KR20060050923A - Cleaning apparatus - Google Patents

Abstract

An object of this invention is to provide the washing | cleaning apparatus which can remove the organic material for organic EL adhering to the mask which consists of a metal thin film. To this end, the cleaning apparatus of the present invention vacuum distills the first and second cleaning tanks 21 and 22 for cleaning the mask 10 with a predetermined cleaning liquid and the cleaning liquids of the cleaning tanks 21 and 22. The first reflux for refluxing the vacuum distillation 30, the first cooler 31 for cooling the vacuum distilled cleaning liquid to room temperature, and the cleaning liquid cooled by the first cooler 31 to the second cleaning tank 22. The tube 101, the first and second rinse tanks 51 and 52 for rinsing the mask 10 with a predetermined rinse liquid, and the rinse liquids of the rinse tanks 51 and 52 are distilled under normal pressure. A second cooler 61 for cooling the atmospheric distillation unit 60, an atmospheric distilled rinse liquid to room temperature, and a second for refluxing the rinse liquid cooled by the second cooler 61 to the second rinse tank 52. A reflux tube 102 is provided.

Organic materials, masks, metal frames, hooks, stirrers

Description

Cleaning device {CLEANING APPARATUS}

1 is a view for explaining a cleaning system of a cleaning device according to an embodiment of the present invention.

2 is a view for explaining a cleaning system of a cleaning device according to an embodiment of the present invention.

3 is a view for explaining a cleaning system of a cleaning device according to an embodiment of the present invention.

4 is a cross-sectional view illustrating a transport system of a cleaning device according to an embodiment of the present invention.

5 is a cross-sectional view illustrating a transport system of a cleaning device according to an embodiment of the present invention.

6 is a cross-sectional view illustrating a transport system of a cleaning device according to an embodiment of the present invention.

7 is a cross-sectional view illustrating a transport system of a cleaning device according to an embodiment of the present invention.

8 is a cross-sectional view illustrating a transport system of a cleaning device according to an embodiment of the present invention.

9 is a perspective view illustrating a transport system of a cleaning device according to an embodiment of the present invention.

10 is a perspective view illustrating a transport system of a cleaning device according to an embodiment of the present invention.

11 is a cross-sectional view illustrating a transport system of a cleaning device according to an embodiment of the present invention.

It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus concerning the Example of this invention.

It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus concerning the Example of this invention.

It is sectional drawing explaining the conveyance system of the washing | cleaning apparatus concerning the Example of this invention.

15 is a top view illustrating a mask for an organic EL according to a conventional example.

16 is a cross-sectional view taken along the line X-X of FIG. 15.

FIG. 17 is a cross-sectional view taken along the line Y-Y of FIG. 15; FIG.

18 is a cross-sectional view of a mask on which an organic material is deposited.

<Explanation of symbols for main parts of drawing>

1: organic material

1a: overhang

10: mask

11: hole

12: metal frame

13: hook

21: first washing tank

22: second washing tank

21a, 22a: first ultrasonic vibrator

21b, 22b: first stirrer

21c, 22c: first temperature sensor

21d, 22d: first liquid carrier

30: vacuum distiller

31: first cooler

40: first temperature regulator

51: first rinse tank

52: second rinse tank

51a, 52a: second ultrasonic vibrator

51b, 52b: second stirrer

51c, 52c: second temperature sensor

51d, 52d: second liquid carrier

54: recovery tank

55: third cooler

60: atmospheric distillation

61: second cooler

70: second temperature regulator

80: water separator

90: separator

91: pool

91f: upper limit sensor

91e: Lower limit sensor

101: first reflux pipe

102: second reflux pipe

200: stage

210: cassette

220: first mobile mounting apparatus

230: second mobile mounting apparatus

240: conveying device

241: Retention Jig

242: hook

[Patent Document 1] Japanese Patent Application Laid-Open No. 2004-103269

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus, and more particularly, to a cleaning apparatus for removing an organic material attached to a mask made of a metal thin film in a deposition step of an organic material for organic EL.

Recently, an organic EL display device using an organic electro luminescence (hereinafter referred to as "organic EL") element has attracted attention as a display device to replace a CRT or LCD. For example, the organic EL element Research and development of an organic EL display device equipped with a driving thin film transistor (hereinafter referred to as "TFT") for driving the LED is also in progress.

The organic EL device is, for example, an anode made of ITO, a first hole transport layer such as MTDATA (4,4-bis (3-methylphenylphenylamino) biphenyl), and TPD (4, 4, 4-tris (3-methylphenylphenylamino) triphenylanine A hole transporting layer composed of a second hole transporting layer, such as a), a light emitting layer made of Bebq ₂ (10-benzo [h] quinolinol beryllium complex) containing a quinacridone derivative, an electron transporting layer consisting of Bebq ₂ , and aluminum The negative electrode which consists of alloys etc. has a laminated structure in this order.

Such an organic EL element emits light by supplying a current through a driving TFT for driving the organic EL element. That is, excitons are generated by exciting holes injected from the anode and electrons injected from the cathode recombine within the light emitting layer to excite the organic molecules forming the light emitting layer. Light is emitted from the light emitting layer during the process of radiation deactivation, and the light is emitted to the outside through an insulating substrate such as a transparent anode and a glass substrate to emit light.

Among the layers of the organic EL device described above, the organic materials used for forming the hole transporting layer, the light emitting layer, and the electron transporting layer have low solvent resistance and are also weak in moisture. Therefore, photolithography techniques in semiconductor processes cannot be used. Therefore, the organic material is selectively deposited on an insulating substrate having a driving TFT by, for example, a deposition method using a mask made of a metal thin film (so-called shadow mask), and the hole transport layer, the light emitting layer, Pattern formation of the electron carrying layer and the cathode was performed.

An example of the mask used at the time of vapor deposition of such an organic material is shown in FIGS. 15-17. 15 is a top view illustrating an organic EL mask according to a conventional example. 16 is sectional drawing along the X-X line of FIG. 15, and FIG. 17 is sectional drawing along the Y-Y line of FIG. As shown in Figs. 15 to 17, the mask 10 includes, for example, nickel (Ni), iron (Fe), or the like, having a plurality of minute holes 11 each having a width and height of several micrometers. It consists of a thin metal film. Through these holes 11, the organic material is selectively deposited on the insulating substrate. Further, the mask 10 made of the metal thin film is fixed to a metal frame 12 made of nickel (Ni) and iron (Fe), for example, and the edge of the mask 10 is formed of the metal frame ( 12) is supported. In addition, a plurality of locking portions 13 for holding the metal frame 12 are formed at the corners of the metal frame 12. Hereinafter, the mask 10 fixed to the metal frame 12 is abbreviated as "mask 10."

