JP4185002B2 - El表示素子 - Google Patents
El表示素子 Download PDFInfo
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- JP4185002B2 JP4185002B2 JP2004069811A JP2004069811A JP4185002B2 JP 4185002 B2 JP4185002 B2 JP 4185002B2 JP 2004069811 A JP2004069811 A JP 2004069811A JP 2004069811 A JP2004069811 A JP 2004069811A JP 4185002 B2 JP4185002 B2 JP 4185002B2
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- 239000000758 substrate Substances 0.000 claims description 91
- 239000010409 thin film Substances 0.000 claims description 68
- 239000011159 matrix material Substances 0.000 claims description 48
- 239000004020 conductor Substances 0.000 claims description 18
- 125000006850 spacer group Chemical group 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 239000012780 transparent material Substances 0.000 claims description 13
- 239000007769 metal material Substances 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- 229910052709 silver Inorganic materials 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 229920000642 polymer Polymers 0.000 claims description 6
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 6
- 229910052720 vanadium Inorganic materials 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 229910004261 CaF 2 Inorganic materials 0.000 claims description 5
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 5
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 5
- 229910000423 chromium oxide Inorganic materials 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000000945 filler Substances 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 239000011810 insulating material Substances 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 239000002923 metal particle Substances 0.000 claims description 4
- 239000011368 organic material Substances 0.000 claims description 3
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 238000013459 approach Methods 0.000 claims description 2
- 230000008878 coupling Effects 0.000 claims 2
- 238000010168 coupling process Methods 0.000 claims 2
- 238000005859 coupling reaction Methods 0.000 claims 2
- 229910010272 inorganic material Inorganic materials 0.000 claims 1
- 239000011147 inorganic material Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 15
- 239000003990 capacitor Substances 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 229920001621 AMOLED Polymers 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- -1 hydroxyquinoline aluminum Chemical compound 0.000 description 3
- 238000002161 passivation Methods 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- MBPCKEZNJVJYTC-UHFFFAOYSA-N 4-[4-(n-phenylanilino)phenyl]aniline Chemical compound C1=CC(N)=CC=C1C1=CC=C(N(C=2C=CC=CC=2)C=2C=CC=CC=2)C=C1 MBPCKEZNJVJYTC-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 230000000740 bleeding effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 230000005281 excited state Effects 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 230000005283 ground state Effects 0.000 description 2
