JP4217369B2 - ２層レジスト - Google Patents

２層レジスト Download PDF

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Publication number
JP4217369B2
JP4217369B2 JP2000188051A JP2000188051A JP4217369B2 JP 4217369 B2 JP4217369 B2 JP 4217369B2 JP 2000188051 A JP2000188051 A JP 2000188051A JP 2000188051 A JP2000188051 A JP 2000188051A JP 4217369 B2 JP4217369 B2 JP 4217369B2
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JP
Japan
Prior art keywords
group
resist
layer
acid
substituent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2000188051A
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English (en)
Japanese (ja)
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JP2002006494A5 (https=
JP2002006494A (ja
Inventor
昭一郎 安波
健一郎 佐藤
一良 水谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2000188051A priority Critical patent/JP4217369B2/ja
Publication of JP2002006494A publication Critical patent/JP2002006494A/ja
Publication of JP2002006494A5 publication Critical patent/JP2002006494A5/ja
Application granted granted Critical
Publication of JP4217369B2 publication Critical patent/JP4217369B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2000188051A 2000-06-22 2000-06-22 ２層レジスト Expired - Lifetime JP4217369B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000188051A JP4217369B2 (ja) 2000-06-22 2000-06-22 ２層レジスト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000188051A JP4217369B2 (ja) 2000-06-22 2000-06-22 ２層レジスト

Publications (3)

Publication Number Publication Date
JP2002006494A JP2002006494A (ja) 2002-01-09
JP2002006494A5 JP2002006494A5 (https=) 2006-01-12
JP4217369B2 true JP4217369B2 (ja) 2009-01-28

Family

ID=18687905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000188051A Expired - Lifetime JP4217369B2 (ja) 2000-06-22 2000-06-22 ２層レジスト

Country Status (1)

Country Link
JP (1) JP4217369B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4262516B2 (ja) 2003-05-12 2009-05-13 富士フイルム株式会社 ポジ型レジスト組成物
JP5353469B2 (ja) * 2009-06-22 2013-11-27 Ｊｓｒ株式会社 酸転写樹脂膜形成用組成物及びこれを用いたパターン形成方法
JPWO2015122293A1 (ja) * 2014-02-13 2017-03-30 富士フイルム株式会社 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、タッチパネル表示装置
KR102051340B1 (ko) * 2015-09-30 2019-12-03 후지필름 가부시키가이샤 패턴 형성 방법, 전자 디바이스의 제조 방법, 및 적층체

Also Published As

Publication number Publication date
JP2002006494A (ja) 2002-01-09

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