ridges per 1 mm length.

  In order to create an original plate such as a relief hologram, a method of photographing using a photosensitive material and a method of drawing a computer generated hologram (CGH) with an electron beam (EB) are known. In the method by photographing, if a plate having a large area is to be made, the photographing optical system becomes enormous, and therefore it is extremely difficult to produce a size of 300 mm square or more. Moreover, the equipment for EB drawing is expensive, and the cost increases as the drawing area increases.

  In view of the above, it is desirable to make the hologram master to the minimum size, and to make a large master by increasing the area by making multiple faces from the hologram master using other embossing duplication techniques. Therefore, as a method of multi-page imposition, for example, there is a cut and paste method. In this method, multiple copy plates are created from a small master plate by a photopolymerization method (2P method) or other method, and the copy plate is cut into a predetermined shape, and then arranged in order and multifaceted to create a large-area plate. How to create. In the 2P method, an ionizing radiation curable resin is applied to the original plate, and the ionizing radiation curable resin is cured by irradiating with ionizing radiation, and then the cured ionizing radiation curable resin is peeled off from the original plate. And can be duplicated with high accuracy.

  As another method, there is a multiple imposition method using a stamp method. This is a combination of an XY stage and a heat press system. Specifically, a method of increasing the area of the relief pattern of the original plate by transferring the original plate positioned by the XY stage one after another onto a large area transfer material prepared in advance using a heating press. It is. In this method, the relief pattern of the duplicate plate is performed by hot-pressing the hologram original plate on a thermoplastic resin or the like.

  However, in the above cut and paste method, there is a step at the joint between the copy plates, and unevenness occurs at the joint of the final plate, so it is difficult to stably copy the vicinity of the joint at the time of duplication. There is a problem of significantly impairing the durability.

  In the above stamp method, when a relief pattern is duplicated by the hot-pressure embossing method, the relief pattern is formed on the thermoplastic resin by the hot-pressure embossing method. Or the material of the original plate is limited to metal or the like.

  The present invention has been made in view of the above-mentioned drawbacks of the prior art, and can produce a large-sized duplicate by imposing the original on multiple sides, and can stably duplicate the vicinity of the joint of the original, and the duplicate It is an object of the present invention to provide a method for producing a duplicate plate that has good durability, can be duplicated with high accuracy, and can be duplicated without limitation on the material of the original plate.

The present invention
This is a method for producing a duplicate plate larger than the original plate by applying multiple relief patterns corresponding to the fine irregularities of the original plate on the same plane. The original plate or a copy plate copied from the original plate is arranged on the substrate and fixed to the relief. A relief forming material in which an embossed plate with a multifaceted pattern is prepared, and a molding resin layer made of a thermoplastic material having a radically polymerizable unsaturated group on the surface of the base material, which is solid at room temperature, is uniformly formed. The embossing plate is pressed against the shaping resin layer of the relief forming material obtained by heat-softening the embossing plate at an embossing pressure of 1 ton or less and a molding temperature of 200 ° C. or less, and the embossing plate is peeled off from the shaping resin layer. A method for producing a duplicated plate, characterized by obtaining a duplicated plate that is multifaceted and has a larger area than the original plate by irradiating the mold resin layer with ionizing radiation to cure the shaped resin layer,
Is a summary.

  By adopting the above configuration, the method for producing a duplicate of the present invention can produce a large duplicate by imposing the original on multiple sides, and can stably duplicate the vicinity of the joint of the original. The durability of the duplication plate is good, duplication can be performed with high accuracy, and duplication without limitation on the material of the original plate is possible.

  Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 1 shows an example of a duplicate plate 1 obtained by the method for producing a duplicate plate of the present invention. In the present invention, as shown in FIG. 1, the unit P provided with the relief pattern corresponding to the fine irregularities 3 provided on the surface of the original 2 is aligned in the vertical and horizontal directions on the same plane, and a large number of units are provided on the surface. This is a method for producing a duplicate plate 1 provided with P (nm) and formed as a plate having a larger area than the original plate by imposing a large number of relief patterns corresponding to the fine irregularities 3 of the original plate.

  The duplicated plate 1 in FIG. 1 is a unit in which one unit P provided with a relief pattern corresponding to the fine irregularities 3 of the original 2 is arranged in the P (n) plane vertically and the P (m) plane horizontally. In FIG. 1, n = 1 to 8 and m = 1 to 8, up to units P (1-1)... P (1-8), 8 vertical surfaces × 8 horizontal surfaces = total 64 surfaces are formed. Is.

