JP4267604B2 - Cleaning device - Google Patents

Description

  The present invention relates to a cleaning apparatus, and more particularly, to a cleaning apparatus that removes an organic material attached to a mask in a vapor deposition process of an organic material for organic EL.

  In recent years, an organic EL display device using an organic electroluminescence (Electro Luminescence: hereinafter referred to as “organic EL”) element has attracted attention as a display device that replaces a CRT or LCD. For example, the organic EL display device is driven. Research and development of an organic EL display device including a driving thin film transistor (Thin Film Transistor: hereinafter abbreviated as “TFT”) is also in progress.

The organic EL device includes, for example, an anode made of ITO, a first hole transport layer such as MTDATA (4,4-bis (3-methylphenylphenyl) biphenyl), and TPD (4,4,4-tris (3-methylphenylamino) triphenyline). A hole transport layer comprising a second hole transport layer, a light emitting layer comprising Bebq ₂ (10-benzo [h] quinolinol-beryllium complex) containing a quinacridone derivative, an electron transport layer comprising Bebq ₂ , and an aluminum alloy Etc. have a structure in which the cathodes are formed in this order.

  Such an organic EL element emits light when current is supplied through a driving TFT for driving the organic EL element. That is, holes injected from the anode and electrons injected from the cathode are recombined inside the light emitting layer, and excitons are generated by exciting organic molecules forming the light emitting layer. Light is emitted from the light emitting layer in the process of radiation deactivation of the excitons, and this light is emitted to the outside through a transparent anode and an insulating substrate such as a glass substrate to emit light.

  Among the layers of the organic EL element described above, an organic material used for forming the hole transport layer, the light emitting layer, and the electron transport layer has characteristics that it has low solvent resistance and is weak against moisture. Therefore, the photolithography technique in the semiconductor process cannot be used. Therefore, for example, the organic material is selectively deposited on an insulating substrate having a driving TFT by a vapor deposition method using a mask made of a metal thin film (so-called shadow mask) to form a hole transport layer of the organic EL element. The patterning of the light emitting layer, the electron transport layer, and the cathode was performed.

  An example of a mask used for vapor deposition of such an organic material is shown in FIGS. FIG. 15 is a top view illustrating a mask for organic EL according to a conventional example. 16 is a cross-sectional view taken along line XX of FIG. 15, and FIG. 17 is a cross-sectional view taken along line YY of FIG. As shown in FIGS. 15 to 17, the mask 10 is made of a metal thin film such as nickel (Ni) and iron (Fe) having a plurality of fine holes 11 each having a length and width of about several microns. Through these holes 11, the organic material is selectively deposited on the insulating substrate.

  The mask 10 made of the metal thin film is fixed to a metal frame 12 made of, for example, nickel (Ni) and iron (Fe), and the edge of the mask 10 is supported by the metal frame 12. A plurality of locking portions 13 for holding the metal frame 12 are formed on the edge of the metal frame 12. Hereinafter, the mask 10 fixed to the metal frame 12 is abbreviated as “mask 10”.

In addition, as a related technical document, the following patent documents are mentioned, for example.
JP 2004-103269 A

  When the organic EL element has light emitting layers of three primary colors, red, green, and blue, corresponding to color display, the organic material vapor deposition step is generally performed by repeatedly using a mask for each color. Therefore, as the number of repeated depositions increases, the organic material adheres to the surface of the mask 10 so as to be laminated in layers. That is, as shown in the cross-sectional view of the mask on which the organic material shown in FIG. 18 is deposited, the organic material 1 is not only on the surface of the mask 10 but also a plurality of holes 11 through which the organic material 1 is supposed to pass. The overhang 1a is formed on the periphery of the hole 11 so as to close the hole.

  Thus, since the hole 11 of the mask 10 is narrowed by the overhang made of an organic material, there has been a problem that the accuracy in vapor deposition of the organic material on the insulating substrate is lowered.

  As a countermeasure to the above-described problem, there is a method in which the used mask is discarded every predetermined number of depositions and replaced with an unused mask without using the same mask a plurality of times. However, when this method is used, an unused mask used for vapor deposition of the organic material for the organic EL is expensive, which causes a problem of an increase in cost.

  Therefore, the present invention provides a cleaning device capable of removing the organic EL organic material adhering to the mask.

  The cleaning device of the present invention has been made in view of the above-described problems, and is a cleaning device that removes the organic material for organic EL attached to the mask, and has the following features.

  That is, the cleaning device of the present invention includes a cleaning tank that cleans the mask with a predetermined cleaning liquid, a vacuum distiller that vacuum-distills the cleaning liquid overflowing from the cleaning tank, and a cleaning liquid vacuum-distilled by the vacuum distiller to room temperature. The first cooler, the first reflux pipe for refluxing the cleaning liquid cooled by the first cooler, the rinse tank for rinsing the mask with a predetermined rinse liquid, and the overflow from the rinse tank A normal pressure distiller for distilling the rinse liquid under normal pressure, a second cooler for cooling the normal pressure distilled rinse liquid to the room temperature, and a rinse liquid cooled by the second cooler. And a second reflux pipe for refluxing the rinse tank.

  In addition to the above configuration, the cleaning apparatus of the present invention further includes a first ultrasonic vibrator that vibrates the cleaning liquid in the cleaning tank, and further detects a temperature of the cleaning liquid in the cleaning tank. And a first temperature controller for adjusting the cleaning liquid in the cleaning tank to room temperature according to the detection result of the first temperature sensor. Here, the first temperature regulator includes a first heat exchanger, and the first temperature regulator performs the cleaning by allowing the cleaning liquid cooled by the first heat exchanger to flow into the cleaning tank. Adjust the temperature of the cleaning liquid in the tank.