Moreover, as related technical document, said patent document 1 is mentioned, for example.

When an organic EL element has three primary colors of red, green, and blue light emitting layers in response to color display, the vapor deposition step of the organic material is generally performed by repeatedly using a mask for each color. Therefore, as the number of repeated vapor depositions increases, the organic material is laminated on the surface of the mask 10 in any number of layers so as to adhere. That is, as shown in the cross-sectional view of the mask on which the organic material shown in FIG. 18 is deposited, the organic material 1 is not only on the surface of the mask 10 but also a plurality of holes through which the organic material 1 is allowed to pass through if it was originally. The overhang 1a is formed in the periphery of the hole 11 so that 11 may be blocked.

Thus, since the hole 11 of the mask 10 is narrowed by the overhang which consists of organic materials, the problem that the precision in the vapor deposition of the said organic material to the insulating substrate has arisen.

As a solution to the above-mentioned problem, there is a method of discarding a mask which has been used for each predetermined deposition number and converting it to an unused mask without using the same mask a plurality of times. However, when this method is used, since the unused mask used for the deposition of the organic material for organic EL is expensive, a problem arises in that the cost is increased.

Therefore, this invention provides the washing | cleaning apparatus which can remove the organic material for organic EL adhering to the mask which consists of a metal thin film.

The cleaning device of the present invention has been made in view of the above-described problems, and has the following features as a cleaning device for removing an organic material for organic EL attached to a mask made of a metal thin film.

That is, the washing | cleaning apparatus of this invention wash | cleans the washing tank which wash | cleans a mask with a predetermined | prescribed washing | cleaning liquid, the vacuum distillation which vacuum-distillates the washing liquid which overflowed from the washing tank, and the washing liquid vacuum-distilled by the vacuum distillation machine is cooled to room temperature. Distilling the 1st cooler, the 1st reflux tube which refluxs the washing | cleaning liquid cooled by the 1st cooling machine to a washing tank, the rinse tank which rinses a mask with a predetermined rinse liquid, and the rinse liquid which overflowed from the rinse tank under normal pressure. And a second refrigeration tube for cooling the rinse liquid at atmospheric pressure distilled by the atmospheric distillation to room temperature, and a second reflux tube for refluxing the rinse liquid cooled by the second cooler to a rinse tank. .

Moreover, the washing | cleaning apparatus of this invention is equipped with the 1st ultrasonic vibrator which vibrates a washing | cleaning liquid in a washing tank further in addition to the said structure, The 1st temperature sensor which detects the temperature of the washing | cleaning liquid of a washing tank, and a 1st temperature It is characterized by including the 1st temperature regulator which adjusts the washing | cleaning liquid in a washing tank to room temperature according to the detection result of a sensor. Here, a 1st temperature regulator is equipped with the 1st heat exchanger, and a said 1st temperature regulator adjusts the temperature of the washing | cleaning liquid in the said washing tank by flowing the washing | cleaning liquid cooled by the said 1st heat exchanger into a washing tank.

Moreover, the washing | cleaning apparatus of this invention is equipped with the 2nd ultrasonic vibrator which vibrates the said rinse liquid further in the rinse tank, and detects the temperature of the rinse liquid of a rinse tank, in addition to the said structure, It is characterized by including the 2nd temperature regulator which adjusts the rinse liquid in a rinse tank to room temperature according to the detection result of a 2nd temperature sensor. The second temperature controller includes a second heat exchanger, and the second temperature regulator adjusts the temperature of the rinse liquid in the rinse tank by introducing the rinse liquid cooled by the second heat exchanger into the rinse tank.

Moreover, the washing | cleaning apparatus of this invention is equipped with the collection tank which has a 3rd cooler in addition to the said structure, The collection tank collect | recovers the rinse liquid evaporated in the rinse tank by cooling by the said 3rd cooler, The recovered rinse liquid is refluxed to a rinse tank through a second reflux tube. Here, the recovery tank includes a third temperature sensor that detects a temperature in the recovery tank, and the third cooler uses a third temperature sensor to move the inside of the recovery tank so that a difference in vapor pressure occurs between the rinse tank and the recovery tank. To cool.

Furthermore, the washing | cleaning apparatus of this invention is equipped with the water separation tank which isolate | separates the water in the rinse liquid collect | recovered by the recovery tank in addition to the said structure, and the rinse liquid which passed the water separation tank through the 2nd reflux tube. It is characterized by reflux in a rinse bath.

The cleaning apparatus of the present invention further includes a separator for separating the rinse liquid containing the washing liquid into a washing liquid and a rinse liquid, a washing liquid separated by the separator, and a washing liquid distilled by an atmospheric distillation, in addition to the above structure. And a pool bath for accumulating the rinse liquid contained therein and flowing it back into the separator. Here, the pool is equipped with the lower limit sensor which detects the lower limit of the liquid level of the washing | cleaning liquid and the said rinse liquid, and introduce | transduces the separated washing | cleaning liquid into a vacuum distillation according to the detection result of the said lower limit sensor.

<Example>

Next, a cleaning apparatus according to an embodiment of the present invention will be described. In addition, the mask which is a to-be-cleaned body shall be the mask 10 similar to what is used by the conventional vapor deposition process shown in FIGS. 15-17. That is, the mask is made of a metal thin film in which holes 11 each having a thickness of several μm are formed along a predetermined pattern in which an organic material is formed. The metal thin film is made of nickel (Ni), iron (Fe), or the like, for example. Moreover, the metal frame 12 which consists of nickel (Ni) and iron (Fe) is fixed to the edge of the said mask, for example. The metal frame 12 has a locking portion 13. Hereinafter, the mask 10 fixed to the metal frame 12 is abbreviated as "mask 10."

The cleaning apparatus according to the present embodiment removes the organic material attached to the mask 10 made of a metal thin film used for vapor deposition in a deposition step of depositing an organic material for organic EL on an insulating substrate having a driving TFT. It is. The whole structure of the washing | cleaning apparatus which concerns on a present Example is divided roughly into the washing | cleaning system for removing the organic material for organic EL adhering to the mask 10, and the conveying system for conveying the mask 10. As shown in FIG.