  FIG. 2 shows an example of a method for producing a duplicate plate according to the present invention, which uses a cut and paste method. In this method, first, the original plate is copied and the required number of sheets are prepared. Specifically, when making the duplicate 1 shown in Fig. 1, copy the original 2 to make 64 copies of Q (1-1), Q (1-2) ... Q (8-8) . As a method for producing this copy plate, for example, a liquid ionizing radiation curable resin is applied to the surface of the original plate 2 for duplication, and after being stretched and shaped, it is cured by irradiation with ionizing radiation, and the original plate for duplication A duplication method such as Photo Polymerization method (2P method) is used. Further, if necessary, the copy plate Q (n-m) is cut using a cutter or the like to remove excess burrs around the periphery or to have a predetermined shape and size.

  Next, as shown in FIG. 2 (a), a large number of copy plates Q (nm) formed in a predetermined shape on the embossed substrate 4 are arranged in order and fixed to form an emboss formed in a large area for 64 original plates. Create version 9. On the other hand, as shown in FIG. 2 (b), a relief forming material provided with a shaping resin layer 6 that is solid at room temperature and has thermoformability and ionizing radiation curability on the surface of the base material 5 of the replication plate 1 Prepare 7. Similar to the size of the embossed plate 9, the size of the base material 5 of the relief forming material 7 is 64 copies of the size of the copy plate Q.

  As shown in FIG. 2 (c), the relief forming material 7 and the embossed plate 9 are laminated so that the shaping resin layer 6 of the relief forming material 7 and the surface of the copy plate Q (nm) face each other. The mold resin layer 6 is heated by an appropriate means to make the mold resin layer 6 in a softened state, and is pressed from above and below the laminate by the pressure plates 11, 12 and the like.

  Since the shaping resin layer 6 is softened by heating and is pressed from above and below by the pressure plates 11 and 12, the shaping resin layer 6 has a relief pattern on the surface of the copy plate Q (nm). A relief pattern 10 having a fine uneven shape corresponding to is formed.

  As shown in FIG. 2 (d), the molding resin layer 6 is cooled, the pressure is released, the copy plate Q (nm) is peeled from the molding resin layer 6, and then the relief pattern 10 is molded. By irradiating the resin layer 6 with ionizing radiation 8 and curing the resin layer 6, a multi-faced large-area replica 1 can be obtained.

  The shaping resin layer 6 is applied and formed flat on the surface of the substrate 5 so that the resin thickness is constant. A relief pattern 10 is formed on the shaping resin layer 6 having a uniform thickness. As a result, the duplicate plate 1 has excellent flatness and high surface accuracy. In addition, even if the duplicate plate 1 has a joint, since the shaping resin layer 6 itself is formed as a single flat layer, a flat duplicate plate is completed, and a large number of copy plates Q ( nm) Even if there is a joint between each other, the entire duplicate will not be bumpy.

  FIG. 3 is a process diagram showing another duplication method of the present invention. The method shown in FIG. 3 is a method using the stamp method. As shown in FIG. 3 (a), first, an original plate or a copy plate Q1 obtained by copying the original plate at an equal magnification is prepared as an embossed plate. On the other hand, as shown in FIG. 3 (b), a relief forming material 7 provided with a shaping resin layer 6 that is solid at room temperature and has thermoformability and ionizing radiation curability on the surface of the substrate 5 is prepared. The size of the base material 5 of the relief forming material 7 is formed to a predetermined size of the duplicate plate 1. When the duplicate plate of FIG. 1 is manufactured, the copy plate Q1 has a size of 64 sheets. .

  Next, as shown in FIG. 3 (c), the relief forming material 7 is placed on the XY stage 13, the copy plate Q1 is placed on the stamper 14, and the surface of the shaping resin layer 6 and the surface of the copy plate Q1 face each other. Install in the same manner. The shaping resin layer 6 of the relief forming material 7 is appropriately heated to make the shaping resin layer 6 softened and positioned with the XY stage 13, and the stamper 14 presses the copy plate Q1 against the shaping resin layer 6. (Stamped) to form fine irregularities corresponding to the relief pattern of the copy plate Q. The positioning by the XY stage 13 and the stamping by the stamper are sequentially repeated a predetermined number of times.

  For example, in the production of the duplicate plate 1 in the embodiment of FIG. 1, stamps are sequentially performed 64 times in total from (1-1), (1-2)... (8-8), as shown in FIG. 3 (d). Thus, the relief forming material 7 in which the relief pattern 10 is formed on the entire shaping resin layer 7 is obtained.

  Since the molding resin layer 6 is in a softened state by heating, when the copy plate Q1 is stamped by the stamper 14, the fine uneven shape corresponding to the relief pattern on the surface of the copy plate Q1 on the molding resin layer 6 The relief pattern 10 is easily formed.