  In addition to the above-described configuration, the cleaning apparatus of the present invention further includes a second ultrasonic vibrator that vibrates the rinse liquid in the rinse tank, and further detects a temperature of the rinse liquid in the rinse tank. And a second temperature regulator that adjusts the rinse liquid in the rinse tank to room temperature according to the detection result of the second temperature sensor. Here, the second temperature regulator includes a second heat exchanger, and the second temperature regulator is configured to flow the rinse liquid cooled by the second heat exchanger into the rinse tank. Adjust the temperature of the rinse liquid in the rinse tank.

  In addition to the above configuration, the cleaning device of the present invention includes a recovery tank having a third cooler, and the recovery tank evaporates in the rinse tank by being cooled by the third cooler. The rinse solution thus collected is collected, and the collected rinse solution is refluxed to the rinse tank through the second reflux pipe. Here, the recovery tank includes a third temperature sensor that detects the temperature in the recovery tank, and the third cooler uses the third temperature sensor to steam in the rinse tank and the recovery tank. The inside of the collection tank is cooled so that a pressure difference is generated.

  In addition to the above-described configuration, the cleaning device of the present invention further includes a water separation tank that separates moisture in the rinse liquid collected by the collection tank, and the rinse liquid that has passed through the water separation tank is supplied to the second reflux pipe. It is made to return to a rinse tank through.

  In addition to the above configuration, the cleaning apparatus of the present invention includes a separator that separates a rinse liquid containing a cleaning liquid into a cleaning liquid and a rinse liquid, a cleaning liquid separated by the separator, and an atmospheric distillation unit. And a pool tank for accumulating a rinse liquid containing the distilled cleaning liquid and allowing the rinse liquid to flow into the separator again. Here, the pool tank includes a lower limit sensor that detects the lower limits of the liquid levels of the cleaning liquid and the rinse liquid, and allows the separated cleaning liquid to flow into the vacuum distiller according to the detection result of the lower limit sensor.

  According to the cleaning apparatus of the present invention, the organic material attached to the mask used for vapor deposition can be appropriately removed in the vapor deposition step of the organic material for organic EL.

  Therefore, even if the same mask is used repeatedly, an overhang made of the organic material is not formed at the periphery of the mask hole, so that the hole is not narrowed. As a result, it can suppress as much as possible that the precision of vapor deposition of an organic material falls.

  Further, since the same mask can be used in the vapor deposition process of the organic material, it is possible to avoid as much as possible the increase in cost due to replacement with an unused mask as seen in the conventional vapor deposition process. . In addition, since it is not necessary to discard the used mask, it is possible to suppress environmental pollution related to the disposal as much as possible.

  Next, the cleaning apparatus according to the embodiment of the present invention will be described. In addition, the mask which is a to-be-cleaned body shall be the mask 10 similar to what is used in the conventional vapor deposition process shown in FIG. 15 thru | or FIG. That is, the mask is made of a metal thin film in which holes 11 each having a length and width of about several microns are formed along a predetermined pattern in which an organic material is formed. This metal thin film is made of, for example, nickel (Ni), iron (Fe), or the like. A metal frame 12 made of, for example, nickel (Ni) and iron (Fe) is fixed to the edge of the mask. The metal frame 12 has a locking portion 13. Hereinafter, the mask 10 fixed to the metal frame 12 is abbreviated as “mask 10”.

  In the cleaning apparatus according to the present embodiment, the organic material for organic EL is attached to the mask 10 made of a metal thin film used for vapor deposition in a vapor deposition process in which the organic material for organic EL is vapor-deposited on the insulating substrate on which the driving TFT is formed. Is to be removed. The overall configuration of the cleaning apparatus according to the present embodiment is broadly divided into a cleaning system for removing the organic EL organic material attached to the mask 10 and a transport system for transporting the mask 10.

  First, the configuration of the cleaning system of the cleaning apparatus according to the present embodiment will be described with reference to the drawings. FIG. 1 is a diagram illustrating a cleaning system of the cleaning apparatus according to the present embodiment. In FIG. 1, components relating to the transport system are omitted.

  As shown in FIG. 1, the cleaning system of the cleaning apparatus according to the present embodiment includes first and second cleaning tanks 21 and 22 for cleaning a mask 10 with a predetermined cleaning liquid, and first and second cleaning tanks. First and second rinsing tanks 51 and 52 for rinsing the mask 10 that has been cleaned in 21 and 22 with a predetermined rinsing liquid are provided.

  Note that the predetermined cleaning liquid is, for example, a hydrocarbon (HC) -based cleaning liquid. The predetermined rinsing liquid is a fluorine (F) -based solvent having a lower boiling point than the cleaning liquid, and is, for example, hydrofluoroether (HFE). The specific gravity of the rinse liquid is large with respect to moisture. Further, by rinsing the cleaning liquid having a large surface tension with the rinsing liquid having a small surface tension, the rinsing enters into a finer area and has an effect of reliably capturing the cleaning liquid.

  Next, the structure which concerns on the 1st and 2nd washing tanks 21 and 22 among the washing | cleaning systems of the washing | cleaning apparatus which concerns on this embodiment is demonstrated.

  The cleaning apparatus includes an overflow tank 23 that stores the cleaning liquid overflowed from the first cleaning tank 21 in the first cleaning tank 21. In addition, the cleaning device includes a vacuum distiller 30 for extracting only the cleaning liquid by so-called vacuum distillation from the cleaning liquid containing the organic material removed from the mask 10 by the cleaning process. The cleaning liquid containing the organic material overflows from the first cleaning tank 21 to the overflow tank 23 and flows into the vacuum distiller 30 from the overflow tank 23. The organic material precipitated on the bottom of the vacuum still 30 is cooled in the cooling pot 30r and discharged to the outside.

  In the above-described distillation of the cleaning liquid, the cleaning liquid is heated and distilled in a vacuum state. Thereby, the boiling point of about 155 ° C. of the cleaning liquid can be reduced, and the heating temperature during distillation can be reduced as much as possible.

  In addition, the cleaning device includes a first cooler 31 that cools the cleaning solution vacuum-distilled by the vacuum still 30 to room temperature. The cleaning liquid cooled to room temperature by the first cooler 31 returns to the second cleaning tank 22 through the first reflux pipe 101.