First, the configuration of the cleaning system of the cleaning device according to the present embodiment will be described with reference to the drawings. 1 is a view for explaining a cleaning system of the cleaning device according to the present embodiment. In addition, in FIG. 1, the component regarding a conveyance system is abbreviate | omitted.

As shown in FIG. 1, the cleaning system of the cleaning apparatus according to the present embodiment includes first and second cleaning tanks 21 and 22 for cleaning the mask 10 with a predetermined cleaning liquid, and first and second cleaning agents. The first and second rinse tanks 51 and 52 which rinse the mask 10 cleaned by the two cleaning tanks 21 and 22 with a predetermined rinse liquid are provided.

In addition, the said predetermined washing | cleaning liquid shall be a hydrocarbon (HC) type washing | cleaning liquid, for example. In addition, the said predetermined rinse liquid is a solvent containing fluorine (F) which has a boiling point lower than the said washing | cleaning liquid, For example, suppose that it is a hydrofluoroether (HFE; Hydrofluoroether). The specific gravity of the rinse liquid is larger than that of water. Moreover, by rinsing the said cleaning liquid with a large surface tension with the said rinse liquid with a small surface tension, rinsing enters into a finer place and there exists an effect which reliably captures a cleaning liquid.

Next, the structure according to the 1st and 2nd washing tanks 21 and 22 of the washing | cleaning system of the washing | cleaning apparatus which concerns on a present Example is demonstrated.

This washing | cleaning apparatus is provided with the overflow tank 23 which stores the washing | cleaning liquid which overflowed from the said 1st washing tank 21 in the 1st washing tank 21. As shown in FIG. Moreover, this washing | cleaning apparatus is equipped with the vacuum distiller 30 for extracting only a washing | cleaning liquid by what is called vacuum distillation from the washing | cleaning liquid containing the organic material removed from the mask 10 by the washing | cleaning process. The washing | cleaning liquid containing an organic material overflows from the 1st washing tank 21 to the overflow tank 23, and flows into the vacuum still 30 from the said overflow tank 23. As shown in FIG. The organic material precipitated at the bottom of the vacuum still 30 is cooled by the cooling vessel 30r and discharged to the outside.

In the distillation of the above-mentioned washing | cleaning liquid, the said washing | cleaning liquid is heated and distilled in a vacuum state. Thereby, the boiling point of about 155 degreeC of the said washing | cleaning liquid can be reduced and the heating temperature at the time of distillation can be reduced as much as possible.

Moreover, this washing | cleaning apparatus is equipped with the 1st cooler 31 which cools the washing | cleaning liquid vacuum-distilled by the vacuum distiller 30 to room temperature. The washing liquid cooled to the room temperature by the first cooler 31 is refluxed to the second washing tank 22 through the first reflux tube 101.

In addition, in this application, room temperature is "10 degreeC-40 degreeC", Preferably it is "20 degreeC-30 degreeC", More preferably, it is about 25 degreeC.

By vacuum distillation, cooling, and reflux of the cleaning liquid as described above, the cleaning treatment of the mask 10 can be performed at room temperature. Therefore, it becomes possible to restrain the mask 10 from generating stress or damage due to stress due to heat.

In addition, the above-mentioned 1st and 2nd washing tanks 21 and 22 are equipped with the 1st ultrasonic vibrator (not shown) for vibrating the said washing | cleaning liquid so that the washing | cleaning liquid may reliably extend to the surface of the mask 10. As shown in FIG. Moreover, in order to cope with the rise of the temperature of the washing | cleaning liquid by the vibration of the said 1st ultrasonic vibrator, the 1st and 2nd washing tanks 21 and 22 are the 1st temperature regulators for fine-adjusting the temperature of a washing liquid to room temperature ( 40).

Here, the 1st temperature regulator 40 is equipped with the 1st heat exchanger 40h and the pump 42, The 1st and 2nd washing tanks 21 and 22 are performed by the said 1st heat exchanger 40h. The washing liquid is cooled. The first temperature controller 40 determines whether or not the cleaning liquid cooled by the first heat exchanger 40h flows into the first and second cleaning tanks 21 and 22 through the pump 42. Therefore, the temperature of the said washing | cleaning liquid of each said tank is finely adjusted to room temperature.

In addition, the washing liquid is circulated and filtered by a filter. In addition, as shown in FIG. 1, a filter may be provided in a path of the circulation, that is, a path of the washing tank 21, the first temperature regulator 40, the pump 42, and the washing tank 21. The filter is a path separate from the path, and a path provided in the path, that is, a path of the washing tank 21, the filter, the pump 42, and the washing tank 21 may be provided.

As described above, the first temperature controller 40 enables fine adjustment of the temperatures of the cleaning liquids of the first and second cleaning tanks 21 and 22.

Next, the structure according to the 1st and 2nd rinse tanks 51 and 52 among the washing | cleaning systems of the washing | cleaning apparatus which concerns on a present Example is demonstrated.

This washing | cleaning apparatus is provided with the overflow tank 53 which stores the rinse liquid which overflowed from the said 1st rinse tank 51 in the 1st rinse tank 51.

Moreover, this washing | cleaning apparatus is a normal pressure under normal pressure from the rinse liquid containing impurities, such as a trace amount of cleaning liquid and a trace amount of organic materials, of the 2nd washing tank 22 which enters the 1st rinse tank 51 through the mask 10. An atmospheric distillation unit 60 for removing the impurities by distillation is provided. The rinse liquid overflows from the first rinse tank 51 to the overflow tank 53, and flows into the atmospheric distillation 60 from the overflow tank 53.

If the boiling point of the rinse liquid described above is, for example, about 60 ° C, it is not necessary to perform vacuum distillation for lowering the boiling point, such as distillation of a washing liquid having a boiling point of about 160 ° C. Therefore, atmospheric distillation under normal pressure (atmospheric pressure) is performed by the atmospheric distillation 60. The rinse liquid evaporated at the time of distillation is liquefied by the trap coil 60t of the temperature which liquefies this.

Moreover, this washing | cleaning apparatus is equipped with the 2nd cooler 61 which cools the rinse liquid atmospheric pressure distilled by the atmospheric distillation apparatus 60 to room temperature. The rinse liquid cooled to the room temperature by the second cooler 61 is refluxed to the second rinse bath 52 through the second reflux tube 102.