  When the stamp on the copy plate is finished, as shown in FIG. 3 (e), the resin layer 6 on which the relief pattern 10 is formed is irradiated with ionizing radiation 8 to cure the resin layer 6. As a result, a multifaceted large-area copy 1 is obtained.

  In the case of multiple imposition by a stamp method using a simple embossing means, it is necessary to withstand pressurization as an embossed plate, and the embossed plate is generally made of metal in terms of printing durability. Further, as a material of the duplicate plate, a shaping resin layer made of a thermoplastic resin is used so that embossing can easily enter.

  On the other hand, in the method shown in FIG. 3, the embossing plate used for the stamp is easily formed because the relief pattern has a fine unevenness because the forming resin layer is softened at the time of stamping. Since the molding can be sufficiently performed even if the pressure of the pressurization is small, the material of the embossing plate is not necessarily made of metal, and the material of the original plate is not limited. In addition, since an ionizing radiation curable resin is used as the shaping resin layer instead of a thermoplastic resin, there is no possibility that the relief pattern deteriorates with use and the accuracy of replication is lowered when used as a duplicate plate.

  As the relief pattern of the fine unevenness 2 used in the duplicate plate of the present invention, a light uneven structure such as a relief hologram or a diffraction grating, or a fine uneven pattern such as a hairline is used. As the hologram image, symbols, letters, numbers, illustrations, and the like can be used in addition to an image obtained by photographing a real object. The hologram image itself can be used to calculate hologram diffraction gratings, calculate digital images captured with digital cameras, 2D or 3D image data obtained from computer graphics, holographic stereograms, etc. It can also be created by an appropriate means. The diffraction grating can express an image such as a character by its outline.

  As the relief hologram, a hologram or diffraction grating in which the intensity distribution of the interference fringe light due to the interference between the object beam and the reference beam is recorded in a concavo-convex pattern can be applied. Examples of the relief hologram include Fresnel holograms, Fraunhofer holograms, lensless Fourier transform holograms, laser reproduction holograms such as image holograms, and white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer holograms, There are hologram displays, multiplex holograms, holographic stereograms, holographic diffraction gratings, and the like.

  As a diffraction grating, in addition to a holographic diffraction grating using a hologram recording means, a precision lathe, an electron beam drawing apparatus, etc. are used to create a diffraction grating mechanically and in a drawing manner. It is possible to increase the diffraction grating from which the diffraction grating can be obtained.

  These holograms and diffraction gratings may be recorded singly, in multiple recordings, or in combination. In addition, the diffraction grating is an assembly having a plurality of regions having different peak directions and / or peak intervals and / or uneven shape and / or uneven height, that is, a plurality of regions having different diffraction directions are regularly arranged. Or, when combined in a random manner, unique glitter with a design property can be obtained.

  The substrate 4 of the embossed plate 9 shown in FIG. 2 (a) may be any material that can hold the copy plate Q. The manufacturing method of the copy plate Q by the 2P method is as follows. First, as shown in FIG. 4 (A), an original plate 21 on which a relief having fine irregularities is formed, and an ionizing radiation curable resin composition 22 is dropped onto the original plate 21 as shown in FIG. 4 (B). Next, as shown in the same figure (C), (D), the substrate 24 is placed thereon and pressed to spread the ionizing radiation curable resin composition 22 and uniformly filled in the recesses. To do. Next, as shown in FIG. 5E, ionizing radiation curable resin composition 22 is cured by irradiating with ionizing radiation such as ultraviolet rays from the original 21 side or the substrate 24 side. As shown in FIG. 4 (F), the relief made of the ionizing radiation curable resin 23 on the base material 24 is obtained by peeling the cured and integrated ionizing radiation curable resin 23 and the base material 24 from the original 11. A copy version Q with the pattern created is obtained.

  The base material 5 of the relief forming material 7 may be a plastic film, paper, synthetic paper, metal film such as iron or aluminum. The above film may be used alone or as a laminate of two or more. The film thickness of the substrate 5 can usually be about 5 to 2000 μm.

  The ionizing radiation curable resin used for the shaping resin layer 6 that is solid at room temperature and has thermoformability is composed of a thermoplastic substance having a radically polymerizable unsaturated group. Specifically, there are the following two types (1) and (2).

