JP4185604B2 - 試料解析方法、試料作成方法およびそのための装置 - Google Patents

試料解析方法、試料作成方法およびそのための装置 Download PDF

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JP4185604B2
JP4185604B2 JP32772898A JP32772898A JP4185604B2 JP 4185604 B2 JP4185604 B2 JP 4185604B2 JP 32772898 A JP32772898 A JP 32772898A JP 32772898 A JP32772898 A JP 32772898A JP 4185604 B2 JP4185604 B2 JP 4185604B2
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sample
thin
tem
electron microscope
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JP2000146781A5 (enExample
JP2000146781A (ja
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馨 梅村
博司 柿林
▲泰▼裕 三井
邦康 中村
聡 富松
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Hitachi Ltd
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JP32772898A 1998-11-18 1998-11-18 試料解析方法、試料作成方法およびそのための装置 Expired - Lifetime JP4185604B2 (ja)

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JP2000146781A5 JP2000146781A5 (enExample) 2005-11-24
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Cited By (5)

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CN102944569A (zh) * 2012-12-07 2013-02-27 北京泰德制药股份有限公司 一种脂微球/脂质乳剂微观结构的测定方法
CN103645083A (zh) * 2013-11-22 2014-03-19 上海华力微电子有限公司 Tem样品再制备的方法
CN103900868A (zh) * 2014-02-21 2014-07-02 上海华力微电子有限公司 一种平面透射电镜样品的制备方法
CN106373847A (zh) * 2016-08-30 2017-02-01 上海大学 一种方位可控的微运动平台及其方位控制方法
TWI798255B (zh) * 2017-11-28 2023-04-11 日商日立高新技術科學股份有限公司 剖面加工觀察方法、帶電粒子束裝置

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JP4616509B2 (ja) * 2001-05-11 2011-01-19 公三 藤本 位置決めマーカおよび位置決め装置
EP1630849B1 (en) * 2004-08-27 2011-11-02 Fei Company Localized plasma processing
JP4851804B2 (ja) * 2006-02-13 2012-01-11 株式会社日立ハイテクノロジーズ 集束イオンビーム加工観察装置、集束イオンビーム加工観察システム及び加工観察方法
JP4923716B2 (ja) * 2006-05-11 2012-04-25 株式会社日立製作所 試料分析装置および試料分析方法
US8835880B2 (en) * 2006-10-31 2014-09-16 Fei Company Charged particle-beam processing using a cluster source
JP4937775B2 (ja) * 2007-01-26 2012-05-23 アオイ電子株式会社 微小試料台、その作成方法、微小試料台集合体、および試料ホルダ
JP2009168560A (ja) * 2008-01-15 2009-07-30 Canon Inc 保護膜形成方法及び試料断面観察方法
US20100025580A1 (en) * 2008-08-01 2010-02-04 Omniprobe, Inc. Grid holder for stem analysis in a charged particle instrument
JP5281525B2 (ja) * 2009-09-11 2013-09-04 一般財団法人電力中央研究所 試料作製方法
WO2011055521A1 (ja) * 2009-11-06 2011-05-12 株式会社日立ハイテクノロジーズ 荷電粒子顕微鏡
JP2012112770A (ja) * 2010-11-24 2012-06-14 Jeol Ltd 試料保持方法及び試料保持体
JP6286146B2 (ja) * 2013-07-24 2018-02-28 株式会社日立ハイテクノロジーズ 荷電粒子線装置
CN105928961B (zh) * 2016-06-13 2018-11-13 北京工业大学 一种原位测试样品台和原位测试方法
DE102017212020B3 (de) * 2017-07-13 2018-05-30 Carl Zeiss Microscopy Gmbh Verfahren zur In-situ-Präparation und zum Transfer mikroskopischer Proben, Computerprogrammprodukt sowie mikroskopische Probe
CN110487823B (zh) * 2019-08-13 2021-11-09 西安工业大学 一种粉末颗粒透射电子显微镜试样的制备方法
US12384683B2 (en) * 2020-10-30 2025-08-12 The Regents Of The University Of California Dopant-vacancy centers in materials and methods of making thereof
CN116490745A (zh) * 2021-02-24 2023-07-25 电装波动株式会社 三维测量系统
JP7586779B2 (ja) 2021-06-24 2024-11-19 日本電子株式会社 試料観察方法およびカートリッジ
CN114354664A (zh) * 2022-01-10 2022-04-15 长江存储科技有限责任公司 使用fib制备截面样品的方法和截面样品的观察方法
CN115728107B (zh) * 2022-11-21 2025-02-14 业成科技（成都）有限公司 指纹识别模组的缺陷分析方法
JP2025161433A (ja) 2024-04-12 2025-10-24 日本電子株式会社 集束イオンビーム装置
CN118603695B (zh) * 2024-06-24 2025-11-14 河北大学 适用于原位压缩实验的透射电镜样品的制备方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102944569A (zh) * 2012-12-07 2013-02-27 北京泰德制药股份有限公司 一种脂微球/脂质乳剂微观结构的测定方法
CN103645083A (zh) * 2013-11-22 2014-03-19 上海华力微电子有限公司 Tem样品再制备的方法
CN103645083B (zh) * 2013-11-22 2016-04-27 上海华力微电子有限公司 Tem样品再制备的方法
CN103900868A (zh) * 2014-02-21 2014-07-02 上海华力微电子有限公司 一种平面透射电镜样品的制备方法
CN106373847A (zh) * 2016-08-30 2017-02-01 上海大学 一种方位可控的微运动平台及其方位控制方法
TWI798255B (zh) * 2017-11-28 2023-04-11 日商日立高新技術科學股份有限公司 剖面加工觀察方法、帶電粒子束裝置

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