Here, a water separation tank 80 is provided between the second cooler and the second reflux tube 102. The water separation tank 80 separates the rinse liquid containing water into water and a rinse liquid through atmospheric distillation. The rinse liquid is refluxed to the second rinse tank 52 through the second reflux tube 102 after separation of the water.

Moreover, this washing | cleaning apparatus is equipped with the collection tank 54 which collect | recovers the rinse liquid evaporated from the 1st rinse tank 51 or the 2nd rinse tank 52. As shown in FIG. For example, the temperature in the recovery tank 54 may be set to a temperature at which the ratio of the vapor pressure of the second rinse tank 52 and the vapor pressure in the recovery tank 54 is 150: 1 to 10: 1. The recovery tank 54 includes a third cooler 55. The third cooler 55 cools the recovery tank 54 to, for example, about minus 25 ° C, so that the vapor pressure of the recovery tank 54 is the vapor pressure of the first rinse tank 51 or the second rinse tank 52. It is lowered by about one hundredth more than that, and the evaporated rinse liquid flows into the recovery tank 54. The rinse liquid introduced into the recovery tank 54 flows into the water separation tank 80, and after separation of the water contained therein, is returned to the second rinse tank 52 through the second reflux tube 102.

By atmospheric distillation, cooling, and reflux of the rinse liquid as described above, the rinse treatment of the mask 10 can be performed at room temperature. Therefore, it becomes possible to restrain the mask 10 from generating stress or damage by stress due to heat.

In addition, in the above-described cleaning apparatus, since the mask 10 immersed in the cleaning liquid is immersed in the rinse liquid, a small amount of the cleaning liquid is transferred to the rinse liquid of the first rinse bath 51 through the mask 10, and the rinsing is performed. It is mixed with the liquid. Therefore, this washing | cleaning apparatus is provided with the separator 90 which isolate | separates the rinse liquid containing a washing | cleaning liquid into a washing | cleaning liquid and a rinse liquid. The separator 90 liquefies and recovers only the evaporated rinse liquid by cooling with a cooler or the like after evaporating the rinse liquid containing the washing liquid. The rinse liquid separated in this way flows into the water separation tank 80 and after the separation of the water contained therein, is returned to the second rinse tank 52 through the second reflux tube 102.

In addition, the washing apparatus accumulates the washing liquid separated by the separator 90 and the rinse liquid (containing the washing liquid) before the atmospheric distillation flowing from the atmospheric distillation 60 into the separator 90 again. 91 is provided.

Here, the pool 91 is provided with the upper limit sensor 91f which detects the upper limit of the liquid level of the washing | cleaning liquid and rinse liquid which flows in and accumulates, and the lower limit sensor 91e which detects the lower limit of the said liquid surface. Then, by opening and closing the valve 60b, the rinse liquid from the atmospheric pressure distillation 60 is introduced into the pool tank 91 until the upper limit sensor 91f detects the liquid level, and the inflow is stopped. The rinse liquid containing the inflow into the separator 90, and the washing liquid and the rinse liquid are separated.

The inflow of the rinse liquid into the separator 90 is stopped at the time when the liquid level of the rinse liquid in the pool 91 is detected by the lower limit sensor 91e, and the upper limit of the rinse liquid from the atmospheric distillation 60 is again obtained. The flow enters the pool 91 and stops the flow until the sensor 91f detects the liquid level. Then, the rinse liquid containing the washing liquid is introduced into the separator (90). As the number of times the separation of the cleaning liquid and the rinse liquid is repeated increases, the rinse liquid accumulated in the pool tank 91 includes a large amount of the cleaning liquid flowing from the separator 90 and accumulating in the pool tank 91. Therefore, the rate at which the rinse liquid containing the cleaning liquid is evaporated and separated in the separator 90 becomes slow.

Therefore, in the pool 91, the time from the start of separation by the separator 90 until the liquid level of the rinse liquid reaches the lower limit is measured by the detection result of the lower limit sensor 91e. When it becomes longer than predetermined time, the washing | cleaning liquid contained in the rinse liquid in the said pool is considered to be saturated state, and separation by the separator 90 is complete | finished. After separation | separation by the separator 90 is complete | finished, the wash | cleaning liquid separated in the pool 91 flows into the vacuum distiller 30.

By the above-mentioned treatment, the washing liquid contained in the rinse liquid can be separated, and only the rinse liquid can be reused.

The first and second rinsing tanks 51 and 52 described above include a second ultrasonic vibrator (not shown) for vibrating the rinse liquid so that the rinse liquid reliably extends to the surface of the mask 10. have. Moreover, in order to cope with the raise of the temperature of the rinse liquid by the vibration of the 2nd ultrasonic vibrator, the 1st and 2nd rinse tanks 51 and 52 are the 2nd temperature for fine-adjusting the temperature of the rinse liquid to room temperature. The regulator 70 is provided.

Here, the 2nd temperature regulator 70 is equipped with the 2nd heat exchanger 70h and the pump 72, The 1st and 2nd rinse tanks 51 and 52 are made by the said 2nd heat exchanger 70h. Cool the rinse solution. Then, the second temperature controller 70 determines whether or not the rinse cleaning liquid cooled by the second heat exchanger 70h is introduced into the first and second rinse baths 51 and 52 through the pump 72. According to this, the temperature of the rinse liquid of each bath is finely adjusted to room temperature.

As described above, the second temperature controller 70 enables fine adjustment of the temperatures of the rinse liquids of the first and second rinse baths 51 and 52.

Next, the detailed structure in each tank of the 1st and 2nd washing tanks 21 and 22 and the 1st and 2nd rinse tanks 51 and 52 is demonstrated. 2 is a cross-sectional view illustrating the first and second cleaning tanks 21 and 22. 3 is sectional drawing explaining the 1st and 2nd rinse tanks 51 and 52 and the recovery tank 54. Moreover, FIG. In addition, in FIG.2 and FIG.3, illustration of the overflow tanks 23 and 53 is abbreviate | omitted.

As shown in FIG. 2, the 1st and 2nd washing tanks 21 and 22 are the 1st ultrasonic vibrators 21a and 22a, the 1st stirrers 21b and 22b, and the 1st temperature sensor 21c, respectively. 22c) and movable first liquid carriers 21d and 22d. Here, the first ultrasonic vibrators 21a and 22a may apply vibration to the cleaning liquid so as to face the mask in front of the mask 10 so that the cleaning liquid extends to the surface of the mask 10 reliably. The effect of the first ultrasonic vibrators 21a and 22a is greater in the case of the so-called sheet-fed type which washes the mask one by one than in the equation. Moreover, the 1st stirrer 21b, 22b stirs the said washing | cleaning liquid so that a washing | cleaning liquid may flow in the 1st and 2nd washing tanks 21 and 22. FIG.

