JP4286981B2 - 枚葉式熱処理装置 - Google Patents

枚葉式熱処理装置 Download PDF

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Publication number
JP4286981B2
JP4286981B2 JP20732799A JP20732799A JP4286981B2 JP 4286981 B2 JP4286981 B2 JP 4286981B2 JP 20732799 A JP20732799 A JP 20732799A JP 20732799 A JP20732799 A JP 20732799A JP 4286981 B2 JP4286981 B2 JP 4286981B2
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Japan
Prior art keywords
processing chamber
processing
susceptor
heat treatment
lid
Prior art date
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Expired - Fee Related
Application number
JP20732799A
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English (en)
Japanese (ja)
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JP2001035799A5 (https=
JP2001035799A (ja
Inventor
亘 大加瀬
英一郎 高鍋
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP20732799A priority Critical patent/JP4286981B2/ja
Priority to US09/549,343 priority patent/US6402848B1/en
Priority to KR1020000020918A priority patent/KR100574116B1/ko
Publication of JP2001035799A publication Critical patent/JP2001035799A/ja
Publication of JP2001035799A5 publication Critical patent/JP2001035799A5/ja
Application granted granted Critical
Publication of JP4286981B2 publication Critical patent/JP4286981B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Muffle Furnaces And Rotary Kilns (AREA)
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JP20732799A 1999-04-23 1999-07-22 枚葉式熱処理装置 Expired - Fee Related JP4286981B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP20732799A JP4286981B2 (ja) 1999-07-22 1999-07-22 枚葉式熱処理装置
US09/549,343 US6402848B1 (en) 1999-04-23 2000-04-13 Single-substrate-treating apparatus for semiconductor processing system
KR1020000020918A KR100574116B1 (ko) 1999-04-23 2000-04-20 반도체 처리 시스템의 매엽식 처리 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20732799A JP4286981B2 (ja) 1999-07-22 1999-07-22 枚葉式熱処理装置

Publications (3)

Publication Number Publication Date
JP2001035799A JP2001035799A (ja) 2001-02-09
JP2001035799A5 JP2001035799A5 (https=) 2006-08-24
JP4286981B2 true JP4286981B2 (ja) 2009-07-01

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ID=16537930

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20732799A Expired - Fee Related JP4286981B2 (ja) 1999-04-23 1999-07-22 枚葉式熱処理装置

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JP (1) JP4286981B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4569042B2 (ja) * 2001-05-18 2010-10-27 東京エレクトロン株式会社 熱処理装置
JP4354908B2 (ja) * 2002-06-10 2009-10-28 東京エレクトロン株式会社 処理装置
JP5010235B2 (ja) * 2006-10-26 2012-08-29 株式会社ニューフレアテクノロジー 気相成長方法
JP5107185B2 (ja) * 2008-09-04 2012-12-26 東京エレクトロン株式会社 成膜装置、基板処理装置、成膜方法及びこの成膜方法を実行させるためのプログラムを記録した記録媒体
CN103201828B (zh) * 2010-11-05 2016-06-29 夏普株式会社 氧化退火处理装置和使用氧化退火处理的薄膜晶体管的制造方法
JP5541406B2 (ja) 2012-08-28 2014-07-09 三菱マテリアル株式会社 セメント製造装置

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JP2001035799A (ja) 2001-02-09

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