(1) A polymer having a glass transition temperature of 0 to 250 ° C. and having a radically polymerizable unsaturated group. More specifically, the polymer is a polymer obtained by polymerizing or copolymerizing the following compounds i) to viii) and introducing a radically polymerizable unsaturated group by the methods (a) to (d) described later.

i) Monomers having a hydroxyl group: N-methylolacrylamide, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 2-hydroxy-3-phenoxypropyl methacrylate, 2-hydroxy-3-phenoxypropyl acrylate, and the like.
ii) Monomers having a carboxyl group: acrylic acid, methacrylic acid, acryloyloxyethyl monosuccinate and the like.
iii) Monomers having an epoxy group: glycidyl methacrylate and the like.
iv) Monomers having an aziridinyl group: 2-aziridinylethyl methacrylate, allyl 2-aziridinylpropionate, and the like.
v) Monomers having an amino group: acrylamide, methacrylamide, diacetone acrylamide, dimethylaminoethyl methacrylate, diethylaminoethyl methacrylate and the like.
vi) Monomers having a sulfonic group: 2-acrylamido-2-methylpropane sulfonic acid and the like.
vii) Monomer having an isocyanate group: an adduct of a radial polymerizable monomer having an active hydrogen and a diisocyanate such as a 1 mol to 1 mol adduct of 2,4-toluene diisocyanate and 2-hydroxyethyl acrylate.
viii) Further, in order to adjust the glass transition point of the above-mentioned polymer or copolymer, or to adjust the physical properties of the cured film, the above-mentioned compound can be copolymerized with this compound as shown below. A monomer can also be copolymerized. Examples of such copolymerizable monomers include methyl methacrylate, methyl acrylate, ethyl acrylate, ethyl methacrylate, propyl acrylate, propyl methacrylate, butyl acrylate, butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, t-butyl acrylate, t -Butyl methacrylate, isoamyl acrylate, isoamyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate and the like.

The following methods (a) to (d) show methods for introducing a radical polymerizable unsaturated group into the above polymer.
(A) In the case of a polymer or copolymer of a monomer having a hydroxyl group, a monomer having a carboxyl group such as acrylic acid or methacrylic acid is subjected to a condensation reaction.
(B) In the case of a polymer or copolymer of a monomer having a carboxyl group or a sulfone group, the aforementioned monomer having a hydroxyl group is subjected to a condensation reaction.
(C) In the case of a polymer or copolymer of a monomer having an epoxy group, an isocyanate group or an aziridinyl group, the above-mentioned monomer having a hydroxyl group or monomer having a carboxyl group is subjected to an addition reaction.
(D) In the case of a polymer or copolymer of a monomer having a hydroxyl group or a carboxyl group, a monomer having an epoxy group, a monomer having an aziridinyl group or a diisocyanate compound and a hydroxyl group-containing acrylate ester Addition reaction of 1 to 1 mole adduct of the body.
In order to perform the above reaction, it is preferable to add a trace amount of a polymerization inhibitor such as hydroquinone and feed dry air.

(2) A compound having a melting point of 0 to 250 ° C. and having a radically polymerizable unsaturated group. Specific examples include stearyl acrylate, stearyl methacrylate, triacryl isocyanurate, cyclohexanediol diacrylate, cyclohexanediol dimethacrylate, spiroglycol diacrylate, and spiroglycol dimethacrylate.

  Further, as the resin of the shaping resin layer 6, the above (1) and (2) can be mixed and used, and further, a radical polymerizable unsaturated monomer can be added thereto. This radically polymerizable unsaturated monomer improves crosslink density and improves heat resistance upon irradiation with ionizing radiation, and in addition to the aforementioned monomers, ethylene glycol diacrylate, ethylene glycol dimethacrylate, Polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, hexanediol diacrylate, hexanediol dimethacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, trimethylolpropane diacrylate, trimethylolpropane dimethacrylate, pentaerythritol tetraacrylate, penta Erythritol tetramethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, dipenta Lithritol hexaacrylate, dipentaerythritol hexamethacrylate, ethylene glycol diglycidyl ether diacrylate, ethylene glycol diglycidyl ether dimethacrylate, polyethylene glycol diglycidyl ether diacrylate, polyethylene glycol diglycidyl ether dimethacrylate, propylene glycol diglycidyl ether diacrylate , Propylene glycol diglycidyl ether dimethacrylate, polypropylene glycol diglycidyl ether diacrylate, polypropylene glycol diglycidyl ether dimethacrylate, sorbitol tetraglycidyl ether tetraacrylate, sorbitol tetraglycidyl ether tetramethacrylate, etc. Come against solid content 100 parts by weight of the copolymer mixture described above, it is preferable to use at 0.1 parts by weight.