  In the present application, the room temperature is “10 ° C. to 40 ° C.”, preferably “20 ° C. to 30 ° C.”, more preferably about 25 ° C.

  The cleaning treatment of the mask 10 can be performed at room temperature by vacuum distillation, cooling, and refluxing of the cleaning liquid as described above. Therefore, it is possible to suppress the mask 10 from being stressed or damaged due to heat-induced stress as much as possible.

  Further, the first and second cleaning tanks 21 and 22 described above are provided with a first ultrasonic vibrator (not shown) for vibrating the cleaning liquid so that the cleaning liquid reliably reaches the surface of the mask 10. . Further, in order to cope with an increase in the temperature of the cleaning liquid due to the vibration of the first ultrasonic vibrator, the first and second cleaning tanks 21 and 22 are provided with a first for finely adjusting the temperature of the cleaning liquid to room temperature. A temperature regulator 40 is provided.

  Here, the 1st temperature regulator 40 is provided with the 1st heat exchanger 40h and the pump 42, The washing | cleaning liquid of the 1st and 2nd washing tanks 21 and 22 is carried out by the said 1st heat exchanger 40h. Cooling. The first temperature controller 40 determines whether the cleaning liquid cooled by the first heat exchanger 40h flows into the first and second cleaning tanks 21 and 22 via the pump 42. Finely adjust the temperature of the cleaning liquid in each tank to room temperature.

  The cleaning liquid is circulated and filtered through a filter. In addition, as shown in FIG. 1, you may provide a filter in the path | route of the circulation, ie, the path | route of the washing tank 21, the 1st temperature regulator 40, the pump 42, and the washing tank 21, However, The filter is the path | route. As a separate path, a path provided along with the path, that is, a path of the cleaning tank 21, the filter, the pump 42, and the cleaning tank 21 may be provided.

  As described above, the temperature of the cleaning liquid in the first and second cleaning tanks 21 and 22 can be finely adjusted by the first temperature controller 40.

  Next, the structure which concerns on the 1st and 2nd rinse tanks 51 and 52 among the washing | cleaning systems of the washing | cleaning apparatus which concerns on this embodiment is demonstrated.

  The cleaning apparatus includes an overflow tank 53 that stores the rinse liquid overflowed from the first rinse tank 51 in the first rinse tank 51.

  In addition, the cleaning apparatus is configured so that the second cleaning tank 22 brought into the first rinsing tank 51 through the mask 10 and the rinsing liquid containing impurities such as a small amount of organic material are used at normal pressure under normal pressure. An atmospheric distillation unit 60 is provided for removing the impurities by distillation. The rinse liquid overflows from the first rinse tank 51 to the overflow tank 53 and flows from the overflow tank 53 into the atmospheric distillation unit 60.

  If the boiling point of the rinse liquid described above is about 60 ° C., for example, it is not necessary to perform vacuum distillation for lowering the boiling point as in the case of distillation of a cleaning liquid having a boiling point of about 160 ° C. Therefore, atmospheric distillation is performed in the atmospheric distiller 60 under normal pressure (atmospheric pressure). The rinse liquid evaporated during the distillation is liquefied by the trap coil 60t having a temperature for liquefying the rinse liquid.

  In addition, the cleaning device includes a second cooler 61 that cools the rinse solution distilled at atmospheric pressure by the atmospheric distillation device 60 to room temperature. The rinse liquid cooled to room temperature by the second cooler 61 is refluxed to the second rinse tank 52 through the second reflux pipe 102.

  Here, a water separation tank 80 is provided between the second cooler and the second reflux pipe 102. This water separation tank 80 separates the rinse liquid containing moisture through atmospheric distillation into moisture and rinse liquid. The rinse liquid is refluxed to the second rinse tank 52 through the second reflux pipe 102 after the moisture is separated.

  In addition, the cleaning device includes a recovery tank 54 that recovers the rinse liquid evaporated from the first rinse tank 51 or the second rinse tank 52. For example, the temperature in the recovery tank 54 may be set such that the ratio of the vapor pressure in the second rinse tank 52 and the vapor pressure in the recovery tank 54 is 150: 1 to 10: 1. The collection tank 54 includes a third cooler 55. The third cooler 55 cools the recovery tank 54 to, for example, about 25 ° C. below zero, so that the vapor pressure of the recovery tank 54 is approximately 100 than the vapor pressure of the first rinse tank 51 or the second rinse tank 52. The evaporated rinse liquid flows into the recovery tank 54. The rinsing liquid that has flowed into the recovery tank 54 flows into the water separation tank 80, and after being separated from the water contained therein, returns to the second rinse tank 52 through the second reflux pipe 102.

  The atmospheric pressure distillation, cooling, and refluxing of the rinsing liquid as described above enables the rinsing process of the mask 10 to be performed at room temperature. Therefore, it is possible to suppress the mask 10 from being stressed or damaged due to heat-induced stress as much as possible.

  Further, in the above-described cleaning apparatus, since the mask 10 immersed in the cleaning liquid is immersed in the rinsing liquid, a small amount of the cleaning liquid moves to the rinsing liquid in the first rinsing tank 51 through the mask 10 and is mixed with the rinsing liquid. The Therefore, this cleaning apparatus includes a separator 90 that separates the rinse liquid containing the cleaning liquid into the cleaning liquid and the rinse liquid. The separator 90 evaporates the rinse liquid containing the cleaning liquid, and then liquefies and collects only the evaporated rinse liquid by cooling with a cooler or the like. The rinse liquid thus separated flows into the water separation tank 80, and after the water contained therein is separated, returns to the second rinse tank 52 through the second reflux pipe 102.

  Further, the cleaning device accumulates the cleaning liquid separated by the separator 90 and the rinsing liquid (containing the cleaning liquid) before being subjected to atmospheric distillation flowing from the atmospheric distillation apparatus 60 and flows into the separator 90 again. A pool tank 91 is provided.