In addition, the 1st temperature sensors 21c and 22c are the reference temperature at the time of temperature adjustment of the cleaning liquid in the 1st and 2nd cleaning tank 21 and 22 by the 1st temperature regulator 40, The temperature of the said cleaning liquid Will be detected. Further, the first liquid carriers 21d and 22d have a function of holding the mask 10 and immersing it in a cleaning liquid when the mask 10 is cleaned. The first liquid carriers 21d and 22d preferably have a rocking function of oscillating the entire mask 10 in the vertical direction so that the rinse liquid reliably extends to the surface of the mask 10.

As described above, in the first and second cleaning tanks 21 and 22, vibration of the cleaning liquid by the first ultrasonic vibrators 21a and 22a, stirring of the cleaning liquid by the first stirrers 21b and 22b, and Due to the fluctuation of the mask 10 by the one-in-one carrier 21d, 22d, the cleaning process of the mask 10 by the said cleaning liquid is performed reliably.

Similarly, as shown in FIG. 3, the 1st and 2nd rinse tanks 51 and 52 are 2nd ultrasonic vibrators 51a and 52a, 2nd agitators 51b and 52b, and 2nd temperature sensor 51c, respectively. And 52c) and movable second liquid carriers 51d and 52d. Here, the second ultrasonic vibrators 51a and 52a are vibrators which impart vibrations to the rinse liquid so that the rinse liquid reliably extends to the surface of the mask 10. In addition, the second stirrers 51b and 52b stir the rinse liquid so as to flow the rinse liquid in the first and second rinse tanks 51 and 52.

In addition, the second temperature sensors 51c and 52c are used as reference temperatures at the time of temperature adjustment of the rinse liquids in the first and second rinse baths 51 and 52 by the second temperature regulator 70. Is to detect the temperature. Further, the second liquid carriers 51d and 52d have a function of holding the mask 10 and immersing it in a rinse liquid when the mask 10 is rinsed. Moreover, it is preferable that this 2nd intracellular carrier 51d has a rocking | fluctuation function which vibrates the mask 10 whole vertically so that the rinse liquid may reliably extend to the surface of the mask 10.

In addition, the recovery tank 54 which conducts with the 2nd rinse tank 52 is equipped with the 3rd cooler 55 and the 3rd temperature sensor 54c. The third cooler 55 cools the recovery tank 54 to a lower temperature than the first and second rinse tanks 51 and 52 according to the detection result of the third temperature sensor 54c. As described above, the cooling temperature is about minus 25 ° C. The evaporated rinse liquid guided to the recovery tank 54 is liquefied by a so-called trap coil 54t and is recovered to the recovery tank 54.

Further, the third and fourth temperature regulators 57 and 58 and two fourth temperature sensors 50c are provided above the liquid surfaces of the rinse liquids of the first and second rinse tanks 51 and 52. . The third temperature controller 57 cools the temperature above the liquid level of the rinse liquids of the first and second rinse baths 51 and 52 to about 10 ° C., for example, so that the first and second rinse liquids have evaporated. The 1st air layer 59a which prevents it from spreading to the exterior of the 2 rinse tanks 51 and 52 is formed. In addition, the 4th temperature regulator 58 adjusts the temperature above the 1st air layer 59a to temperature slightly higher than room temperature, and the atmosphere outside of the 1st and 2nd rinse tanks 51 and 52 is mentioned above. A second air layer 59b is formed which inhibits the flow into the tank.

Here, it is preferable that adjustment of the said temperature by the 3rd and 4th temperature regulators 57 and 58 is performed according to the detection result of the temperature by two 4th temperature sensors 50c. In addition, when the said temperature adjustment by the 3rd and 4th temperature regulators 57 and 58 is adjusted to predetermined temperature set previously, any one or all of the 2nd 4th temperature sensors 50c may be It may be omitted.

As described above, in the first and second rinse tanks 51 and 52, vibration of the rinse liquid by the second ultrasonic vibrators 51a and 52a, stirring of the rinse liquid by the second stirrers 51b and 52b, And the rinse process of the mask 10 by the said rinse liquid is performed reliably by the fluctuation | variation of the mask 10 by the 2nd liquid carriers 51d and 52d.

Moreover, since the 3rd and 4th temperature regulators 57 and 58 are provided above the liquid level of the rinse liquid of the 1st and 2nd rinse tanks 51 and 52, the 1st and 2nd rinse tanks ( The rinse liquids evaporated in 51 and 52 can be recovered by the recovery tank 54 without diffusing to the atmosphere.

Next, the flow of the washing | cleaning liquid in the washing | cleaning system of the washing | cleaning apparatus which concerns on a present Example is demonstrated. When the mask 10 is immersed in the 1st cleaning tank 21 and the 2nd cleaning tank 22, and a cleaning process is performed, the organic material removed from the mask 10 will be mixed with a cleaning liquid. When the washing liquid refluxed through the first reflux tube 101 flows into the second washing tank 22, the washing liquids of the first and second washing tanks 21 and 22 are transferred to the first overflow tank 23. Overflow. The overflowed washing liquid flows into the vacuum distiller 30. Here, the inside of the vacuum distiller 30 is pressure-reduced to about 0.8 atmosphere, for example, is heated to about 120 degreeC, and vacuum distillation of a washing | cleaning liquid is performed. The organic material precipitated at the bottom of the vacuum still 30 is cooled by the cooling vessel 30r and periodically discharged to the outside.

Although the boiling point of this washing | cleaning liquid is about 160 degreeC, for example, by heating and distilling the said washing | cleaning liquid in a vacuum state, the said boiling point can be reduced and the heating temperature at the time of distillation can be reduced to about 120 degreeC, for example. In addition, since the distillation is a vacuum distillation, the washing liquid does not contain water in the distillation process.

The cleaning liquid from which the organic material is removed by vacuum distillation is cooled to room temperature by the first cooler 31 and refluxed to the second cleaning tank 22 through the first reflux tube 101.

In addition, a part of the cleaning liquid of the first and second cleaning tanks 21 and 22 is cooled by the first heat exchanger 40h provided in the first temperature controller 40, so that the cooled cleaning liquid is pumped ( It flows into the 2nd washing tank 22 suitably through 42).