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 2
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- YOZHUJDVYMRYDM-UHFFFAOYSA-N 4-(4-anilinophenyl)-3-naphthalen-1-yl-n-phenylaniline Chemical compound C=1C=C(C=2C(=CC(NC=3C=CC=CC=3)=CC=2)C=2C3=CC=CC=C3C=CC=2)C=CC=1NC1=CC=CC=C1 YOZHUJDVYMRYDM-UHFFFAOYSA-N 0.000 description 1
- AGVJBLHVMNHENQ-UHFFFAOYSA-N Calcium sulfide Chemical class [S-2].[Ca+2] AGVJBLHVMNHENQ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910019923 CrOx Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910019015 Mg-Ag Inorganic materials 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000005394 sealing glass Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
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- H10K50/805—Electrodes
- H10K50/82—Cathodes
- H10K50/824—Cathodes combined with auxiliary electrodes
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
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- H10K50/81—Anodes
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- H10K50/842—Containers
- H10K50/8428—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
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- H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
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- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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Description
層がさらに形成される。
302 バッファ層、
303 前面基板、
304 機能性薄膜、
304a 開口部、
320 駆動TFT、
321 半導体活性層、
322 ゲート絶縁膜、
323 ゲート電極、
324 中間絶縁膜、
325 ソース電極、
326 ドレイン電極、
327 パッシベーション膜、
328 平坦化膜、
328a 開口部、
330 キャパシタ、
331 キャパシタの第1電極、
332 キャパシタの第2電極、
340 EL素子、
341 第1電極層、
342 発光層、
343 第2電極層、
P 画素領域、
D 駆動領域。
Claims (35)
- 背面基板の一面に、第1電極層、発光層、及び第2電極層が順次形成された前記背面基板と、
前記背面基板と結合し、前記第2電極層と対面する面に導電性ブラックマトリックス層が所定パターンに形成された前面基板と、
前記第2電極層とブラックマトリックス層とを電気的に連結する導電性連結手段と、を具備することを特徴とするEL表示素子。 - 前記連結手段は、第2電極層とブラックマトリックス層間に介在する導電性スペーサよりなることを特徴とする請求項1に記載のEL表示素子。
- 前記導電性スペーサは、外周面にメタルまたはメタル粒子がコーティングされたポリマー粒子よりなることを特徴とする請求項2に記載のEL表示素子。
- 前記連結手段は、前記第2電極層に対面する、導電性ペーストによりブラックマトリックス層に固定された導電性粒子であることを特徴とする請求項1に記載のEL表示素子。
- 前記連結手段は、Ni、Al、Ag、Au、Cuまたはこれらの合金よりなることを特徴とする請求項1に記載のEL表示素子。
- 前記第2電極層とブラックマトリックス層間には前記連結手段を固定する透明な内部充填材が介在することを特徴とする請求項1に記載のEL表示素子。
- 前記連結手段の高さは2μmないし30μmであることを特徴とする請求項1に記載のEL表示素子。
- 前記前面基板の前記第2電極層と対面する面には前記ブラックマトリックス層により区切られるカラーフィルタ層がさらに形成されてなることを特徴とする請求項1に記載のEL表示素子。
- 前記ブラックマトリックス層は前記第2電極層の電圧降下なしに前記第2電極層に電気的に連結されることを特徴とする請求項1に記載のEL表示素子。
- 前記連結手段の金属部分はNi、Al、Ag、Au、Cuまたはこれらの合金よりなることを特徴とする請求項3に記載のEL表示素子。
- 前記発光層は有機物で形成されてなることを特徴とする請求項1に記載のEL表示素子。
- 前記発光層は無機物で形成されてなることを特徴とする請求項1に記載のEL表示素子。
- 薄膜トランジスタ、前記薄膜トランジスタによって駆動される第1電極層、前記第1電極層上に形成された発光層、及び前記発光層上に形成された第2電極層を具備した背面基板と、
前記背面基板と結合し、前記第2電極層に対面して所定のパターンに形成された導電性ブラックマトリックス層を具備してなる前面基板と、