  Here, the pool tank 91 includes an upper limit sensor 91f that detects the upper limit of the liquid level of the cleaning liquid and the rinse liquid that flows in and accumulates, and a lower limit sensor 91e that detects the lower limit of the liquid level. Then, by opening and closing the valve 60b, the rinsing liquid from the atmospheric distillation unit 60 is caused to flow into the pool tank 91 until the upper limit sensor 91f detects the liquid level and the inflow is stopped, and then the rinsing liquid containing the cleaning liquid is removed. The cleaning liquid and the rinsing liquid are separated from each other by flowing into the separator 90.

  The flow of the rinsing liquid into the separator 90 is stopped when the liquid level of the rinsing liquid in the pool tank 91 is detected by the lower limit sensor 91e, and the rinsing liquid from the atmospheric distillation unit 60 is again used as the upper limit sensor. It flows into the pool tank 91 until 91f detects the liquid level and stops the inflow. Then, the rinse liquid containing the cleaning liquid is caused to flow into the separator 90. As the number of times of repeating the separation of the cleaning liquid and the rinsing liquid increases, the rinsing liquid accumulated in the pool tank 91 includes a large amount of the cleaning liquid flowing in from the separator 90 and accumulating in the pool tank 91. become. For this reason, the speed at which the rinse liquid containing the cleaning liquid is evaporated and separated by the separator 90 is reduced.

  Therefore, in the pool tank 91, the time from the start of separation by the separator 90 until the liquid level of the rinse liquid reaches the lower limit is measured based on the detection result of the lower limit sensor 91e, and the arrival time is shorter than a predetermined time. When it becomes long, the washing | cleaning liquid contained in the rinse liquid in the said pool tank is considered to be a saturated state, and isolation | separation by the separator 90 is complete | finished. After the separation by the separator 90 is completed, the separated cleaning liquid in the pool tank 91 flows into the vacuum still 30.

  By the treatment as described above, the cleaning liquid contained in the rinsing liquid can be separated and only the rinsing liquid can be reused.

  Further, the first and second rinse tanks 51 and 52 described above include a second ultrasonic vibrator (not shown) for vibrating the rinse liquid so that the rinse liquid reliably reaches the surface of the mask 10. ing. Furthermore, in order to cope with an increase in the temperature of the rinsing liquid due to the vibration of the second ultrasonic vibrator, the first and second rinsing tanks 51 and 52 are configured to adjust the temperature of the rinsing liquid to room temperature. Two temperature regulators 70 are provided.

  Here, the 2nd temperature regulator 70 is provided with the 2nd heat exchanger 70h and the pump 72, The rinse liquid of the 1st and 2nd rinse tanks 51 and 52 by the said 2nd heat exchanger 70h. Cool down. The second temperature controller 70 determines whether the rinse cleaning liquid cooled by the second heat exchanger 70h flows into the first and second rinse tanks 51 and 52 via the pump 72. Finely adjust the temperature of the rinse liquid in each tank to room temperature.

  As described above, the temperature of the rinse liquid in the first and second rinse tanks 51 and 52 can be finely adjusted by the second temperature controller 70.

  Next, the detailed structure in each tank of the 1st and 2nd washing tanks 21 and 22 and the 1st and 2nd rinse tanks 51 and 52 is demonstrated. FIG. 2 is a cross-sectional view illustrating the first and second cleaning tanks 21 and 22. FIG. 3 is a cross-sectional view illustrating the first and second rinse tanks 51 and 52 and the recovery tank 54. 2 and 3, the overflow tanks 23 and 53 are not shown.

  As shown in FIG. 2, the first and second cleaning tanks 21 and 22 include first ultrasonic vibrators 21a and 22a, first stirrers 21b and 22b, and first temperature sensors 21c and 22c, respectively. , And movable first submerged carriers 21d, 22d. Here, the first ultrasonic vibrators 21a and 22a may apply vibration to the cleaning liquid so as to face the mask so that the cleaning liquid surely reaches the surface of the mask 10. The effect of the first ultrasonic vibrators 21a and 22a is greater in the case of the so-called single wafer type in which the masks are washed one by one than in the case of the so-called batch type in which the cleaning is performed. The first stirrers 21b and 22b stir the cleaning liquid so that the cleaning liquid flows in the first and second cleaning tanks 21 and 22, respectively.

  The first temperature sensors 21c and 22c use the temperature of the cleaning liquid as a reference temperature when the temperature of the cleaning liquid in the first and second cleaning tanks 21 and 22 is adjusted by the first temperature controller 40. It is to detect. Further, the first submerged carriers 21d and 22d have a function of holding the mask 10 and immersing it in the cleaning liquid when the mask 10 is cleaned. The first submerged carriers 21d and 22d preferably have a swinging function that vibrates the entire mask 10 in the vertical direction so that the rinsing liquid reliably reaches the surface of the mask 10.

  As described above, in the first and second cleaning tanks 21 and 22, the vibration of the cleaning liquid by the first ultrasonic vibrators 21a and 22a, the stirring of the cleaning liquid by the first stirrers 21b and 22b, and the first As the mask 10 is swung by the liquid carriers 21d and 22d, the cleaning process of the mask 10 by the cleaning liquid is surely performed.

  Similarly, as shown in FIG. 3, the 1st and 2nd rinse tanks 51 and 52 are respectively 2nd ultrasonic vibrator 51a, 52a, 2nd stirrer 51b, 52b, 2nd temperature sensor. 51c, 52c, and movable second submerged carriers 51d, 52d. Here, the second ultrasonic vibrators 51 a and 52 a are vibrators that vibrate the rinse liquid so that the rinse liquid surely reaches the surface of the mask 10. The second stirrers 51b and 52b stir the rinse liquid so that the rinse liquid flows in the first and second rinse tanks 51 and 52.