Next, the flow of the rinse liquid in the cleaning system of the cleaning apparatus according to the present embodiment will be described. When the mask 10 is immersed in the first rinse bath 51 and the second rinse bath 52 and rinsed, the cleaning liquid removed from the mask 10 is mixed with the rinse liquid. When the rinse liquid refluxed through the second reflux pipe 102 flows into the second rinse tank 52, the rinse liquid of the first and second rinse baths 51 and 52 is transferred to the second overflow tank 53. Overflow.

This overflowed rinse liquid flows into the atmospheric distillation unit 60. Since the boiling point of the rinse liquid is 60 ° C., for example, it is not necessary to perform vacuum distillation to lower the boiling point, such as distillation of a washing liquid having a boiling point of about 160 ° C., for example. Therefore, the inside of the atmospheric distillation apparatus 60 is heated to about 65 degreeC exceeding the said boiling point, for example under normal pressure (atmospheric pressure), and atmospheric distillation of a rinse liquid is performed.

By this atmospheric distillation, impurities such as an organic material (transported through the mask 10 with the cleaning liquid) contained in the rinse liquid are removed. The atmospheric distilled rinse liquid is mixed with water in the process of atmospheric distillation, but is separated into water and the rinse liquid using a specific gravity larger than the moisture. The rinse liquid is cooled to room temperature by the second cooler 62, and flows into the water separation tank 80.

The rinse liquid further removed from the water separation tank 80 is refluxed to the second rinse tank 52 through the second reflux tube 102.

In addition, a part of the rinse liquid introduced into the atmospheric distillation unit 60 but not at atmospheric pressure distillation, that is, a rinse liquid containing a small amount of the rinse liquid (mixed into the rinse liquid through the mask 10), is opened and closed on the valve 60b. Therefore, it flows into the pool 91. After the rinse liquid flows into the pool tank 91 to fill the upper limit of the pool tank 91, the valve 60b is closed and the inflow of the rinse liquid is stopped. The rinse liquid in the pool 91 flows into the separator 90, and separation of the rinse liquid and the washing liquid is started.

When the liquid level of the rinse liquid in the pool tank 91 is detected by the lower limit sensor 91e, the valve 60b is opened again and the rinse liquid flows into the pool tank 91 from the atmospheric distillation 60.

The rinse liquid separated by the separator 90 removes water from the water separation tank 80 by using a specific gravity greater than that of water, and then passes through the second reflux pipe 102 to the second rinse tank 52. Reflux. In addition, the washing | cleaning liquid separated by the separator 90 flows into the pool 91.

As the separation of the rinse liquid and the rinse liquid is repeated, the rinse liquid accumulated in the pool tank 91 contains a lot of the rinse liquid introduced by the separator 90 and accumulated in the pool tank 91. Therefore, the rate at which the rinse liquid containing the cleaning liquid is evaporated and separated by the separator 90 becomes slow.

Therefore, according to the detection result of the lower limit sensor 91e with respect to the liquid level of the rinse liquid of the pool 91, the time from the start of separation by the separator 90 until the liquid level of the rinse liquid reaches the lower limit is measured, When the said arrival time becomes longer than the predetermined time, the washing | cleaning liquid contained in the rinse liquid in the said pool 91 is considered saturated, and separation by the separator 90 is complete | finished. And the valve 91b which closed until then is opened, and the washing | cleaning liquid isolate | separated in the pool 91 flows into the vacuum still 30.

In addition, the rinse liquid evaporated from the first and second rinse tanks 51 and 52 is lower than the first and second rinse tanks 51 and 52 by the third cooler 55, for example, minus 25 ° C. It is led to the recovery tank 54 cooled to such an extent, and it is collect | recovered. The rinse liquid collected in the recovery tank 54 flows into the water separation tank 80, and water is removed using the specific gravity of about 1.5, and the second rinse tank 52 is provided through the second reflux tube 102. To reflux).

Next, the conveyance system of the washing | cleaning apparatus which concerns on a present Example is demonstrated with reference to drawings. 4-8 and FIG. 11-14 is sectional drawing explaining the conveyance system of the washing | cleaning apparatus which concerns on a present Example. 9 and 10 are perspective views illustrating a conveyance system of the cleaning device according to the present embodiment. In addition, in FIG.4-14, only the some component which is necessary for description of a conveyance system is shown about the component which concerns on a washing system.

As shown in FIGS. 4-14, the conveying system of the washing | cleaning apparatus which concerns on a present Example is provided on the stage 200, the cassette 210 which stored the some mask 10 in the horizontal direction, and the cassette The first movable mounting apparatus 220 having the first arm 221 to take out one mask 10 from the 210, and the second movable mounting apparatus 230 having the second arm holding the mask 10. And a conveying device 240 for conveying the mask 10 to the first and second cleaning tanks 21 and 22 and the first and second rinsing tanks 51 and 52. Here, the conveying apparatus 240 has the hook part 242 for holding one side of the mask 10, when conveying the mask 10. As shown in FIG.

Next, operation | movement of the conveyance system of the washing | cleaning apparatus which concerns on a present Example is demonstrated. First, as shown in FIG. 4, the 1st arm 221 of the 1st mobile mounting apparatus 220 is stretched | contracted, and one mask 10 is taken out from the cassette 210. As shown in FIG. Next, as shown in FIG. 5, the first moving mounting apparatus 220 lowers the first arm 221 and places the mask 10 at a predetermined position of the stage 200. Next, as shown in FIG. 6, the second mobile mounting apparatus 230 holds the mask 10 by the second arm 231, and further conveys the mask 10 as shown in FIG. 7. It is placed on the device 240.

And the conveying apparatus 240 in which the mask 10 was mounted as shown in FIG. 8 is stood until it rotates about 90 degrees in a vertical direction, and reaches a perpendicular state. In addition, the mask 10 mounted on the conveying apparatus 240 also stands by rotating about 90 degrees in the vertical direction at the same time. When the form of the conveying apparatus 240 and the mask 10 mounted on it at this time is shown, it becomes like the perspective view of FIG.

Thus, since the conveying apparatus 240 and the mask 10 are in a perpendicular state, the metal thin film constituting the mask 10 is caused by stress (stress caused by gravity against the metal thin film or fluctuation by liquid). Stress) can be applied to avoid the occurrence of metal fatigue or damage as much as possible. In addition, the vertical separation of the mask 10 also has the effect of good liquid separation.