前記第2電極層とブラックマトリックス層とを電気的に連結する複数の導電性連結手段と、を具備することを特徴とするEL表示素子。 - 前記連結手段は、前記第2電極層とブラックマトリックス層間に介在する導電性スペーサであることを特徴とする請求項13に記載のEL表示素子。
- 前記導電性スペーサは、外部表面がメタルまたはメタル粒子でコーティングされたポリマー粒子であることを特徴とする請求項14に記載のEL表示素子。
- 前記連結手段は、前記第2電極層に対面する、導電性ペーストにより前記ブラックマトリックス層に固定された導電性粒子であることを特徴とする請求項13に記載のEL表示素子。
- 前記連結手段は、Ni、Al、Ag、Au、Cu、またはこれらの合金よりなることを特徴とする請求項13に記載のEL表示素子。
- 第2電極層とブラックマトリックス層間には前記連結手段を固定させる透明な内部充填材が介在することを特徴とする請求項13に記載のEL表示素子。
- 前記連結手段は、2μmないし30μmの高さを有することを特徴とする請求項13に記載のEL表示素子。
- 前記ブラックマトリックス層が形成された前面基板と同一面であって、前記ブラックマトリックス層が形成されていない面上にカラーフィルタ層をさらに具備することを特徴とする請求項13に記載のEL表示素子。
- 前記ブラックマトリックス層は、前記第2電極層の電圧降下なしに前記第2電極層に電気的に連結されることを特徴とする請求項13に記載のEL表示素子。
- 背面基板と、
前記背面基板の一面上に形成された第1電極層と、
前記第1電極層の上部に第1電極層と対向して形成された第2電極層と、
前記第1電極層と第2電極層間に介在されて発光するものであって、少なくとも有機発光層を含む発光層と、
前記背面基板に対向し、前記第2電極層の一面に接合される前面基板と、
前記前面基板の前記第2電極層と接する面に設置され、少なくとも前記第2電極層と接する部分に導電性材料が含まれた機能性薄膜とを備え、ここで、前記機能性薄膜は、前記前面基板から透明な材料である第1成分と、金属材料である第2成分とが順次備えられたものであって、前記第1成分は前記前面基板に近づくほどその含量が増加し、前記第2成分は前記前面基板から遠ざかるほどその含量が増加するように形成されることを特徴とするEL表示素子。 - 前記第1成分は、シリコンオキシド、シリコンナイトライド、MgF2、CaF2、Al2O3、SnO2などの透明な絶縁材料よりなる群及び、ITO、IZO、ZnO、In2O3などの透明な導電材料よりなる群のうち少なくともいずれか一つの群から選択される少なくとも一つ以上の透明な材料よりなることを特徴とする請求項22に記載のEL表示素子。
- 前記第2成分は、Fe、Co、V、Ti、Al、Ag、Si、Ge、Y、Zn、Zr、W、Ta、Cu、Ptよりなる群から選択された少なくとも一つ以上の金属材料よりなることを特徴とする請求項22に記載のEL表示素子。
- 前記機能性薄膜は、前記前面基板上にクロムオキシドよりなる第1薄膜と、前記第1薄膜の上部にCrよりなる第2薄膜とを備えることを特徴とする請求項22に記載のEL表示素子。
- 前記機能性薄膜と前記第2電極層間に導電性スペーサまたは導電性ペーストが介在することを特徴とする請求項22に記載の有機EL表示装置。
- 前記機能性薄膜は、前記前面基板を通じて外部から流入する外光を吸収するものであって、前記発光層を通じて発光する領域が所定の画素パターンに開口されるように形成されてなることを特徴とする請求項22に記載のEL表示素子。
- 前記機能性薄膜の開口部はドットまたはストライプ状に形成されてなることを特徴とする請求項27に記載のEL表示素子。
- 背面基板と、
前記背面基板の一面上に形成されたものであって、互いに対向した第1電極層及び第2電極層と、前記第1電極層と第2電極層間に少なくとも有機発光層を含む発光層とを備えて発光する画素領域と、
前記背面基板に対向して前記第2電極層の一面に接合される前面基板と、
前記前面基板の前記第2電極層と接する面に設置されて前記画素領域をその発光部が開口されるように区切り、前記前面基板を通じて外側から流入する外光を吸収するものであって、少なくとも前記第2電極層と接する部分に導電性材料が含まれた機能性薄膜と、を備えることを特徴とするEL表示素子。 - 前記機能性薄膜は、前記前面基板から透明な材料である第1成分と、金属材料である第2成分とが順次備えられたものであって、前記第1成分は前記前面基板に近づくほどその含量が増加し、前記第2成分は前記前面基板から遠ざかるほどその含量が増加するように形成されることを特徴とする請求項29に記載のEL表示素子。
- 前記第1成分は、シリコンオキシド、シリコンナイトライド、MgF2、CaF2、Al2O3、SnO2などの透明な絶縁材料よりなる群及び、ITO、IZO、ZnO、In2O3などの透明な導電材料よりなる群のうち少なくともいずれか一つの群から選択される少なくとも一つ以上の透明な材料よりなることを特徴とする請求項30に記載のEL表示素子。
- 前記第2成分は、Fe、Co、V、Ti、Al、Ag、Si、Ge、Y、Zn、Zr、W、Ta、Cu、Ptよりなる群から選択された少なくとも一つ以上の金属材料よりなることを特徴とする請求項30に記載のEL表示素子。
- 前記機能性薄膜は、前記前面基板上にクロムオキシドよりなる第1薄膜と、前記第1薄膜の上部にCrよりなる第2薄膜とを備えることを特徴とする請求項29に記載のEL表示素子。
- 前記機能性薄膜と前記第2電極層間に導電性スペーサまたは導電性ペーストが介在することを特徴とする請求項29に記載の有機EL表示装置。
- 前記機能性薄膜の開口部はドットまたはストライプ状に形成されてなることを特徴とする請求項29に記載のEL表示素子。
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KR10-2003-0027991A KR100528914B1 (ko) | 2003-05-01 | 2003-05-01 | 유기 전계 발광 표시 장치 |
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US7214967B2 (en) | 2007-05-08 |
JP2004281399A (ja) | 2004-10-07 |
US20040185604A1 (en) | 2004-09-23 |
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US20060124950A1 (en) | 2006-06-15 |
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