  Further, the second temperature sensors 51c and 52c are used as reference temperatures when the temperature of the rinse liquid in the first and second rinse tanks 51 and 52 is adjusted by the second temperature regulator 70. It detects temperature. The second submerged carriers 51d and 52d have a function of holding the mask 10 and immersing it in the rinsing liquid when the mask 10 is rinsed. The second submerged carrier 51d preferably has a swinging function that vibrates the entire mask 10 in the vertical direction so that the rinsing liquid reliably reaches the surface of the mask 10.

  The recovery tank 54 that is electrically connected to the second rinse tank 52 includes a third cooler 55 and a third temperature sensor 54c. The third cooler 55 cools the collection tank 54 to a temperature lower than that of the first and second rinse tanks 51 and 52 according to the detection result of the third temperature sensor 54c. As described above, the cooling temperature is, for example, about 25 ° C. below zero. The evaporated rinse liquid guided to the recovery tank 54 is liquefied by a so-called trap coil 54 t and recovered in the recovery tank 54.

  In addition, the third and fourth temperature regulators 57 and 58 and the two fourth temperature sensors 50c are provided above the surface of the rinse liquid in the first and second rinse tanks 51 and 52, respectively. Yes. The third temperature regulator 57 cools the temperature above the surface of the rinsing liquid in the first and second rinsing tanks 51 and 52 to, for example, about 10 ° C. below zero, whereby the evaporated rinsing liquid is A first air layer 59a that suppresses diffusion outside the second rinse tanks 51 and 52 is formed. The fourth temperature regulator 58 adjusts the temperature above the first air layer 59a to a temperature slightly higher than room temperature, and the atmosphere outside the first and second rinse tanks 51 and 52 A second air layer 59b that inhibits the flow into the tank is formed.

  Here, the temperature adjustment by the third and fourth temperature regulators 57 and 58 is preferably performed according to the temperature detection results by the two fourth temperature sensors 50c. When the temperature adjustment by the third and fourth temperature regulators 57 and 58 is adjusted to a predetermined temperature set in advance, any one or all of the two fourth temperature sensors 50c are , May be omitted.

  As described above, in the first and second rinse tanks 51 and 52, the vibration of the rinse liquid by the second ultrasonic vibrators 51a and 52a, the stirring of the rinse liquid by the second stirrers 51b and 52b, and the first The rinsing process of the mask 10 with the rinsing liquid is surely performed by the swing of the mask 10 by the second submerged carriers 51d and 52d.

  Moreover, since the 3rd and 4th temperature regulators 57 and 58 are provided above the liquid level of the rinse liquid of the 1st and 2nd rinse tanks 51 and 52, the 1st and 2nd rinse tank 51 is provided. , 52 can be recovered by the recovery tank 54 without diffusing into the atmosphere.

  Next, the flow of the cleaning liquid in the cleaning system of the cleaning apparatus according to the present embodiment will be described. When the mask 10 is immersed in the first cleaning tank 21 and then the second cleaning tank 22 and the cleaning process is performed, the organic material removed from the mask 10 is mixed with the cleaning liquid. Then, when the cleaning liquid refluxed through the first reflux pipe 101 flows into the second cleaning tank 22, the cleaning liquid in the first and second cleaning tanks 21 and 22 overflows into the first overflow tank 23. The overflow cleaning liquid flows into the vacuum still 30. Here, the inside of the vacuum distiller 30 is decompressed to, for example, about 0.8 atm, and heated to, for example, about 120 ° C., and the vacuum distillation of the cleaning liquid is performed. The organic material precipitated on the bottom of the vacuum still 30 is cooled in the cooling pot 30r and periodically discharged to the outside.

  The boiling point of this cleaning liquid is, for example, about 160 ° C. However, by heating and distilling the cleaning liquid in a vacuum state, the boiling point can be reduced and the heating temperature during distillation can be decreased to, for example, about 120 ° C. it can. Moreover, since the said distillation is vacuum distillation, a washing | cleaning liquid does not contain a water | moisture content in the process of distillation.

  The cleaning liquid from which the organic material has been removed by vacuum distillation is cooled to room temperature by the first cooler 31, and refluxed to the second cleaning tank 22 through the first reflux pipe 101.

Further, a part of the cleaning liquid in the first and second cleaning tanks 21 and 22 is cooled by the first heat exchanger 40h provided in the first temperature regulator 40, and the cooled cleaning liquid is
It flows appropriately into the second cleaning tank 22 via the pump 42.

  Next, the flow of the rinse liquid in the cleaning system of the cleaning apparatus according to the present embodiment will be described. When the mask 10 is immersed in the first rinse tank 51 and then the second rinse tank 52 and the rinse treatment is performed, the cleaning liquid removed from the mask 10 is mixed with the rinse liquid. When the rinse liquid refluxed through the second reflux pipe 102 flows into the second rinse tank 52, the rinse liquids in the first and second rinse tanks 51 and 52 overflow into the second overflow tank 53.

  This overflow rinse liquid flows into the atmospheric distillation unit 60. Here, since the boiling point of the rinsing liquid is, for example, 60 ° C., there is no need to perform vacuum distillation for lowering the boiling point, for example, distillation of a cleaning liquid having a boiling point of about 160 ° C. Therefore, the inside of the atmospheric distillation apparatus 60 is heated to, for example, about 65 ° C., which exceeds the boiling point, under atmospheric pressure (atmospheric pressure), for example, and the atmospheric distillation of the rinsing liquid is performed.

  By this atmospheric distillation, impurities such as an organic material contained in the rinsing liquid (carrying through the mask 10 to which the cleaning liquid is attached) are removed. The atmospherically distilled rinse liquid is mixed with water in the process of atmospheric distillation, but is separated into water and rinse liquid using a specific gravity larger than the water. The rinse liquid is cooled to room temperature by the second cooler 62 and flows into the water separation tank 80.

  The rinse liquid from which water has been further removed in the water separation tank 80 is refluxed to the second rinse tank 52 through the second reflux pipe 102.