In addition, the angle when the said conveying apparatus 240 and the mask 10 rotate is not necessarily about 90 degrees. That is, when the metal thin film constituting the mask 10 due to the stress caused by gravity is an angle at which no metal fatigue or damage is generated, the conveying device 240 and the mask 10 are angles other than horizontal and vertical. You may rotate to reach.

In addition, as shown in the perspective view of FIG. 10, the holding jig 241 provided in advance in the conveying device 240 is fitted with the catching portion 13 of the mask 10 so that the mask 10 is caught. It is pressed by the part 13. Thus, the mask 10 is held by the holding jig 241 and the hook 242 of the conveying device 240 without damaging the surface of the metal thin film.

Thus, the mask 10 held on the conveying apparatus 240, together with the conveying apparatus 240, is the washing | cleaning system of a washing | cleaning apparatus, ie, the 1st and 2nd washing tanks 21 and 22 (and the 1st) And second rinse tanks 51 and 52). Here, at the time of the said conveyance, as shown to the sectional drawing of FIG. 11, the conveying apparatus 240 carries out the movement in a vertical direction and a horizontal direction continuously, like the locus 1 and 8 of FIG. It moves along a predetermined trajectory of a curved shape approximated by an arc shape. In addition, A, B, and C of FIG. 11 have shown the position (height) of the vertical direction above the liquid level of a washing | cleaning liquid or a rinse liquid.

By the movement of the conveying apparatus 240 having such a predetermined trajectory, the mask which consists of a metal thin film by the stress by the impact when the said movement is switched from a vertical direction to a horizontal direction, or from a horizontal direction to a vertical direction. The occurrence of metal fatigue or damage to (10) can be avoided as much as possible.

In addition, the conveying apparatus 240 moves along a predetermined speed. This predetermined speed is such that metal fatigue and damage are not caused to the mask 10 made of a metal thin film due to stress caused by wind pressure or impact when the conveying device 240 moves. Alternatively, the predetermined speed is a predetermined speed that does not promote the evaporation of the rinse liquid in the first and second rinsing tanks 51 and 52 by disturbing the airflow generated when the conveying device 240 moves. It shall be

Next, as shown in FIG. 12, the conveying apparatus 240 in which the mask 10 is placed is conveyed on the first cleaning tank 21. And as shown in FIG. 13, 21 d of 1st liquid carriers provided in the 1st washing tank 21 raise above the liquid level of the washing | cleaning liquid. And after 21 d of 1st intracellular carriers raise to the same position as the conveying apparatus 240, or after the conveying apparatus 240 moves to the same position as the intracellular carrier 21d which raised above the liquid level of the washing | cleaning liquid, conveyance Pressing of the holding jig 241 of the apparatus 240 is released, and the mask 10 is moved to the intracarrier carrier 21d.

Subsequently, as shown in FIG. 14, the first in-liquid carrier 21d on which the mask 10 is placed is lowered into the cleaning liquid, and the mask 10 is immersed in the cleaning liquid. In addition, when taking out the mask 10 in a washing | cleaning liquid, the process shown in FIG. 14, FIG. 13, and FIG. 12 shall pass in this order. And the conveying apparatus 240 in which the mask 10 was mounted is conveyed on the 2nd washing tank 22 like the 1st washing tank 21 shown in FIGS. 12-14. Then, after the mask 10 is immersed in the cleaning liquid through the first liquid carrier 21d, the mask 10 is taken out.

As described above, when the mask 10 is immersed in the cleaning liquids of the first and second cleaning tanks 21 and 22, the cleaning apparatus can be performed without immersing the conveying device 240 in the cleaning liquid. That is, the adhesion of the washing | cleaning liquid to the conveying apparatus 240 can be avoided as much as possible. Therefore, the cleaning liquid of the 1st and 2nd washing tanks 21 and 22 can be avoided to be conveyed to the rinse liquid of the 1st and 2nd rinse tanks 51 and 52 through the conveying apparatus 240 as much as possible. .

Next, the conveying apparatus 240 in which the mask 10 is mounted is conveyed on the 1st rinse tank 51 like the case of the 1st washing tank 21 shown in FIGS. 12-14. After the mask 10 is immersed in the rinse liquid through the second liquid carrier 51d, the mask 10 is taken out. In addition, the conveying apparatus 240 which mounted the mask 10 is conveyed on the 2nd rinse tank 52. Then, after the mask 10 is immersed in the rinse liquid through the second liquid carrier 52d, the mask 10 is taken out.

As described above, when the mask 10 is immersed in the rinse liquids of the first and second rinse baths 51 and 52, the rinsing process can be performed without immersing the conveying device 240 in the rinse liquid. That is, the rinse liquid adheres to the conveying apparatus 240 as much as possible. Therefore, when performing a washing process again, the rinse liquid adheres to the conveying apparatus 240, and it can avoid that conveyance of the said rinse liquid to the washing | cleaning liquid of the 1st and 2nd washing tanks 21 and 22 as much as possible.

In addition, when the conveying apparatus 240 mentioned above is immersed in the washing | cleaning liquid or the rinse liquid, it is preferable to move along the traces 1 thru | or 4 of FIG. That is, first, the conveying apparatus 240 moves to the height of A to B along the trajectory 1, and pauses. At the time of stopping, it does not stop suddenly, but stops slowly while decelerating so that a mask may not apply the above-mentioned stress. And after the intracarrier carrier 21d, 22d, 51d, 52d (not shown) raises to the height of B, the conveying apparatus 240 replaces the mask 10 with the intracarrier carrier 21d 122d, 51d, 52d, , From B to C height. Thereafter, the conveying apparatus 240 moves the liquid carriers 21d, 22d, 51d, 52d apart in the horizontal direction along the trajectory 3. In addition, the conveying apparatus 240 moves to the height of A, and moves vertically along the trajectory 4.

In addition, when the above-mentioned conveying apparatus 240 takes out the mask 10 from the inside of the washing | cleaning liquid or the rinse liquid, it is preferable to move along the traces 5 thru | or 8 of FIG. That is, first, the conveying apparatus 240 moves from A to C along the locus 5. Next, it moves closer to the intracarrier carriers 21d, 22d, 51d, and 52d and moves in the horizontal direction along the trajectory 6. Thereafter, the conveying apparatus 240 moves from C to the height of B in accordance with the trajectory 7 and pauses. Thereafter, the conveying apparatus 240 moves the mask 10 from the B to the A along the trajectory 8 while moving the mask 10 from the liquid carriers 21d, 22d, 51d, and 52d that are rising to the height of B. Move to height Also at this time, it is preferable to gradually increase the moving speed so that the conveying device 240 does not suddenly move upward. By doing so, the conveying apparatus 240 can move without applying the above-mentioned stress to a mask.