  The ionizing radiation curable resin can be sufficiently cured by an electron beam. However, when it is cured by ultraviolet irradiation, a photopolymerization initiator such as acetophenones, benzophenones, Michler benzoylbenzoate, α-amino is used. A photopolymerization initiator such as oxime ester, tetramethylmeurum monosulfide, or thioxanthone, and a photosensitizer such as n-butylamine, triethylamine, or tri-n-butylphosphine are added as necessary.

  The ionizing radiation curable resin can also be cured by heat energy if an appropriate catalyst is present.

  The ionizing radiation curable resin that is solid at room temperature and has thermoformability used for the shaping resin layer 6 is, for example, a film thickness of 0.1 to 50 μm, desirably 0.5 to 5 μm when replicating a hologram as an uneven pattern. Formed with. This film thickness varies depending on the purpose of use of the relief pattern 10 to be reproduced.

  In order to form the shaping resin layer 6 on the substrate of the relief forming material 5, a known printing method such as spin coating, knife coating, roll coating, bar coating, general printing technology such as screen printing, gravure printing, or A transfer method or the like can be used.

  As the ionizing radiation 8 for curing the shaping resin layer 6, all ultraviolet rays (UV-A, UV-B, UV-C), visible rays, gamma rays, X-rays, electron beams, etc. can be used. Ultraviolet light or electron beam is preferred. The ionizing radiation irradiation device used for the irradiation of ionizing radiation 8 includes ultraviolet lamps such as an ultra-high pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc, a black light lamp, and a metal halide lamp as a light source when irradiating ultraviolet rays as ionizing radiation. Can be mentioned. The wavelength of the ultraviolet light is usually about 200 to 400 nm, and the wavelength may be selected according to the composition of the resin layer. Moreover, the irradiation amount can also be irradiated according to the composition of the resin layer, the output of the ultraviolet lamp and the processing speed.

  When irradiating an electron beam as ionizing radiation 8, various electron beam accelerators such as a Cockloft Walton type, a bandegraph type, a resonant transformer type, an insulated core transformer type, a linear type, a dynamitron type, a high frequency type, etc. A device capable of irradiating an electron beam by an electro curtain method, a beam scanning method, or the like is used. Preferably, an “electro curtain” (trade name) capable of irradiating a uniform electron beam in a curtain form from a linear filament can be used. The electron beam is irradiated with electrons having an energy of 100 to 1,000 keV, preferably 100 to 300 keV, with an irradiation amount of about 0.5 to 20 Mrad. The atmosphere during irradiation is performed at an oxygen concentration of 500 ppm or less, and it is usually preferable to perform the irradiation at about 200 ppm.

  As shown in FIG. 2 (c), when the embossing plate 9 is pressed to form the shaping resin layer 6, and as shown in FIGS. 3 (c) and 3 (d), the stamper 14 is used to stamp the shaping resin. When the layer 6 is molded, it is preferable that the embossing conditions are an embossing pressure of 1 ton or less and a molding temperature of 200 ° C. or less. If it is the said conditions, shaping | molding can be performed favorably, without giving damage to resin, such as original plates, such as a resin plate, and the shaping resin layer of a relief forming material. In the conventional stamping method, the metal plate is used and the embossing condition pressure is 10 to 50 tons and the molding temperature is about 400 ° C. or lower. However, under such molding conditions, the resin plate or Resin cannot be used for the relief forming material.

It is an external appearance perspective view which shows an example of the replication plate obtained by the manufacturing method of this invention replication plate. It is process drawing which shows an example of the manufacturing method of this invention replica. It is process drawing which shows the other example of the manufacturing method of this invention replica. It is a process diagram showing a method of forming a copy plate from an original plate by 2P method.

Explanation of symbols

1 Duplicate version
2 Original edition
3 Fine irregularities
4 Embossed base edition
5 Base material for relief forming material
6 Molding resin layer
7 Relief forming material
8 Ionizing radiation
9 Embossed version
10 Relief pattern

Claims (1)

This is a method for producing a duplicate plate larger than the original plate by applying multiple relief patterns corresponding to the fine irregularities of the original plate on the same plane. The original plate or a copy plate copied from the original plate is arranged on the substrate and fixed to the relief. A relief forming material in which an embossed plate with a multifaceted pattern is prepared, and a molding resin layer made of a thermoplastic material having a radically polymerizable unsaturated group on the surface of the base material, which is solid at room temperature, is uniformly formed. The embossing plate is pressed against the shaping resin layer of the relief forming material obtained by heat-softening the embossing plate at an embossing pressure of 1 ton or less and a molding temperature of 200 ° C. or less, and the embossing plate is peeled off from the shaping resin layer. A method for producing a duplicated plate, wherein a duplicated plate having a larger area than the original plate is obtained by irradiating the mold resin layer with ionizing radiation to cure the shaped resin layer.

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