  In addition, a portion of the rinse liquid that has flowed into the atmospheric distillation apparatus 60 but has not been subjected to atmospheric distillation, that is, a rinse liquid that contains a small amount of cleaning liquid (mixed with the rinse liquid through the mask 10), corresponds to the opening and closing of the valve 60b. Flows into the pool tank 91. After the rinse liquid flows into the pool tank 91 and satisfies the upper limit of the pool tank 91, the valve 60b is closed and the flow of the rinse liquid is stopped. Then, the rinse liquid in the pool tank 91 flows into the separator 90, and separation of the rinse liquid and the cleaning liquid is started.

  When the liquid level of the rinse liquid in the pool tank 91 is detected by the lower limit sensor 91e, the valve 60b is opened again, and the rinse liquid flows into the pool tank 91 from the atmospheric distillation unit 60.

  The rinsing liquid separated by the separator 90 uses the specific gravity larger than the water to remove the water in the water separation tank 80 and then returns to the second rinse tank 52 through the second reflux pipe 102. In addition, the cleaning liquid separated by the separator 90 flows into the pool tank 91.

  As such separation of the cleaning liquid and the rinsing liquid is repeated, the rinsing liquid accumulated in the pool tank 91 contains a large amount of the cleaning liquid flowing in from the separator 90 and accumulating in the pool tank 91. For this reason, the speed at which the rinse liquid containing the cleaning liquid is evaporated and separated by the separator 90 is reduced.

  Therefore, based on the detection result of the lower limit sensor 91e with respect to the liquid level of the rinse liquid in the pool tank 91, the time from the start of separation by the separator 90 until the liquid level of the rinse liquid reaches the lower limit is measured. When the time is longer than the time, the cleaning liquid contained in the rinse liquid in the pool tank 91 is considered to be saturated, and the separation by the separator 90 is completed. Then, the valve 91 b that has been closed until then is opened, and the separated cleaning liquid in the pool tank 91 flows into the vacuum still 30.

  The rinse liquid evaporated from the first and second rinse tanks 51 and 52 is cooled by the third cooler 55 to, for example, about 25 ° C. below zero, which is lower than that of the first and second rinse tanks 51 and 52. It is guided to the recovery tank 54 and recovered. The rinse liquid collected in the collection tank 54 flows into the water separation tank 80, moisture is removed using the specific gravity of about 1.5, and the second rinse pipe 52 passes through the second reflux pipe 102 to the second rinse tank 52. Reflux.

  Next, the conveyance system of the cleaning apparatus according to the present embodiment will be described with reference to the drawings. 4 to 8 and FIGS. 11 to 14 are cross-sectional views for explaining a transport system of the cleaning apparatus according to the present embodiment. 9 and 10 are perspective views for explaining a transport system of the cleaning apparatus according to the present embodiment. In FIGS. 4 to 14, only some components necessary for the description of the transport system are illustrated as components related to the cleaning system.

  As shown in FIGS. 4 to 14, the transport system of the cleaning apparatus according to the present embodiment includes a cassette 210 that is installed on a stage 200 and stores a plurality of masks 10 in the horizontal direction, and one mask 10 from the cassette 210. A first transfer device 220 having a first arm 221 for taking out the second, a second transfer device 230 having a second arm for gripping the mask 10, and first and second cleaning tanks 21, 22. And a transfer device 240 that transfers the mask 10 to the first and second rinse tanks 51 and 52. Here, the transport device 240 has a flange 242 for holding one side of the mask 10 when the mask 10 is transported.

  Next, the operation of the transport system of the cleaning apparatus according to this embodiment will be described. First, as shown in FIG. 4, the first arm 221 of the first transfer device 220 expands and contracts to take out one mask 10 from the cassette 210. Next, as shown in FIG. 5, the first transfer device 220 lowers the first arm 221 to place the mask 10 at a predetermined position on the stage 200. Next, as shown in FIG. 6, the second transfer device 230 grips the mask 10 with the second arm 231, and further places the mask 10 on the transport device 240 as shown in FIG. 7.

  As shown in FIG. 8, the transfer device 240 on which the mask 10 is placed rises up to a vertical state by rotating about 90 degrees in the vertical direction. In addition, the mask 10 placed on the transfer device 240 also rises simultaneously by rotating about 90 degrees in the vertical direction. The state of the transfer device 240 and the mask 10 placed thereon is shown in the perspective view of FIG.

  As described above, since the transfer device 240 and the mask 10 are in a vertical state, stress (stress caused by gravity on the metal thin film or stress caused by liquid oscillation) is applied to the metal thin film constituting the mask 10. In addition, it is possible to avoid metal fatigue and damage as much as possible. Further, the mask 10 is stood in the vertical direction, so that there is an effect that the liquid breakage is improved.

  Note that the angle at which the transfer device 240 and the mask 10 rotate does not necessarily need to be about 90 degrees. That is, if the angle is such that metal fatigue and damage do not occur as much as possible in the metal thin film constituting the mask 10 due to the stress caused by gravity, the transfer device 240 and the mask 10 should be at angles other than horizontal and vertical. May rotate.

  Further, as shown in the perspective view of FIG. 10, the holder 241 provided in advance in the transport device 240 is fitted to the locking portion 13 of the mask 10 so as to be fitted to the locking portion 13 of the mask 10. Crimped. As a result, the mask 10 is sandwiched and held between the holder 241 and the flange 242 of the transfer device 240 without damaging the surface of the metal thin film.

  The mask 10 thus held on the transporting device 240 together with the transporting device 240 is a cleaning system of the cleaning device, that is, the first and second cleaning tanks 21 and 22 (and the first and second rinsing tanks 51 and 52). ). Here, at the time of the conveyance, the conveyance device 240 continuously moves in the vertical direction and the horizontal direction as shown in the cross-sectional view of FIG. Then, it moves along a predetermined trajectory of a curve that approximates an arc shape. In the figure, A, B, and C indicate vertical positions (heights) above the surface of the cleaning liquid or rinsing liquid.

  Due to the movement of the transfer device 240 having such a predetermined trajectory, the mask 10 made of a metal thin film is subjected to metal fatigue or the like due to stress caused by an impact when the movement is switched from the vertical direction to the horizontal direction or from the horizontal direction to the vertical direction. It is possible to avoid the occurrence of damage as much as possible.

