JP4205565B2 - 薄膜製造方法 - Google Patents

薄膜製造方法 Download PDF

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Publication number
JP4205565B2
JP4205565B2 JP2003403975A JP2003403975A JP4205565B2 JP 4205565 B2 JP4205565 B2 JP 4205565B2 JP 2003403975 A JP2003403975 A JP 2003403975A JP 2003403975 A JP2003403975 A JP 2003403975A JP 4205565 B2 JP4205565 B2 JP 4205565B2
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thin film
gas
temperature
film
film manufacturing
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JP2003403975A
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Japanese (ja)
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JP2005166965A5 (enExample
JP2005166965A (ja
Inventor
健 増田
浩 西岡
雅彦 梶沼
貴一 山田
正紀 植松
紅コウ 鄒
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Ulvac Inc
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Ulvac Inc
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  • Formation Of Insulating Films (AREA)
  • Chemical Vapour Deposition (AREA)
JP2003403975A 2003-12-03 2003-12-03 薄膜製造方法 Expired - Fee Related JP4205565B2 (ja)

Priority Applications (1)

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JP2003403975A JP4205565B2 (ja) 2003-12-03 2003-12-03 薄膜製造方法

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Application Number Priority Date Filing Date Title
JP2003403975A JP4205565B2 (ja) 2003-12-03 2003-12-03 薄膜製造方法

Publications (3)

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JP2005166965A JP2005166965A (ja) 2005-06-23
JP2005166965A5 JP2005166965A5 (enExample) 2006-12-07
JP4205565B2 true JP4205565B2 (ja) 2009-01-07

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JP2003403975A Expired - Fee Related JP4205565B2 (ja) 2003-12-03 2003-12-03 薄膜製造方法

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070218200A1 (en) * 2006-03-16 2007-09-20 Kenji Suzuki Method and apparatus for reducing particle formation in a vapor distribution system
JP5248025B2 (ja) * 2007-03-01 2013-07-31 東京エレクトロン株式会社 ＳｒＴｉＯ３膜の成膜方法およびコンピュータ読取可能な記憶媒体
US20130023062A1 (en) * 2009-12-11 2013-01-24 Takeshi Masuda Thin film manufacturing apparatus, thin film manufacturing method and method for manufacturing semiconductor device
KR102433290B1 (ko) * 2018-02-08 2022-08-17 에스케이하이닉스 주식회사 강유전성 소자의 제조 방법
CN119465078B (zh) * 2024-11-12 2025-09-09 武汉理工大学 一种取向可调控的单斜相二氧化铪薄膜及其制备方法

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JP2005166965A (ja) 2005-06-23

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