Here, after the conveying apparatus 240 conveys one mask 10 to any one of the 1st and 2nd washing tanks 21 and 22 or the 1st and 2nd rinse tanks 51 and 52, You may convey the other mask 10 different from the mask 10 in which the said conveyance was completed to another tank.

Finally, the conveying apparatus 240 which mounted the mask 10 is conveyed to the vacuum dryer 99 shown in FIG. 1, and is dried.

As described above, moving the tracks 1 and 8 shown in Fig. 11 so as to form an arc, and in the track 1, slowly decelerating the moving speed (downward direction), and moving in the track 8 By slowly increasing the speed (up direction), the stress applied to the mask 10 can be reduced. In addition, the movement of the conveying apparatus 240 at the time of not conveying the mask 10 may be made so that it may not collide with the side wall of a liquid tank and an intracarrier carrier, and may be circular arc shape, and may move rapidly.

In addition, although the washing | cleaning liquid and the rinse liquid were made into the hydrocarbon-based washing | cleaning liquid and the fluorine-based rinse liquid in the above-mentioned Example, this invention is not limited to this. That is, the cleaning liquid and the rinse liquid can be subjected to the cleaning treatment (removal of the organic material for organic EL) and the rinse treatment with respect to the mask 10, and the boiling points similar to those of the hydrocarbon-based cleaning liquid and the fluorine-based rinse liquid, And cleaning liquids and rinsing liquids other than the above, as long as they have specific gravity with respect to moisture.

According to the washing | cleaning apparatus of this invention, in the vapor deposition process of the organic material for organic EL, the organic material adhering to the mask used for vapor deposition can be removed suitably.

Therefore, even if the same mask is used repeatedly, the overhang made of the organic material is not formed at the periphery of the hole of the mask, so that the hole is not narrowed. As a result, it can suppress that the precision of vapor deposition of an organic material falls.

Moreover, since the same mask can be used in the vapor deposition process of an organic material, it becomes possible to avoid the increase of the cost by the exchange with the unused mask as much as seen with the conventional vapor deposition process. In addition, since the disposal of the used mask is unnecessary, it becomes possible to restrain the environmental pollution caused by the disposal as much as possible.

Claims (14)

A cleaning apparatus for removing an organic material for organic EL attached to a mask made of a metal thin film, A cleaning tank for cleaning the mask with a predetermined cleaning liquid; A vacuum distillation unit for vacuum distilling the washing liquid overflowed from the washing tank; A first cooler for cooling the cleaning liquid vacuum distilled by the vacuum still to room temperature; A first reflux tube for refluxing the cleaning liquid cooled by the first cooler to the cleaning tank; A rinse tank for rinsing the mask cleaned by the washing tank with a predetermined rinse liquid; An atmospheric distillation unit for distilling the rinse liquid overflowed from the rinse tank under atmospheric pressure, A second cooler for cooling the rinse liquid at atmospheric pressure distilled by the atmospheric distillation unit to room temperature; A second reflux tube for refluxing the rinse liquid cooled by the second cooler to the rinse tank The cleaning apparatus characterized by including the. The method of claim 1, And a first ultrasonic vibrator for vibrating the cleaning liquid in the cleaning tank. The method of claim 2, A first temperature sensor detecting a temperature of the cleaning liquid of the cleaning tank; And a first temperature controller for adjusting the cleaning liquid in the cleaning tank to room temperature according to the detection result of the first temperature sensor. The method of claim 3, The first temperature regulator is provided with a first heat exchanger, And the first temperature controller adjusts the temperature of the cleaning liquid in the cleaning tank by introducing the cleaning liquid cooled by the first heat exchanger into the cleaning tank. The method of claim 1, And a second ultrasonic vibrator for vibrating the rinse liquid in the rinse bath. The method of claim 5, A second temperature sensor for detecting a temperature of the rinse liquid of the rinse bath; And a second temperature controller for adjusting the rinse liquid in the rinse bath to room temperature according to the detection result of the second temperature sensor. The method of claim 6, The second temperature controller is provided with a second heat exchanger, And the second temperature controller adjusts the temperature of the rinse liquid in the rinse tank by introducing the rinse liquid cooled by the second heat exchanger into the rinse tank. The method of claim 1, A recovery tank having a third cooler, The recovery tank is cooled by the third cooler to recover the rinse liquid evaporated in the rinse tank, The said rinse liquid collect | recovered in the said collection tank is refluxed to the said rinse tank via the said 2nd reflux pipe, The washing | cleaning apparatus characterized by the above-mentioned. The method of claim 8, The recovery tank is provided with a third temperature sensor for detecting the temperature in the recovery tank, And the third cooler uses the third temperature sensor to cool the inside of the recovery tank so that a difference in vapor pressure occurs in the rinse tank and in the recovery tank. The method of claim 1, A water separation tank for separating water in the rinse liquid cooled by the second cooler, The said rinse liquid which passed the said water separation tank is refluxed to the said rinse tank through the said 2nd reflux pipe, The washing | cleaning apparatus characterized by the above-mentioned. The method according to claim 8 or 9, A water separation tank for separating water in the rinse liquid recovered by the recovery tank, The said rinse liquid which passed the said water separation tank is refluxed to the said rinse tank through the said 2nd reflux pipe, The washing | cleaning apparatus characterized by the above-mentioned. The method of claim 1, A separator for separating the rinse liquid containing the washing liquid into the washing liquid and the rinse liquid, A pool bath for accumulating the rinse liquid containing the washing liquid separated by the separator and the washing liquid of the atmospheric distillation, and introducing the washing liquid into the separator again. Washing apparatus comprising a. The method of claim 12, The said pool is equipped with the lower limit sensor which detects the minimum of the liquid level of the said washing | cleaning liquid and the rinse liquid, The washing | cleaning apparatus characterized by flowing a separated washing | cleaning liquid into the said vacuum still according to the detection result of the said lower limit sensor. The method according to any one of claims 1 to 10, 12, 13, The predetermined rinse liquid is a fluorine-based solvent, characterized in that the cleaning device.

Images