  Further, the conveying device 240 moves at a predetermined speed. This predetermined speed is assumed to be a speed that does not cause metal fatigue or damage to the mask 10 made of the metal thin film due to wind pressure or stress caused by impact when the transport device 240 moves. Or the said predetermined speed is a predetermined speed which does not promote evaporation of the rinse liquid in the 1st and 2nd rinse tanks 51 and 52 by the disturbance of the airflow which arises when the conveying apparatus 240 moves. And

  Next, as shown in FIG. 12, the transfer device 240 on which the mask 10 is placed is transferred onto the first cleaning tank 21. As shown in FIG. 13, the first submerged carrier 21d provided in the first cleaning tank 21 rises above the liquid surface of the cleaning liquid. Then, after the first submerged carrier 21d rises to the same position as the transport device 240, or after the transport device 240 moves to the same position as the submerged carrier 21d raised above the liquid level of the cleaning liquid, The pressure bonding of the holder 241 of the device 240 is released, and the mask 10 is transferred to the submerged carrier 21d.

  After that, as shown in FIG. 14, the first submerged carrier 21d on which the mask 10 is placed descends into the cleaning liquid, and the mask 10 is immersed in the cleaning liquid. Further, when the mask 10 is taken out from the cleaning liquid, the processes shown in FIGS. 14, 13, and 12 are performed in this order. Then, similarly to the case of the first cleaning tank 21 shown in FIGS. 12 to 14, the transfer device 240 on which the mask 10 is placed is transferred onto the second cleaning tank 22. Then, after the mask 10 is immersed in the cleaning liquid through the first liquid carrier 21d, the mask 10 is taken out.

  As described above, when the mask 10 is immersed in the cleaning liquids of the first and second cleaning tanks 21 and 22, the cleaning process can be performed without immersing the transport device 240 in the cleaning liquid. That is, it is possible to prevent the cleaning liquid from adhering to the transport device 240 as much as possible. Therefore, it is possible to avoid as much as possible that the cleaning liquids in the first and second cleaning tanks 21 and 22 are conveyed to the rinsing liquids in the first and second rinsing tanks 51 and 52 via the transport device 240.

  Next, similarly to the case of the first cleaning tank 21 shown in FIGS. 12 to 14, the transfer device 240 on which the mask 10 is placed is transferred onto the first rinse tank 51. And after the mask 10 is immersed in the rinse liquid through the 2nd liquid carrier 51d, it is taken out. Further, the transfer device 240 on which the mask 10 is placed is transferred onto the second rinse tank 52. Then, the mask 10 is taken out after being immersed in the rinsing liquid via the second liquid carrier 52d.

  As described above, when the mask 10 is immersed in the rinsing liquids of the first and second rinsing tanks 51 and 52, the rinsing process can be performed without immersing the transport device 240 in the rinsing liquid. That is, it is possible to avoid the rinse liquid from adhering to the transport device 240 as much as possible. Therefore, when the cleaning process is performed again, it is possible to avoid as much as possible that the rinse liquid adheres to the transport device 240 and the rinse liquid is carried to the cleaning liquid in the first and second cleaning tanks 21 and 22.

  In addition, when the mask 10 is immersed in the cleaning liquid or the rinsing liquid, the transfer device 240 described above preferably moves according to the trajectories 1 to 4 in FIG. That is, first, the conveying device 240 moves from A to B along the trajectory 1 and pauses. At the time of the stop, it is not stopped suddenly, but stopped while gradually decelerating so that the aforementioned stress is not applied to the mask. Then, after the unillustrated submerged carriers 21d, 22d, 51d, and 52d rise to the height of B, the transfer device 240 delivers the mask 10 to the submerged carriers 21d, 22d, 51d, and 52d, while transferring the mask 10 from B to C. Move to the height of. Thereafter, the conveying device 240 moves in the horizontal direction according to the trajectory 3 so as to leave the submerged carriers 21d, 22d, 51d, and 52d. Further, the conveying device 240 moves in the vertical direction along the locus 4 so as to return to the height of A.

  In addition, the transfer device 240 described above preferably moves according to the trajectories 5 to 8 in FIG. 11 when the mask 10 is taken out of the cleaning liquid or the rinse liquid. That is, first, the transport device 240 moves from A to C along the trajectory 5. Next, it moves in the horizontal direction according to the locus 6 so as to approach the submerged carriers 21d, 22d, 51d, and 52d. Thereafter, the conveying device 240 moves from C to B along the locus 7 and stops temporarily. After that, the transfer device 240 moves from the submerged carrier 21d, 22d, 51d, 52d rising to the height of B so as to scoop up the mask 10 and moves from B to the height of A according to the trajectory 8. Moving. Also at this time, it is preferable to gradually increase the moving speed so that the conveying device 240 does not move rapidly upward. By doing so, the transfer device 240 can move without applying the stress described above to the mask.

  Here, after the transport device 240 transports one mask 10 to one of the first and second cleaning tanks 21 and 22 or the first and second rinse tanks 51 and 52, the transport is performed. Another mask 10 different from the completed mask 10 may be transferred to another tank.

  Finally, the transfer device 240 on which the mask 10 is placed is transferred to the vacuum dryer 99 shown in FIG. 1 and dried.

  As described above, the trajectories 1 and 8 shown in FIG. 11 are moved so as to form an arc, the trajectory 1 is gradually decelerated, and the trajectory 8 is moved. By gradually increasing the speed (upward direction), the stress applied to the mask 10 can be reduced. Further, the movement of the transfer device 240 when the mask 10 is not transferred may be prevented from colliding with the side wall of the liquid tank or the carrier in liquid, may be arcuate, or may move rapidly.

  In the above-described embodiment, the cleaning liquid and the rinse liquid are the hydrocarbon-based cleaning liquid and the fluorine-based rinse liquid, but the present invention is not limited to this. That is, the cleaning liquid and the rinsing liquid can be subjected to a cleaning process (removal of organic materials for organic EL) and a rinsing process on the mask 10, and are the same as the hydrocarbon-based cleaning liquid and the fluorine-based rinsing liquid. As long as it has the boiling point of and the specific gravity with respect to water | moisture content, the washing | cleaning liquid and rinse liquid other than the above may be sufficient.

  In the embodiment described above, the mask 10 is a metal thin film made of nickel (Ni) and iron (Fe), but the present invention is not limited to this. That is, the present invention is also applied when the mask 10 is made of a metal other than the metal thin film or a resin.

It is a figure explaining the washing | cleaning system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is a figure explaining the washing | cleaning system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is a figure explaining the washing | cleaning system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is a perspective view explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is a perspective view explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus which concerns on embodiment of this invention. It is a top view explaining the mask for organic EL which concerns on a prior art example. It is sectional drawing along the XX line of FIG. It is sectional drawing along the YY line of FIG. It is sectional drawing of the mask in which the organic material was vapor-deposited.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Organic material 1a Overhang 10 Mask 11 Hole 12 Metal frame 13 Locking part 21 1st washing tank 22 2nd washing tank 21a, 22a 1st ultrasonic vibrator 21b, 22b 1st stirrer 21c, 22c 1st temperature sensor 21d, 22d 1st submerged carrier 30 Vacuum distiller 31 1st cooler 40 1st temperature regulator 51 1st rinse tank 52 2nd rinse tank 51a, 52a 2nd super Sonic vibrators 51b, 52b Second stirrers 51c, 52c Second temperature sensors 51d, 52d Second submerged carrier 54 Recovery tank 55 Third cooler 60 Atmospheric distiller 61 Second cooler 70 First 2 temperature controller 80 water separation tank 90 separator 91 pool tank 91f upper limit sensor 91e lower limit sensor 101 first reflux pipe 102 second reflux pipe 200 stage 210 cassette 20 first transfer device 230 the second transfer device 240 conveying device 241 holder 242 hook

Claims (14)

A cleaning device for removing an organic EL organic material attached to a mask,
A cleaning tank for cleaning the mask with a predetermined cleaning liquid;
A vacuum still for vacuum distillation of the cleaning liquid overflowed from the cleaning tank;
A first cooler that cools the cleaning solution vacuum distilled by the vacuum still to room temperature;
A first reflux pipe for refluxing the cleaning liquid cooled by the first cooler to the cleaning tank;
A rinsing tank for rinsing the mask cleaned in the cleaning tank with a predetermined rinsing liquid;
An atmospheric distiller for distilling the rinse liquid overflowed from the rinse tank under atmospheric pressure;
A second cooler that cools the rinse solution that has been atmospherically distilled in the atmospheric distillation device to room temperature;
A cleaning apparatus comprising: a second reflux pipe for refluxing the rinse liquid cooled by the second cooler to the rinse tank. The cleaning apparatus according to claim 1, further comprising a first ultrasonic vibrator that vibrates the cleaning liquid in the cleaning tank. A first temperature sensor for detecting the temperature of the cleaning liquid in the cleaning tank;
The cleaning apparatus according to claim 2, further comprising: a first temperature controller that adjusts the cleaning liquid in the cleaning tank to room temperature according to a detection result of the first temperature sensor. The first temperature controller includes a first heat exchanger,
The first temperature regulator adjusts the temperature of the cleaning liquid in the cleaning tank by allowing the cleaning liquid cooled by the first heat exchanger to flow into the cleaning tank. 3. The cleaning apparatus according to 3. The cleaning apparatus according to claim 1, further comprising a second ultrasonic vibrator that vibrates the rinse liquid in the rinse tank. A second temperature sensor for detecting the temperature of the rinse liquid in the rinse tank;
The cleaning apparatus according to claim 5, further comprising: a second temperature controller that adjusts the rinse liquid in the rinse tank to room temperature according to a detection result of the second temperature sensor. The second temperature controller includes a second heat exchanger,
The second temperature regulator adjusts the temperature of the rinse liquid in the rinse tank by allowing the rinse liquid cooled by the second heat exchanger to flow into the rinse tank. The cleaning apparatus according to claim 6. A recovery tank having a third cooler;
The recovery tank recovers the rinse liquid evaporated in the rinse tank by being cooled by the third cooler,
The cleaning apparatus according to claim 1, wherein the rinse liquid recovered in the recovery tank is refluxed to the rinse tank through the second reflux pipe. The recovery tank is provided with a third temperature sensor for detecting the temperature in the recovery tank,
The said 3rd cooler uses the said 3rd temperature sensor, and cools the inside of the said collection tank so that a vapor | steam pressure difference may arise in the inside of the said rinse tank and the said collection tank. The cleaning device described. A water separation tank for separating water in the rinse liquid cooled by the second cooler;
The cleaning apparatus according to claim 1, wherein the rinse liquid that has passed through the water separation tank is refluxed to the rinse tank through the second reflux pipe. A water separation tank for separating water in the rinse liquid collected by the collection tank;
The cleaning apparatus according to claim 8 or 9, wherein the rinse liquid that has passed through the water separation tank is refluxed to the rinse tank through the second reflux pipe. A separator for separating the rinse liquid containing the cleaning liquid into the cleaning liquid and the rinse liquid;
The cleaning tank according to claim 1, further comprising a pool tank that accumulates a cleaning liquid separated by the separator and a rinsing liquid containing the cleaning liquid of the atmospheric distillation apparatus and allows the rinse liquid to flow into the separator again. apparatus. The pool tank includes a lower limit sensor that detects a lower limit of the liquid level of the cleaning liquid and the rinse liquid,
The cleaning apparatus according to claim 12, wherein the cleaning liquid separated is caused to flow into the vacuum distiller according to a detection result of the lower limit sensor. The predetermined rinsing liquid is a fluorinated solvent, according to any one of claims 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, and 13. Cleaning device.

Images